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1. 发明授权

US08372651B2 Method of monitoring a surfactant in a microelectronic process by absorbance 有权
标题翻译：通过吸光度监测微电子工艺中的表面活性剂的方法
公开(公告)号：US08372651B2
公开(公告)日：2013-02-12
申请号：US11696797
申请日：2007-04-05
申请人： Amy M. Tseng , John E. Hoots , Brian V. Jenkins
发明人： Amy M. Tseng , John E. Hoots , Brian V. Jenkins
IPC分类号： G01N21/75
CPC分类号： G01N21/272 , G01N35/085 , G01N2021/8411 , G01N2021/8557 , Y10T436/12 , Y10T436/16 , Y10T436/163333
摘要： A method of monitoring a surfactant in a microelectronic process is disclosed. Specifically, the monitoring of a surfactant occurs by studying the absorbance of a sample collected from a microelectronic process.
摘要翻译：公开了一种在微电子工艺中监测表面活性剂的方法。具体来说，通过研究从微电子工艺收集的样品的吸光度来监测表面活性剂。

2. 发明授权

US08753896B2 Method of monitoring a surfactant in a microelectronic process by fluorescence 有权
标题翻译：通过荧光监测微电子过程中的表面活性剂的方法
公开(公告)号：US08753896B2
公开(公告)日：2014-06-17
申请号：US11696760
申请日：2007-04-05
申请人： Brian V. Jenkins , John E. Hoots , Amy M. Tseng
发明人： Brian V. Jenkins , John E. Hoots , Amy M. Tseng
IPC分类号： G01N21/76 , H01L21/66 , G01N21/00
CPC分类号： H01L22/00 , G01N21/00 , G01N21/643 , G01N31/22 , H01L22/20 , H01L22/30 , Y10T436/12 , Y10T436/153333 , Y10T436/16 , Y10T436/163333
摘要： A method of monitoring a surfactant in a microelectronic process is disclosed. Specifically, the monitoring of a surfactant occurs by studying the fluorescence or electromagnetic emission of a sample collected from a microelectronic process.
摘要翻译：公开了一种在微电子工艺中监测表面活性剂的方法。具体来说，通过研究从微电子工艺收集的样品的荧光或电磁发射来监测表面活性剂。

3. 发明申请

US20080245134A1 METHOD OF MONITORING A SURFACTANT IN A MICROELECTRONIC PROCESS BY ABSORBANCE 有权
标题翻译：通过吸收在微电子过程中监测表面活性剂的方法
公开(公告)号：US20080245134A1
公开(公告)日：2008-10-09
申请号：US11696797
申请日：2007-04-05
申请人： Amy M. Tseng , John E. Hoots , Brian V. Jenkins
发明人： Amy M. Tseng , John E. Hoots , Brian V. Jenkins
IPC分类号： G01N11/00 , G01N1/00 , G01N33/00
CPC分类号： G01N21/272 , G01N35/085 , G01N2021/8411 , G01N2021/8557 , Y10T436/12 , Y10T436/16 , Y10T436/163333
摘要： A method of monitoring a surfactant in a microelectronic process is disclosed. Specifically, the monitoring of a surfactant occurs by studying the absorbance of a sample collected from a microelectronic process.
摘要翻译：公开了一种在微电子工艺中监测表面活性剂的方法。具体来说，通过研究从微电子工艺收集的样品的吸光度来监测表面活性剂。

4. 发明申请

US20080248577A1 A METHOD OF MONITORING A SURFACTANT IN A MICROELECTRONIC PROCESS BY FLUORESCENCE 有权
标题翻译：通过荧光监测微电子工艺中表面活性剂的方法
公开(公告)号：US20080248577A1
公开(公告)日：2008-10-09
申请号：US11696760
申请日：2007-04-05
申请人： Brian V. Jenkins , John E. Hoots , Amy M. Tseng
发明人： Brian V. Jenkins , John E. Hoots , Amy M. Tseng
IPC分类号： G01N31/22
CPC分类号： H01L22/00 , G01N21/00 , G01N21/643 , G01N31/22 , H01L22/20 , H01L22/30 , Y10T436/12 , Y10T436/153333 , Y10T436/16 , Y10T436/163333
摘要： A method of monitoring a surfactant in a microelectronic process is disclosed. Specifically, the monitoring of a surfactant occurs by studying the fluorescence or electromagnetic emission of a sample collected from a microelectronic process.
摘要翻译：公开了一种在微电子工艺中监测表面活性剂的方法。具体来说，通过研究从微电子工艺收集的样品的荧光或电磁发射来监测表面活性剂。

5. 发明授权

US5304800A Leak detection and responsive treatment in industrial water processes 失效
标题翻译：工业水处理中的泄漏检测和响应处理
公开(公告)号：US5304800A
公开(公告)日：1994-04-19
申请号：US974144
申请日：1992-11-10
申请人： John E. Hoots , Brian V. Jenkins , Philip M. Eastin , Eric R. Brundage
发明人： John E. Hoots , Brian V. Jenkins , Philip M. Eastin , Eric R. Brundage
IPC分类号： G01M3/04 , G01M3/20 , G01M3/22 , G01N21/90
CPC分类号： G01M3/228
摘要： Leakage is detected between a process fluid and a temperature-conditioning fluid, or from a process fluid to a temperature-conditioning fluid, in an industrial process. The industrial process includes an A and a B fluid, and one of the A and B fluids receives heat from or transfer heat to the other of the A and the B fluids by an indirect contact method, and one but not both of the A and the B fluids is an industrial process fluid. At least one specie of tracer chemical is maintained in the A fluid, and that specie of tracer chemical is not a normal component of the B fluid. At least one of the A and the B fluids is subjected to at least one analysis at least one site. Such analysis at least detects the presence of the specie of tracer chemical when the fluid subjected to the analysis is the B fluid, and such analysis at least determines the concentration of the specie of tracer chemical when the fluid subjected to the analysis is the A fluid.
摘要翻译：在工业过程中，在工艺流体和温度调节流体之间或从工艺流体到温度调节流体之间检测到泄漏。工业过程包括A和B流体，A和B流体中的一个通过间接接触方法从A或B流体中接收热量或将热量传递到另一个A和B流体，而A和B两者之一 B液是工业过程流体。在A液中保持至少一种示踪剂化学物质，而示踪剂化学物质不是B液的正常组分。至少一个A和B流体对至少一个位点进行至少一个分析。当分析的流体是B液时，这种分析至少检测示踪剂化学物质的存在，并且当分析的流体是A流体时，这种分析至少确定示踪剂化学物质的浓度。

6. 发明授权

US5922606A Fluorometric method for increasing the efficiency of the rinsing and water recovery process in the manufacture of semiconductor chips 失效
标题翻译：用于提高半导体芯片制造中冲洗和水回收过程效率的荧光方法
公开(公告)号：US5922606A
公开(公告)日：1999-07-13
申请号：US931556
申请日：1997-09-16
申请人： Brian V. Jenkins , John E. Hoots
发明人： Brian V. Jenkins , John E. Hoots
IPC分类号： H01L21/304 , H01L21/306 , G01N21/64
CPC分类号： H01L21/02052 , Y10S438/906 , Y10T436/12 , Y10T436/13
摘要： A method for determining wafer cleanliness by fluorometric monitoring of the impurities in the semiconductor chip wafer rinse solution. A clean chip is indicated by a leveling off of increased concentration of impurities as the rinsing of the chip progresses. A method for optimizing reuse or recyling of the water discharged from the rinse process which accurately measures the contaminants in that water.
摘要翻译：一种通过荧光监测半导体芯片晶片冲洗溶液中的杂质来确定晶片清洁度的方法。当芯片的漂洗进行时，清洁芯片由均匀的杂质浓度表示。一种优化从冲洗过程排出的水的再利用或再生的方法，其精确地测量该水中的污染物。

7. 发明授权

US6140130A Detection and removal of copper from wastewater streams from semiconductor and printed circuit board processing 失效
标题翻译：从半导体和印刷电路板处理的废水流中检测和去除铜
公开(公告)号：US6140130A
公开(公告)日：2000-10-31
申请号：US114740
申请日：1998-07-13
申请人： Kristine S. Salmen , Angela S. Kowalski , Brian V. Jenkins , John E. Hoots
发明人： Kristine S. Salmen , Angela S. Kowalski , Brian V. Jenkins , John E. Hoots
IPC分类号： C02F1/42 , C02F1/62 , G01N21/64
CPC分类号： G01N21/643 , Y10T436/12
摘要： A system and method for the detection and removal of copper from wastewater streams from semiconductor or printed circuit board manufacturing is described and claimed. The detection system and method involve the addition of a reagent that reacts with copper to quench the fluorophore present, with the decrease in fluorescence being detected by a fluorometer. The reduction of fluorescence is then used to calculate the amount of copper present in the form of Cu+2 ion in the wastewater. The removal system and method involve either the addition of a polymer that reacts with copper to form an insoluble precipitate with said precipitate then being removed by using any technique commonly known in the art; or the use of an ion exchange column to remove the copper from the wastewater stream.
摘要翻译：描述并要求保护从半导体或印刷电路板制造的废水流中检测和去除铜的系统和方法。检测系统和方法包括加入与铜反应以猝灭存在的荧光团的试剂，荧光检测器的荧光减少。然后使用荧光的还原来计算废水中Cu + 2离子形式存在的铜的量。去除系统和方法包括加入与铜反应以形成不溶性沉淀物的聚合物，然后通过使用本领域公知的任何技术将所述沉淀物除去; 或使用离子交换柱从废水流中除去铜。

8. 发明授权

US5658798A Detection of process components in food process streams by fluorescence 失效
标题翻译：通过荧光检测食品工艺流程中的工艺成分
公开(公告)号：US5658798A
公开(公告)日：1997-08-19
申请号：US597415
申请日：1996-02-08
申请人： Gregory K. Bertin , Theresa P. Cawley , John E. Hoots , Brian V. Jenkins , Christine M. Stuart , Terry L. Stuebner
发明人： Gregory K. Bertin , Theresa P. Cawley , John E. Hoots , Brian V. Jenkins , Christine M. Stuart , Terry L. Stuebner
IPC分类号： G01N21/64 , G01N33/02
CPC分类号： G01N21/6486 , G01N33/02
摘要： The invention is a method of monitoring for the presence of certain constituents of food processing streams by measurement of fluorescence. The constituent monitored can be a fluorescing impurity of a food product, or the food product itself if such naturally fluoresces. Moreover, losses of the constituent to be monitored may be determined by concurrent measurement of fluorescence of a fluorescent material added to the food process stream. The method is applicable to the following food processing streams among others: meat, vegetable oil, sugar beet, sugar cane, grain, poultry, fruit and soybean processing streams. Upon determination of a variation of the fluorescing constituent to be measured, the food process can be adjusted accordingly.
摘要翻译：本发明是通过测量荧光监测食物加工流的某些成分的存在的方法。监测的成分可以是食品的荧光杂质，或者如果这种天然发荧光，食品本身就可以是食品。此外，待监测的成分的损失可以通过同时测量添加到食品工艺流中的荧光材料的荧光来确定。该方法适用于以下食品加工流程：肉类，植物油，甜菜，甘蔗，粮食，家禽，水果和大豆加工流。在确定待测量的荧光成分的变化时，可以相应地调节食物过程。

9. 发明授权

US06238487B1 Method for improving the efficiency of semiconductor chip production 有权
标题翻译：提高半导体芯片生产效率的方法
公开(公告)号：US06238487B1
公开(公告)日：2001-05-29
申请号：US09334189
申请日：1999-06-16
申请人： Brian V. Jenkins , John E. Hoots
发明人： Brian V. Jenkins , John E. Hoots
IPC分类号： G01R3126
CPC分类号： H01L21/02052 , Y10S438/906 , Y10T436/12 , Y10T436/13
摘要： A method for determining wafer cleanliness by fluorometric monitoring of the impurities in the semiconductor chip wafer rinse solution. A clean chip is indicated by a leveling off of increased concentration of impurities as the rinsing of the chip progresses. A method for optimizing reuse or recyling of the water discharged from the rinse process which accurately measures the contaminants in that water.
摘要翻译：一种通过荧光监测半导体芯片晶片冲洗溶液中的杂质来确定晶片清洁度的方法。当芯片的漂洗进行时，清洁芯片由均匀的杂质浓度表示。一种优化从冲洗过程排出的水的再利用或再生的方法，其精确地测量该水中的污染物。

10. 发明申请

US20130183773A1 CONTROL OVER HYDROGEN FLUORIDE LEVELS IN OXIDE ETCHANT 有权
标题翻译：控制氧化物中氢氟化物的含量
公开(公告)号：US20130183773A1
公开(公告)日：2013-07-18
申请号：US13731296
申请日：2012-12-31
申请人： Amy M. Tseng , Brian V. Jenkins , Robert Mack
发明人： Amy M. Tseng , Brian V. Jenkins , Robert Mack
IPC分类号： G01N31/22
CPC分类号： G01N31/221 , B81C1/00531 , B81C2201/0132 , B81C2201/0142 , C09K13/00 , G01N21/272 , G01N21/80 , G01N35/085 , G01N2021/8411 , G01N2021/8557 , H01L21/67063 , H01L22/12 , Y10T436/153333
摘要： The invention is directed towards methods and compositions for identifying the amount of hydrofluoric acid in a buffered oxide etching composition. In buffered oxide etching compositions it is very difficult to measure the amount of hydrofluoric acid because it has varying equilibriums and it is toxic so it hard to handle and sample. When used to manufacture microchips however, incorrect amounts of hydrofluoric acid will ruin those chips. The invention utilizes a unique method of spectrographically measuring the hydrofluoric acid when in contact with added chromogenic agents to obtain exact measurements that are accurate, immediate, and safe.
摘要翻译：本发明涉及用于鉴定缓冲氧化物蚀刻组合物中氢氟酸的量的方法和组合物。在缓冲氧化物蚀刻组合物中，非常难以测量氢氟酸的量，因为其具有不同的平衡，并且它是有毒的，因此难以处理和取样。然而，当用于制造微芯片时，不正确量的氢氟酸会破坏这些芯片。当与添加的显色剂接触时，本发明利用光谱测量氢氟酸的独特方法，以获得准确，立即和安全的精确测量。

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