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1. 发明专利

JP2008142884A Flexible membrane for carrier head 有权
标题翻译：用于运输头的柔性膜
公开(公告)号：JP2008142884A
公开(公告)日：2008-06-26
申请号：JP2007298308
申请日：2007-11-16
申请人： Applied Materials Inc , アプライドマテリアルズインコーポレイテッドApplied Materials,Incorporated
发明人： ZUNIGA STEVEN M , NAGENGAST ANDREW J , OH JEONGHOON
IPC分类号： B24B37/32 , H01L21/304
CPC分类号： B24B37/30 , Y10T428/24174 , Y10T428/24182
摘要： PROBLEM TO BE SOLVED: To provide chemical and mechanical polishing of a substrate, and more specifically, to provide a carrier head exhibiting excellent performance used for the chemical and mechanical polishing. SOLUTION: The carrier head 100 has a base assembly 104, a retaining ring assembly 200, a carrier ring 400, and flexible membranes 300, 500. The flexible membrane has a main portion and an outer annular portion, and the junction between the main portion and the outer annular portion comprises: a peripheral edge hinge; and an annular recess above the hinge along the outer wall of the outer annular portion. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：为了提供对基材的化学和机械抛光，并且更具体地，提供一种显示出用于化学和机械抛光的优异性能的载体头。解决方案：载体头部100具有基部组件104，保持环组件200，载体环400和柔性膜300,500.柔性膜具有主要部分和外部环形部分，主要部分和外部环形部分包括：周边铰链; 以及沿着外环形部分的外壁的铰链上方的环形凹部。版权所有（C）2008，JPO＆INPIT

2. 发明专利

JP2007227915A Surface polishing 有权
标题翻译：表面抛光
公开(公告)号：JP2007227915A
公开(公告)日：2007-09-06
申请号：JP2007035270
申请日：2007-02-15
申请人： Applied Materials Inc , アプライドマテリアルズインコーポレイテッドApplied Materials,Incorporated
发明人： BONNER BENJAMIN A , MCREYNOLDS PETER , GREGORY E MENK , PRABHU GOPALAKRISHNA B , ANAND N IYER , LEUNG GARLEN C , ZUNIGA STEVEN M , RONDUM ERIK S , AU HENRY H
IPC分类号： H01L21/304 , B24B37/20
CPC分类号： B24B21/06 , B24B21/04 , B24B21/12 , B24B37/12 , B24B37/205 , B24B37/26 , B24D11/001
摘要： PROBLEM TO BE SOLVED: To provide an efficient CMP step providing not only a fast polishing rate but also a finish processed flat substrate surface. SOLUTION: The polishing device comprises a rotational platen 30. In addition, it further comprises a sub pad on the platen for supporting a polishing sheet 34. A groove is formed in the sub pad. The polishing device further comprises a vacuum source. The vacuum source is connected with the groove of the sub pad. In addition, the vacuum source is constituted such that vacuum sufficient for drawing each portion of the polishing sheet into the groove of the sub pad is added such that a groove is produced in a polished surface. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供不仅提供快速抛光速率而且提供精加工的平坦基板表面的有效的CMP步骤。解决方案：抛光装置包括旋转压板30.此外，其还包括用于支撑抛光片34的压板上的子焊盘。在子焊盘中形成凹槽。抛光装置还包括真空源。真空源与子垫的凹槽连接。此外，真空源被构造成使得足以将抛光片的每个部分拉入子焊盘的凹槽中的真空度被添加，使得在抛光表面中产生凹槽。版权所有（C）2007，JPO＆INPIT

3. 发明专利

JP2013116554A Retaining ring, flexible membrane for applying load to retaining ring, and retaining ring assembly 有权
标题翻译：保持环，用于施加负载到保持环的柔性膜和保持环组件
公开(公告)号：JP2013116554A
公开(公告)日：2013-06-13
申请号：JP2013024749
申请日：2013-02-12
申请人： Applied Materials Inc , アプライドマテリアルズインコーポレイテッドApplied Materials,Incorporated
发明人： ZUNIGA STEVEN M , NAGENGAST ANDREW J , OH JEONGHOON
IPC分类号： B24B37/30 , B24B37/32 , H01L21/304
CPC分类号： B24B37/32
摘要： PROBLEM TO BE SOLVED: To provide a carrier head having: a retaining ring assembly which is formed of a retaining ring retaining a substrate, and a flexible membrane applying a load to the retaining ring in such a way of reducing nonuniform wear; a base assembly; and a carrier ring.SOLUTION: The retaining ring assembly included in the carrier head 100 has a first flexible membrane 300 shaped to provide an annular chamber 350 and an annular retaining ring 200 retaining the substrate 10, wherein annular concentric projections of the first flexible membrane 300 are sized to be fitted into annular concentric recesses of the annular retaining ring 200.
摘要翻译：要解决的问题：提供一种承载头，其具有：由保持基板的保持环形成的保持环组件和以减少不均匀磨损的方式向保持环施加负载的柔性膜; 基座组件和一个载体环。包括在承载头100中的保持环组件具有形成为提供环形室350的第一柔性膜300和保持基板10的环形保持环200，其中第一柔性膜300的环形同心突起为尺寸适合安装在环形保持环200的环形同心凹槽中。版权所有（C）2013，JPO＆INPIT

4. 发明专利

JP2008137149A Retaining ring, flexible membrane for applying load to retaining ring, and retaining ring assembly 有权
标题翻译：保持环，用于施加负载到保持环的柔性膜和保持环组件
公开(公告)号：JP2008137149A
公开(公告)日：2008-06-19
申请号：JP2007298303
申请日：2007-11-16
申请人： Applied Materials Inc , アプライドマテリアルズインコーポレイテッドApplied Materials,Incorporated
发明人： ZUNIGA STEVEN M , NAGENGAST ANDREW J , OH JEONGHOON
IPC分类号： B24B37/32 , H01L21/304
CPC分类号： B24B37/32
摘要： PROBLEM TO BE SOLVED: To provide a carrier head capable of independently adjusting a load from a retainer ring applied to a polishing pad and a load from a carrier ring applied to the polishing pad. SOLUTION: The carrier head consists of: a base assembly 104; a retaining ring assembly having a retaining ring 200, an annular chamber 350, and a first flexible membrane 300; a carrier ring 400; and a second flexible membrane 500, wherein annular concentric projections of the first flexible membrane 300 are sized to fit into an annular concentric recesses of the retaining ring 200. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供能够独立地调整施加到抛光垫的保持环的负载和从施加到抛光垫的载体环的载荷的载体头。解决方案：承载头包括：基座组件104; 具有保持环200，环形室350和第一柔性膜300的保持环组件; 载体环400; 和第二柔性膜500，其中第一柔性膜300的环形同心突起的尺寸被设计成装配到保持环200的环形同心凹槽中。（C）2008年，JPO和INPIT

5. 发明专利

JP2005328103A Support head having flexible membrane for chemical mechanical polishing system 有权
标题翻译：具有化学机械抛光系统柔性膜支撑头
公开(公告)号：JP2005328103A
公开(公告)日：2005-11-24
申请号：JP2005234735
申请日：2005-08-12
申请人： Applied Materials Inc , アプライドマテリアルズインコーポレイテッドApplied Materials,Incorporated
发明人： ZUNIGA STEVEN M , BIRANG MANOOCHER , CHEN HUNG , KO SEN-HOU
IPC分类号： B24B37/30 , B24B37/32 , B24B49/16 , H01L21/304 , B24B37/04
CPC分类号： B24B37/30 , B24B37/32
摘要： PROBLEM TO BE SOLVED: To provide a new support head for a chemical mechanical polishing apparatus. SOLUTION: A support head 100 includes a housing 102, a base 104, a load mechanism 108, a gimbal mechanism 106 and a substrate-backing assembly 112. The substrate backing assembly includes a support structure 114 disposed under the base, a ring flexure 116 which is substantially horizontal for coupling the support structure to the base, and a flexible membrane 118 which is to be coupled to the support structure. The flexible membrane has an attachment surface 274 for the substrate and extends directly beneath the base, to form a chamber 290. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：为化学机械抛光装置提供新的支撑头。解决方案：支撑头100包括壳体102，基座104，负载机构108，万向架机构106和基板背衬组件112.衬底背衬组件包括设置在基座下方的支撑结构114，环形挠曲件116，其基本上是水平的，用于将支撑结构连接到基座;以及柔性膜118，其将被联接到支撑结构。柔性膜具有用于基底的附接表面274并且直接在底部下方延伸以形成腔290.（C）2006，JPO和NCIPI

6. 发明专利

JP2013116555A Flexible membrane for carrier head 有权
标题翻译：用于运输头的柔性膜
公开(公告)号：JP2013116555A
公开(公告)日：2013-06-13
申请号：JP2013024750
申请日：2013-02-12
申请人： Applied Materials Inc , アプライドマテリアルズインコーポレイテッドApplied Materials,Incorporated
发明人： ZUNIGA STEVEN M , NAGENGAST ANDREW J , OH JEONGHOON
IPC分类号： B24B37/32 , H01L21/304
CPC分类号： B24B37/30 , Y10T428/24174 , Y10T428/24182
摘要： PROBLEM TO BE SOLVED: To provide a carrier head having: a retaining ring assembly formed of a retaining ring retaining a substrate, and a flexible membrane applying a load to the retaining ring in such a way of reducing nonuniform wear and elongating the ring life; a base assembly; and a carrier ring.SOLUTION: The carrier head 100 includes: the retaining ring 200 retaining the substrate 10; the flexible membrane 300 applying a load to the retaining ring 200; and the carrier ring 400. The flexible membrane 300 has a main part and an outside annular part, and the joining part of the main part and outside annular part includes a circumferential edge part hinge and an annular recess on the hinge along an outer wall of the outside annular part.
摘要翻译：要解决的问题：提供一种承载头，其具有：保持环组件，其由保持基板的保持环和向保持环施加负载的柔性膜形成，以减少不均匀的磨损并延长戒指生命基座组件和一个载体环。解决方案：承载头100包括：保持环200保持基板10; 柔性膜300向保持环200施加负载; 柔性膜300具有主要部分和外部环形部分，并且主要部分和外部环形部分的接合部分包括周向边缘部分铰链和铰链上的环形凹部沿着外部壁的外壁外部环形部分。版权所有（C）2013，JPO＆INPIT

7. 发明专利

JP2009065195A Retaining ring for chemical mechanical polishing head 有权
标题翻译：化学机械抛光头保持环
公开(公告)号：JP2009065195A
公开(公告)日：2009-03-26
申请号：JP2008290041
申请日：2008-11-12
申请人： Applied Materials Inc , アプライドマテリアルズインコーポレイテッドApplied Materials,Incorporated
发明人： ZUNIGA STEVEN M , BIRANG MANOOCHER , CHEN HUNG , KO SEN-HOU
IPC分类号： H01L21/304 , B24B37/30 , B24B37/32 , B24B49/16
CPC分类号： B24B37/30 , B24B37/32
摘要： PROBLEM TO BE SOLVED: To provide a retaining ring for a chemical mechanical polishing head capable of applying an even load all over a substrate during a chemical mechanical polishing operation. SOLUTION: The retaining ring 110 for the chemical mechanical polishing head is formed of an annular body having a lower face 230, a cylinder inner face 232, a cylinder outer face, an uppermost face, and a passage 236; and is fixed on the base of a support head 100 in the polishing head. The passage 236 extends through the annular body from its inner face to its outer face, and is formed in a position spaced from the lower face 230. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够在化学机械抛光操作期间在整个基板上施加均匀负载的化学机械抛光头的保持环。解决方案：用于化学机械抛光头的保持环110由具有下表面230，气缸内表面232，气缸外表面，最上表面和通道236的环形体形成; 并且固定在研磨头中的支撑头100的基部上。通道236从其内表面延伸穿过环形体到其外表面，并且形成在与下表面230间隔开的位置。（C）2009，JPO＆INPIT

8. 发明专利

JP2008147646A Carrier head with holder ring and carrier ring 有权
标题翻译：带支架环和承载环的承载头
公开(公告)号：JP2008147646A
公开(公告)日：2008-06-26
申请号：JP2007303516
申请日：2007-11-22
申请人： Applied Materials Inc , アプライドマテリアルズインコーポレイテッドApplied Materials,Incorporated
发明人： ZUNIGA STEVEN M , NAGENGAST ANDREW J , OH JEONGHOON
IPC分类号： H01L21/304 , B24B37/04
CPC分类号： B24B37/32 , B24B37/30
摘要： PROBLEM TO BE SOLVED: To provide a carrier head suitable for CMP (Chemical Mechanical Polishing) of semiconductor. SOLUTION: The carrier head includes: a housing 102; a base assembly 104; a holder ring 200; a carrier ring 400; and flexible membranes 300 and 500. The base assembly 104 can move to and from the housing 102 vertically. The holder ring 200 is connected to the base assembly 104 through a first flexible membrane 300, can move to and from the base assembly vertically, has an under surface constituted so as to contact with a polishing pad, and has an inner peripheral surface constituted so as to hold a substrate 10 by surrounding an edge of the substrate. The carrier ring 400 is connected to the base assembly 104 being fixed vertically to the base assembly, surrounds the holder ring in order to prevent horizontal movement of the holder ring 200, and has an under surface constituted so as to contact with the polishing pad. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供适用于半导体的CMP（化学机械抛光）的载体头。解决方案：承载头包括：壳体102; 基座组件104; 保持环200; 载体环400; 以及柔性膜300和500.基座组件104可以垂直于壳体102移动和从壳体102移动。保持环200通过第一柔性膜300连接到基部组件104，可以垂直于基部组件移动和移动，具有构造成与抛光垫接触的下表面，并且具有如下构造的内周表面以便通过围绕基板的边缘来保持基板10。承载环400连接到垂直于基座组件固定的基座组件104，围绕保持环以防止保持环200的水平移动，并且具有构造成与抛光垫接触的下表面。版权所有（C）2008，JPO＆INPIT

9. 发明专利

JP2008131049A Carrier ring for carrier heads 有权
标题翻译：运输车头架
公开(公告)号：JP2008131049A
公开(公告)日：2008-06-05
申请号：JP2007298304
申请日：2007-11-16
申请人： Applied Materials Inc , アプライドマテリアルズインコーポレイテッドApplied Materials,Incorporated
发明人： ZUNIGA STEVEN M , NAGENGAST ANDREW J , OH JEONGHOON
IPC分类号： H01L21/304 , B24B37/04
CPC分类号： B24B37/32
摘要： PROBLEM TO BE SOLVED: To independently adjust a load from a holding ring to a polishing pad and a load from a carrier ring to the polishing ring. SOLUTION: A carrier ring for a carrier head is provided with a carrier head 100 having a base assembly 104, a holding ring assembly, a carrier ring 400, and a flexible film 500. The carrier ring has an annular upper side, and an annular lower side having a lower face with an inner diameter smaller than that in the upper face of the annular upper side. Further, the carrier ring has the lower face surrounding the holding ring and coming in contact with the polishing pad. COPYRIGHT: (C)2008,JPO&INPIT

10. 发明专利

JP2007335895A Chemical mechanical polishing membrane 有权
标题翻译：化学机械抛光膜
公开(公告)号：JP2007335895A
公开(公告)日：2007-12-27
申请号：JP2007218692
申请日：2007-08-24
申请人： Applied Materials Inc , アプライドマテリアルズインコーポレイテッドApplied Materials,Incorporated
发明人： ZUNIGA STEVEN M , BIRANG MANOOCHER , CHEN HUNG , KO SEN-HOU
IPC分类号： H01L21/304 , B24B37/30 , B24B37/32 , B24B49/16
CPC分类号： B24B37/30 , B24B37/32
摘要： PROBLEM TO BE SOLVED: To provide a membrane in a support head for applying a substantially even load to the overall substrate of a chemical mechanical polishing unit which optimizes a polishing capability and ensures a desired flatness and finish. SOLUTION: This membrane 162 is a chemical mechanical polishing membrane 162 comprising an annular membrane 167 with an external surface configured in a way that it contacts the substrate during polishing and an edge 164 projecting from this annular membrane 167. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：为了在化学机械抛光单元的整个基板上提供基本上均匀的负载的支撑头中的膜，其优化抛光能力并确保期望的平整度和光洁度。解决方案：该膜162是化学机械抛光膜162，其包括环形膜167，其外表面以抛光过程中与衬底接触的方式配置，以及从该环形膜167突出的边缘164。（C）2008，JPO＆INPIT

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