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1. 发明授权

US07227612B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07227612B2
公开(公告)日：2007-06-05
申请号：US10937871
申请日：2004-09-10
申请人： Antonius Johannes Van Der Net , Tjarko Adriaan Rudolf Van Empel , Ronald Van Der Ham
发明人： Antonius Johannes Van Der Net , Tjarko Adriaan Rudolf Van Empel , Ronald Van Der Ham
IPC分类号： G03B27/52 , G03B27/42
CPC分类号： G03F7/70933 , G03F7/70775 , G03F7/70883
摘要： A lithographic apparatus includes a support constructed to support a patterning device that is capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, an interior space through which an interferometer beam propagates, and a first gas supply for supplying a purge gas to inhibit contamination of the projection system. The purge gas has a predetermined refractive index. The apparatus also includes a second gas supply for supplying a conditioning gas to the interior space for conditioning the interior space, and a refractive index matching system arranged to match the refractive index of the conditioning gas to the predetermined refractive index of the purge gas.
摘要翻译：光刻设备包括：支撑构件，用于支撑图案形成装置，该构图装置能够在其横截面中赋予具有图案的辐射束以形成图案化的辐射束;构造成保持衬底的衬底台;被配置为投影图案化的辐射束到基板的目标部分，干涉仪光束传播的内部空间以及用于供应吹扫气体以抑制投影系统的污染的第一气体供应。净化气体具有预定的折射率。该设备还包括用于将调节气体供应到内部空间用于调节内部空间的第二气体供应源，以及折射率匹配系统，其布置成使调节气体的折射率与净化气体的预定折射率相匹配。

2. 发明授权

US07924399B2 Assembly comprising a conditioning system and at least one object, a conditioning system, a lithographic apparatus and methods 有权
标题翻译：组件包括调节系统和至少一个物体，调节系统，光刻设备和方法
公开(公告)号：US07924399B2
公开(公告)日：2011-04-12
申请号：US11389493
申请日：2006-03-27
申请人： Ronald Van Der Ham , Tjarko Adriaan Rudolf Van Empel , Herman Vogel , Niek Jacobus Johannes Roset
发明人： Ronald Van Der Ham , Tjarko Adriaan Rudolf Van Empel , Herman Vogel , Niek Jacobus Johannes Roset
IPC分类号： A61N5/00 , G03B27/32 , G03B27/42 , G03B27/52 , G03B27/58 , G03B27/62
CPC分类号： G03F7/70933 , G03F7/70775 , G03F7/70858 , G03F7/70866 , Y10T137/8593
摘要： An assembly including a conditioning system and an object movable into and/or out of an area to be conditioned is disclosed. The conditioning system has fluid outlet passages to supply conditioning fluid to the area to be conditioned and is configured to adjust outflow of the conditioning fluid from the fluid outlet passages depending on a position of the object.
摘要翻译：公开了一种组件，其包括调节系统和可移动到待调节区域中和/或之外的物体。调节系统具有流体出口通道，以将调节流体供应到待调节的区域，并且构造成根据物体的位置调节调节流体与流体出口通道的流出。

3. 发明授权

US08441610B2 Assembly comprising a conditioning system and at least one object, a conditioning system, a lithographic apparatus and methods 失效
标题翻译：组件包括调节系统和至少一个物体，调节系统，光刻设备和方法
公开(公告)号：US08441610B2
公开(公告)日：2013-05-14
申请号：US13084372
申请日：2011-04-11
申请人： Ronald Van Der Ham , Tjarko Adriaan Rudolf Van Empel , Herman Vogel , Niek Jacobus Johannes Roset
发明人： Ronald Van Der Ham , Tjarko Adriaan Rudolf Van Empel , Herman Vogel , Niek Jacobus Johannes Roset
IPC分类号： F03B11/02 , F15B13/00 , F16L3/01 , G03B27/52 , G03B27/32 , G03B27/42
CPC分类号： G03F7/70933 , G03F7/70775 , G03F7/70858 , G03F7/70866 , Y10T137/8593
摘要： An assembly including a conditioning system and an object moveable into and/or out of an area to be conditioned is disclosed. The conditioning system has fluid outlet passages to supply conditioning fluid to the area to be conditioned and is configured to adjust outflow of the conditioning fluid from the fluid outlet passages depending on a position of the object.
摘要翻译：公开了一种组件，其包括调节系统和可移动到待调节区域中和/或之外的物体。调节系统具有流体出口通道，以将调节流体供应到待调节的区域，并且构造成根据物体的位置调节调节流体与流体出口通道的流出。

4. 发明授权

US07432513B2 Gas shower, lithographic apparatus and use of a gas shower 有权
标题翻译：气体淋浴，光刻设备和使用气体淋浴
公开(公告)号：US07432513B2
公开(公告)日：2008-10-07
申请号：US11255195
申请日：2005-10-21
申请人： Tjarko Adriaan Rudolf Van Empel , Ronald Van Der Ham , Niek Jacobus Johannes Roset
发明人： Tjarko Adriaan Rudolf Van Empel , Ronald Van Der Ham , Niek Jacobus Johannes Roset
IPC分类号： G01N21/01
CPC分类号： G03F7/70908
摘要： A gas shower to condition at least one optical path in an optical apparatus, wherein the gas shower includes a gas distribution chamber having a shower outlet side to supply gas to the optical path, the gas distribution chamber being configured to distribute the gas to the optical path, wherein the gas distribution chamber includes a substantially sharp tapered tip.
摘要翻译：一种用于调节光学装置中的至少一个光路的气体淋浴，其中所述气体淋浴器包括具有喷淋出口侧的气体分配室，用于向所述光路供应气体，所述气体分配室被配置为将所述气体分配到所述光学路径，其中所述气体分配室包括基本尖锐的锥形尖端。

5. 发明授权

US07728951B2 Lithographic apparatus and method for conditioning an interior space of a device manufacturing apparatus 失效
标题翻译：用于调节装置制造装置的内部空间的平版印刷装置和方法
公开(公告)号：US07728951B2
公开(公告)日：2010-06-01
申请号：US11238156
申请日：2005-09-29
申请人： Tjarko Adriaan Rudolf Van Empel , Ronald Van Der Ham , Niek Jacobus Johannes Roset
发明人： Tjarko Adriaan Rudolf Van Empel , Ronald Van Der Ham , Niek Jacobus Johannes Roset
IPC分类号： G03B27/52 , G03B27/68 , G03B27/42 , G03B27/58
CPC分类号： G03F7/70933 , G03F7/70775 , G03F7/70883
摘要： A lithographic apparatus is disclosed that includes a first gas shower configured to supply a first gas flow to an interior space of the apparatus, and a second gas shower configured to supply a second gas flow to the interior space of the apparatus, the gas showers configured to direct the first gas flow and the second gas flow at least partly towards each other. Also, a method for conditioning an interior space of a device manufacturing apparatus is provided that includes supplying a first conditioned gas flow and a second conditioned gas flow to the interior space, such that the first conditioned gas flow and the second conditioned gas flow are at least partly directed to each other.
摘要翻译：公开了一种光刻设备，其包括构造成将第一气流提供给设备的内部空间的第一气体淋浴器和被配置为向设备的内部空间供应第二气流的第二气体淋浴器，以引导第一气流和第二气流至少部分地朝向彼此。此外，还提供了一种用于调节装置制造装置的内部空间的方法，其包括向所述内部空间供应第一调节气体流和第二调节气体流，使得所述第一调节气体流和所述第二调节气体流在最少部分指向彼此。

6. 发明授权

US07057702B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07057702B2
公开(公告)日：2006-06-06
申请号：US10873650
申请日：2004-06-23
申请人： Joeri Lof , Johannes Catharinus Hubertus Mulkens , Jeroen Johannes Sophia Maria Mertens , Antonius Johannes Van Der Net , Ronald Van Der Ham , Nicolas Lallemant , Marcel Beckers
发明人： Joeri Lof , Johannes Catharinus Hubertus Mulkens , Jeroen Johannes Sophia Maria Mertens , Antonius Johannes Van Der Net , Ronald Van Der Ham , Nicolas Lallemant , Marcel Beckers
IPC分类号： G03B27/52
CPC分类号： G03F7/70933 , G03F7/70341 , G03F7/70808
摘要： A lithographic projection apparatus is disclosed. The apparatus includes an illumination system configured to condition a beam of radiation, and a support structure configured to support a patterning device. The patterning device serves to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate table configured to hold a substrate, a projection system configured to project the patterned beam onto a target portion of the substrate, and a fluid supply system configured to provide a fluid to a volume. The volume includes at least a portion of the projection system and/or at least a portion of the illumination system. The apparatus further includes a coupling device configured to couple the fluid supply system to the substrate table, substrate, support structure, patterning device, or any combination thereof.
摘要翻译：公开了一种光刻投影装置。该装置包括被配置为调节辐射束的照明系统和被配置为支撑图案形成装置的支撑结构。图案形成装置用于使辐射束在其横截面上具有图案。该设备还包括被配置为保持基板的基板台，配置成将图案化的光束投影到基板的目标部分上的投影系统以及被配置成向流体提供流体的流体供应系统。体积包括投影系统的至少一部分和/或照明系统的至少一部分。该装置还包括配置成将流体供应系统耦合到衬底台，衬底，支撑结构，图案形成装置或其任何组合的耦合装置。

7. 发明申请

US20090168037A1 Lithographic apparatus and device manufacturing method 审中-公开
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20090168037A1
公开(公告)日：2009-07-02
申请号：US12292963
申请日：2008-12-01
申请人： Roger Johannes Maria Hubertus Kroonen , Sebastiaan Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Ronald Van Der Ham , Niek Jacobus Johannes Roset , Fransiscus Mathijs Jacobs , Michel Riepen , Gerardus Arnoldus Hendricus Fanciscus Janssen , Reinder Wietse Roos , Mattijs Hogeland
发明人： Roger Johannes Maria Hubertus Kroonen , Sebastiaan Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Ronald Van Der Ham , Niek Jacobus Johannes Roset , Fransiscus Mathijs Jacobs , Michel Riepen , Gerardus Arnoldus Hendricus Fanciscus Janssen , Reinder Wietse Roos , Mattijs Hogeland
IPC分类号： G03B27/60 , G03B27/52
CPC分类号： G03F7/70716 , G03F7/70341
摘要： An immersion lithographic projection apparatus is disclosed. The apparatus includes a substrate table for holding a substrate and a liquid supply system for supply liquid to the substrate. The apparatus is constructed and arranged to allow the liquid to flow off the substrate and over at least two edges of a top surface of the substrate table. The geometry of the edge may be optimized to reduce a static thickness of a layer of liquid on the top surface.
摘要翻译：公开了一种浸没式光刻投影装置。该装置包括用于保持基板的基板台和用于向基板供应液体的液体供应系统。该装置被构造和布置成允许液体从衬底流出并且在衬底台的顶表面的至少两个边缘之上。可优化边缘的几何形状以减少顶表面上的液体层的静态厚度。

8. 发明申请

US20090073395A1 Lithographic apparatus and device manufacturing method 失效
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20090073395A1
公开(公告)日：2009-03-19
申请号：US11898637
申请日：2007-09-13
申请人： Paul Petrus Joannes Berkvens , Roelof Frederik De Graaf , Paulus Martinus Maria Liebregts , Ronald Van Der Ham , Wilhelmus Franciscus Simons , Daniel Jozef Maria Direcks , Franciscus Johannes Joseph Janssen , Paul William Scholtes-Van Eijk , Gert-Jan Gerardus Brands , Koen Steffens , Han Henricus Aldegonda Lempens , Mathieus Anna Karel Van Lierop , Christophe De Metsenaere , Marcio Alexandre Cano Miranda , Patrick Johannes Spruytenburg , Joris Johan Verstraete
发明人： Paul Petrus Joannes Berkvens , Roelof Frederik De Graaf , Paulus Martinus Maria Liebregts , Ronald Van Der Ham , Wilhelmus Franciscus Simons , Daniel Jozef Maria Direcks , Franciscus Johannes Joseph Janssen , Paul William Scholtes-Van Eijk , Gert-Jan Gerardus Brands , Koen Steffens , Han Henricus Aldegonda Lempens , Mathieus Anna Karel Van Lierop , Christophe De Metsenaere , Marcio Alexandre Cano Miranda , Patrick Johannes Spruytenburg , Joris Johan Verstraete
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： An immersion lithographic apparatus is disclosed that includes a fluid confinement system configured to confine fluid to a space between a projection system and a substrate. The fluid confinement system includes a fluid inlet to supply fluid, the fluid inlet connected to an inlet port and an outlet port. The immersion lithographic apparatus further includes a fluid supply system configured to control fluid flow through the fluid inlet by varying the flow rate of fluid provided to the inlet port and the flow rate of fluid removed from the outlet port.
摘要翻译：公开了一种浸没式光刻设备，其包括被配置为将流体限制在投影系统和基板之间的空间的流体限制系统。流体限制系统包括用于供应流体的流体入口，流体入口连接到入口端口和出口端口。浸没式光刻设备还包括流体供应系统，其构造成通过改变提供给入口的流体的流量和从出口移除的流体的流速来控制流过流体入口的流体流动。

9. 发明授权

US07253875B1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07253875B1
公开(公告)日：2007-08-07
申请号：US11366803
申请日：2006-03-03
申请人： Bernardus Antonius Johannes Luttikhuis , Engelbertus Antonius Fransiscus Van Der Pasch , Ronald Van Der Ham , Niek Jacobus Johannes Roset
发明人： Bernardus Antonius Johannes Luttikhuis , Engelbertus Antonius Fransiscus Van Der Pasch , Ronald Van Der Ham , Niek Jacobus Johannes Roset
IPC分类号： G03B27/52 , G03B27/42
CPC分类号： G03F7/70858 , G03F7/70775 , G03F7/70908
摘要： A lithographic apparatus includes a measurement system to measure the position and/or movement of a substrate support relative to a reference frame. The measurement system includes a target mounted to one of the substrate support and the reference frame, a radiation source mounted to the other one of the substrate support and the reference frame and a sensor configured to detect a pattern of radiation propagating from the target, indicating the position or movement of the substrate support. The substrate support includes one or more gas outlets configured to provide a flow of gas that encapsulates the volume of space through which the beam of radiation propagates to the target.
摘要翻译：光刻设备包括用于测量衬底支撑件相对于参考框架的位置和/或运动的测量系统。测量系统包括安装到基板支撑件和参考框架中的一个的目标，安装到基板支撑件和参考框架中的另一个的辐射源以及被配置为检测从目标传播的辐射图案的传感器，指示衬底支撑件的位置或运动。衬底支撑件包括一个或多个气体出口，其构造成提供封装辐射束通过其传播到靶的空间体积的气体流。

10. 发明申请

US20070071889A1 Lithographic apparatus and method for conditioning an interior space of a device manufacturing apparatus 失效
标题翻译：用于调节装置制造装置的内部空间的平版印刷装置和方法
公开(公告)号：US20070071889A1
公开(公告)日：2007-03-29
申请号：US11238156
申请日：2005-09-29
申请人： Tjarko Van Empel , Ronald Van Der Ham , Niek Roset
发明人： Tjarko Van Empel , Ronald Van Der Ham , Niek Roset
IPC分类号： B05D7/22 , C23C16/00
CPC分类号： G03F7/70933 , G03F7/70775 , G03F7/70883
摘要： A lithographic apparatus is disclosed that includes a first gas shower configured to supply a first gas flow to an interior space of the apparatus, and a second gas shower configured to supply a second gas flow to the interior space of the apparatus, the gas showers configured to direct the first gas flow and the second gas flow at least partly towards each other. Also, a method for conditioning an interior space of a device manufacturing apparatus is provided that includes supplying a first conditioned gas flow and a second conditioned gas flow to the interior space, such that the first conditioned gas flow and the second conditioned gas flow are at least partly directed to each other.
摘要翻译：公开了一种光刻设备，其包括构造成将第一气流提供给设备的内部空间的第一气体淋浴器和被配置为向设备的内部空间供应第二气流的第二气体淋浴器，以引导第一气流和第二气流至少部分地朝向彼此。此外，还提供了一种用于调节装置制造装置的内部空间的方法，其包括向所述内部空间供应第一调节气体流和第二调节气体流，使得所述第一调节气体流和所述第二调节气体流处于最少部分指向彼此。

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