专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20130048765A1 Proximity Head Having a Fluid Resistor 有权
标题翻译：具有流体电阻的接近头
公开(公告)号：US20130048765A1
公开(公告)日：2013-02-28
申请号：US13661969
申请日：2012-10-26
申请人： Arnold Kholodenko , Cheng-Yu (Sean) Lin , Russell Martin
发明人： Arnold Kholodenko , Cheng-Yu (Sean) Lin , Russell Martin
IPC分类号： B05B1/00
CPC分类号： H01L21/67051 , Y10S134/902 , Y10T29/49826
摘要： A proximity head defined by a body having a length. The body includes a main bore defined therein and extending along the length. A resistor bore is defined in the body and extends along the length. The resistor bore defined below the main bore. A first plurality of bores defined between the main bore and the resistor bore and a second plurality of bores defined between the resistor bore and an exterior surface of the body. The exterior surface of the body defining a proximity surface of the proximity head.
摘要翻译：由具有长度的主体限定的邻近头。主体包括限定在其中并沿着长度延伸的主孔。电阻孔定义在主体中并沿着长度延伸。电阻孔位于主孔下方。限定在主孔和电阻器孔之间的第一多个孔和限定在电阻器孔和主体的外表面之间的第二多个孔。主体的外表面限定了邻近头部的接近表面。

2. 发明授权

US08317966B2 Apparatus for substantially uniform fluid flow rates relative to a proximity head in processing of a wafer surface by a meniscus 有权
标题翻译：用于在通过弯液面处理晶片表面时相对于邻近头部基本上均匀的流体流速的装置
公开(公告)号：US08317966B2
公开(公告)日：2012-11-27
申请号：US12367515
申请日：2009-02-07
申请人： Arnold Kholodenko , Cheng-Yu (Sean) Lin , Russell Martin
发明人： Arnold Kholodenko , Cheng-Yu (Sean) Lin , Russell Martin
IPC分类号： B29C65/00 , B08B3/00
CPC分类号： H01L21/67051 , Y10S134/902 , Y10T29/49826
摘要： Conditioning fluid flow into a proximity head is provided for fluid delivery to a wafer surface. An upper plenum connected to a plurality of down flow bores is supplied by a main bore. The down flow bores provide fluid into the upper plenum, and a resistor bore is connected to the upper plenum. The resistor bore receives a resistor having a shape so as to limit flow of the fluid through the resistor bore. A lower plenum connected to the resistor bore is configured to receive fluid from the resistor bore as limited by the resistor for flow to a plurality of outlet ports extending between the lower plenum and surfaces of the head surface. Fluid flowing through the upper plenum, the resistor bore with the resistor and the lower plenum is substantially conditioned to define a substantially uniform fluid outflow from the plurality of outlet ports, across the width of the proximity head.
摘要翻译：提供流体流入邻近头部的调节流体输送到晶片表面。连接到多个向下流动孔的上部气室由主孔提供。向下流动孔将流体提供到上部通风室中，并且电阻器孔连接到上部增压室。电阻器孔接收具有形状以阻止流体流过电阻器孔的电阻器。连接到电阻器孔的下部增压室被配置为从电阻器孔接收流体，由电阻器限制，以流向在下部增压室和头部表面的表面之间延伸的多个出口端口。流过上部通风室的流体，具有电阻器和下部增压室的电阻器孔基本上被调节以限定跨过接近头部宽度的多个出口端口的基本均匀的流体流出。

3. 发明申请

US20100037922A1 APPARATUS FOR SUBSTANTIALLY UNIFORM FLUID FLOW RATES RELATIVE TO A PROXIMITY HEAD IN PROCESSING OF A WAFER SURFACE BY A MENISCUS 有权
标题翻译：装置用于通过曼尼斯卡处理WAFER表面的临时头部的大体均匀流体流量
公开(公告)号：US20100037922A1
公开(公告)日：2010-02-18
申请号：US12367515
申请日：2009-02-07
申请人： Arnold Kholodenko , Cheng-Yu (Sean) Lin , Russell Martin
发明人： Arnold Kholodenko , Cheng-Yu (Sean) Lin , Russell Martin
IPC分类号： B08B3/00
CPC分类号： H01L21/67051 , Y10S134/902 , Y10T29/49826
摘要： Conditioning fluid flow into a proximity head is provided for fluid delivery to a wafer surface. An upper plenum connected to a plurality of down flow bores is supplied by a main bore. The down flow bores provide fluid into the upper plenum, and a resistor bore is connected to the upper plenum. The resistor bore receives a resistor having a shape so as to limit flow of the fluid through the resistor bore. A lower plenum connected to the resistor bore is configured to receive fluid from the resistor bore as limited by the resistor for flow to a plurality of outlet ports extending between the lower plenum and surfaces of the head surface. Fluid flowing through the upper plenum, the resistor bore with the resistor and the lower plenum is substantially conditioned to define a substantially uniform fluid outflow from the plurality of outlet ports, across the width of the proximity head.
摘要翻译：提供流体流入邻近头部的调节流体输送到晶片表面。连接到多个向下流动孔的上部气室由主孔提供。向下流动孔将流体提供到上部通风室中，并且电阻器孔连接到上部增压室。电阻器孔接收具有形状以阻止流体流过电阻器孔的电阻器。连接到电阻器孔的下部增压室被配置为从电阻器孔接收流体，由电阻器限制，以流向在下部增压室和头部表面的表面之间延伸的多个出口端口。流过上部通风室的流体，具有电阻器和下部增压室的电阻器孔基本上被调节以限定跨过接近头部宽度的多个出口端口的基本均匀的流体流出。

4. 发明授权

US08313582B2 System, method and apparatus for maintaining separation of liquids in a controlled meniscus 有权
标题翻译：用于在受控弯液面中保持液体分离的系统，方法和装置
公开(公告)号：US08313582B2
公开(公告)日：2012-11-20
申请号：US13370119
申请日：2012-02-09
申请人： Robert O'Donnell , Cheng-Yu (Sean) Lin , Arnold Kholodenko
发明人： Robert O'Donnell , Cheng-Yu (Sean) Lin , Arnold Kholodenko
IPC分类号： B08B3/00
CPC分类号： B08B3/04 , H01L21/67034 , H01L21/67051
摘要： A system and method of forming and using a proximity head. The proximity head includes a head surface including a first zone, a second zone and an inner return zone. The first zone including a first flat surface region and multiple first discrete holes connected to a corresponding first conduit and arranged in a first row. The second zone including a second flat region and multiple second discrete holes connected to a corresponding second conduit. The inner return zone being disposed between and adjacent to the first zone and the second zone and including multiple inner return discrete holes connected to a corresponding inner return conduit and arranged in an inner return row. The first row and the inner return row are parallel. A portion of an edge of each of the inner return discrete holes is recessed into the head surface.
摘要翻译：形成和使用邻近头的系统和方法。邻近头包括头表面，其包括第一区域，第二区域和内部返回区域。所述第一区域包括第一平面区域和连接到对应的第一导管并且布置在第一排中的多个第一离散孔。所述第二区域包括连接到相应的第二导管的第二平坦区域和多个第二离散孔。所述内部返回区域设置在所述第一区域和所述第二区域之间并且邻近所述第二区域并且包括连接到相应的内部返回管道并布置在内部返回行中的多个内部返回离散孔。第一行和内部返回行是平行的。每个内部返回离散孔的边缘的一部分凹入头部表面。

5. 发明授权

US08141566B2 System, method and apparatus for maintaining separation of liquids in a controlled meniscus 有权
标题翻译：用于在受控弯液面中保持液体分离的系统，方法和装置
公开(公告)号：US08141566B2
公开(公告)日：2012-03-27
申请号：US11820590
申请日：2007-06-19
申请人： Robert O'Donnell , Cheng-Yu (Sean) Lin , Arnold Kholodenko
发明人： Robert O'Donnell , Cheng-Yu (Sean) Lin , Arnold Kholodenko
IPC分类号： B08B3/04
CPC分类号： B08B3/04 , H01L21/67034 , H01L21/67051
摘要： A system and method of forming and using a proximity head. The proximity head includes a head surface including a first zone, a second zone and an inner return zone. The first zone including a first flat surface region and multiple first discrete holes connected to a corresponding first conduit and arranged in a first row. The second zone including a second flat region and multiple second discrete holes connected to a corresponding second conduit. The inner return zone being disposed between and adjacent to the first zone and the second zone and including multiple inner return discrete hole connected to a corresponding inner return conduit and arranged in an inner return row. The first row and the inner return row are parallel. A portion of an edge of each of the inner return discrete holes is recessed into the head surface.
摘要翻译：形成和使用邻近头的系统和方法。邻近头包括头表面，其包括第一区域，第二区域和内部返回区域。所述第一区域包括第一平面区域和连接到对应的第一导管并且布置在第一排中的多个第一离散孔。所述第二区域包括连接到相应的第二导管的第二平坦区域和多个第二离散孔。内部返回区域设置在第一区域和第二区域之间并且邻近第一区域并且包括连接到相应的内部返回导管并且布置在内部返回行中的多个内部返回离散孔。第一行和内部返回行是平行的。每个内部返回离散孔的边缘的一部分凹入头部表面。

6. 发明授权

US08246755B2 In situ morphological characterization of foam for a proximity head 有权
标题翻译：用于邻近头部的泡沫的原位形态学表征
公开(公告)号：US08246755B2
公开(公告)日：2012-08-21
申请号：US12613453
申请日：2009-11-05
申请人： Arnold Kholodenko , Gregrory A. Tomasch , Leonid Ginzburg , Cheng-Yu (Sean) Lin
发明人： Arnold Kholodenko , Gregrory A. Tomasch , Leonid Ginzburg , Cheng-Yu (Sean) Lin
IPC分类号： B08B7/00 , B08B7/04
CPC分类号： H01L21/67051 , H01L21/67057
摘要： In an example embodiment, a wet system delivers a flow of cleaning foam through a channel in a proximity head to a meniscus interfacing with a semiconductor wafer. The wet system diverts a sample of the flow from the channel through a transparent cell that is connected to the channel by an input passage that leads from the channel to the transparent cell and by an output passage that leads from the transparent cell back to the channel. The wet system illuminates the sample in the transparent cell with an LED from the top or the back and captures an image of the illuminated sample with a CCD camera. The image shows a morphological attribute of the cleaning foam such as bubble diameter or spacing. The wet system generates a statistical characterization from the morphological attribute and adjusts other attributes of the cleaning foam based on the statistical characterization.
摘要翻译：在示例性实施例中，湿系统将清洁泡沫流通过邻近头部中的通道传送到与半导体晶片接合的弯液面。湿式系统将来自通道的流的样本通过透明单元转移，该透明单元通过从通道引导到透明单元的输入通道连接到通道，并且通过从透明单元引导回通道的输出通道。湿系统使用顶部或背面的LED照亮透明单元中的样品，并用CCD相机捕获照明样品的图像。图像显示清洁泡沫的形态属性，例如气泡直径或间距。湿系统从形态属性生成统计特征，并根据统计特征调整清洗泡沫的其他属性。

7. 发明申请

US20100024842A1 GENERATOR FOR FOAM TO CLEAN SUBSTRATE 有权
标题翻译：泡沫发电机清洁基板
公开(公告)号：US20100024842A1
公开(公告)日：2010-02-04
申请号：US12185780
申请日：2008-08-04
申请人： Arnold Kholodenko , Anwar Husain , Gregory A. Tomasch , Cheng-Yu (Sean) Lin
发明人： Arnold Kholodenko , Anwar Husain , Gregory A. Tomasch , Cheng-Yu (Sean) Lin
IPC分类号： B08B5/00 , B08B3/00 , C23G1/00
CPC分类号： H01L21/67051 , B01F3/04446 , B01F5/0473 , B01F5/0475 , B01F5/0485 , B01F5/0656 , B01F5/0657 , Y10T137/0318
摘要： In an example embodiment, a device for generating a cleaning foam includes a female housing and a male plug. The plug includes an aperture into which a fluid flows from another component of the cleaning system. The plug includes a premix chamber which receives the fluid from the aperture and into which a gas is injected to form a foam. In an example embodiment, the chamber is a hollow cylinder and the gas is injected into the cylinder through channels which are tangential to the cylinder. The plug also includes a solid cylinder with a continuous helical indentation on the outside of the solid cylinder. When the male plug is inserted into the female housing, the continuous helical indentation and the inner surface of the housing form a helical channel through which the foam flows and is further mixed on its way back into the cleaning system.
摘要翻译：在示例性实施例中，用于产生清洁泡沫的装置包括阴壳体和阳插头。塞子包括孔，流体从清洁系统的另一部件流入流体。塞子包括预混合室，其接收来自孔的流体并注入气体以形成泡沫。在一个示例性实施例中，腔室是中空圆柱体，并且气体通过与气缸相切的通道注入气缸。塞子还包括在实心圆柱体的外侧上具有连续的螺旋形凹陷的实心圆柱体。当公插头插入阴壳体中时，连续的螺旋形凹口和壳体的内表面形成螺旋通道，泡沫流过该通道，并进一步在返回到清洁系统中的混合物中混合。

8. 发明授权

US08557051B2 Method for using generator for foam to clean substrate 有权
标题翻译：使用发泡机清洗基材的方法
公开(公告)号：US08557051B2
公开(公告)日：2013-10-15
申请号：US13445868
申请日：2012-04-12
申请人： Arnold Kholodenko , Anwar Husain , Gregory A. Tomasch , Cheng-Yu (Sean) Lin
发明人： Arnold Kholodenko , Anwar Husain , Gregory A. Tomasch , Cheng-Yu (Sean) Lin
IPC分类号： B08B3/00 , B05B7/04
CPC分类号： H01L21/67051 , B01F3/04446 , B01F5/0473 , B01F5/0475 , B01F5/0485 , B01F5/0656 , B01F5/0657 , Y10T137/0318
摘要： A system for cleaning a substrate with a foam performs a method for generating a cleaning foam. In the first operation of the method, the system pumps a fluid into a premix chamber. The premix chamber is a component of a male plug which fits into a female housing in the system. Then the system injects a gas into the premix chamber to initiate generation of the foam from the fluid. The foam flows from the premix chamber into a sealed helical channel formed by a helical indentation on an outside surface of the male plug and an inner surface of the female housing to allow the foam to reach a desired state along a length of the sealed helical channel. In the last operation of the method, the foam outputs from an exit end of the helical channel through the male plug to a component of the system.
摘要翻译：用泡沫清洁基材的系统执行产生清洁泡沫的方法。在该方法的第一操作中，系统将流体泵送到预混合室中。预混合室是配合在系统中的阴壳体中的阳插头的部件。然后系统将气体注入到预混合室中以引发从流体产生泡沫。泡沫从预混合室流入密封的螺旋通道，该密封螺旋通道由阳螺栓的外表面上的螺旋形凹陷和阴壳体的内表面形成，以允许泡沫沿着密封的螺旋通道的长度达到期望的状态。在该方法的最后操作中，泡沫从螺旋通道的出口端通过公插头输出到系统的部件。

9. 发明申请

US20130068261A1 MULTI-STAGE SUBSTRATE CLEANING METHOD AND APPARATUS 有权
标题翻译：多级基板清洗方法和装置
公开(公告)号：US20130068261A1
公开(公告)日：2013-03-21
申请号：US13670006
申请日：2012-11-06
申请人： Arnold Kholodenko , Katrina Mikhaylichenko , Cheng-Yu (Sean) Lin , Mark Wilcoxson , Leon Ginzburg , Mark Kawaguchi
发明人： Arnold Kholodenko , Katrina Mikhaylichenko , Cheng-Yu (Sean) Lin , Mark Wilcoxson , Leon Ginzburg , Mark Kawaguchi
IPC分类号： B08B3/04
CPC分类号： B08B3/041 , H01L21/02057 , H01L21/67051
摘要： A first application of a cleaning material is made to a surface of a substrate. The cleaning material includes one or more viscoelastic materials for entrapping contaminants present on the surface of the substrate. A first application of a rinsing fluid is made to the surface of the substrate so as to rinse the cleaning material from the surface of the substrate. The first application of the rinsing fluid is also performed to leave a residual thin film of the rinsing fluid on the surface of the substrate. A second application of the cleaning material is made to the surface of the substrate having the residual thin film of rinsing fluid present thereon. A second application of the rinsing fluid is then made to the surface of the substrate so as to rinse the cleaning material from the surface of the substrate.
摘要翻译：对基材的表面进行清洁材料的第一次施加。清洁材料包括用于捕获存在于基底表面上的污染物的一种或多种粘弹性材料。冲洗流体的第一次施加是在基材的表面上，以从基材的表面上冲洗清洁材料。洗涤液的第一次施加也被执行以在衬底的表面上留下漂洗液的残余薄膜。清洁材料的第二次应用是在其上具有残留的冲洗液薄膜的基板的表面上。然后将冲洗流体的第二次应用制成到基材的表面，以便从基材的表面漂洗清洁材料。

10. 发明授权

US08317934B2 Multi-stage substrate cleaning method and apparatus 有权
标题翻译：多级基板清洗方法及装置
公开(公告)号：US08317934B2
公开(公告)日：2012-11-27
申请号：US12465594
申请日：2009-05-13
申请人： Arnold Kholodenko , Katrina Mikhaylichenko , Cheng-Yu (Sean) Lin , Mark Wilcoxson , Leon Ginzburg , Mark Kawaguchi
发明人： Arnold Kholodenko , Katrina Mikhaylichenko , Cheng-Yu (Sean) Lin , Mark Wilcoxson , Leon Ginzburg , Mark Kawaguchi
IPC分类号： B08B5/04 , B08B3/00 , B08B7/04
CPC分类号： B08B3/041 , H01L21/02057 , H01L21/67051
摘要： A first application of a cleaning material is made to a surface of a substrate. The cleaning material includes one or more viscoelastic materials for entrapping contaminants present on the surface of the substrate. A first application of a rinsing fluid is made to the surface of the substrate so as to rinse the cleaning material from the surface of the substrate. The first application of the rinsing fluid is also performed to leave a residual thin film of the rinsing fluid on the surface of the substrate. A second application of the cleaning material is made to the surface of the substrate having the residual thin film of rinsing fluid present thereon. A second application of the rinsing fluid is then made to the surface of the substrate so as to rinse the cleaning material from the surface of the substrate.
摘要翻译：对基材的表面进行清洁材料的第一次施加。清洁材料包括用于捕获存在于基底表面上的污染物的一种或多种粘弹性材料。冲洗流体的第一次施加是在基材的表面上，以从基材的表面上冲洗清洁材料。洗涤液的第一次施加也被执行以在衬底的表面上留下漂洗液的残余薄膜。清洁材料的第二次应用是在其上具有残留的冲洗液薄膜的基板的表面上。然后将冲洗流体的第二次应用制成到基材的表面，以便从基材的表面漂洗清洁材料。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式