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1. 发明公开

EP0853380A3 High efficiency impedance matching network 失效
标题翻译：阻抗匹配电路以高效率
公开(公告)号：EP0853380A3
公开(公告)日：1999-09-08
申请号：EP98300176.9
申请日：1998-01-12
申请人： Applied Materials, Inc.
发明人： Mett, Richard R. , Greenway, Robert D. , Bilek, Gabriel , Joshi, Ajey
IPC分类号： H03H7/38
CPC分类号： H03H7/38
摘要： A high efficiency radio frequency (RF) impedance matching network (102) containing an "L-type" inductor-capacitor (LC) circuit (110, 116) where the capacitor (110) is a variable capacitor (110) coupled from an input port (128) to ground (126) and the inductor (116) is a variable inductance inductor (116) coupled from the input port (128) to an output port (132). A blocking capacitor (120) is provided between the inductor (116) and the output port (132) and a ceramic capacitor (112) is coupled in parallel across the variable capacitor (110). The impedance match is tuned by physically adjusting tuning elements of both the inductor (116) and capacitor (110). The variable inductor (116) contains an improved inductor tuning element (236) that optimizes current flow in the tuning elements and inductor. To further improve the efficiency of the matching network, the assembly uses an improved enclosure interior finish and various circuit optimization techniques that reduce contributions to match loop resistance.

2. 发明公开

EP0855725A2 Slip ring for a variable capacitor 失效
标题翻译： Schleifringfüreinen variablen Kondensator
公开(公告)号：EP0855725A2
公开(公告)日：1998-07-29
申请号：EP98300175.1
申请日：1998-01-12
申请人： Applied Materials, Inc.
发明人： Mett, Richard R. , Greenway, Robert D. , Bilek, Gabriel , Elliott, Steven O.
IPC分类号： H01G5/011
CPC分类号： H03H7/38
摘要： A variable capacitor (110) containing a high efficiency slip ring (218) for optimally coupling RF power to the capacitor. The slip ring contains a beveled annulus (312) that abuts a rotor contact portion (316). The rotor contact portion attached to a shaft (214) that supports the rotor blades (212) of the capacitor. The shaft passes through the aperture and the slip ring. The slip ring further contains a biasing means (308, 400) that maintains the beveled annulus in contact with the rotor contact portion.
摘要翻译：一种可变电容器（110），其包含用于将RF功率最优化耦合到所述电容器的高效滑环（218）。滑环包含与转子接触部分（316）相邻的斜面环（312）。转子接触部分附接到支撑电容器的转子叶片（212）的轴（214）上。轴穿过孔和滑环。滑环还包含一个偏压装置（308,400），该偏置装置使倾斜的环与转子接触部分保持接触。

3. 发明公开

EP0853380A2 High efficiency impedance matching network 失效
标题翻译： Impedanzanpassungsschaltung mit hohem Wirkungsgrad
公开(公告)号：EP0853380A2
公开(公告)日：1998-07-15
申请号：EP98300176.9
申请日：1998-01-12
申请人： Applied Materials, Inc.
发明人： Mett, Richard R. , Greenway, Robert D. , Bilek, Gabriel , Joshi, Ajey
IPC分类号： H03H7/38
CPC分类号： H03H7/38
摘要： A high efficiency radio frequency (RF) impedance matching network (102) containing an "L-type" inductor-capacitor (LC) circuit (110, 116) where the capacitor (110) is a variable capacitor (110) coupled from an input port (128) to ground (126) and the inductor (116) is a variable inductance inductor (116) coupled from the input port (128) to an output port (132). A blocking capacitor (120) is provided between the inductor (116) and the output port (132) and a ceramic capacitor (112) is coupled in parallel across the variable capacitor (110). The impedance match is tuned by physically adjusting tuning elements of both the inductor (116) and capacitor (110). The variable inductor (116) contains an improved inductor tuning element (236) that optimizes current flow in the tuning elements and inductor. To further improve the efficiency of the matching network, the assembly uses an improved enclosure interior finish and various circuit optimization techniques that reduce contributions to match loop resistance.
摘要翻译：一种包含“L型”电感器 - 电容器（LC）电路（110,116）的高效射频（RF）阻抗匹配网络（102），其中电容器（110）是可变电容器（110）端口（128）到地（126），并且电感器（116）是从输入端口（128）耦合到输出端口（132）的可变电感电感器（116）。隔离电容器（120）设置在电感器（116）和输出端口（132）之间，并且陶瓷电容器（112）并联连接在可变电容器（110）上。通过物理地调节电感器（116）和电容器（110）的调谐元件来调谐阻抗匹配。可变电感器（116）包含改进的电感器调谐元件（236），其优化调谐元件和电感器中的电流。为了进一步提高匹配网络的效率，组件使用改进的外壳内部表面处理和各种电路优化技术，减少对匹配环路电阻的贡献。

4. 发明公开

EP0887835A3 Diagnostic pedestal assembly for a semiconductor wafer processing system 失效
标题翻译：用于半导体晶片加工系统的诊断装置
公开(公告)号：EP0887835A3
公开(公告)日：1999-12-29
申请号：EP98304921.4
申请日：1998-06-23
申请人： Applied Materials, Inc.
发明人： Ke, Kuang-Han , Lindley, Roger A. , Shan, Hongching , Mett, Richard R.
IPC分类号： H01J37/32
CPC分类号： H01L21/67109 , H01J37/32935 , H01J2237/244 , H01L21/67253 , H01L21/68785
摘要： A diagnostic pedestal assembly (104) for measuring ion current and DC bias voltage within a high-power plasma reaction chamber (804) of a semiconductor wafer processing system (802). The diagnostic pedestal assembly (104) contains an aperture located in a surface (114) of the pedestal (208) and a probe element (112) that is supported within the aperture.

5. 发明公开

EP0887835A2 Diagnostic pedestal assembly for a semiconductor wafer processing system 失效
标题翻译：诊断信息Halbleiterwaferbearbeitungssystem
公开(公告)号：EP0887835A2
公开(公告)日：1998-12-30
申请号：EP98304921.4
申请日：1998-06-23
申请人： Applied Materials, Inc.
发明人： Ke, Kuang-Han , Lindley, Roger A. , Shan, Hongching , Mett, Richard R.
IPC分类号： H01J37/32
CPC分类号： H01L21/67109 , H01J37/32935 , H01J2237/244 , H01L21/67253 , H01L21/68785
摘要： A diagnostic pedestal assembly (104) for measuring ion current and DC bias voltage within a high-power plasma reaction chamber (804) of a semiconductor wafer processing system (802). The diagnostic pedestal assembly (104) contains an aperture located in a surface (114) of the pedestal (208) and a probe element (112) that is supported within the aperture.
摘要翻译：一种用于测量半导体晶片处理系统（802）的大功率等离子体反应室（804）内的离子电流和DC偏置电压的诊断基座组件（104）。诊断基座组件（104）包含位于基座（208）的表面（114）中的孔和支撑在孔内的探针元件（112）。

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