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    • 3. 发明授权
    • Method and system for curing ultra violet curable sealant that is shadowed by metallization
    • 用于固化由金属化阴影的紫外线可固化密封剂的方法和系统
    • US06179679B2
    • 2001-01-30
    • US09425701
    • 1999-10-22
    • Robert J. von GutfeldJames H. GlowniaGareth G. Hougham
    • Robert J. von GutfeldJames H. GlowniaGareth G. Hougham
    • G02F11339
    • G02F1/1339
    • The invention is a method for curing a sealant used to affix two substrates to one another. The sealant requires curing by heat or uv photons. To overcome the shadowing caused by metal patterns, the uv light in the form of laser light is delivered at slant angles without losing light due to strong reflections caused by shallow angles of incidence. Several embodiments are described including a modulation technique for a providing scanned uv beam. Another method utilizes a sufficiently strong pulsed stationary or moving laser beam that can heat the regions of a metallized pattern to provide thermal energy for curing the sealant while providing uv photons through open regions of the metal pattern to access the sealant so as to afford a photolytic cure of a hybrid sealant.
    • 本发明是用于固化用于将两个基板彼此粘合的密封剂的方法。 密封剂需要通过热或紫外光子固化。 为了克服由金属图案引起的阴影,由于由较小的入射角引起的强烈的反射,激光形式的紫外光以倾斜的角度传送而不会损失光。 描述了包括用于提供扫描的紫外线束的调制技术的几个实施例。 另一种方法使用足够强的脉冲静止或移动的激光束,其可以加热金属化图案的区域以提供用于固化密封剂的热能,同时通过金属图案的开放区域提供紫外光子以进入密封剂,以提供光解 固化混合密封剂。
    • 6. 发明申请
    • TWO MASK PROCESS FOR ELECTROPLATING METAL EMPLOYING A NEGATIVE ELECTROPHORETIC PHOTORESIST
    • 用于电镀金属的两个掩模工艺使用负极电泳光电
    • US20140242524A1
    • 2014-08-28
    • US13584326
    • 2012-08-13
    • Gareth G. HoughamGerard McVickerAnna Pratt
    • Gareth G. HoughamGerard McVickerAnna Pratt
    • G03F7/20G03F7/40
    • C25D17/12C25D1/003C25D5/022C25D13/00G03F7/0037G03F7/2022G03F7/203Y10T428/24562
    • A negative electrophoretic photoresist is applied over a plurality of protruding disposable template portions on a substrate. A silo structure is placed on planar portions of the negative electrophoretic photoresist that laterally surround the plurality of protruding disposable template portions. The negative electrophoretic photoresist is lithographically exposed employing the silo structure and a first lithographic mask, which includes a transparent substrate with isolated opaque patterns thereupon. After removal of the silo structure, the negative electrophoretic photoresist is lithographically exposed employing a second lithographic mask, which includes a pattern of transparent areas overlying the planar portions of the negative electrophoretic photoresist less the areas for bases of metal structure to be subsequently formed by electroplating. The negative electrophoretic photoresist is developed to form cavities therein, and metal structures are formed by electroplating within the cavities. The negative electrophoretic photoresist and the plurality of protruding disposable template portions can be subsequently removed.
    • 将负电泳光致抗蚀剂施加在基板上的多个突出的一次性模板部分上。 筒状结构放置在横向包围多个突出的一次性模板部分的负电泳光致抗蚀剂的平面部分上。 负电泳光致抗蚀剂利用筒仓结构和第一平版印刷掩模进行光刻曝光,第一光刻掩模包括具有分离的不透明图案的透明基板。 在除去筒仓结构之后,使用第二光刻掩模将负电泳光致抗蚀剂光刻曝光,其包括覆盖负电泳光致抗蚀剂的平面部分的透明区域的图案,以减少随后通过电镀形成的金属结构基底的区域 。 负电泳光致抗蚀剂被开发以在其中形成空腔,并且通过在腔内电镀形成金属结构。 负电泳光致抗蚀剂和多个突出的一次性模板部分可以随后被去除。