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1. 发明申请

US20070190200A1 Chucking system comprising an array of fluid chambers 有权
标题翻译：包括流体室阵列的卡盘系统
公开(公告)号：US20070190200A1
公开(公告)日：2007-08-16
申请号：US11690480
申请日：2007-03-23
申请人： Anshuman Cherala , Byung-Jin Choi , Pankaj Lad , Steven Shackleton
发明人： Anshuman Cherala , Byung-Jin Choi , Pankaj Lad , Steven Shackleton
IPC分类号： B28B11/08
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , H01L21/6838 , H01L21/6875
摘要： The present invention is directed towards a chucking system to hold a substrate, said system including, inter alia, a chuck body having first and second opposed sides, said first side including an array of fluid chambers arranged in rows and columns, said fluid chambers each comprising first and second spaced-apart recesses defining first and second spaced-apart support regions, with said first support region cincturing said second support region and said first and second recesses, and said second support region cincturing said second recess, with said substrate resting against said first and second support regions, with said first recess and a portion of said substrate in superimposition therewith defining a first chamber and said second recess and a portion of said substrate in superimposition therewith defining a second chamber, with each column of said first chambers and each row of said second chambers being in fluid communication with a differing source of fluid to control a flow of fluid in said array of fluid chambers.
摘要翻译：本发明涉及一种用于夹持基板的夹紧系统，所述系统尤其包括具有第一和第二相对侧面的卡盘体，所述第一侧包括排列成行和列的流体室阵列，所述流体室各自包括限定第一和第二间隔开的支撑区域的第一和第二间隔开的凹部，其中所述第一支撑区域使所述第二支撑区域和所述第一和第二凹部相互影响，并且所述第二支撑区域使所述第二凹部相互嵌合，所述第一和第二支撑区域与所述第一凹部和所述基板的一部分重叠地限定第一腔室和所述第二凹部以及与所述基底的一部分重叠形成第二腔室，所述第一腔室的每一列和每排所述第二室与不同的流体源流体连通以控制流动在所述流体室阵列中的流体。

2. 发明申请

US20070275114A1 Partial Vacuum Environment Imprinting 有权
标题翻译：部分真空环境印刷
公开(公告)号：US20070275114A1
公开(公告)日：2007-11-29
申请号：US11695263
申请日：2007-04-02
申请人： Anshuman Cherala , Pankaj Lad , Ian McMackin , Byung-Jin Choi
发明人： Anshuman Cherala , Pankaj Lad , Ian McMackin , Byung-Jin Choi
IPC分类号： B29C47/76
CPC分类号： G03F7/0002 , B29C43/003 , B29C43/021 , B29C2043/025 , B29C2043/5833 , B82Y10/00 , B82Y40/00
摘要： The present invention is directed towards a method and a system to create and maintain a desired environment in the vicinity of a nano-imprint lithography template by creation of a partial vacuum using channels or holes in the template holding the nano-imprint mold.
摘要翻译：本发明涉及通过使用保持纳米压印模具的模板中的通道或孔产生部分真空来在纳米压印光刻模板附近创建和维持所需环境的方法和系统。

3. 发明授权

US08968620B2 Safe separation for nano imprinting 有权
标题翻译：纳米压印安全分离
公开(公告)号：US08968620B2
公开(公告)日：2015-03-03
申请号：US13095514
申请日：2011-04-27
申请人： Se-Hyuk Im , Mahadevan GanapathiSubramanian , Edward Brian Fletcher , Niyaz Khusnatdinov , Gerard M. Schmid , Mario Johannes Meissl , Anshuman Cherala , Frank Y. Xu , Byung-Jin Choi , Sidlgata V. Sreenivasan
发明人： Se-Hyuk Im , Mahadevan GanapathiSubramanian , Edward Brian Fletcher , Niyaz Khusnatdinov , Gerard M. Schmid , Mario Johannes Meissl , Anshuman Cherala , Frank Y. Xu , Byung-Jin Choi , Sidlgata V. Sreenivasan
IPC分类号： B29C45/76 , G03F7/00 , B82Y10/00 , B82Y40/00
CPC分类号： B29C59/02 , B29C45/76 , B29L2007/001 , B82Y10/00 , B82Y40/00 , G03F7/0002 , Y10S977/877
摘要： Control of lateral strain and lateral strain ratio (dt/db) between template and substrate through the selection of template and/or substrate thicknesses (Tt and/or Tb), control of template and/or substrate back pressure (Pt and/or Pb), and/or selection of material stiffness are described.
摘要翻译：通过选择模板和/或衬底厚度（Tt和/或Tb），模板和/或衬底背压（Pt和/或Pb）的控制来控制模板和衬底之间的横向应变和横向应变比（dt / db））和/或材料刚度的选择。

4. 发明申请

US20070287081A1 METHOD FOR OBTAINING FORCE COMBINATIONS FOR TEMPLATE DEFORMATION USING NULLSPACE AND METHODS OPTIMIZATION TECHNIQUES 有权
标题翻译：使用空位获取模板变形的力组合的方法和方法优化技术
公开(公告)号：US20070287081A1
公开(公告)日：2007-12-13
申请号：US11695469
申请日：2007-04-02
申请人： Anshuman Cherala , Sidlgata Sreenivasan , Byung-Jin Choi , Ecron Thompson
发明人： Anshuman Cherala , Sidlgata Sreenivasan , Byung-Jin Choi , Ecron Thompson
IPC分类号： G03F9/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F7/703 , G03F7/70633 , G03F7/70783 , G03F9/7003 , G03F9/7092
摘要： The present invention is directed towards a method for determining deformation parameters that a patterned device would undergo to minimize dimensional variations between a recorded pattern thereon and a reference pattern, the method including, inter alia, comparing spatial variation between features of the recorded pattern with respect to corresponding features of the reference pattern; and determining deformation forces to apply to the patterned device to attenuate the dimensional variations, with the forces having predetermined constraints, wherein a summation of a magnitude of the forces is substantially zero and a summation of moment of the forces is substantially zero.
摘要翻译：本发明涉及一种用于确定图案化装置将经历以使其上的记录图案与参考图案之间的尺寸变化最小化的变形参数的方法，该方法尤其包括将记录图案的特征与相对于参考图案的相应特征; 以及确定施加到所述图案化装置上的变形力以衰减所述尺寸变化，其中所述力具有预定的约束，其中所述力的大小的总和基本上为零，并且所述力的力矩的总和基本上为零。

5. 发明申请

US20060172553A1 Method of retaining a substrate to a wafer chuck 有权
标题翻译：将基板保持在晶片卡盘上的方法
公开(公告)号：US20060172553A1
公开(公告)日：2006-08-03
申请号：US11047499
申请日：2005-01-31
申请人： Byung-Jin Choi , Anshuman Cherala , Daniel Babbs
发明人： Byung-Jin Choi , Anshuman Cherala , Daniel Babbs
IPC分类号： H01L21/31 , H01L21/469
CPC分类号： H01L21/6831 , H01L21/6838 , Y10T29/4978 , Y10T29/49998
摘要： The present invention is directed towards a method of retaining a substrate to a wafer chuck. The method features accelerating a portion of the substrate toward the wafer chuck, generating a velocity of travel of the substrate toward the wafer chuck, and reducing the velocity before the substrate reaches the wafer chuck. In this manner, the force of impact of the portion with the wafer chuck is greatly reduced, which is believed to reduce the probability that the structural integrity of the substrate, and layers on the substrate and/or the wafer chuck, are damaged.
摘要翻译：本发明涉及将基板保持在晶片卡盘上的方法。该方法特征在于，将基板的一部分朝向晶片卡盘加速，产生基板朝向晶片卡盘的移动速度，并降低基板到达晶片卡盘之前的速度。以这种方式，晶片卡盘的部分的冲击力大大降低，这被认为降低了基板的结构完整性和基板和/或晶片卡盘上的层被损坏的可能性。

6. 发明授权

US07636999B2 Method of retaining a substrate to a wafer chuck 有权
标题翻译：将基板保持在晶片卡盘上的方法
公开(公告)号：US07636999B2
公开(公告)日：2009-12-29
申请号：US11047499
申请日：2005-01-31
申请人： Byung-Jin Choi , Anshuman Cherala , Daniel A. Babbs
发明人： Byung-Jin Choi , Anshuman Cherala , Daniel A. Babbs
IPC分类号： B23Q7/00
CPC分类号： H01L21/6831 , H01L21/6838 , Y10T29/4978 , Y10T29/49998
摘要： A method of retaining a substrate to a wafer chuck. The method features accelerating a portion of the substrate toward the wafer chuck, generating a velocity of travel of the substrate toward the wafer chuck, and reducing the velocity before the substrate reaches the wafer chuck. In this manner, the force of impact of the portion with the wafer chuck is greatly reduced, which is believed to reduce the probability that the structural integrity of the substrate, and layers on the substrate and/or the wafer chuck, are damaged.
摘要翻译：将基板保持在晶片卡盘上的方法。该方法特征在于，将基板的一部分朝向晶片卡盘加速，产生基板朝向晶片卡盘的移动速度，并降低基板到达晶片卡盘之前的速度。以这种方式，晶片卡盘的部分的冲击力大大降低，这被认为降低了基板的结构完整性和基板和/或晶片卡盘上的层被损坏的可能性。

7. 发明授权

US07635445B2 Method of separating a mold from a solidified layer disposed on a substrate 有权
标题翻译：从设置在基板上的凝固层分离模具的方法
公开(公告)号：US07635445B2
公开(公告)日：2009-12-22
申请号：US11108208
申请日：2005-04-18
申请人： Byung-Jin Choi , Anshuman Cherala , Yeong-jun Choi , Mario J. Meissl , Sidlgata V. Sreenivasan , Norman E. Schumaker , Xiaoming Lu , Ian M. McMackin , Daniel A. Babbs
发明人： Byung-Jin Choi , Anshuman Cherala , Yeong-jun Choi , Mario J. Meissl , Sidlgata V. Sreenivasan , Norman E. Schumaker , Xiaoming Lu , Ian M. McMackin , Daniel A. Babbs
IPC分类号： H01L21/31 , H01L21/469
CPC分类号： H01L21/6875 , B82Y10/00 , B82Y40/00 , G03F7/0002 , H01L21/6838 , Y10S977/887
摘要： The present invention is directed towards a method of separating a mold, included in a template, from a layer disposed on a substrate, the method including, inter alia, applying a separation force to the template to separate the template from the layer; and facilitating localized deformation in the substrate to reduce the separation force required to achieve separation.
摘要翻译：本发明涉及一种将包含在模板中的模具与设置在基板上的层分离的方法，该方法尤其包括向模板施加分离力以将模板与层分离; 并且促进基板中的局部变形以减小实现分离所需的分离力。

8. 发明授权

US07462028B2 Partial vacuum environment imprinting 有权
标题翻译：部分真空环境印记
公开(公告)号：US07462028B2
公开(公告)日：2008-12-09
申请号：US11695263
申请日：2007-04-02
申请人： Anshuman Cherala , Pankaj B. Lad , Ian M. McMackin , Byung-Jin Choi
发明人： Anshuman Cherala , Pankaj B. Lad , Ian M. McMackin , Byung-Jin Choi
IPC分类号： B28B11/08
CPC分类号： G03F7/0002 , B29C43/003 , B29C43/021 , B29C2043/025 , B29C2043/5833 , B82Y10/00 , B82Y40/00
摘要： The present invention is directed towards a method and a system to create and maintain a desired environment in the vicinity of a nano-imprint lithography template by creation of a partial vacuum using channels or holes in the template holding the nano-imprint mold.
摘要翻译：本发明涉及通过使用保持纳米压印模具的模板中的通道或孔产生部分真空来在纳米压印光刻模板附近创建和维持所需环境的方法和系统。

9. 发明申请

US20070231422A1 System to vary dimensions of a thin template 审中-公开
标题翻译：系统以改变薄模板的尺寸
公开(公告)号：US20070231422A1
公开(公告)日：2007-10-04
申请号：US11687902
申请日：2007-03-19
申请人： Anshuman Cherala , Byung-Jin Choi
发明人： Anshuman Cherala , Byung-Jin Choi
IPC分类号： B28B7/00
CPC分类号： G03F7/0002 , B01J2219/00382 , B29C2059/023 , B82Y10/00 , B82Y40/00
摘要： The present invention is directed towards a system to vary dimensions of a body having first and second opposed sides, the first side having a patterning area, the system including, inter alia, a fluid chamber having a support region and a recess, the support region cincturing the recess and the body resting against the support region, with the recess and a portion of the body in superimposition therewith defining a sub-chamber, the sub-chamber having a pressure defined therein to couple the fluid chamber to the second side of the body; and an actuator coupled to the fluid chamber, the actuator applying a force to the fluid chamber such that the dimensions of the body are varied.
摘要翻译：本发明涉及一种用于改变具有第一和第二相对侧的本体的尺寸的系统，该第一侧具有图案化区域，该系统尤其包括具有支撑区域和凹部的流体室，该支撑区域使凹部和身体静止抵靠支撑区域，其中凹部和主体的一部分叠加形成子室，子室具有限定在其中的压力以将流体室连接到第二侧身体; 以及联接到所述流体室的致动器，所述致动器向所述流体室施加力，使得所述主体的尺寸改变。

10. 发明授权

US07170589B2 Apparatus to vary dimensions of a substrate during nano-scale manufacturing 有权
标题翻译：用于在纳米级制造期间改变衬底尺寸的装置
公开(公告)号：US07170589B2
公开(公告)日：2007-01-30
申请号：US11142839
申请日：2005-06-01
申请人： Anshuman Cherala , Byung-Jin Choi , Pawan K Nimmakayala , Mario J. Meissl , Sidlgata V. Sreenivasan
发明人： Anshuman Cherala , Byung-Jin Choi , Pawan K Nimmakayala , Mario J. Meissl , Sidlgata V. Sreenivasan
IPC分类号： G03B27/58 , G03B27/42
CPC分类号： G03F7/0002 , B82Y10/00
摘要： The present invention is directed toward a system to vary dimensions of a substrate, such as a template having a patterned mold. To that end, the system includes a substrate chuck adapted to position the substrate in a region; a pliant member; and an actuator sub-assembly elastically coupled to the substrate chuck through the pliant member. The actuator assembly includes a plurality of lever sub-assemblies, one of which includes a body lying in the region and spaced-apart from an opposing body associated with one of the remaining lever sub-assemblies of the plurality of lever sub-assemblies. One of the plurality of lever assemblies is adapted to vary a distance between the body and the opposing body. In this manner, compressive forces may be applied to the template to remove unwanted magnification or other distortions in the pattern on the mold. The pliant member is configured to attenuate a magnitude of resulting forces sensed by the substrate chuck generated in response to the compressive forces.
摘要翻译：本发明涉及一种改变基底的尺寸的系统，例如具有图案化模具的模板。为此，系统包括适于将衬底定位在区域中的衬底卡盘; 柔顺的会员以及致动器子组件，其通过柔性构件弹性地联接到基板卡盘。所述致动器组件包括多个杠杆子组件，其中一个杆子组件包括位于所述区域中并与与所述多个杠杆子组件中的剩余杠杆子组件之一相关联的相对主体间隔开的主体。多个杠杆组件中的一个适于改变主体和相对主体之间的距离。以这种方式，可以对模板施加压缩力以去除模具上的图案中的不期望的放大或其它变形。柔性构件被构造成衰减由响应于压缩力产生的基板卡盘感测的结果力的大小。

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