会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 1. 发明授权
    • Multiplexing and selective updatable fixing and erasing of volume
holograms in photorefractive media and second harmonic generation in
photorefractive media by optically induced periodic poling
    • 光折射介质中体积全息图的复用和选择性可更新固定和擦除,光折射介质中的二次谐波生成
    • US5422873A
    • 1995-06-06
    • US37076
    • 1993-03-25
    • Anthony S. KewitschMordechai SegevAmnon Yariv
    • Anthony S. KewitschMordechai SegevAmnon Yariv
    • G03H1/26G11C13/04G11B7/00
    • G11C13/042G03H1/2645G03H1/0248G03H2001/0268G03H2001/2615G03H2260/35
    • New methods are presented for multiplexing volume holograms in electrooptic materials. Multiple volume holograms can be superimposed in a medium and be individually addressed by tuning the underlying refractive index of the medium or the crystal parameters, while keeping the external parameters (wavelength, angles) fixed. According to the presented methods, the refractive index and crystal parameters of the material can be varied via the electrooptic, elastooptic or piezoelectric effects, alone or in combination with each other, by tuning the value of an applied electric field, or by tuning an applied mechanical stress, or by changing the material temperature. Volume holograms that have been multiplexed by either wavelength or angle or electric field or mechanical stress or temperature can be individually addressed by any one of the same five parameters. Additionally, selective, updatable fixing and erasing of volume holograms in photorefractive media is described. Each holographic page may be fixed individually and overwritten without destroying the other fixed pages. Further, Second Harmonic Generation and Parametric Amplification by optically induced periodic poling in ferroelectric photorefractive materials is described.
    • 提出了新的电光学材料中多重体积全息图的方法。 多个体积全息图可以叠加在介质中,并通过调节介质的潜在折射率或晶体参数,同时保持外部参数(波长,角度)固定而单独寻址。 根据所提出的方法,材料的折射率和晶体参数可以通过电光,弹性或压电效应单独或彼此组合,通过调节所施加的电场的值,或通过调谐施加的 机械应力,或通过改变材料温度。 通过波长或角度或电场或机械应力或温度复用的体积全息图可以通过相同的五个参数中的任何一个来单独寻址。 另外,描述了在光折射介质中的体积全息图的选择性,可更新的固定和擦除。 每个全息页可以单独固定和重写,而不会破坏其他固定页。 此外,描述了在铁电光折变材料中的光诱导周期极化的第二谐波产生和参数放大。