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1. 发明授权

US06203637B1 Use of a cleaning process, a cleaning process, a connection process and a workpiece pair 有权
公开(公告)号：US06203637B1
公开(公告)日：2001-03-20
申请号：US09172598
申请日：1998-10-15
申请人： Alex Dommann , Christoph Benno Luechinger-Bautista , Nicolino Onda , Juergen Ramm , Heinrich Zimmerman
发明人： Alex Dommann , Christoph Benno Luechinger-Bautista , Nicolino Onda , Juergen Ramm , Heinrich Zimmerman
IPC分类号： B32B3116
CPC分类号： H01J37/32431 , B08B7/0035 , B23K1/206 , H01J2237/335 , H01J2237/338
摘要： A method uses a treatment process for surfaces which subsequently are to be connected by bonding, gluing or molding. The surfaces are exposed to an atmosphere with activated hydrogen. The connection is made a process step for eliminating the conservation treatment. The surfaces can be subjected to a plasma discharge in an atmosphere containing hydrogen. The plasma discharge is operated by a cathode/anode path as a DC discharge, and using a thermionic cathode as the cathode. The workpiece to be stored in air comprises a connection, which by gluing, bonding or molding, is subjectable to substantially higher stress than an identical workpiece which is stored in an identical manner, this being determinable by essentially identical Auger diagrams.

2. 发明授权

US06503351B2 Use of a cleaning process, a cleaning process, a connection process and a workpiece pair 失效
标题翻译：使用清洁过程，清洁过程，连接过程和工件对
公开(公告)号：US06503351B2
公开(公告)日：2003-01-07
申请号：US09729176
申请日：2000-12-05
申请人： Alex Dommann , Christoph Benno Luechinger-Bautista , Nicolino Onda , Juergen Ramm , Heinrich Zimmerman
发明人： Alex Dommann , Christoph Benno Luechinger-Bautista , Nicolino Onda , Juergen Ramm , Heinrich Zimmerman
IPC分类号： B32B3116
CPC分类号： H01J37/32431 , B08B7/0035 , B23K1/206 , H01J2237/335 , H01J2237/338
摘要： A method uses a treatment process for surfaces which subsequently are to be connected by bonding, gluing or molding. The surfaces are exposed to an atmosphere with activated hydrogen. The connection is made a process step for eliminating the conservation treatment. The surfaces can be subjected to a plasma discharge in an atmosphere containing hydrogen. The plasma discharge is operated by a cathode/anode path as a DC discharge, and using a thermionic cathode as the cathode. The workpiece to be stored in air comprises a connection, which by gluing, bonding or molding, is subjectable to substantially higher stress than an identical workpiece which is stored in an identical manner, this being determinable by essentially identical Auger diagrams.
摘要翻译：一种方法使用用于通过粘合，胶合或模制连接的表面的处理工艺。表面暴露于活性氢气氛中。该连接是消除保护处理的过程步骤。表面可以在含氢的气氛中进行等离子体放电。等离子体放电由作为直流放电的阴极/阳极路径操作，并且使用热离子阴极作为阴极。待储存在空气中的工件包括通过胶合，粘合或模制而形成的连接件，其能够以相同方式存储的相同的工件受到比相同工件大得多的应力，这可通过基本上相同的俄歇图来确定。

3. 发明申请

US20100291320A1 METHOD FOR MANUFACTURING A TREATED SURFACE AND VACUUM PLASMA SOURCES 有权
标题翻译：用于制造处理表面和真空等离子体源的方法
公开(公告)号：US20100291320A1
公开(公告)日：2010-11-18
申请号：US12740456
申请日：2007-11-01
申请人： Juergen Ramm , Beno Widrig , Denis Kurapov
发明人： Juergen Ramm , Beno Widrig , Denis Kurapov
IPC分类号： B05D3/00 , H05H1/24
CPC分类号： C23C14/54 , C23C14/0036 , C23C14/228 , C23C14/35 , C23C14/351 , H01J37/32009 , H01J37/32055 , H01J37/32477 , H01J37/32541
摘要： When treating workpiece or substrate surfaces with the help of a vacuum plasma discharge between an anode and an cathode and whereby due to such treatment a solid is formed and deposited on the anode surface, which solid has a higher specific DC impedance than the specific DC impedance of the anode material, at least parts of the anode surface are shielded from such deposition by establishing thereat a shielding plasma.
摘要翻译：借助于在阳极和阴极之间的真空等离子体放电来处理工件或衬底表面，由此由于这种处理，形成固体并沉积在阳极表面上，该固体具有比特定直流阻抗更高的特定直流阻抗阳极材料的阳极表面的至少一部分通过在屏蔽等离子体上建立来屏蔽这种沉积。

4. 发明申请

US20080292812A1 Vacuum Treatment Installation and Vacuum Treatment Method 有权
标题翻译：真空处理安装和真空处理方法
公开(公告)号：US20080292812A1
公开(公告)日：2008-11-27
申请号：US12110463
申请日：2008-04-28
申请人： Juergen Ramm , Beno Widrig , Stephan Kasemann , Marcelo Dornelles Pimenta , Orlaw Massler , Barbara Hanselmann
发明人： Juergen Ramm , Beno Widrig , Stephan Kasemann , Marcelo Dornelles Pimenta , Orlaw Massler , Barbara Hanselmann
IPC分类号： C23C14/22
CPC分类号： H01J37/3255 , C23C14/325 , C23C16/0245 , C23C16/503 , H01J37/32055
摘要： Vacuum treatment installation or vacuum treatment method for carrying out a plasma method, wherein the treatment is carried out in a vacuum chamber, in which are disposed a device for generating an electric low voltage arc discharge (NVBE) comprised of a cathode and an anode electrically interconnectable with the cathode via an arc generator, and a workpiece carrier electrically interconnectable with a bias generator for receiving and moving workpieces, as well as at least one feed for inert and/or reactive gas. At least a portion of the surface of the anode is therein fabricated of graphite and is operated at high temperature.
摘要翻译：用于进行等离子体方法的真空处理装置或真空处理方法，其中处理在真空室中进行，其中设置有用于产生由阴极和阳极电气组成的电低压电弧放电（NVBE）的装置可通过电弧发生器与阴极互连，以及与用于接收和移动工件的偏置发生器电连接的工件载体，以及用于惰性和/或反应性气体的至少一个进料。阳极的表面的至少一部分在其中由石墨制成并且在高温下操作。

5. 发明授权

US06605175B1 Process for manufacturing component parts, use of same, with air bearing supported workpieces and vacuum processing chamber 有权
标题翻译：制造零部件的工艺，使用方法，带空气轴承支撑的工件和真空处理室
公开(公告)号：US06605175B1
公开(公告)日：2003-08-12
申请号：US09257207
申请日：1999-02-25
申请人： Juergen Ramm , Eugen Beck
发明人： Juergen Ramm , Eugen Beck
IPC分类号： B32B3100
CPC分类号： B23K1/206 , H01L2924/0002 , H01L2924/00
摘要： A method is disclosed for manufacturing parts with intimate connection of least two material phases, of which at least one is a solid body phase. Prior to intimate connection, at least the surface of the solid body phase to be connected is pretreated by a plasma-activated gas that contains nitrogen. The method is used, for example, for connecting integrated circuits with an HLST or for the electrical connection of the printed circuits by wire bonding or for the sheathing of electrical circuits joined with HLST and connected by wire bonding, with a potting compound. A workpiece stored in air is characterized by a surface exposed to the air, by contrast with a surface of the workpiece produced directly, having an elevated nitrogen concentration, detectable for example by a “Fourier transform infrared spectroscopy” with “attenuated total reflection” FTIR-ATR and/or with “nuclear reaction analysis,” NRA and/or with “time of flight secondary ion mass spectrometry,” TO-SIMS. Also disclosed is a vacuum processing chamber with a plasma discharge section, a gas supply to the chamber, connected with a gas tank arrangement, as well as with a workpiece holding device. The gas tank arrangement contains a gas with nitrogen and the holding arrangement has at least one access slit open to the discharge chamber for a disk-shaped or plate-shaped workpiece.
摘要翻译：公开了用于制造具有至少两个材料相的紧密连接的部件的方法，其中至少一个是固体相。在紧密连接之前，至少要连接的固体相的表面由含有氮的等离子体活化气体预处理。该方法例如用于将集成电路与HLST连接或通过引线接合或通过与HLST连接并通过引线接合连接的电路的护套与封装化合物连接印刷电路。存储在空气中的工件的特征在于暴露于空气的表面与通过直接生产的具有升高的氮浓度的工件的表面形成对比，该表面可以例如通过具有“衰减全反射”FTIR的“傅里叶变换红外光谱” -ATR和/或“核反应分析”，NRA和/或“飞行时间二次离子质谱法”TO-SIMS。还公开了一种具有等离子体放电部分的真空处理室，与气罐装置连接的室的气体供给以及工件保持装置。气罐装置包含具有氮气的气体，并且保持装置具有至少一个通向用于盘形或板状工件的排放室的进入狭缝。

6. 发明授权

US08197648B2 Method for depositing electrically insulating layers 有权
标题翻译：沉积电绝缘层的方法
公开(公告)号：US08197648B2
公开(公告)日：2012-06-12
申请号：US12374319
申请日：2007-07-12
申请人： Juergen Ramm , Beno Widrig , Christian Wohlrab
发明人： Juergen Ramm , Beno Widrig , Christian Wohlrab
IPC分类号： C23C14/08 , C23C14/32 , C23C14/56
CPC分类号： C23C14/325 , C23C14/081 , H01J37/32055 , H01J37/3405 , H01J37/3417 , H01J37/3447 , H01J37/345 , H01J37/3467
摘要： A method for producing a low-conductivity layer on at least one workpiece by vacuum coating is provided. The method includes operating an electrical arc discharge between an anode and a cathode of an arc source in an atmosphere containing a reactive gas. A small external magnetic field is generated to be essentially perpendicular to a target surface of a target, which is electrically connected to the cathode, to assist an evaporation process. A degree of recoating of the target surface by other coating sources in a vacuum coating installation is less than 10%, and the magnetic field is generated by a magnet system with an axially-polarized coil having a geometry similar in size to that of the target.Excitation current for the electrical arc discharge is supplied through the axially-polarized coil.
摘要翻译：提供了一种通过真空涂覆在至少一个工件上制造低电导率层的方法。该方法包括在包含反应性气体的气氛中操作电弧源的阳极和阴极之间的电弧放电。产生小的外部磁场以基本上垂直于与阴极电连接的靶的目标表面，以辅助蒸发过程。在真空镀膜装置中，其它涂料源对目标表面的重涂程度小于10％，磁场由具有尺寸与目标尺寸相似的几何形状的轴向极化线圈的磁体系统产生。通过轴向极化线圈供给电弧放电的励磁电流。

7. 发明申请

US20060118043A1 Method for producing coated workpieces, uses and installation for the method 审中-公开
公开(公告)号：US20060118043A1
公开(公告)日：2006-06-08
申请号：US11271738
申请日：2005-11-14
申请人： Rudolf Wagner , Siegfried Wiltsche , Juergen Ramm
发明人： Rudolf Wagner , Siegfried Wiltsche , Juergen Ramm
IPC分类号： C23C16/00
CPC分类号： H01J37/32009 , C23C16/503 , C30B25/105 , H01J37/32027 , H01L21/28525
摘要： A method of manufacturing electronic or opto-electronic or micromechanic components by providing a vacuum where the external surface of a wall is exposed to ambient air and the inner surface enclosed as a processing area. A base body of a part to be manufactured is introduced into the processing area and a low energy plasma discharged is generated in the process area, the ion energy at the surface of the base body is between 0 and 15 eV in order to introduce a reactive gas. Subsequently, the reactive gas treats the base body in order to separate the processing area from an inner surface of the wall and enclosing the processing area during the treatment.

8. 发明授权

US09376747B2 Method for manufacturing a treated surface and vacuum plasma sources 有权
标题翻译：制造处理过的表面和真空等离子体源的方法
公开(公告)号：US09376747B2
公开(公告)日：2016-06-28
申请号：US12740456
申请日：2007-11-01
申请人： Juergen Ramm , Beno Widrig , Denis Kurapov
发明人： Juergen Ramm , Beno Widrig , Denis Kurapov
IPC分类号： C23C14/00 , C23C14/32 , C23C14/54 , C23C14/35 , C23C14/22 , H01J37/32
CPC分类号： C23C14/54 , C23C14/0036 , C23C14/228 , C23C14/35 , C23C14/351 , H01J37/32009 , H01J37/32055 , H01J37/32477 , H01J37/32541
摘要： When treating workpiece or substrate surfaces with the help of a vacuum plasma discharge between an anode and an cathode and whereby due to such treatment a solid is formed and deposited on the anode surface, which solid has a higher specific DC impedance than the specific DC impedance of the anode material, at least parts of the anode surface are shielded from such deposition by establishing thereat a shielding plasma.
摘要翻译：借助于在阳极和阴极之间的真空等离子体放电来处理工件或衬底表面，由此由于这种处理，形成固体并沉积在阳极表面上，该固体具有比特定直流阻抗更高的特定直流阻抗阳极材料的阳极表面的至少一部分通过在屏蔽等离子体上建立来屏蔽这种沉积。

9. 发明申请

US20130036942A1 COATING BASED ON NiAl2O4 IN SPINEL STRUCTURE 有权
标题翻译：基于NiAl2O4在螺旋结构中的涂层
公开(公告)号：US20130036942A1
公开(公告)日：2013-02-14
申请号：US13635710
申请日：2011-03-18
申请人： Juergen Ramm
发明人： Juergen Ramm
IPC分类号： C09D1/00
CPC分类号： C23C14/325 , C23C14/081 , C23C14/085 , H01J37/34
摘要： The invention relates to a coating that comprises at least one compound of oxygen and/or nitrogen with at least two metal materials, said compound being present at least partly in spinel structure. The invention also relates to a method for coating and to a coated substrate.
摘要翻译：本发明涉及包含至少一种氧和/或氮化合物与至少两种金属材料的涂层，所述化合物至少部分地以尖晶石结构存在。本发明还涉及涂覆和涂覆的基底的方法。

10. 发明授权

US09428826B2 Coating based on NiAl2O4 in spinel structure 有权
标题翻译：基于NiAl2O4的尖晶石结构涂层
公开(公告)号：US09428826B2
公开(公告)日：2016-08-30
申请号：US13635710
申请日：2011-03-18
申请人： Juergen Ramm
发明人： Juergen Ramm
IPC分类号： C09D1/00 , C23C14/32 , C23C14/08 , H01J37/34
CPC分类号： C23C14/325 , C23C14/081 , C23C14/085 , H01J37/34
摘要： The invention relates to a coating that comprises at least one compound of oxygen and/or nitrogen with at least two metal materials, said compound being present at least partly in spinel structure. The invention also relates to a method for coating and to a coated substrate.
摘要翻译：本发明涉及包含至少一种氧和/或氮化合物与至少两种金属材料的涂层，所述化合物至少部分地以尖晶石结构存在。本发明还涉及涂覆和涂覆的基底的方法。

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