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1. 发明授权

US08203693B2 Liquid immersion lithography system comprising a tilted showerhead relative to a substrate 有权
标题翻译：液浸光刻系统包括相对于基底的倾斜喷头
公开(公告)号：US08203693B2
公开(公告)日：2012-06-19
申请号：US11911704
申请日：2006-04-19
申请人： Aleksandr Khmelichek , Marina Khmelichek, legal representative , Harry Sewell , Louis John Markoya , Erik Roelof Loopstra , Nicolaas Ten Kate
发明人： Aleksandr Khmelichek , Harry Sewell , Louis John Markoya , Erik Roelof Loopstra , Nicolaas Ten Kate
IPC分类号： G03B27/42 , G03B27/52 , G03B27/32
CPC分类号： G03F7/70341
摘要： A liquid immersion lithography system includes projection optics (PL) and a showerhead (604). The projection optics are configured to expose a substrate (W) with a patterned beam. The showerhead includes a first nozzle (610) and a second nozzle (612) that are configured to be at different distances from a surface of the substrate during an exposure operation.
摘要翻译：液浸光刻系统包括投影光学器件（PL）和喷头（604）。投影光学器件被配置为用图案化的光束曝光衬底（W）。淋浴头包括第一喷嘴（610）和第二喷嘴（612），其被配置为在曝光操作期间与基板的表面不同的距离。

2. 发明申请

US20100053574A1 Liquid Immersion Lithography System Comprising a Tilted Showerhead Relative to a Substrate 有权
标题翻译：相对于基材的倾斜淋浴头的液体浸没平版印刷系统
公开(公告)号：US20100053574A1
公开(公告)日：2010-03-04
申请号：US11911704
申请日：2006-04-19
申请人： Aleksandr Khmelichek , Harry Sewell , Louis John Markoya , Erik Roelof Loopstra , Nicolaas Ten Kate
发明人： Aleksandr Khmelichek , Harry Sewell , Louis John Markoya , Erik Roelof Loopstra , Nicolaas Ten Kate
IPC分类号： G03B27/52 , G03B27/32
CPC分类号： G03F7/70341
摘要： A liquid immersion lithography system includes projection optics (PL) and a showerhead (604). The projection optics are configured to expose a substrate (W) with a patterned beam. The showerhead includes a first nozzle (610) and a second nozzle (612) that are configured to be at different distances from a surface of the substrate during an exposure operation.
摘要翻译：液浸光刻系统包括投影光学器件（PL）和喷头（604）。投影光学器件被配置为用图案化的光束曝光衬底（W）。淋浴头包括第一喷嘴（610）和第二喷嘴（612），其被配置为在曝光操作期间与基板的表面不同的距离。

3. 发明授权

US07256864B2 Liquid immersion lithography system having a tilted showerhead relative to a substrate 有权
标题翻译：液浸光刻系统相对于基底具有倾斜的喷头
公开(公告)号：US07256864B2
公开(公告)日：2007-08-14
申请号：US11403196
申请日：2006-04-13
申请人： Nicolaas Ten Kate , Erik Roelof Loopstra , Aleksandr Khmelichek , Louis J. Markoya , Harry Sewell
发明人： Nicolaas Ten Kate , Erik Roelof Loopstra , Aleksandr Khmelichek , Louis J. Markoya , Harry Sewell
IPC分类号： G03B27/52 , G03B27/42
CPC分类号： G03F7/70341
摘要： A liquid immersion lithography system includes projection optics and a showerhead. The projection optics are configured to expose a substrate with a patterned beam. The showerhead includes a first nozzle and a second nozzle that are configured to be at different distances from a surface of the substrate during an exposure operation.
摘要翻译：液浸光刻系统包括投影光学元件和喷头。投影光学器件被配置为用图案化的光束曝光衬底。喷头包括第一喷嘴和第二喷嘴，其被配置为在曝光操作期间与基板的表面不同的距离。

4. 发明授权

US08629970B2 Immersion lithographic apparatus with immersion fluid re-circulating system 失效
标题翻译：浸没式光刻设备带浸液再循环系统
公开(公告)号：US08629970B2
公开(公告)日：2014-01-14
申请号：US12355039
申请日：2009-01-16
申请人： Harry Sewell , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Louis John Markoya , Diane McCafferty
发明人： Harry Sewell , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Louis John Markoya , Diane McCafferty
IPC分类号： G03B27/52 , G03B27/32
CPC分类号： G03F7/70341
摘要： A lithographic apparatus includes a projection system, a fluid handling structure, a metrology device, and a recycling control device. The projection system is configured to project a patterned radiation beam onto a target portion of a substrate, the substrate being supported on a substrate table. The fluid handling structure is configured to provide an immersion fluid to a space between the projection system and the substrate and/or substrate table. The metrology device is configured to monitor a parameter of the immersion fluid. The recycling control device regulates a routing of the immersion fluid either to be reused by the fluid handling structure or to be reconditioned based on the quality of immersion fluid indicated by the metrology device.
摘要翻译：光刻设备包括投影系统，流体处理结构，计量装置和再循环控制装置。投影系统被配置为将图案化的辐射束投影到基板的目标部分上，该基板被支撑在基板台上。流体处理结构被配置为向投影系统和衬底和/或衬底台之间的空间提供浸没流体。测量装置被配置为监测浸没流体的参数。回收控制装置调节浸没流体的路线，以便由流体处理结构重新使用，或者基于由计量装置指示的浸入流体的质量进行再修复。

5. 发明授权

US07751030B2 Interferometric lithographic projection apparatus 有权
标题翻译：干涉光刻投影仪
公开(公告)号：US07751030B2
公开(公告)日：2010-07-06
申请号：US11341381
申请日：2006-01-30
申请人： Louis Markoya , Aleksandr Khmelichek , Diane C. McCafferty , Harry Sewell , Justin L. Kreuzer
发明人： Louis Markoya , Aleksandr Khmelichek , Diane C. McCafferty , Harry Sewell , Justin L. Kreuzer
IPC分类号： G03B27/54
CPC分类号： G03F7/70408
摘要： A lithographic projection apparatus includes an illumination system, an interchangeable upper optics module, and a lower optics module. The illumination system provides a beam of radiation. The interchangeable upper optics module receives the beam and includes, sequentially, a beam splitter that splits the beam into portions, an aperture plate, and a plurality of reflecting surfaces. The lower optics module receives portions of the beam from respective ones the reflecting surfaces and directs the portions of the beam onto a substrate. Interference fringes or contact hole patterns are formed on the substrate using the portions of the beam.
摘要翻译：光刻投影设备包括照明系统，可互换的上部光学模块和下部光学模块。照明系统提供辐射束。可互换的上光学模块接收光束，并且依次包括将光束分成多个部分的光束分离器，孔板和多个反射表面。下部光学模块从相应的反射表面接收光束的部分并将光束的部分引导到衬底上。使用梁的部分在基板上形成干涉条纹或接触孔图案。

6. 发明申请

US20070070321A1 Adjustable Resolution Interferometric Lithography System 有权
标题翻译：可调分辨率干涉光刻系统
公开(公告)号：US20070070321A1
公开(公告)日：2007-03-29
申请号：US11561238
申请日：2006-11-17
申请人： Louis Markoya , Aleksandr Khmelichek , Harry Sewell
发明人： Louis Markoya , Aleksandr Khmelichek , Harry Sewell
IPC分类号： G03B27/54
CPC分类号： G03F7/70408 , G03F7/70341 , G03F7/7035 , G03F7/70383 , G03F7/70516
摘要： A lithographic system includes a source of a laser beam; a beamsplitter dividing the laser beam into a plurality of beams; and a plurality of reflecting surfaces that forms interference fringes on a substrate using the plurality of beams. Resolution of the lithographic system is adjustable by adjusting angular orientation of the reflecting surfaces. The beamsplitter is movable along the optical path to adjust the resolution. The reflecting surfaces may be facets of a prism. Each reflecting surface corresponds to a particular beamsplitter position along the optical path, and/or to a particular resolution. The beamsplitter includes a linear grating or a checkerboard grating. The beams are N-way symmetric. A numerical aperture of the system is adjustable by moving the beamsplitter along the optical path. A liquid can be between the substrate and the prism.
摘要翻译：光刻系统包括激光束源; 分束器将激光束分成多个光束; 以及多个反射表面，其使用所述多个光束在基板上形成干涉条纹。光刻系统的分辨率可通过调整反射表面的角度方向来调节。分束器可沿着光路移动以调节分辨率。反射面可以是棱镜的面。每个反射表面对应于沿着光路的特定分束器位置和/或特定分辨率。分束器包括线性光栅或棋盘格栅。梁是N路对称的。通过沿着光路移动分束器来调节系统的数值孔径。液体可以在基板和棱镜之间。

7. 发明申请

US20060232753A1 Liquid immersion lithography system with tilted liquid flow 审中-公开
标题翻译：液浸光刻系统具有倾斜的液体流动
公开(公告)号：US20060232753A1
公开(公告)日：2006-10-19
申请号：US11108673
申请日：2005-04-19
申请人： Aleksandr Khmelichek , Louis Markoya , Harry Sewell
发明人： Aleksandr Khmelichek , Louis Markoya , Harry Sewell
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： A liquid immersion lithography system including a projection optical system for directing electromagnetic radiation onto a substrate, and a showerhead for delivering liquid flow between the projection optical system and the substrate. The showerhead includes an injection nozzle and a retrieval nozzle located at different heights. The liquid flow is tilted relative to the substrate. A direction from the injection nozzle to the retrieval nozzle is tilted at approximately 1 to 2 degrees relative to the substrate.
摘要翻译：一种液浸光刻系统，包括用于将电磁辐射引导到基板上的投影光学系统，以及用于在投影光学系统和基板之间输送液体流的喷头。喷头包括位于不同高度的注射喷嘴和拾取喷嘴。液体流动相对于基底倾斜。从注射喷嘴到回收喷嘴的方向相对于基板倾斜约1至2度。

8. 发明申请

US20060044539A1 Adjustable resolution interferometric lithography system 有权
公开(公告)号：US20060044539A1
公开(公告)日：2006-03-02
申请号：US10927309
申请日：2004-08-27
申请人： Louis Markoya , Aleksandr Khmelichek , Harry Sewell
发明人： Louis Markoya , Aleksandr Khmelichek , Harry Sewell
IPC分类号： G03B27/54
CPC分类号： G03F7/70408 , G03F7/70341 , G03F7/7035 , G03F7/70383 , G03F7/70516
摘要： A lithographic system includes a laser outputting a laser beam; a beamsplitter dividing the laser beam into a plurality of beams; and a prism for forming interference fringes on a substrate using the plurality of beams. Resolution of the lithographic system is adjustable without replacing any optical components in an optical path of the lithographic system. The beamsplitter is movable along the optical path to adjust the resolution. The prism includes a plurality of sets of facets, each set of facets corresponding to a particular resolution. Each set of facets corresponds to a particular beamsplitter position along the optical path, and/or to a particular resolution. The beamsplitter includes a linear grating or a checkerboard grating. The beams are N-way symmetric. The resolution is adjustable. A numerical aperture of the system is adjustable by moving the beamsplitter along the optical path. A liquid can be between the substrate and the prism.

9. 发明授权

US07474385B2 Adjustable resolution interferometric lithography system 有权
标题翻译：可调分辨率干涉光刻系统
公开(公告)号：US07474385B2
公开(公告)日：2009-01-06
申请号：US11561238
申请日：2006-11-17
申请人： Louis Markoya , Aleksandr Khmelichek , Harry Sewell
发明人： Louis Markoya , Aleksandr Khmelichek , Harry Sewell
IPC分类号： G03B27/54 , G03B27/52
CPC分类号： G03F7/70408 , G03F7/70341 , G03F7/7035 , G03F7/70383 , G03F7/70516
摘要： A lithographic system includes a source of a laser beam; a beamsplitter dividing the laser beam into a plurality of beams; and a plurality of reflecting surfaces that forms interference fringes on a substrate using the plurality of beams. Resolution of the lithographic system is adjustable by adjusting angular orientation of the reflecting surfaces. The beamsplitter is movable along the optical path to adjust the resolution. The reflecting surfaces may be facets of a prism. Each reflecting surface corresponds to a particular beamsplitter position along the optical path, and/or to a particular resolution. The beamsplitter includes a linear grating or a checkerboard grating. The beams are N-way symmetric. A numerical aperture of the system is adjustable by moving the beamsplitter along the optical path. A liquid can be between the substrate and the prism.
摘要翻译：光刻系统包括激光束源; 分束器将激光束分成多个光束; 以及多个反射表面，其使用所述多个光束在基板上形成干涉条纹。光刻系统的分辨率可通过调整反射表面的角度方向来调节。分束器可沿着光路移动以调节分辨率。反射面可以是棱镜的面。每个反射表面对应于沿着光路的特定分束器位置和/或特定分辨率。分束器包括线性光栅或棋盘格栅。梁是N路对称的。通过沿着光路移动分束器来调节系统的数值孔径。液体可以在基板和棱镜之间。

10. 发明申请

US20070041002A1 Liquid immersion lithography system with tilted liquid flow 有权
标题翻译：液浸光刻系统具有倾斜的液体流动
公开(公告)号：US20070041002A1
公开(公告)日：2007-02-22
申请号：US11586639
申请日：2006-10-26
申请人： Aleksandr Khmelichek , Louis Markoya , Harry Sewell
发明人： Aleksandr Khmelichek , Louis Markoya , Harry Sewell
IPC分类号： G03B27/42
CPC分类号： G03F7/70341
摘要： A liquid immersion lithography system including a projection optical system for directing electromagnetic radiation onto a substrate, and a showerhead for delivering liquid flow between the projection optical system and the substrate. The showerhead includes an injection nozzle and a retrieval nozzle located at different heights. The liquid flow is tilted relative to the substrate. A direction from the injection nozzle to the retrieval nozzle is tilted at approximately 1 to 2 degrees relative to the substrate.
摘要翻译：一种液浸光刻系统，包括用于将电磁辐射引导到基板上的投影光学系统，以及用于在投影光学系统和基板之间输送液体流的喷头。喷头包括位于不同高度的注射喷嘴和拾取喷嘴。液体流动相对于基底倾斜。从注射喷嘴到回收喷嘴的方向相对于基板倾斜约1至2度。

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