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    • 5. 发明申请
    • SILICON-GERMANIUM, QUANTUM-WELL, LIGHT-EMITTING DIODE
    • 硅锗,量子阱,发光二极管
    • US20120175586A1
    • 2012-07-12
    • US13259455
    • 2009-09-25
    • Alexandre M. BratkovskiViatcheslav Osipov
    • Alexandre M. BratkovskiViatcheslav Osipov
    • H01L33/06
    • H01L33/34H01L33/06
    • A silicon-germanium, quantum-well, light-emitting diode (120). The light-emitting diode (120) includes a p-doped portion (410), a quantum-well portion (420), and an p-doped portion (430). The quantum-well portion (420) is disposed between the p-doped portion (410) and the n-doped portion (430). The quantum-well portion (420) includes a carrier confinement region that is configured to facilitate luminescence with emission of light (344) produced by direct recombination (340) of an electron (314) with a hole (324) confined within the carrier confinement region. The p-doped portion (410) includes a first alloy of silicon-germanium, and the n-doped portion (430) includes a second alloy of silicon-germanium.
    • 硅锗,量子阱,发光二极管(120)。 发光二极管(120)包括p掺杂部分(410),量子阱部分(420)和p掺杂部分(430)。 量子阱部分(420)设置在p掺杂部分(410)和n掺杂部分(430)之间。 量子阱部分(420)包括载体限制区域,其被配置为便于通过电子(314)的直接复合(340)产生的发射光(344)的发光,所述电子(314)具有限定在载体限制内的孔(324) 地区。 p掺杂部分(410)包括硅 - 锗的第一合金,并且n掺杂部分(430)包括硅 - 锗的第二合金。
    • 7. 发明授权
    • Indirect-bandgap-semiconductor, light-emitting diode
    • 间接带隙半导体,发光二极管
    • US08471270B2
    • 2013-06-25
    • US13257393
    • 2009-03-23
    • Alexandre M. BratkovskiViatcheslav Osipov
    • Alexandre M. BratkovskiViatcheslav Osipov
    • H01L27/15H01L29/18H01L31/12H01L33/00
    • H01L33/34H01L33/0012
    • An indirect-bandgap-semiconductor, light-emitting diode. The indirect-bandgap-semiconductor, light-emitting diode includes a plurality of portions including a p-doped portion of an indirect-bandgap semiconductor, an intrinsic portion of the indirect-bandgap semiconductor, and a n-doped portion of the indirect-bandgap semiconductor. The intrinsic portion is disposed between the p-doped portion and the n-doped portion and forms a p-i junction with the p-doped portion, and an i-n junction with the n-doped portion. The p-i junction and the i-n junction are configured to facilitate formation of at least one hot electron-hole plasma in the intrinsic portion when the indirect-bandgap-semiconductor, light-emitting diode is reverse biased and to facilitate luminescence produced by recombination of a hot electron with a hole.
    • 间接带隙半导体,发光二极管。 间接带隙半导体发光二极管包括多个部分,其包括间接带隙半导体的p掺杂部分,间接带隙半导体的本征部分和间接带隙的n掺杂部分 半导体。 本征部分设置在p掺杂部分和n掺杂部分之间,并与p掺杂部分形成p-i结,并与n掺杂部分形成i-n结。 当间接带隙半导体发光二极管被反向偏置时,pi结和in结被构造成便于在本征部分中形成至少一个热电子空穴等离子体,并且促进通过热的复合产生的发光 电子有孔。
    • 8. 发明申请
    • INDIRECT-BANDGAP-SEMICONDUCTOR, LIGHT-EMITTING DIODE
    • 间接双峰半导体,发光二极管
    • US20120012863A1
    • 2012-01-19
    • US13257393
    • 2009-03-23
    • Alexandre M. BratkovskiViatcheslav Osipov
    • Alexandre M. BratkovskiViatcheslav Osipov
    • H01L33/34
    • H01L33/34H01L33/0012
    • An indirect-bandgap-semiconductor, light-emitting diode. The indirect-bandgap-semiconductor, light-emitting diode includes a plurality of portions including a p-doped portion of an indirect-bandgap semiconductor, an intrinsic portion of the indirect-bandgap semiconductor, and a n-doped portion of the indirect-bandgap semiconductor. The intrinsic portion is disposed between the p-doped portion and the n-doped portion and forms a p-i junction with the p-doped portion, and an i-n junction with the n-doped portion. The p-i junction and the i-n junction are configured to facilitate formation of at least one hot electron-hole plasma in the intrinsic portion when the indirect-bandgap-semiconductor, light-emitting diode is reverse biased and to facilitate luminescence produced by recombination of a hot electron with a hole.
    • 间接带隙半导体,发光二极管。 间接带隙半导体发光二极管包括多个部分,其包括间接带隙半导体的p掺杂部分,间接带隙半导体的本征部分和间接带隙的n掺杂部分 半导体。 本征部分设置在p掺杂部分和n掺杂部分之间,并与p掺杂部分形成p-i结,并与n掺杂部分形成i-n结。 当间接带隙半导体发光二极管被反向偏置时,pi结和in结被构造成便于在本征部分中形成至少一个热电子空穴等离子体,并且促进通过热的复合产生的发光 电子有孔。