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1. 发明授权

US6139716A Submicron patterned metal hole etching 失效
标题翻译：亚微米图案金属孔蚀刻
公开(公告)号：US6139716A
公开(公告)日：2000-10-31
申请号：US315387
申请日：1999-05-18
申请人： Anthony M. McCarthy , Robert J. Contolini , Vladimir Liberman , Jeffrey Morse
发明人： Anthony M. McCarthy , Robert J. Contolini , Vladimir Liberman , Jeffrey Morse
IPC分类号： C25F3/12
CPC分类号： C25F3/12
摘要： A wet chemical process for etching submicron patterned holes in thin metal layers using electrochemical etching with the aid of a wetting agent. In this process, the processed wafer to be etched is immersed in a wetting agent, such as methanol, for a few seconds prior to inserting the processed wafer into an electrochemical etching setup, with the wafer maintained horizontal during transfer to maintain a film of methanol covering the patterned areas. The electrochemical etching setup includes a tube which seals the edges of the wafer preventing loss of the methanol. An electrolyte composed of 4:1 water: sulfuric is poured into the tube and the electrolyte replaces the wetting agent in the patterned holes. A working electrode is attached to a metal layer of the wafer, with reference and counter electrodes inserted in the electrolyte with all electrodes connected to a potentiostat. A single pulse on the counter electrode, such as a 100 ms pulse at +10.2 volts, is used to excite the electrochemical circuit and perform the etch. The process produces uniform etching of the patterned holes in the metal layers, such as chromium and molybdenum of the wafer without adversely effecting the patterned mask.
摘要翻译：借助于润湿剂，使用电化学蚀刻在薄金属层中蚀刻亚微米图案化孔的湿法化学方法。在此过程中，待处理的待蚀刻晶片在将经处理的晶片插入电化学蚀刻装置之前，浸入润湿剂（如甲醇）中几秒钟，晶片在转移过程中保持水平，以保持甲醇膜覆盖图案区域。电化学蚀刻装置包括密封晶片边缘的管，防止甲醇损失。将由4:1水：硫酸盐组成的电解液倒入管中，并且电解质代替图案化孔中的润湿剂。将工作电极连接到晶片的金属层上，其中参考电极和对置电极插入电解质中，所有电极连接到恒电位仪。对电极上的单个脉冲，例如+10.2伏特的100ms脉冲，用于激发电化学电路并进行蚀刻。该方法对金属层中的图案化孔进行均匀蚀刻，例如晶片的铬和钼，而不会对图案化掩模产生不利影响。

2. 发明申请

US20190235228A1 Methods and Apparatus for Modulating Light with Phase Change Materials 审中-公开
公开(公告)号：US20190235228A1
公开(公告)日：2019-08-01
申请号：US16263071
申请日：2019-01-31
申请人： Jeffrey Chou , Vladimir Liberman , Juejun Hu , Yifei Zhang , William Herzog , Jason Stewart , Christopher Roberts
发明人： Jeffrey Chou , Vladimir Liberman , Juejun Hu , Yifei Zhang , William Herzog , Jason Stewart , Christopher Roberts
IPC分类号： G02B26/06 , G02B27/09 , G02B5/20 , G02B26/02
CPC分类号： G02B26/06 , G02B5/20 , G02B26/02 , G02B27/0955
摘要： Alloys of GeSbSeTe (GSST) can be used to make actively tunable infrared transmission filters that are small, fast, and solid-state. These filters can be used for hyperspectral imaging, 3D LIDAR, portable bio/chem sensing systems, thermal emission control, and tunable filters. GSST is a low-loss phase-change material that can switch from a low-index (n=3), amorphous state to a high-index (n=4.5), hexagonal state with low loss (k

3. 发明申请

US20110075263A1 Optical limiting using plasmonically enhancing nanoparticles 有权
标题翻译：使用等离子体增强纳米粒子的光学限制
公开(公告)号：US20110075263A1
公开(公告)日：2011-03-31
申请号：US12586971
申请日：2009-09-30
申请人： Vladimir Liberman , Mordechai Rothschild
发明人： Vladimir Liberman , Mordechai Rothschild
IPC分类号： G02B5/22
CPC分类号： G02B5/008 , B82Y20/00 , G02B5/22
摘要： There is provided an optical limiter device for protecting an object from incident light having a wavelength in the visible, infrared or ultraviolet spectrum. The device comprises a plurality of nanoparticles of a metallic material including free electrons that undergo collective oscillations when exposed to the incident light. The plurality of nanoparticles of the metallic material include a plurality of nanoparticles of a non-spherical particle geometry, which may include a geometry having a plurality of sharp protrusions on a spherical body. The metallic material may include gold, silver, aluminum, indium or copper. The device further comprises a structurally rigid transparent medium in which the plurality of nanoparticles of the metallic material are embedded; and a mechanical support mounting the transparent medium between the incident light and the object.
摘要翻译：提供了一种用于保护物体免受具有可见光，红外或紫外光谱波长的入射光的光限制器件。该装置包括金属材料的多个纳米颗粒，包括当暴露于入射光时经历集体振荡的自由电子。金属材料的多个纳米颗粒包括多个非球形颗粒几何形状的纳米颗粒，其可以包括在球体上具有多个尖锐突起的几何形状。金属材料可以包括金，银，铝，铟或铜。该装置还包括其中嵌入金属材料的多个纳米颗粒的结构刚性透明介质; 以及将透明介质安装在入射光和物体之间的机械支撑。

4. 发明授权

US08345364B2 Optical limiting using plasmonically enhancing nanoparticles 有权
标题翻译：使用等离子体增强纳米粒子的光学限制
公开(公告)号：US08345364B2
公开(公告)日：2013-01-01
申请号：US12586971
申请日：2009-09-30
申请人： Vladimir Liberman , Mordechai Rothschild
发明人： Vladimir Liberman , Mordechai Rothschild
IPC分类号： G02B5/22 , B82Y20/00
CPC分类号： G02B5/008 , B82Y20/00 , G02B5/22
摘要： There is provided an optical limiter device for protecting an object from incident light having a wavelength in the visible, infrared or ultraviolet spectrum. The device comprises a plurality of nanoparticles of a metallic material including free electrons that undergo collective oscillations when exposed to the incident light. The plurality of nanoparticles of the metallic material include a plurality of nanoparticles of a non-spherical particle geometry, which may include a geometry having a plurality of sharp protrusions on a spherical body. The metallic material may include gold, silver, aluminum, indium or copper. The device further comprises a structurally rigid transparent medium in which the plurality of nanoparticles of the metallic material are embedded; and a mechanical support mounting the transparent medium between the incident light and the object.
摘要翻译：提供了一种用于保护物体免受具有可见光，红外或紫外光谱波长的入射光的光限制器件。该装置包括金属材料的多个纳米颗粒，包括当暴露于入射光时经历集体振荡的自由电子。金属材料的多个纳米颗粒包括多个非球形颗粒几何形状的纳米颗粒，其可以包括在球体上具有多个尖锐突起的几何形状。金属材料可以包括金，银，铝，铟或铜。该装置还包括其中嵌入金属材料的多个纳米颗粒的结构刚性透明介质; 以及将透明介质安装在入射光和物体之间的机械支撑。

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