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1. 发明专利

JP2008302068A X-ray imaging apparatus 审中-公开
标题翻译： X射线成像装置
公开(公告)号：JP2008302068A
公开(公告)日：2008-12-18
申请号：JP2007152792
申请日：2007-06-08
申请人： Aloka Co Ltd , アロカ株式会社
发明人： OTOMO NAOKI , KITAGAWA SHIGERU , HOSOBE TAKASHI , KOBAYASHI MASAKI , YAMASHITA FUMIAKI
IPC分类号： A61B6/03
CPC分类号： A61B6/508
摘要： PROBLEM TO BE SOLVED: To appropriately extract an unstable device in X-ray imaging apparatus with relatively high detection sensitivity.
SOLUTION: The average value and the standard deviation are calculated based on projection data obtained when X rays are radiated from an X-ray generator. For example, the average value AV
n and the standard deviation SD
n when X rays are radiated are calculated for a channel ch
n . Next, the standard deviation is calculated based on the projection data obtained when X rays are not radiated from the X-ray generator. For example, the standard deviation SD
n when X rays are not radiated is calculated for the channel ch
n . Then, whether a semiconductor device is unstable or not is determined based on the average value and the standard deviation when the X rays are radiated and the standard deviation when X rays are not radiated, calculated for each semiconductor device. For example, whether the semiconductor device is unstable or not is determined by comparing the data with predetermined reference data.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：为了适当地提取具有较高检测灵敏度的X射线成像装置中的不稳定装置。
解决方案：根据从X射线发生器发射X射线时获得的投影数据计算平均值和标准偏差。例如，对于通道ch n 计算X射线照射时的平均值AV n 和标准偏差SD n 。接下来，基于当X射线不从X射线发生器发射时获得的投影数据来计算标准偏差。例如，针对信道ch n 计算X射线未被辐射时的标准偏差SD n 。然后，基于对于每个半导体器件计算X射线时的平均值和标准偏差以及不辐射X射线时的标准偏差，确定半导体器件是否不稳定。例如，通过将数据与预定的参考数据进行比较来确定半导体器件是否不稳定。版权所有（C）2009，JPO＆INPIT

2. 发明专利

JP2008302065A X-ray imaging apparatus 有权
标题翻译： X射线成像装置
公开(公告)号：JP2008302065A
公开(公告)日：2008-12-18
申请号：JP2007152783
申请日：2007-06-08
申请人： Aloka Co Ltd , アロカ株式会社
发明人： OTOMO NAOKI , KITAGAWA SHIGERU , HOSOBE TAKASHI , KOBAYASHI MASAKI , YAMASHITA FUMIAKI
IPC分类号： A61B6/03
CPC分类号： A61B6/508
摘要： PROBLEM TO BE SOLVED: To remove foreign radiation components such as cosmic rays included in detection data of X-ray imaging apparatus.
SOLUTION: An X-ray generator 10 irradiates a subject 90 with an X-ray fan beam 12. An X-ray detector 20 has a semiconductor device array 22 consisting of a plurality of semiconductor devices for detecting the fan beam 12. A cosmic ray component removing part 30 removes muon components included in the projection data of the fan beam 12. Specifically, the cosmic ray component removing part 30 determines whether muon components are included or not in a plurality of projection data by comparing the plurality of projection data detected at different hours, and removes the muon components. An image forming part 40 forms X-ray image data by executing the reconstruction arithmetic operation based on the projection data from which the muon components are removed.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：去除包括在X射线成像设备的检测数据中的宇宙射线等外来的辐射成分。解决方案：X射线发生器10用X射线扇形光束12照射被检体90.X射线检测器20具有由用于检测扇形光束12的多个半导体器件组成的半导体器件阵列22。宇宙射线成分去除部30除去风扇光束12的投影数据中包含的μ子成分。具体地，宇宙射线成分去除部30通过比较多个投影来判定多个投影数据中是否包含muon成分在不同时间检测数据，并删除muon组件。图像形成部分40通过基于去除了μ子分量的投影数据执行重建算术运算来形成X射线图像数据。版权所有（C）2009，JPO＆INPIT

3. 发明专利

JP2008302067A X-ray imaging apparatus 审中-公开
标题翻译： X射线成像装置
公开(公告)号：JP2008302067A
公开(公告)日：2008-12-18
申请号：JP2007152790
申请日：2007-06-08
申请人： Aloka Co Ltd , アロカ株式会社
发明人： OTOMO NAOKI , KITAGAWA SHIGERU , HOSOBE TAKASHI , KOBAYASHI MASAKI , YAMASHITA FUMIAKI
IPC分类号： A61B6/03
CPC分类号： A61B6/508
摘要： PROBLEM TO BE SOLVED: To reduce the influence of cosmic rays, etc. in the calibration of an X-ray imaging apparatus.
SOLUTION: Projection data D
1 -D
k are collected for each channel in reference time, and the average value AV
R and the standard deviation SD
R on the projection data D
1 -D
k for all the channels are calculated. Then, the projection data, obtained one after another for the respective channels as the data for calibration, are compared with the average value AV
R for example. If the difference of the projection data from the average value AV
R exceeds tolerance, it is determined that the projection data are affected by muons, and the affected projection data are removed from the data for calibration. In this way, the calibration is hardly affected by muons, etc, so that the calibration can be more accurately performed.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：为了减少在X射线成像设备的校准中的宇宙射线等的影响。
解决方案：在参考时间内为每个通道收集投影数据D 1 -D k ，平均值AV R 计算所有通道的投影数据D -D k 上的标准偏差SD R 。然后，将用于各个通道的各个通道相继获得的用于校准的数据的投影数据与例如平均值AV R 进行比较。如果投影数据与平均值AV R 的差超过公差，则确定投影数据受μ子影响，并从数据中删除受影响的投影数据进行校准。这样，校准几乎不受μ子等影响，从而可以更准确地进行校准。版权所有（C）2009，JPO＆INPIT

4. 发明专利

JP2008302066A X-ray ct apparatus 有权
标题翻译： X射线CT装置
公开(公告)号：JP2008302066A
公开(公告)日：2008-12-18
申请号：JP2007152787
申请日：2007-06-08
申请人： Aloka Co Ltd , アロカ株式会社
发明人： OTOMO NAOKI , KITAGAWA SHIGERU , HOSOBE TAKASHI , KOBAYASHI MASAKI , YAMASHITA FUMIAKI
IPC分类号： A61B6/03
CPC分类号： A61B6/508
摘要： PROBLEM TO BE SOLVED: To reduce the influence of cosmic rays, etc. in the calibration of an X-ray CT apparatus.
SOLUTION: In the calibration performed by actual irradiation/detection with a fan beam 12, an X-ray generator 10 and an X-ray detector 20 are disposed in the horizontal direction (in the x-axis direction). Specifically, the X-ray generator 10 and the X-ray detector 20 are moved as a rotary base 72 is rotated by a rotating mechanism 70, and the normal of the detection face of the semiconductor device array 22 is turned approximately in the horizontal direction. As the possibility of muons coming approximately in the vertical direction (in the z-axis direction) is high, the possibility of muons flying into the detection face can be reduced by turning the normal of the detection face of the semiconductor device array 22 approximately in the horizontal direction. As a result, the calibration including the detection of X rays is hardly affected by muons, etc., and therefore, the calibration can be more accurately performed.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：为了减少在X射线CT装置的校准中的宇宙射线等的影响。解决方案：在通过风扇光束12的实际照射/检测进行的校准中，在水平方向（x轴方向）上设置X射线发生器10和X射线检测器20。具体地说，当旋转基座72被旋转机构70旋转时，X射线发生器10和X射线检测器20移动，半导体器件阵列22的检测面的法线大致在水平方向转动。由于μ子大致在垂直方向（在z轴方向上）的可能性很高，所以可以通过将半导体器件阵列22的检测面的法线近似地转过来来减小μons进入检测面的可能性水平方向。结果，包括X射线检测的校准几乎不受μ子等的影响，因此可以更精确地进行校准。版权所有（C）2009，JPO＆INPIT

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