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1. 发明授权

US07423757B2 Modulated reflectance measurement system with multiple wavelengths 有权
标题翻译：多波长调制反射测量系统
公开(公告)号：US07423757B2
公开(公告)日：2008-09-09
申请号：US11492583
申请日：2006-07-25
申请人： Lena Nicolaides , Jeffrey T. Fanton , Alex Salnik , Jon Opsal
发明人： Lena Nicolaides , Jeffrey T. Fanton , Alex Salnik , Jon Opsal
IPC分类号： G01N21/55
CPC分类号： G01N21/39 , G01N21/1717 , G01N21/55 , G01N21/636 , G01N21/9501 , G01N2201/0612 , G01N2201/0691
摘要： A modulated reflectance measurement system includes three monochromatic diode-based lasers. Each laser can operate as a probe beam or as a pump beam source. The laser outputs are redirected using a series of mirrors and beam splitters to reach an objective lens. The objective lens focuses the laser outputs on a sample. Reflected energy returns through objective and is redirected by a beam splitter to a detector. A lock-in amplifier converts the output of the detector to produce quadrature (Q) and in-phase (I) signals for analysis. A Processor uses the Q and/or I signals to analyze the sample. By changing the number of lasers used as pump or probe beam sources, the measurement system can be optimized to measure a range of different samples types.
摘要翻译：调制反射测量系统包括三个基于单色二极管的激光器。每个激光器可以作为探测光束或作为泵浦光源操作。使用一系列反射镜和分束器将激光输出重定向到达物镜。物镜将激光输出聚焦在样品上。反射能量通过目标返回，并被分束器重定向到检测器。锁定放大器转换检测器的输出以产生正交（Q）和同相（I）信号用于分析。处理器使用Q和/或I信号来分析样本。通过改变用作泵浦或探针光束源的激光器的数量，可以优化测量系统以测量不同样品类型的范围。

2. 发明申请

US20080151247A1 Methods for depth profiling in semiconductors using modulated optical reflectance technology 有权
标题翻译：采用调制光学反射技术的半导体深度剖面方法
公开(公告)号：US20080151247A1
公开(公告)日：2008-06-26
申请号：US11998118
申请日：2007-11-28
申请人： Alex Salnik , Jon Opsal , Lena Nicolaides
发明人： Alex Salnik , Jon Opsal , Lena Nicolaides
IPC分类号： G01N21/55
CPC分类号： G01N21/1717 , G01N2021/1719 , G01N2021/178
摘要： Methods of obtaining dopant and damage depth profile information are disclosed using modulated optical reflectivity (MOR) measurements. In one aspect, the depth profile is constructed using information obtained from various measurements such as the junction depth, junction abruptness and dopant concentration. In another aspect, a full theoretical model is developed. Actual measurements are fed to the model. Using an iterative approach, the actual measurements are compared to theoretical measurements calculated from the model to determine the actual depth profile.
摘要翻译：使用调制光学反射率（MOR）测量公开了获得掺杂剂和损伤深度分布信息的方法。在一个方面，使用从诸如结深度，结突起和掺杂剂浓度的各种测量获得的信息来构建深度分布。另一方面，开发了一个完整的理论模型。实际测量被馈送到模型。使用迭代方法，将实际测量与从模型计算的理论测量值进行比较，以确定实际深度分布。

3. 发明授权

US07116424B2 Modulated reflectance measurement system with multiple wavelengths 有权
公开(公告)号：US07116424B2
公开(公告)日：2006-10-03
申请号：US11302674
申请日：2005-12-14
申请人： Lena Nicolaides , Jeffrey T. Fanton , Alex Salnik , Jon Opsal
发明人： Lena Nicolaides , Jeffrey T. Fanton , Alex Salnik , Jon Opsal
IPC分类号： G01N21/55
CPC分类号： G01N21/39 , G01N21/1717 , G01N21/55 , G01N21/636 , G01N21/9501 , G01N2201/0612 , G01N2201/0691
摘要： A modulated reflectance measurement system includes three monochromatic diode-based lasers. Each laser can operate as a probe beam or as a pump beam source. The laser outputs are redirected using a series of mirrors and beam splitters to reach an objective lens. The objective lens focuses the laser outputs on a sample. Reflected energy returns through objective and is redirected by a beam splitter to a detector. A lock-in amplifier converts the output of the detector to produce quadrature (Q) and in-phase (I) signals for analysis. A Processor uses the Q and/or I signals to analyze the sample. By changing the number of lasers used as pump or probe beam sources, the measurement system can be optimized to measure a range of different samples types.

4. 发明申请

US20060092425A1 Modulated reflectance measurement system with multiple wavelengths 有权
公开(公告)号：US20060092425A1
公开(公告)日：2006-05-04
申请号：US11302674
申请日：2005-12-14
申请人： Lena Nicolaides , Jeffrey Fanton , Alex Salnik , Jon Opsal
发明人： Lena Nicolaides , Jeffrey Fanton , Alex Salnik , Jon Opsal
IPC分类号： G01N21/55
CPC分类号： G01N21/39 , G01N21/1717 , G01N21/55 , G01N21/636 , G01N21/9501 , G01N2201/0612 , G01N2201/0691
摘要： A modulated reflectance measurement system includes three monochromatic diode-based lasers. Each laser can operate as a probe beam or as a pump beam source. The laser outputs are redirected using a series of mirrors and beam splitters to reach an objective lens. The objective lens focuses the laser outputs on a sample. Reflected energy returns through objective and is redirected by a beam splitter to a detector. A lock-in amplifier converts the output of the detector to produce quadrature (Q) and in-phase (I) signals for analysis. A Processor uses the Q and/or I signals to analyze the sample. By changing the number of lasers used as pump or probe beam sources, the measurement system can be optimized to measure a range of different samples types.

5. 发明授权

US07002690B2 Ion implant monitoring through measurement of modulated optical response 有权
公开(公告)号：US07002690B2
公开(公告)日：2006-02-21
申请号：US11122452
申请日：2005-05-05
申请人： Alex Salnik , Lena Nicolaides , Jon Opsal
发明人： Alex Salnik , Lena Nicolaides , Jon Opsal
IPC分类号： G01N21/00 , G01N21/55
CPC分类号： G01N21/276 , G01N21/1717 , G01N21/55 , G01N2021/3568
摘要： A method for simultaneously monitoring ion implantation dose, damage and/or dopant depth profiles in ion-implanted semiconductors includes a calibration step where the photo-modulated reflectance of a known damage profile is identified in I-Q space. In a following measurement step, the photo-modulated reflectance of a subject is empirically measured to obtain in-phase and quadrature values. The in-phase and quadrature values are then compared, in I-Q space, to the known damage profile to characterize the damage profile of the subject.

6. 发明申请

US20050195399A1 Method for measuring ion-implanted semiconductors with improved repeatability 失效
标题翻译：用于测量具有改善的重复性的离子注入半导体的方法
公开(公告)号：US20050195399A1
公开(公告)日：2005-09-08
申请号：US11067961
申请日：2005-02-28
申请人： Lena Nicolaides , Mira Bakshi , Alex Salnik , Jon Opsal
发明人： Lena Nicolaides , Mira Bakshi , Alex Salnik , Jon Opsal
IPC分类号： G01N21/55
CPC分类号： G01N21/171 , H01L22/12
摘要： The repeatability of wafer uniformity measurements can be increased by taking spatially averaged measurements of wafer response. By increasing the time over which measurements are obtained, the amount of noise can be significantly reduced, thereby improving the repeatability of the measurements. These measurements can be taken at several locations on the wafer to ensure wafer uniformity. In order to get a stable and repeatable assessment of the wafer process, addressing uncertainties related to damage relaxation or incomplete anneal, an anneal decay factor (ADF) characterization can be performed at a distance away from the TW measurement boxes. From the ADF measurement and the spatially averaged measurements of wafer response, a repeatable assessment of the wafer process can be obtained.
摘要翻译：通过采用晶圆响应的空间平均测量可以提高晶片均匀性测量的重复性。通过增加获得测量的时间，可以显着降低噪声量，从而提高测量的重复性。这些测量可以在晶片上的几个位置进行，以确保晶片的均匀性。为了获得对晶圆工艺的稳定和可重复的评估，解决与损伤弛豫或不完全退火有关的不确定性，可以在远离TW测量箱的距离处执行退火衰减因子（ADF）表征。从ADF测量和晶片响应的空间平均测量，可以获得晶片工艺的可重复评估。

7. 发明授权

US07705977B2 Methods for depth profiling in semiconductors using modulated optical reflectance technology 有权
标题翻译：采用调制光学反射技术的半导体深度剖面方法
公开(公告)号：US07705977B2
公开(公告)日：2010-04-27
申请号：US11998118
申请日：2007-11-28
申请人： Alex Salnik , Jon Opsal , Lena Nicolaides
发明人： Alex Salnik , Jon Opsal , Lena Nicolaides
IPC分类号： G01N21/00
CPC分类号： G01N21/1717 , G01N2021/1719 , G01N2021/178
摘要： Methods of obtaining dopant and damage depth profile information are disclosed using modulated optical reflectivity (MOR) measurements. In one aspect, the depth profile is constructed using information obtained from various measurements such as the junction depth, junction abruptness and dopant concentration. In another aspect, a full theoretical model is developed. Actual measurements are fed to the model. Using an iterative approach, the actual measurements are compared to theoretical measurements calculated from the model to determine the actual depth profile.
摘要翻译：使用调制光学反射率（MOR）测量公开了获得掺杂剂和损伤深度分布信息的方法。在一个方面，使用从诸如结深度，结突起和掺杂剂浓度的各种测量获得的信息来构建深度分布。另一方面，开发了一个完整的理论模型。实际测量被馈送到模型。使用迭代方法，将实际测量与从模型计算的理论测量值进行比较，以确定实际深度分布。

8. 发明授权

US07502104B2 Probe beam profile modulated optical reflectance system and methods 有权
标题翻译：探头光束轮廓调制光学反射系统及方法
公开(公告)号：US07502104B2
公开(公告)日：2009-03-10
申请号：US11890712
申请日：2007-08-06
申请人： Alex Salnik , Lena Nicolaides , Jon Opsal
发明人： Alex Salnik , Lena Nicolaides , Jon Opsal
IPC分类号： G01N21/00
CPC分类号： G01N21/1717 , G01N21/4788 , G01N21/55 , G01N21/636 , G01N21/9501 , G01N2021/1731 , G01N2021/214
摘要： The present invention provides a probe beam profile—modulated optical reflectivity metrology system having a modulated pump source for exciting the sample. A separate probe beam is directed to interact with the sample in a manner so that the rays within the probe beam create a spread of angles of incidence. A detector array simultaneously measures intensities of the rays within the reflected/diffracted probe beam simultaneously at different angles of incidence. The intensity and angle of incidence information is used to analyze the sample.
摘要翻译：本发明提供一种具有用于激发样品的调制泵浦源的探测光束分布调制光学反射率测量系统。引导单独的探针光束以与样品相互作用的方式使得探针束内的光线产生入射角的扩展。检测器阵列同时以不同的入射角测量反射/衍射探测光束内的光线的强度。使用入射信息的强度和角度分析样品。

9. 发明申请

US20080309943A1 MODULATED REFLECTANCE MEASUREMENT SYSTEM WITH MULTIPLE WAVELENGTHS 失效
标题翻译：具有多个波长的调制反射测量系统
公开(公告)号：US20080309943A1
公开(公告)日：2008-12-18
申请号：US12185297
申请日：2008-08-04
申请人： Lena Nicolaides , Jeffrey T. Fanton , Alex Salnik , Jon Opsal
发明人： Lena Nicolaides , Jeffrey T. Fanton , Alex Salnik , Jon Opsal
IPC分类号： G01N21/55
CPC分类号： G01N21/39 , G01N21/1717 , G01N21/55 , G01N21/636 , G01N21/9501 , G01N2201/0612 , G01N2201/0691
摘要： A modulated reflectance measurement system includes three monochromatic diode-based lasers. Each laser can operate as a probe beam or as a pump beam source. The laser outputs are redirected using a series of mirrors and beam splitters to reach an objective lens. The objective lens focuses the laser outputs on a sample. Reflected energy returns through objective and is redirected by a beam splitter to a detector. A lock-in amplifier converts the output of the detector to produce quadrature (Q) and in-phase (I) signals for analysis. A Processor uses the Q and/or I signals to analyze the sample. By changing the number of lasers used as pump or probe beam sources, the measurement system can be optimized to measure a range of different samples types.
摘要翻译：调制反射测量系统包括三个基于单色二极管的激光器。每个激光器可以作为探测光束或作为泵浦光源操作。使用一系列反射镜和分束器将激光输出重定向到达物镜。物镜将激光输出聚焦在样品上。反射能量通过目标返回，并被分束器重定向到检测器。锁定放大器转换检测器的输出以产生正交（Q）和同相（I）信号用于分析。处理器使用Q和/或I信号来分析样本。通过改变用作泵浦或探针光束源的激光器的数量，可以优化测量系统以测量不同样品类型的范围。

10. 发明申请

US20080074668A1 Modulated optical reflectance measurement system with enhanced sensitivity 审中-公开
标题翻译：具有增强灵敏度的调制光学反射测量系统
公开(公告)号：US20080074668A1
公开(公告)日：2008-03-27
申请号：US11899105
申请日：2007-09-04
申请人： Alex Salnik , Lena Nicolaides , Jon Opsal
发明人： Alex Salnik , Lena Nicolaides , Jon Opsal
IPC分类号： G01N21/63
CPC分类号： G01N21/636 , G01N21/1717
摘要： A modulated optical reflectance (MOR) measurement system is disclosed which uses an infrared probe beam. Preferably the probe beam has a wavelength of at least 800 nm and preferable greater than one micron (1000 nm).
摘要翻译：公开了使用红外探测光束的调制光反射（MOR）测量系统。优选地，探针束的波长为至少800nm，优选大于1微米（1000nm）。

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