会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 3. 发明授权
    • Error compensation in three-dimensional mapping
    • 三维映射中的误差补偿
    • US09330324B2
    • 2016-05-03
    • US13541775
    • 2012-07-05
    • Daniel CohenDmitri RaisErez SaliNiv GalezerAlexander Shpunt
    • Daniel CohenDmitri RaisErez SaliNiv GalezerAlexander Shpunt
    • H04N5/228G01B11/30G06K9/20G06T7/00H04N13/02
    • G06K9/2036G06K2209/40G06T7/521G06T2207/30196H04N13/254H04N13/271
    • A method for forming a three-dimensional (3D) map of an object, including illuminating the object from a light source so as to project a pattern onto the object, capturing an image of the pattern using an array of detector elements, and processing the captured image so as to measure respective offsets of elements of the pattern in the captured image relative to a reference pattern, the offsets including at least a first offset of a first element of the pattern and a second offset of a second element of the pattern, measured respectively in first and second, mutually-perpendicular directions in a plane of the array. The method further includes computing a correction factor in response to the first offset, applying the correction factor to the second offset so as to find a corrected offset, and computing depth coordinates of the object in response to the corrected offset.
    • 一种用于形成物体的三维(3D)地图的方法,包括从光源照射物体以将图案投射到物体上,使用检测器元件的阵列捕获图案的图像,并且处理 拍摄图像,以便相对于参考图案测量所捕获的图像中的图案的元素的相应偏移,所述偏移包括图案的第一元素的第一偏移和图案的第二元素的第二偏移的至少第一偏移, 分别在阵列的平面中的第一和第二,相互垂直的方向测量。 所述方法还包括:响应于所述第一偏移来计算校正因子,将所述校正因子应用于所述第二偏移,以便找到校正的偏移量,以及响应于校正的偏移来计算所述物体的深度坐标。
    • 4. 发明申请
    • Error Compensation in Three-Dimensional Mapping
    • 三维映射误差补偿
    • US20120281240A1
    • 2012-11-08
    • US13541775
    • 2012-07-05
    • Daniel CohenDmitri RaisErez SaliNiv GalezerAlexander Shpunt
    • Daniel CohenDmitri RaisErez SaliNiv GalezerAlexander Shpunt
    • G01B11/25
    • G06K9/2036G06K2209/40G06T7/521G06T2207/30196H04N13/254H04N13/271
    • A method for forming a three-dimensional (3D) map of an object, including illuminating the object from a light source so as to project a pattern onto the object, capturing an image of the pattern using an array of detector elements, and processing the captured image so as to measure respective offsets of elements of the pattern in the captured image relative to a reference pattern, the offsets including at least a first offset of a first element of the pattern and a second offset of a second element of the pattern, measured respectively in first and second, mutually-perpendicular directions in a plane of the array. The method further includes computing a correction factor in response to the first offset, applying the correction factor to the second offset so as to find a corrected offset, and computing depth coordinates of the object in response to the corrected offset.
    • 一种用于形成物体的三维(3D)地图的方法,包括从光源照射物体以将图案投射到物体上,使用检测器元件的阵列捕获图案的图像,并且处理 拍摄图像,以便相对于参考图案测量所捕获的图像中的图案的元素的相应偏移,所述偏移包括图案的第一元素的第一偏移和图案的第二元素的第二偏移的至少第一偏移, 分别在阵列的平面中的第一和第二,相互垂直的方向测量。 所述方法还包括:响应于所述第一偏移来计算校正因子,将所述校正因子应用于所述第二偏移,以便找到校正的偏移量,以及响应于校正的偏移来计算所述物体的深度坐标。
    • 5. 发明申请
    • Error Compensation in Three-Dimensional Mapping
    • 三维映射误差补偿
    • US20110096182A1
    • 2011-04-28
    • US12605340
    • 2009-10-25
    • Daniel CohenDmitri RaisErez SaliNiv GalezerAlexander Shpunt
    • Daniel CohenDmitri RaisErez SaliNiv GalezerAlexander Shpunt
    • H04N5/228G06K9/36G06T17/00
    • G06K9/2036G06K2209/40G06T7/521G06T2207/30196H04N13/254H04N13/271
    • A method for forming a three-dimensional (3D) map of an object, including illuminating the object from a light source so as to project a pattern onto the object, capturing an image of the pattern using an array of detector elements, and processing the captured image so as to measure respective offsets of elements of the pattern in the captured image relative to a reference pattern, the offsets including at least a first offset of a first element of the pattern and a second offset of a second element of the pattern, measured respectively in first and second, mutually-perpendicular directions in a plane of the array. The method further includes computing a correction factor in response to the first offset, applying the correction factor to the second offset so as to find a corrected offset, and computing depth coordinates of the object in response to the corrected offset.
    • 一种用于形成物体的三维(3D)地图的方法,包括从光源照射物体以将图案投射到物体上,使用检测器元件的阵列捕获图案的图像,并且处理 拍摄图像,以便相对于参考图案测量所捕获的图像中的图案的元素的相应偏移,所述偏移包括图案的第一元素的第一偏移和图案的第二元素的第二偏移的至少第一偏移, 分别在阵列的平面中的第一和第二,相互垂直的方向测量。 所述方法还包括:响应于所述第一偏移来计算校正因子,将所述校正因子应用于所述第二偏移,以便找到校正的偏移量,以及响应于校正的偏移来计算所述物体的深度坐标。
    • 9. 发明授权
    • Optical components, systems including an optical component, and devices
    • 光学部件,包括光学部件的系统和装置
    • US09140844B2
    • 2015-09-22
    • US12940343
    • 2010-11-05
    • Seth Coe-SullivanDaniel CohenJohn E. RitterJohn R. Linton
    • Seth Coe-SullivanDaniel CohenJohn E. RitterJohn R. Linton
    • H01L29/06F21V8/00
    • G02B6/0015G02B6/005G02B6/0065
    • A lighting system including a light source capable of generating light, and an optical component optically coupled to receive at least a portion of the light generated by the light source and convert at least a portion of the light so received to a predetermined wavelength such that the light emitted by the lighting system includes light emission from the light source supplemented with light emission at the predetermined wavelength, wherein the optical component including an optical material comprises quantum confined semiconductor nanoparticles. Also disclosed is an optical component comprising a light guide plate and an optical material disposed over at least a portion of a surface of the light guide plate, the optical material comprising quantum confined semiconductor nanoparticles capable of emitting light in a predetermined spectral region. Devices are also disclosed.
    • 一种包括能够产生光的光源的照明系统和光学部件,光学部件被光耦合以接收由光源产生的光的至少一部分,并将至少一部分如此接收的光转换成预定波长,使得 由照明系统发射的光包括来自补充有预定波长的发光的来自光源的光发射,其中包括光学材料的光学部件包括量子限制的半导体纳米颗粒。 还公开了一种光学部件,其包括导光板和设置在导光板的至少一部分表面上的光学材料,该光学材料包括能够在预定光谱区域中发光的量子限制半导体纳米粒子。 还公开了设备。