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    • 1. 发明申请
    • HIGH PH SLURRY FOR CHEMICAL MECHANICAL POLISHING OF COPPER
    • 化学机械抛光高PH浆料
    • US20050017367A1
    • 2005-01-27
    • US10917729
    • 2004-08-12
    • Anne MillerA. FellerKenneth Cadien
    • Anne MillerA. FellerKenneth Cadien
    • C09G1/02C09K3/14H01L21/321H01L21/768H01L21/4763
    • H01L21/3212C09K3/1463H01L21/7684
    • A slurry for copper polishing has a pH between 7.5 and 12. In a particular embodiment of the present invention, a slurry for polishing copper has a pH between 8 and 11.5, and includes a SiO2 abrasive, a (NH4)2S2O8 oxidizer, a benzotriazole corrosion inhibitor, and a K3PO4/K2HPO4 buffer. A copper polish slurry, in accordance with the present invention, operates with a high pH of greater than approximately 7.5. In this range the slurry has a low static etch due to formation of a robust, protective layer. This slurry may additionally have S2O8−2 or Fe(CN)6−3 as an oxidizer and can thus offer a high polish rate on the order of 7,000 to 10,000 angstroms per minute which does not decrease significantly during polishing. Such an inventive slurry offers a wide CMP process window such that the slurry and process parameters can be optimized to yield low recess, erosion, and dishing on patterned wafers.
    • 用于铜抛光的浆料的pH为7.5至12.在本发明的一个具体实施方案中,用于抛光铜的浆料的pH为8至11.5,并且包括SiO 2研磨剂,(NH 4)2 S 2 O 8氧化剂,苯并三唑 缓蚀剂和K3PO4 / K2HPO4缓冲液。 根据本发明的铜抛光浆料以大于约7.5的高pH操作。 在该范围内,由于形成坚固的保护层,浆料具有低静态蚀刻。 该浆液可另外具有作为氧化剂的S2O8或Fe(CN)6-3,因此能够提供每分钟7000至10,000埃的高抛光速率,这在抛光过程中不会显着降低。 这种本发明的浆料提供了广泛的CMP工艺窗口,使得浆料和工艺参数可以被优化以在图案化的晶片上产生低的凹陷,侵蚀和凹陷。
    • 9. 发明授权
    • Blood sampling device
    • 采血装置
    • US5873887A
    • 1999-02-23
    • US735975
    • 1996-10-25
    • Toby KingAnne Miller
    • Toby KingAnne Miller
    • A61B5/151A61B5/15A61B5/154A61B17/34
    • A61B5/15194A61B5/150022A61B5/150099A61B5/150183A61B5/150221A61B5/150412A61B5/150809A61B5/150824A61B5/15113A61B5/15117A61B5/1513
    • An automatic blood sampling device is provided with a housing (12, 14, 18, 20), a reciprocable shaft (50) disposed in the housing (12, 14, 18, 20), and a lancet (40) operatively coupled to the shaft (50). The lancet (40) is movable between a retracted position in which the lancet (40) is disposed within the housing (12, 14, 18, 20) and an extended position in which the lancet (40) extends outside of the housing (12, 14, 18, 20).The blood sampling device includes means for retaining the lancet (40) in its retracted position, means (51) for causing the lancet (40) to automatically move from its retracted position to its extended position, and means for generating a reduced internal pressure within an area in the housing (12, 14, 18, 20) as the lancet (40) moves from its retracted position to its extended position to facilitate drawing blood from a skin puncture to be made by the lancet (40) into an interior portion of the housing (12, 14, 18, 20), the internal pressure being less than the ambient pressure outside of the housing (12, 14, 18, 20) of the sampling device.
    • 自动采血装置设置有壳体(12,14,18,20),设置在壳体(12,14,18,20)中的往复运动轴(50),以及可操作地联接到壳体 轴(50)。 所述柳叶刀(40)能够在其中所述柳叶刀(40)设置在所述壳体(12,14,18,20)内的缩回位置与所述柳叶刀(40)延伸到所述壳体(12)外侧的延伸位置之间移动 ,14,18,20)。 采血装置包括用于将柳叶刀(40)保持在其缩回位置的装置,用于使柳叶刀(40)从其缩回位置自动移动到其伸出位置的装置(51),以及用于产生内部压力降低的装置 当刺血针(40)从其缩回位置移动到其延伸位置时,壳体(12,14,18,20)中的区域,以便于将刺血针(40)所形成的皮肤穿刺血液吸入内部 (12,14,18,20),所述内部压力小于所述取样装置的壳体(12,14,18,20)外部的环境压力。