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1. 发明授权

US08573152B2 Showerhead electrode 有权
标题翻译：喷头电极
公开(公告)号：US08573152B2
公开(公告)日：2013-11-05
申请号：US12875869
申请日：2010-09-03
申请人： Anthony de la Llera , Pratik Mankidy , Michael C. Kellogg , Rajinder Dhindsa
发明人： Anthony de la Llera , Pratik Mankidy , Michael C. Kellogg , Rajinder Dhindsa
IPC分类号： C23C16/455 , C23C16/505 , C23C16/509 , B23P19/00 , C23F1/00 , H01L21/306 , C23C16/06 , C23C16/22
CPC分类号： H01R13/20
摘要： A showerhead electrode, a gasket set and an assembly thereof in plasma reaction chamber for etching semiconductor substrates are provided with improved a gas injection hole pattern, positioning accuracy and reduced warping, which leads to enhanced uniformity of plasma processing rate. A method of assembling the inner electrode and gasket set to a supporting member includes simultaneous engagement of cam locks.
摘要翻译：在用于蚀刻半导体衬底的等离子体反应室中的喷头电极，垫圈组件及其组件设置有改进的气体注入孔图案，定位精度和减小的翘曲，这导致等离子体处理速率的均匀性提高。将内部电极和垫圈组装在支撑构件上的方法包括凸轮锁的同时接合。

2. 发明申请

US20120175062A1 CAM-LOCKED SHOWERHEAD ELECTRODE AND ASSEMBLY 有权
标题翻译： CAM锁住的淋浴电极和组件
公开(公告)号：US20120175062A1
公开(公告)日：2012-07-12
申请号：US12985568
申请日：2011-01-06
申请人： Anthony de la Llera , Pratik Mankidy , Rajinder Dhindsa , Michael C. Kellogg , Gregory R. Bettencourt , Roger Patrick
发明人： Anthony de la Llera , Pratik Mankidy , Rajinder Dhindsa , Michael C. Kellogg , Gregory R. Bettencourt , Roger Patrick
IPC分类号： C23C16/50 , C23F1/08 , C23C16/455
CPC分类号： H01J37/32091 , H01J37/3244 , H01J37/32532
摘要： A showerhead electrode and assembly useful for plasma etching includes cam locks which provide improved thermal contact between the showerhead electrode and a backing plate. The cam locks include cam shafts in the backing plate which engage enlarged heads of studs mounted on the showerhead electrode. The assembly can include an annular shroud surrounding the showerhead electrode and eight of the cam shafts in the backing plate can be operated such that each cam shaft simultaneously engages a stud on the annular shroud and a stud in an outer row of studs on the showerhead electrode. Another eight cam shafts can be operated such that each cam shaft engages a pair of studs on inner and middle rows of the studs mounted of the showerhead electrode.
摘要翻译：用于等离子体蚀刻的喷头电极和组件包括提供喷头电极和背板之间改进的热接触的凸轮锁。凸轮锁包括背板中的凸轮轴，其接合安装在喷头电极上的螺柱的扩大头部。组件可以包括围绕喷头电极的环形护罩，并且背板中的八个凸轮轴可以被操作，使得每个凸轮轴同时接合环形护罩上的螺柱和喷头电极的外排螺柱中的螺柱。可以操作另外八个凸轮轴，使得每个凸轮轴接合在喷头电极安装的螺柱的内部和中间行上的一对螺柱。

3. 发明申请

US20120055632A1 SHOWERHEAD ELECTRODE 有权
标题翻译：淋浴电极
公开(公告)号：US20120055632A1
公开(公告)日：2012-03-08
申请号：US12875869
申请日：2010-09-03
申请人： Anthony de la Llera , Pratik Mankidy , Michael C. Kellogg , Rajinder Dhindsa
发明人： Anthony de la Llera , Pratik Mankidy , Michael C. Kellogg , Rajinder Dhindsa
IPC分类号： H01L21/3065 , F16J15/06 , H01R43/00
CPC分类号： H01R13/20
摘要： A showerhead electrode, a gasket set and an assembly thereof in plasma reaction chamber for etching semiconductor substrates are provided with improved a gas injection hole pattern, positioning accuracy and reduced warping, which leads to enhanced uniformity of plasma processing rate. A method of assembling the inner electrode and gasket set to a supporting member includes simultaneous engagement of cam locks.
摘要翻译：在用于蚀刻半导体衬底的等离子体反应室中的喷头电极，垫圈组件及其组件设置有改进的气体注入孔图案，定位精度和减小的翘曲，这导致等离子体处理速率的均匀性提高。将内部电极和垫圈组装在支撑构件上的方法包括凸轮锁的同时接合。

4. 发明授权

US08847495B2 Movable grounding arrangements in a plasma processing chamber and methods therefor 有权
标题翻译：等离子体处理室中的可移动接地装置及其方法
公开(公告)号：US08847495B2
公开(公告)日：2014-09-30
申请号：US13616641
申请日：2012-09-14
申请人： Anthony de la Llera , Michael C. Kellogg , Alexei Marakhtanov , Rajinder Dhindsa
发明人： Anthony de la Llera , Michael C. Kellogg , Alexei Marakhtanov , Rajinder Dhindsa
IPC分类号： H01J7/24
CPC分类号： H01J37/32082 , H01J37/32577
摘要： A plasma processing systems having at least one plasma processing chamber, comprising a movable grounding component, an RF contact component configured to receive RF energy from an RF source when the RF source provides the RF energy to the RF contact component, and a ground contact component coupled to ground. The plasma processing system further includes an actuator operatively coupled to the movable grounding component for disposing the movable grounding component in a first position and a second position. The first position represents a position whereby the movable grounding component is not in contact with at least one of the RF contact component and the ground contact component. The second position represents a position whereby the movable grounding component is in contact with both the RF contact component and the ground contact component.
摘要翻译：一种具有至少一个等离子体处理室的等离子体处理系统，包括可移动接地部件，RF接触部件，其被配置为当RF源向RF接触部件提供RF能量时从RF源接收RF能量;以及接地部件加上地面。等离子体处理系统还包括可操作地耦合到可移动接地部件的致动器，用于将可移动接地部件设置在第一位置和第二位置。第一位置表示可移动接地部件不与RF接触部件和接地部件中的至少一个接触的位置。第二位置表示可移动接地部件与RF接触部件和接地部件接触的位置。

5. 发明申请

US20100003824A1 Clamped showerhead electrode assembly 有权
标题翻译：夹紧淋浴头电极组件
公开(公告)号：US20100003824A1
公开(公告)日：2010-01-07
申请号：US12216526
申请日：2008-07-07
申请人： Babak Kadkhodayan , Rajinder Dhindsa , Anthony de la Llera , Michael C. Kellogg
发明人： Babak Kadkhodayan , Rajinder Dhindsa , Anthony de la Llera , Michael C. Kellogg
IPC分类号： H01L21/3065 , C23C16/00 , B05C11/00
CPC分类号： H01J37/32532 , H01J37/32091 , H01J37/3244 , H01J37/32449 , H01J37/32541 , H01J37/32568 , H01J37/32605
摘要： An electrode assembly for a plasma reaction chamber used in semiconductor substrate processing. The assembly includes an upper showerhead electrode which includes an inner electrode mechanically attached to a backing plate by a clamp ring and an outer electrode attached to the backing plate by a series of spaced apart cam locks. A guard ring surrounds the backing plate and is movable to positions at which openings in the guard ring align with openings in the backing plate so that the cam locks can be rotated with a tool to release cam pins extending upward from the upper face of the outer electrode. To compensate for differential thermal expansion, the clamp ring can include expansion joins at spaced locations which allow the clamp ring to absorb thermal stresses.
摘要翻译：用于等离子体反应室的电极组件，用于半导体衬底处理。组件包括上喷头电极，其包括通过夹紧环机械连接到背板的内电极和通过一系列间隔开的凸轮锁附接到背板的外电极。防护环围绕背板并且可移动到保护环中的开口与背板中的开口对准的位置，使得凸轮锁可以用工具旋转以释放从外部的上表面向上延伸的凸轮销电极。为了补偿差分热膨胀，夹紧环可以包括在间隔位置处的膨胀接合，这允许夹紧环吸收热应力。

6. 发明申请

US20130134876A1 MOVABLE GROUNDING ARRANGEMENTS IN A PLASMA PROCESSING CHAMBER AND METHODS THEREFOR 有权
标题翻译：等离子体加工室中的可移动接地装置及其方法
公开(公告)号：US20130134876A1
公开(公告)日：2013-05-30
申请号：US13616641
申请日：2012-09-14
申请人： Anthony de la Llera , Michael C. Kellogg , Alexei Marakhtanov , Rajinder Dhindsa
发明人： Anthony de la Llera , Michael C. Kellogg , Alexei Marakhtanov , Rajinder Dhindsa
IPC分类号： H05H1/24 , H05K13/00
CPC分类号： H01J37/32082 , H01J37/32577
摘要： A plasma processing systems having at least one plasma processing chamber, comprising a movable grounding component, an RF contact component configured to receive RF energy from an RF source when the RF source provides the RF energy to the RF contact component, and a ground contact component coupled to ground. The plasma processing system further includes an actuator operatively coupled to the movable grounding component for disposing the movable grounding component in a first position and a second position. The first position represents a position whereby the movable grounding component is not in contact with at least one of the RF contact component and the ground contact component. The second position represents a position whereby the movable grounding component is in contact with both the RF contact component and the ground contact component.
摘要翻译：一种具有至少一个等离子体处理室的等离子体处理系统，包括可移动接地部件，RF接触部件，其被配置为当RF源向RF接触部件提供RF能量时从RF源接收RF能量;以及接地部件加上地面。等离子体处理系统还包括可操作地耦合到可移动接地部件的致动器，用于将可移动接地部件设置在第一位置和第二位置。第一位置表示可移动接地部件不与RF接触部件和接地部件中的至少一个接触的位置。第二位置表示可移动接地部件与RF接触部件和接地部件接触的位置。

7. 发明申请

US20120171872A1 CLAMPED SHOWERHEAD ELECTRODE ASSEMBLY 有权
标题翻译：夹紧式淋浴电极组件
公开(公告)号：US20120171872A1
公开(公告)日：2012-07-05
申请号：US13422696
申请日：2012-03-16
申请人： Babak Kadkhodayan , Rajinder Dhindsa , Anthony de la Llera , Michael C. Kellogg
发明人： Babak Kadkhodayan , Rajinder Dhindsa , Anthony de la Llera , Michael C. Kellogg
IPC分类号： H01L21/3065
CPC分类号： H01J37/32532 , H01J37/32091 , H01J37/3244 , H01J37/32449 , H01J37/32541 , H01J37/32568 , H01J37/32605
摘要： An electrode assembly for a plasma reaction chamber used in semiconductor substrate processing. The assembly includes an upper showerhead electrode which includes an inner electrode mechanically attached to a backing plate by a clamp ring and an outer electrode attached to the backing plate by a series of spaced apart cam locks. A guard ring surrounds the backing plate and is movable to positions at which openings in the guard ring align with openings in the backing plate so that the cam locks can be rotated with a tool to release cam pins extending upward from the upper face of the outer electrode. To compensate for differential thermal expansion, the clamp ring can include expansion joins at spaced locations which allow the clamp ring to absorb thermal stresses.
摘要翻译：用于等离子体反应室的电极组件，用于半导体衬底处理。组件包括上喷头电极，其包括通过夹紧环机械连接到背板的内电极和通过一系列间隔开的凸轮锁附接到背板的外电极。防护环围绕背板并且可移动到保护环中的开口与背板中的开口对准的位置，使得凸轮锁可以用工具旋转以释放从外部的上表面向上延伸的凸轮销电极。为了补偿差分热膨胀，夹紧环可以包括在间隔位置处的膨胀接合，这允许夹紧环吸收热应力。

8. 发明申请

US20100000683A1 Showerhead electrode 有权
标题翻译：喷头电极
公开(公告)号：US20100000683A1
公开(公告)日：2010-01-07
申请号：US12216525
申请日：2008-07-07
申请人： Babak Kadkhodayan , Rajinder Dhindsa , Anthony de la Llera , Michael C. Kellogg
发明人： Babak Kadkhodayan , Rajinder Dhindsa , Anthony de la Llera , Michael C. Kellogg
IPC分类号： H01L21/3065 , H01L21/306
CPC分类号： H01J37/3244 , H01J37/32449
摘要： A showerhead electrode includes inner and outer steps at an outer periphery thereof, the outer step cooperating with a clamp ring which mechanically attaches the electrode to a backing plate.
摘要翻译：淋浴头电极在其外周边包括内台阶和外台阶，外台阶与夹板环配合，该夹环将电极机械地附接到背板。

9. 发明授权

US08628268B2 Cam lock electrode clamp 有权
标题翻译：凸轮锁电极夹
公开(公告)号：US08628268B2
公开(公告)日：2014-01-14
申请号：US12922382
申请日：2009-03-13
申请人： Michael C. Kellogg , Anthony J. Norell , Anthony de la Llera , Rajinder Dhindsa
发明人： Michael C. Kellogg , Anthony J. Norell , Anthony de la Llera , Rajinder Dhindsa
IPC分类号： B25B5/08
CPC分类号： H01L21/68728 , H01L21/687 , Y10T403/7005 , Y10T403/7007 , Y10T403/7041
摘要： A cam lock clamp comprises a stud having a substantially cylindrical body with a first end including a head area and a second end arranged to support one or more disc springs concentrically about the stud. A socket is arranged to mechanically couple concentrically around the stud with the head area of the stud being exposed above an uppermost portion of the socket. The socket is configured to be firmly attached to a consumable material. A camshaft has a substantially cylindrical body and is configured to mount within a bore of a backing plate. The camshaft further comprises an eccentric cutout area located in a central portion of the camshaft body. The camshaft is configured to engage and lock the head area of the stud when the consumable material and the backing plate are proximate to one another.
摘要翻译：凸轮锁定夹具包括具有基本上圆柱形主体的螺柱，其具有包括头部区域的第一端和布置成围绕螺柱同心地支撑一个或多个盘簧的第二端。插座布置成以同心的方式围绕螺柱共同连接，螺柱的头部区域暴露在插座的最上部分之上。插座被配置为牢固地连接到消耗材料上。凸轮轴具有基本上圆柱形的主体并被构造成安装在背板的孔内。凸轮轴还包括位于凸轮轴主体的中心部分的偏心切口区域。凸轮轴构造成当消耗材料和背板彼此靠近时接合并锁定螺柱的头部区域。

10. 发明授权

US08313805B2 Clamped showerhead electrode assembly 有权
公开(公告)号：US08313805B2
公开(公告)日：2012-11-20
申请号：US13422696
申请日：2012-03-16
申请人： Babak Kadkhodayan , Rajinder Dhindsa , Anthony de la Llera , Michael C. Kellogg
发明人： Babak Kadkhodayan , Rajinder Dhindsa , Anthony de la Llera , Michael C. Kellogg
IPC分类号： C23C16/50 , C23C16/503 , C23C16/505 , C23C16/509 , C23F1/00 , C23C16/06 , C23C16/22
CPC分类号： H01J37/32532 , H01J37/32091 , H01J37/3244 , H01J37/32449 , H01J37/32541 , H01J37/32568 , H01J37/32605
摘要： An electrode assembly for a plasma reaction chamber used in semiconductor substrate processing. The assembly includes an upper showerhead electrode which includes an inner electrode mechanically attached to a backing plate by a clamp ring and an outer electrode attached to the backing plate by a series of spaced apart cam locks. A guard ring surrounds the backing plate and is movable to positions at which openings in the guard ring align with openings in the backing plate so that the cam locks can be rotated with a tool to release cam pins extending upward from the upper face of the outer electrode. To compensate for differential thermal expansion, the clamp ring can include expansion joins at spaced locations which allow the clamp ring to absorb thermal stresses.

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