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1. 发明申请

US20090063834A1 Auto-Switching Bios System and the Method Thereof 审中-公开
标题翻译：自动切换生物系统及其方法
公开(公告)号：US20090063834A1
公开(公告)日：2009-03-05
申请号：US11850089
申请日：2007-09-05
申请人： An-Sheng Huang , Shan-Hua Wu
发明人： An-Sheng Huang , Shan-Hua Wu
IPC分类号： G06F15/177
CPC分类号： G06F9/4401
摘要： An auto-switching BIOS system and the method thereof, switches to dual BIOS by a hardware control circuit. After the system has been started with the first BIOS to the predetermined period of time and the BIOS_READY signal is detected as disabled, the hardware control circuit switches the system from the first BIOS to the second BIOS and restarts the system with the second BIOS.
摘要翻译：一种自动切换BIOS系统及其方法，通过硬件控制电路切换到双BIOS。在将系统从第一BIOS开始到预定时间段并且BIOS_READY信号被检测为禁用之后，硬件控制电路将系统从第一BIOS切换到第二BIOS，并且用第二BIOS重新启动系统。

2. 发明申请

US20060001945A1 Spacer fabrication process for manufacturing reflective stealth mirrors and other MEMS devices 有权
标题翻译：用于制造反射隐形镜和其他MEMS器件的间隔件制造工艺
公开(公告)号：US20060001945A1
公开(公告)日：2006-01-05
申请号：US11002766
申请日：2004-12-02
申请人： Shan-Hua Wu , Fei-Yun Chen , Wei-Ya Wang , Hung-Hsin Liu , Sheng-Liang Pan
发明人： Shan-Hua Wu , Fei-Yun Chen , Wei-Ya Wang , Hung-Hsin Liu , Sheng-Liang Pan
IPC分类号： G02B26/00
CPC分类号： G02B26/0833
摘要： A method for use in manufacturing a microelectromechanical system, such as a reflective stealth mirror includes the steps of: forming an I-shape mirror structure; forming a spacer layer over the I-shape mirror structure; and patterning the spacer layer to form at least one spacer along a side of the I-shape mirror structure.
摘要翻译：一种用于制造诸如反射式隐形镜的微机电系统的方法包括以下步骤：形成I形镜结构; 在所述I形镜结构上形成间隔层; 以及图案化间隔层以沿着I形镜结构的一侧形成至少一个间隔物。

3. 发明申请

US20060199393A1 H20 PLASMA AND H20 VAPOR METHODS FOR RELEASING CHARGES 审中-公开
标题翻译： H20等离子体和H 2 O蒸汽方法用于释放电荷
公开(公告)号：US20060199393A1
公开(公告)日：2006-09-07
申请号：US11383931
申请日：2006-05-17
申请人： Yuan-Bang Lee , Tzu-Yang Wu , Sheng-Liang Pan , U. Lin , Yu-Chih Lai , De-Fang Chen , Pei-Hsuan Lin , Shan-Hua Wu , Hung-Hsin Liu
发明人： Yuan-Bang Lee , Tzu-Yang Wu , Sheng-Liang Pan , U. Lin , Yu-Chih Lai , De-Fang Chen , Pei-Hsuan Lin , Shan-Hua Wu , Hung-Hsin Liu
IPC分类号： H01L21/302
CPC分类号： H01L21/31138 , G03F7/427 , H01L21/67069
摘要： An in-situ performed method utilizing a pure H2O plasma to remove a layer of resist from a substrate or wafer without substantially accumulating charges thereon. Also, in-situ performed methods utilizing a pure H2O plasma or a pure H2O vapor to release or remove charges from a surface or surfaces of a substrate or wafer that have accumulated during one or more IC fabrication processes.
摘要翻译：使用纯H 2 O 2等离子体的原位执行方法从衬底或晶片上去除一层抗蚀剂，而基本上不累积电荷。而且，使用纯H 2 O 2等离子体或纯H 2 O 2蒸气的原位实施方法从基板或晶片的表面或表面释放或去除电荷其在一个或多个IC制造过程中积累。

4. 发明授权

US06685842B2 Thermophoretic particle removing system 有权
标题翻译：热解颗粒去除系统
公开(公告)号：US06685842B2
公开(公告)日：2004-02-03
申请号：US10039477
申请日：2001-12-31
申请人： Ruei-Hung Jang , Chih-Lin Ying , Tien-Hsing Woo , Shan-Hua Wu , Ming-Kuo Yu
发明人： Ruei-Hung Jang , Chih-Lin Ying , Tien-Hsing Woo , Shan-Hua Wu , Ming-Kuo Yu
IPC分类号： B01D1709
CPC分类号： B01D21/009
摘要： A method and apparatus for carrying out a method for thermophoretically removing particles from a particulate containing liquid the method including providing a heated turbulent flowing particulate contain liquid through a first conduit; redirecting a portion of the particulate containing liquid through a second conduit to provide laminar flow having a flow direction substantially parallel to the first conduit; forming a thermal gradient in said second conduit substantially perpendicular to the flow direction; concentrating particles in the particulate containing liquid in a portion of the second conduit aided at least in part by thermophoretic forces; and, separating the particulate containing liquid into at least a relatively concentrated particle containing portion and a relatively unconcentrated particle containing portion.
摘要翻译：一种用于实施用于从含颗粒的液体中热去除颗粒的方法的方法和装置，该方法包括提供加热的紊流流动的颗粒通过第一导管容纳液体; 通过第二导管将含部分颗粒的液体重新定向以提供具有基本上平行于第一导管的流动方向的层流; 在所述第二导管中基本上垂直于所述流动方向形成热梯度; 在第二导管的一部分中将颗粒聚集在含微粒的液体中至少部分地通过热电解力来辅助; 并且将含微粒的液体分离成至少相对浓缩的含有颗粒的部分和相对不浓缩的含颗粒的部分。

5. 发明授权

US07180651B2 Spacer fabrication process for manufacturing reflective stealth mirrors and other MEMS devices 有权
标题翻译：用于制造反射隐形镜和其他MEMS器件的间隔件制造工艺
公开(公告)号：US07180651B2
公开(公告)日：2007-02-20
申请号：US11002766
申请日：2004-12-02
申请人： Shan-Hua Wu , Fei-Yun Chen , Wei-Ya Wang , Hung-Hsin Liu , Sheng-Liang Pan
发明人： Shan-Hua Wu , Fei-Yun Chen , Wei-Ya Wang , Hung-Hsin Liu , Sheng-Liang Pan
IPC分类号： G02F26/00
CPC分类号： G02B26/0833
摘要： A method for use in manufacturing a microelectromechanical system, such as a reflective stealth mirror includes the steps of: forming an I-shape mirror structure; forming a spacer layer over the I-shape mirror structure; and patterning the spacer layer to form at least one spacer along a side of the I-shape mirror structure.
摘要翻译：一种用于制造诸如反射式隐形镜的微机电系统的方法包括以下步骤：形成I形镜结构; 在所述I形镜结构上形成间隔层; 以及图案化间隔层以沿着I形镜结构的一侧形成至少一个间隔物。

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