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1. 发明授权

US07168939B2 System, method, and apparatus for multilevel UV molding lithography for air bearing surface patterning 失效
标题翻译：用于空气轴承表面图案化的多层UV成型光刻的系统，方法和装置
公开(公告)号：US07168939B2
公开(公告)日：2007-01-30
申请号：US10787476
申请日：2004-02-26
申请人： Alexander Bietsch , Michael W. Chaw , Ashok Lahiri , Ian Robson McFadyen , Bruno Michel , Mark C. Thurber
发明人： Alexander Bietsch , Michael W. Chaw , Ashok Lahiri , Ian Robson McFadyen , Bruno Michel , Mark C. Thurber
IPC分类号： B29C59/02
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F7/0017
摘要： UV molding from elastomeric masters on thin bendable backplanes that allow replication of UV-cured resist patterns with high accuracy is disclosed. This design accommodates large substrate topographies, has improved de-molding properties, and facilitates two-in-one lithography and assembly of the sliders on topographically structured elastomeric sticky pads. The combination of sticky pad assembly and two-in-one lithography allows an all-in-one harmony process based on UV-molding. These features cure prior art technical problems of the harmony process while significantly reducing cost.
摘要翻译：公开了能够以高精度复制UV固化的抗蚀剂图案的薄弯曲背板上的弹性体主体的UV模塑。这种设计适应于大的基片形状，具有改善的脱模性能，并且促进滑块在地形结构的弹性粘性垫上的二合一光刻和组装。粘垫组件和二合一光刻的组合允许基于UV成型的一体式和谐工艺。这些特征解决了和谐过程的现有技术问题，同时显着降低了成本。

2. 发明授权

US07504038B2 System, method, and apparatus for mechanically releasable slider processing including lapping, air bearing patterning, and debonding 有权
标题翻译：用于机械可拆卸的滑块加工的系统，方法和装置，包括研磨，空气轴承图案化和脱粘
公开(公告)号：US07504038B2
公开(公告)日：2009-03-17
申请号：US10788145
申请日：2004-02-26
申请人： Alexander Bietsch , Michael W. Chaw , Ashok Lahiri , Bruno Michel , Mark C. Thurber
发明人： Alexander Bietsch , Michael W. Chaw , Ashok Lahiri , Bruno Michel , Mark C. Thurber
IPC分类号： B44C1/22
CPC分类号： G11B5/127
摘要： A mechanically releasable slider process utilizes silicone rubber or PDMS to take the function of a planarization material for individual sliders or slider rows. Mechanical debonding takes advantage of the rubber-elastic property of PDMS. A gripper is used in a virtually solvent-free, air bearing patterning UV-molding process and resist-based processes. A PDMS-based fixture is used during both the lapping process and the photo or UV-mold patterning of the ABS surface. This fixture can mechanically hold sliders by large area reversible adhesion while allowing gimbaling, electrical connection, actuation, UV-molding or photolithography, and mechanical release, thus reducing the number of slider manipulations to two.
摘要翻译：机械可剥离的滑块工艺利用硅橡胶或PDMS来承担各个滑块或滑块排的平面化材料的功能。机械剥离利用了PDMS的橡胶弹性特性。夹具用于几乎无溶剂的空气轴承图案化UV成型工艺和基于抗蚀剂的工艺。在ABS表面的研磨过程和照相或UV模具图案化期间都使用基于PDMS的夹具。该夹具可以通过大面积可逆粘合机械地保持滑块，同时允许伸缩，电连接，致动，UV成型或光刻，以及机械释放，从而将滑块操纵的数量减少到两个。

3. 发明申请

US20050191582A1 System, method, and apparatus for mechanically releasable slider processing including lapping, air bearing patterning, and debonding 有权
标题翻译：用于机械可拆卸的滑块加工的系统，方法和装置，包括研磨，空气轴承图案化和脱粘
公开(公告)号：US20050191582A1
公开(公告)日：2005-09-01
申请号：US10788145
申请日：2004-02-26
申请人： Alexander Bietsch , Michael Chaw , Ashok Lahiri , Bruno Michel , Mark Thurber
发明人： Alexander Bietsch , Michael Chaw , Ashok Lahiri , Bruno Michel , Mark Thurber
IPC分类号： B24B1/00 , G03C5/00 , G11B5/127
CPC分类号： G11B5/127
摘要： A mechanically releasable slider process utilizes silicone rubber or PDMS to take the function of a planarization material for individual sliders or slider rows. Mechanical debonding takes advantage of the rubber-elastic property of PDMS. A gripper is used in a virtually solvent-free, air bearing patterning UV-molding process and resist-based processes. A PDMS-based fixture is used during both the lapping process and the photo or UV-mold patterning of the ABS surface. This fixture can mechanically hold sliders by large area reversible adhesion while allowing gimbaling, electrical connection, actuation, UV-molding or photolithography, and mechanical release, thus reducing the number of slider manipulations to two.
摘要翻译：机械可剥离的滑块工艺利用硅橡胶或PDMS来承担各个滑块或滑块排的平面化材料的功能。机械剥离利用了PDMS的橡胶弹性特性。夹具用于几乎无溶剂的空气轴承图案化UV成型工艺和基于抗蚀剂的工艺。在ABS表面的研磨过程和照相或UV模具图案化期间都使用基于PDMS的夹具。该夹具可以通过大面积可逆粘合机械地保持滑块，同时允许伸缩，电连接，致动，UV成型或光刻，以及机械释放，从而将滑块操纵的数量减少到两个。

4. 发明申请

US20050191418A1 System, method, and apparatus for multilevel UV molding lithography for air bearing surface patterning 失效
标题翻译：用于空气轴承表面图案化的多层UV成型光刻的系统，方法和装置
公开(公告)号：US20050191418A1
公开(公告)日：2005-09-01
申请号：US10787476
申请日：2004-02-26
申请人： Alexander Bietsch , Michael Chaw , Ashok Lahiri , Ian McFadyen , Bruno Michel , Mark Thurber
发明人： Alexander Bietsch , Michael Chaw , Ashok Lahiri , Ian McFadyen , Bruno Michel , Mark Thurber
IPC分类号： B05D5/00 , G03F7/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F7/0017
摘要： UV molding from elastomeric masters on thin bendable backplanes that allow replication of UV-cured resist patterns with high accuracy is disclosed. This design accommodates large substrate topographies, has improved de-molding properties, and facilitates two-in-one lithography and assembly of the sliders on topographically structured elastomeric sticky pads. The combination of sticky pad assembly and two-in-one lithography allows an all-in-one harmony process based on UV-molding. These features cure prior art technical problems of the harmony process while significantly reducing cost.
摘要翻译：公开了能够以高精度复制UV固化的抗蚀剂图案的薄弯曲背板上的弹性体主体的UV模塑。这种设计适应于大的基片形状，具有改善的脱模性能，并且促进滑块在地形结构的弹性粘性垫上的二合一光刻和组装。粘垫组件和二合一光刻的组合允许基于UV成型的一体式和谐工艺。这些特征解决了和谐过程的现有技术问题，同时显着降低了成本。

5. 发明授权

US07446057B2 Fabrication method 失效
标题翻译：制作方法
公开(公告)号：US07446057B2
公开(公告)日：2008-11-04
申请号：US10574150
申请日：2004-08-23
申请人： Alexander Bietsch , Bruno Michel
发明人： Alexander Bietsch , Bruno Michel
IPC分类号： H01L21/20
CPC分类号： H01L21/76817 , B82Y10/00 , B82Y40/00 , G03F7/0002 , H01L21/76807 , H01L2221/1021 , Y10S438/946
摘要： A method for forming a multilevel structure on a surface by depositing a curable liquid layer on the surface; pressing a stamp having a multilevel pattern therein into the liquid layer to produce in the liquid layer a multilevel structure defined by the pattern; and, curing the liquid layer to produce a solid layer having the multilevel structure therein. Mechanical alignment may be employed to enhance optical alignment of the stamp relative to the substrate via spaced protrusions on the substrate on which the structure is to be formed and complementary recesses in the patterning of the stamp.
摘要翻译：一种通过在表面上沉积可固化液体层而在表面上形成多层结构的方法; 将其中具有多层图案的印模压入液体层中，以在液体层中产生由图案限定的多层结构; 并且固化液体层以产生其中具有多层结构的固体层。可以采用机械对准来增强印模相对于基板的光学对准，通过其上要形成结构的基板上的间隔开的突起和印模的图案化中的互补凹槽。

6. 发明申请

US20070275556A1 Fabrication Method 失效
标题翻译：制作方法
公开(公告)号：US20070275556A1
公开(公告)日：2007-11-29
申请号：US10574150
申请日：2004-08-23
申请人： Alexander Bietsch , Bruno Michel
发明人： Alexander Bietsch , Bruno Michel
IPC分类号： H01L21/4763
CPC分类号： H01L21/76817 , B82Y10/00 , B82Y40/00 , G03F7/0002 , H01L21/76807 , H01L2221/1021 , Y10S438/946
摘要： A method for forming a multilevel structure on a surface by depositing a curable liquid layer on the surface; pressing a stamp having a multilevel pattern therein into the liquid layer to produce in the liquid layer a multilevel structure defined by the pattern; and, curing the liquid layer to produce a solid layer having the multilevel structure therein. Mechanical alignment may be employed to enhance optical alignment of the stamp relative to the substrate via spaced protrusions on the substrate on which the structure is to be formed and complementary recesses in the patterning of the stamp.
摘要翻译：一种通过在表面上沉积可固化液体层而在表面上形成多层结构的方法; 将其中具有多层图案的印模压入液体层中，以在液体层中产生由图案限定的多层结构; 并且固化液体层以产生其中具有多层结构的固体层。可以采用机械对准来增强印模相对于基板的光学对准，通过其上要形成结构的基板上的间隔开的突起和印模的图案化中的互补凹槽。

7. 发明授权

US06798464B2 Liquid crystal display 有权
标题翻译：液晶显示器
公开(公告)号：US06798464B2
公开(公告)日：2004-09-28
申请号：US10063781
申请日：2002-05-13
申请人： Alexander Bietsch , Emmanuel Delamarche , Bruno Michel , Heinz Schmid
发明人： Alexander Bietsch , Emmanuel Delamarche , Bruno Michel , Heinz Schmid
IPC分类号： G02F11335
CPC分类号： G02F1/13439 , G02F1/133621 , G02F2001/133548
摘要： A liquid crystal display device includes a substantially transparent substrate layer between a grating layer and a pixel electrode that comprises a solid conductor and an electrically conductive mesh. The device also includes a liquid crystal layer between said pixel electrode and a substantially transparent counter electrode that is arranged at a transparent cover plate. It further includes an active circuit element layer with a field effect transistor for controlling the pixel electrode. A method for manufacturing the liquid crystal display device is further disclosed wherein the pixel electrode is formed by printing a patterned substance onto the substrate layer and selectively plating a conductor onto said substance. The device may also comprise a conductor mesh comprising rows of conductor lines crossing with columns of conductor lines, wherein at least part of the conductor lines are randomly spaced from each other.
摘要翻译：液晶显示装置包括在光栅层和像素电极之间的基本上透明的基底层，其包括实心导体和导电网。该装置还包括在所述像素电极和布置在透明盖板上的基本上透明的对电极之间的液晶层。其还包括具有用于控制像素电极的场效应晶体管的有源电路元件层。进一步公开了一种用于制造液晶显示装置的方法，其中通过将图案化物质印刷到基底层上并选择性地将导体镀在所述物质上而形成像素电极。该装置还可以包括导体网，其包括与导体线的列交叉的导体线行，其中导体线的至少一部分彼此间隔开。

8. 发明申请

US20090038493A1 Printing in a medium 有权
标题翻译：在媒体上打印
公开(公告)号：US20090038493A1
公开(公告)日：2009-02-12
申请号：US12249322
申请日：2008-10-10
申请人： Alexander Bietsch , Emmanuel Delamarche , Bruno Michel , Heinz Schmid , Heiko Wolf
发明人： Alexander Bietsch , Emmanuel Delamarche , Bruno Michel , Heinz Schmid , Heiko Wolf
IPC分类号： B41K1/42
CPC分类号： B01J19/0093 , B01J2219/00382 , B01J2219/00527 , B01J2219/0072 , B01J2219/0074 , B01J2219/00745 , B01J2219/00747 , B01J2219/00783 , B01J2219/00833 , B01L3/0293 , B01L2300/0819 , B41K1/30 , B41M3/006 , C40B30/08 , C40B40/18 , C40B60/14 , G01N35/1002 , G01N2035/1034 , H05K3/12 , Y10S977/887
摘要： A method for transferring a pattern from an elastic stamp to a substrate in the presence of a third medium is described. A proximity contact is achieved between the stamp and the substrate. A layer of the third medium between the stamp and the substrate is controlled to a predetermined thickness. Stamps for carrying out this method are also described.
摘要翻译：描述了在存在第三介质的情况下将图案从弹性印模转移到基板的方法。在印模和基板之间实现接近接触。将印模和基板之间的第三介质层控制到预定厚度。还描述了用于执行该方法的邮票。

9. 发明授权

US07041232B2 Selective etching of substrates with control of the etch profile 失效
标题翻译：通过控制蚀刻轮廓选择性蚀刻衬底
公开(公告)号：US07041232B2
公开(公告)日：2006-05-09
申请号：US10081860
申请日：2002-02-22
申请人： Alexander Bietsch , Emmanuel Delamarche , Bruno Michel , Heinz Schmid , Matthias Geisler
发明人： Alexander Bietsch , Emmanuel Delamarche , Bruno Michel , Heinz Schmid , Matthias Geisler
IPC分类号： C09K13/00 , C09K13/06 , H01L21/306
CPC分类号： H01L21/76838 , C23F1/02 , C23F1/34 , C23F1/40
摘要： A wet etching system for selectively patterning substrates having regions covered with self-assembled monolayers (SAM) thereby controlling the etch profile. The system contains a) a liquid etching solution; and b) at least one additive to the liquid etching solution having a higher affinity to the regions of the substrate covered with the SAMs than to the other regions of the substrate. Also provided is a method of selectively patterning substrates having regions covered with self-assembled monolayers (SAMs), thereby controlling the etch profile, the method consisting of the steps of a) providing a liquid etching solution; b) adding at least one additive to said etching solution having a higher affinity to the regions of the substrate covered with the SAMs than to the other regions of the substrate; and c) etching said substrate with said liquid etching solution containing at least one additive.
摘要翻译：一种湿蚀刻系统，用于选择性地图案化具有被自组装单层（SAM）覆盖的区域的衬底，从而控制蚀刻轮廓。该系统包含a）液体蚀刻溶液; 和b）液体蚀刻溶液中至少一种添加剂对于被SAM覆盖的衬底的区域比对衬底的其它区域具有更高的亲和力。还提供了一种选择性地图案化具有被自组装单层（SAM）覆盖的区域的衬底的方法，从而控制蚀刻轮廓，该方法包括以下步骤：a）提供液体蚀刻溶液; b）向所述衬底覆盖的所述衬底的所述区域具有比所述衬底的其它区域更高亲和力的所述蚀刻溶液中的至少一种添加剂; 和c）用含有至少一种添加剂的液体蚀刻溶液蚀刻所述基材。

10. 发明授权

US08453569B2 Stamp with permeable hydrophylic matrix 有权
标题翻译：用可渗透的亲水基体印上
公开(公告)号：US08453569B2
公开(公告)日：2013-06-04
申请号：US13477447
申请日：2012-05-22
申请人： Alexander Bietsch , Emmanuel Delamarche , Bruno Michel , Heinz Schmid , Heiko Wolf
发明人： Alexander Bietsch , Emmanuel Delamarche , Bruno Michel , Heinz Schmid , Heiko Wolf
IPC分类号： H01L21/027 , B01J19/00
CPC分类号： B01J19/0093 , B01J2219/00382 , B01J2219/00527 , B01J2219/0072 , B01J2219/0074 , B01J2219/00745 , B01J2219/00747 , B01J2219/00783 , B01J2219/00833 , B01L3/0293 , B01L2300/0819 , B41K1/30 , B41M3/006 , C40B30/08 , C40B40/18 , C40B60/14 , G01N35/1002 , G01N2035/1034 , H05K3/12 , Y10S977/887
摘要： A stamp for transferring a pattern to a substrate in the presence of a third medium, includes a permeable hydrophilic matrix for guiding excess third medium away from the surface of the stamp.
摘要翻译：用于在存在第三介质的情况下将图案转印到基材上的印模包括用于将多余的第三介质引导到印模表面的可渗透的亲水基质。

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