专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US07083880B2 Lithographic template and method of formation and use 失效
标题翻译：光刻模板及其形成和使用方法
公开(公告)号：US07083880B2
公开(公告)日：2006-08-01
申请号：US10222734
申请日：2002-08-15
申请人： Albert Alec Talin , Jeffrey H. Baker , William J. Dauksher , Andy Hooper , Douglas J. Resnick
发明人： Albert Alec Talin , Jeffrey H. Baker , William J. Dauksher , Andy Hooper , Douglas J. Resnick
IPC分类号： G03F1/00 , G03C5/00
CPC分类号： B82Y10/00 , B82Y40/00 , C23C14/086 , G03F7/0002 , G03F7/0017 , G03F7/093
摘要： This invention relates to semiconductor devices, microelectronic devices, micro electro mechanical devices, microfluidic devices, photonic devices, and more particularly to a lithographic template, a method of forming the lithographic template and a method for forming devices with the lithographic template. The lithographic template (10) is formed having a substrate (12), a transparent conductive layer (16) formed on a surface (14) of the substrate (12) by low pressure sputtering to a thickness that allows for preferably 90% transmission of ultraviolet light therethrough, and a patterning layer (20) formed on a surface (18) of the transparent conductive layer (16). The template (10) is used in the fabrication of a semiconductor device (30) for affecting a pattern in device (30) by positioning the template (10) in close proximity to semiconductor device (30) having a radiation sensitive material formed thereon and applying a pressure to cause the radiation sensitive material to flow into the relief image present on the template. Radiation is then applied through the template so as to cure portions of the radiation sensitive material and define the pattern in the radiation sensitive material. The template (10) is then removed to complete fabrication of semiconductor device (30).
摘要翻译：本发明涉及半导体器件，微电子器件，微电子机械器件，微流体器件，光子器件，更具体地涉及光刻模板，形成光刻模板的方法和用光刻模板形成器件的方法。光刻模板（10）形成为具有基板（12），通过低压溅射形成在基板（12）的表面（14）上的透明导电层（16）至允许优选90％透射率的厚度紫外光，以及形成在透明导电层（16）的表面（18）上的图形层（20）。模板（10）用于通过将模板（10）定位成紧邻其上形成有辐射敏感材料的半导体器件（30）而影响器件（30）中的图案的半导体器件（30）的制造，以及施加压力以使辐射敏感材料流入存在于模板上的浮雕图像。然后通过模板施加辐射，以便固化辐射敏感材料的部分并限定辐射敏感材料中的图案。然后移除模板（10）以完成半导体器件（30）的制造。

2. 发明授权

US07432024B2 Lithographic template and method of formation and use 有权
标题翻译：光刻模板及其形成和使用方法
公开(公告)号：US07432024B2
公开(公告)日：2008-10-07
申请号：US11423621
申请日：2006-06-12
申请人： Albert Alec Talin , Jeffrey H. Baker , William J. Dauksher , Andy Hooper , Douglas J. Resnick
发明人： Albert Alec Talin , Jeffrey H. Baker , William J. Dauksher , Andy Hooper , Douglas J. Resnick
IPC分类号： G03F1/00 , G03C5/00
CPC分类号： B82Y10/00 , B82Y40/00 , C23C14/086 , G03F7/0002 , G03F7/0017 , G03F7/093
摘要： This invention relates to semiconductor devices, microelectronic devices, micro electro mechanical devices, microfluidic devices, photonic devices, and more particularly to a lithographic template, a method of forming the lithographic template and a method for forming devices with the lithographic template. The lithographic template (10) is formed having a substrate (12), a transparent conductive layer (16) formed on a surface (14) of the substrate (12) by low pressure sputtering to a thickness that allows for preferably 90% transmission of ultraviolet light therethrough, and a patterning layer (20) formed on a surface (18) of the transparent conductive layer (16). The template (10) is used in the fabrication of a semiconductor device (30) for affecting a pattern in device (30) by positioning the template (10) in close proximity to semiconductor device (30) having a radiation sensitive material formed thereon and applying a pressure to cause the radiation sensitive material to flow into the relief image present on the template. Radiation is then applied through the template so as to cure portions of the radiation sensitive material and define the pattern in the radiation sensitive material. The template (10) is then removed to complete fabrication of semiconductor device (30).
摘要翻译：本发明涉及半导体器件，微电子器件，微电子机械器件，微流体器件，光子器件，更具体地涉及光刻模板，形成光刻模板的方法和用光刻模板形成器件的方法。光刻模板（10）形成为具有基板（12），通过低压溅射形成在基板（12）的表面（14）上的透明导电层（16）至允许优选90％透射率的厚度紫外光，以及形成在透明导电层（16）的表面（18）上的图形层（20）。模板（10）用于通过将模板（10）定位成紧邻其上形成有辐射敏感材料的半导体器件（30）而影响器件（30）中的图案的半导体器件（30）的制造，以及施加压力以使辐射敏感材料流入存在于模板上的浮雕图像。然后通过模板施加辐射，以便固化辐射敏感材料的部分并限定辐射敏感材料中的图案。然后移除模板（10）以完成半导体器件（30）的制造。

3. 发明授权

US06373174B1 Field emission device having a surface passivation layer 失效
标题翻译：具有表面钝化层的场致发射器件
公开(公告)号：US06373174B1
公开(公告)日：2002-04-16
申请号：US09459119
申请日：1999-12-10
申请人： Albert Alec Talin , Curtis D. Moyer , Kenneth A. Dean , Jeffrey H. Baker , Steven A. Voight
发明人： Albert Alec Talin , Curtis D. Moyer , Kenneth A. Dean , Jeffrey H. Baker , Steven A. Voight
IPC分类号： H01J102
CPC分类号： H01J29/84 , H01J3/022 , H01J21/105
摘要： A field emission device (100, 200, 300, 400, 500) includes a substrate (110, 210, 310, 410, 510), a cathode (115, 215, 315, 415, 515) formed thereon, a plurality of electron emitters (170, 270, 370, 470, 570) and a plurality of gate electrodes (150, 250, 350, 450, 550) proximately disposed to the plurality of electron emitters (170, 270, 370, 470, 570) for effecting electron emission therefrom, a dielectric layer (140, 240, 340, 440, 540) having a major surface (143, 243, 343, 443, 543), a surface passivation layer (190, 290, 390, 490, 590) formed on the major surface (143, 243, 343, 443, 543), and an anode (180, 280, 380, 480, 580) spaced from the gate electrodes (250, 350, 450, 550).
摘要翻译：场发射器件（100,200,300,400,500）包括衬底（110,210,310,410,510），形成在其上的阴极（115,215,315,415,515），多个电子发射器（170,270,370,470,570）以及近似设置在多个电子发射器（170,270,370,470,570）上的多个栅电极（150,250,350,450,550），用于实现具有主表面（143,243,343,443,543）的电介质层（140,240,340,440,540），形成的表面钝化层（190,290,390,490,590）在主表面（143,243,343,443,543）上，以及与栅电极（250,350,450,550）间隔开的阳极（180,280,380,480,580）。

4. 发明授权

US06672925B2 Vacuum microelectronic device and method 失效
标题翻译：真空微电子器件及方法
公开(公告)号：US06672925B2
公开(公告)日：2004-01-06
申请号：US09932642
申请日：2001-08-17
申请人： Albert Alec Talin , James E. Jaskie , Bernard F. Coll
发明人： Albert Alec Talin , James E. Jaskie , Bernard F. Coll
IPC分类号： H01J900
CPC分类号： B82Y10/00 , H01J1/304 , H01J2201/30469 , H01J2201/317 , Y10S977/939
摘要： A vacuum microelectronic device (10,40) emits electrons (37) from surfaces of nanotube emitters (17, 18). Extracting electrons from the surface of each nanotube emitter (17) results is a small voltage variation between each emitter utilized in the device (10, 40). Consequently, the vacuum microelectronic device (10,40) has a more controllable turn-on voltage and a consistent current density from each nanotube emitter (17,18).
摘要翻译：真空微电子器件（10,40）从纳米管发射器（17,18）的表面发射电子（37）。从每个纳米管发射器（17）的表面提取电子的结果是在器件（10,40）中使用的每个发射极之间的电压变化很小。因此，真空微电子器件（10,40）具有来自每个纳米管发射极（17,18）的更可控的接通电压和一致的电流密度。

5. 发明授权

US06573642B1 Field emission device and method for the conditioning thereof 失效
标题翻译：场致发射装置及其调理方法
公开(公告)号：US06573642B1
公开(公告)日：2003-06-03
申请号：US09491357
申请日：2000-01-26
申请人： Paul VonAllmen , Bernard F. Coll , Albert Alec Talin
发明人： Paul VonAllmen , Bernard F. Coll , Albert Alec Talin
IPC分类号： H01J1304
CPC分类号： H01J1/3044 , H01J2201/30426
摘要： A field emission device (100) includes an electron emitter structure (105) having a deuteride layer (108), which defines a surface (109) of electron emitter structure (105). Deuteride layer (108) is disposed upon an electron emitter (106), which is made from a metal. Deuteride layer (108) is a deuteride of the metal from which electron emitter (106) is made. A method for conditioning field emission device (100) includes the step of providing a contaminated cathode structure (137), which has a contaminated emitter structure (138). The method further includes the step of causing deuterium to react with a metal oxide layer (140) of emitter structure (138), so that the deuterium replaces the oxygen of metal oxide layer (140).
摘要翻译：场发射器件（100）包括具有限定电子发射器结构（105）的表面（109）的氘化层（108）的电子发射器结构（105）。氘化层（108）设置在由金属制成的电子发射器（106）上。氘化层（108）是制造电子发射体（106）的金属的氘化物。一种用于调节场发射装置（100）的方法包括提供污染的阴极结构（137）的步骤，该污染阴极结构具有污染的发射体结构（138）。该方法还包括使氘与发射极结构（138）的金属氧化物层（140）反应的步骤，使得氘代替金属氧化物层（140）的氧。

6. 发明授权

US06353286B1 Field emission display having a multi-layered barrier structure 失效
标题翻译：具有多层势垒结构的场发射显示
公开(公告)号：US06353286B1
公开(公告)日：2002-03-05
申请号：US09414737
申请日：1999-10-08
申请人： Albert Alec Talin , Bernard F. Coll , Chenggang Xie , Yi Wei , Troy A. Trottier
发明人： Albert Alec Talin , Bernard F. Coll , Chenggang Xie , Yi Wei , Troy A. Trottier
IPC分类号： H01J1924
CPC分类号： H01J29/085 , H01J2329/00
摘要： A field emission display (100) includes an electron emitter structure (105) designed to emit an emission current (134), a phosphor (126) disposed to receive at an electron-receiving surface (127) emission current (134), and a multi-layered barrier structure (125) disposed on electron-receiving surface (127) of phosphor (126). Multi-layered barrier structure (125) of the preferred embodiment includes an aluminum layer (128) disposed on electron-receiving surface (127) of phosphor (126) and a carbon layer (129) disposed on aluminum layer (128).
摘要翻译：场致发射显示器（100）包括被设计为发射发射电流（134）的电子发射器结构（105），设置成在电子接收表面（127）发射电流（134））处接收的荧光体（126）设置在荧光体（126）的电子接收表面（127）上的多层势垒结构（125）。优选实施例的多层阻挡结构（125）包括设置在磷光体（126）的电子接收表面（127）上的铝层（128）和设置在铝层（128）上的碳层。

7. 发明授权

US07608461B1 Surface engineered nanoparticles for improved surface enhanced Raman scattering applications and method for preparing same 有权
标题翻译：用于改进的表面增强拉曼散射应用的表面改性纳米颗粒及其制备方法
公开(公告)号：US07608461B1
公开(公告)日：2009-10-27
申请号：US11228934
申请日：2005-09-16
申请人： Blake A. Simmons , Albert Alec Talin
发明人： Blake A. Simmons , Albert Alec Talin
IPC分类号： B22F9/24
CPC分类号： B22F9/24 , B22F1/0018 , B22F2001/0037 , B22F2999/00 , B82Y30/00 , Y10S977/777 , B22F2202/17
摘要： A method for producing metal nanoparticles that when associated with an analyte material will generate an amplified SERS spectrum when the analyte material is illuminated by a light source and a spectrum is recorded. The method for preparing the metal nanoparticles comprises the steps of (i) forming a water-in-oil microemulsion comprising a bulk oil phase, a dilute water phase, and one or more surfactants, wherein the water phase comprises a transition metal ion; (ii) adding an aqueous solution comprising a mild reducing agent to the water-in-oil microemulsion; (iii) stirring the water-in-oil microemulsion and aqueous solution to initiate a reduction reaction resulting in the formation of a fine precipitate dispersed in the water-in-oil microemulsion; and (iv) separating the precipitate from the water-in-oil microemulsion.
摘要翻译：当分析物质被光源照射并记录光谱时，与分析物质相关联的金属纳米粒子的制造方法将产生放大的SERS光谱。制备金属纳米颗粒的方法包括以下步骤：（i）形成包含本体油相，稀水相和一种或多种表面活性剂的油包水微乳液，其中所述水相包含过渡金属离子; （ii）将包含温和还原剂的水溶液加入到油包水微乳液中; （iii）搅拌油包水微乳液和水溶液以引发还原反应，导致分散在油包水微乳液中的细小沉淀物的形成; 和（iv）从油包水微乳液中分离出沉淀物。

8. 发明授权

US07608367B1 Vitreous carbon mask substrate for X-ray lithography 有权
标题翻译：用于X射线光刻的玻璃碳掩模基板
公开(公告)号：US07608367B1
公开(公告)日：2009-10-27
申请号：US11192797
申请日：2005-07-28
申请人： Georg Aigeldinger , Dawn M. Skala , Stewart K. Griffiths , Albert Alec Talin , Matthew W. Losey , Chu-Yeu Peter Yang
发明人： Georg Aigeldinger , Dawn M. Skala , Stewart K. Griffiths , Albert Alec Talin , Matthew W. Losey , Chu-Yeu Peter Yang
IPC分类号： G03F1/00
CPC分类号： G03F1/22
摘要： The present invention is directed to the use of vitreous carbon as a substrate material for providing masks for X-ray lithography. The new substrate also enables a small thickness of the mask absorber used to pattern the resist, and this enables improved mask accuracy. An alternative embodiment comprised the use of vitreous carbon as a LIGA substrate wherein the VC wafer blank is etched in a reactive ion plasma after which an X-ray resist is bonded. This surface treatment provides a surface enabling good adhesion of the X-ray photoresist and subsequent nucleation and adhesion of the electrodeposited metal for LIGA mold-making while the VC substrate practically eliminates secondary radiation effects that lead to delamination of the X-ray resist form the substrate, the loss of isolated resist features, and the formation of a resist layer adjacent to the substrate that is insoluble in the developer.
摘要翻译：本发明涉及玻璃碳作为基片材料用于提供用于X射线光刻的掩模的用途。新的基板还能够使用用于图案化抗蚀剂的掩模吸收体的小的厚度，并且这使得能够改善掩模精度。一个替代实施例包括使用玻璃碳作为LIGA衬底，其中VC晶片坯料在反应离子等离子体中被蚀刻，之后结合X射线抗蚀剂。该表面处理提供了表面，使得能够良好地粘附X射线光致抗蚀剂并且随后的成核和用于LIGA模制的电沉积金属的粘附，而VC衬底实际上消除了导致X射线抗蚀剂分层的二次辐射效应衬底，孤立的抗蚀剂特征的损失以及与基底相邻的抗蚀剂层的形成，其不溶于显影剂。

9. 发明授权

US07020374B2 Optical waveguide structure and method for fabricating the same 有权
标题翻译：光波导结构及其制造方法
公开(公告)号：US07020374B2
公开(公告)日：2006-03-28
申请号：US10356550
申请日：2003-02-03
申请人： Albert Alec Talin , Steven A. Voight
发明人： Albert Alec Talin , Steven A. Voight
IPC分类号： G02B6/10
CPC分类号： G02B6/132
摘要： An optical waveguide structure (10) is provided. The optical waveguide structure (10) has a monocrystalline substrate (12), an amorphous interface layer (14) overlying the monocrystalline substrate (12) and an accommodating buffer layer (16) overlying the amorphous interface layer (14). An optical waveguide layer (20) overlies the accommodating buffer layer (16).
摘要翻译：提供一种光波导结构（10）。光波导结构（10）具有单晶衬底（12），覆盖单晶衬底（12）的非晶界面层（14）和覆盖在非晶界面层（14）上的容纳缓冲层（16）。光波导层（20）覆盖容纳缓冲层（16）。

10. 发明授权

US06410101B1 Method for scrubbing and passivating a surface of a field emission display 失效
标题翻译：擦除和钝化场致发射显示器表面的方法
公开(公告)号：US06410101B1
公开(公告)日：2002-06-25
申请号：US09505124
申请日：2000-02-16
申请人： James E. Jaskie , Albert Alec Talin
发明人： James E. Jaskie , Albert Alec Talin
IPC分类号： C23C1406
CPC分类号： H01J29/085 , H01J9/20
摘要： A method for scrubbing and passivating an anode plate (100) of a field emission display (120) includes the steps of providing a scrubbing passivation material (127); imparting to scrubbing passivation material (127) an energy selected to cause removal of a contamination layer (123, 117) from anode plate (100); causing scrubbing passivation material (127) to be received by contamination layer (123, 117), thereby removing contamination layer (123, 117); and depositing at least a portion of scrubbing passivation material (127) on anode plate (100), thereby forming a passivation layer (129).
摘要翻译：用于擦洗和钝化场致发射显示器（120）的阳极板（100）的方法包括提供擦洗钝化材料（127）的步骤。赋予擦洗钝化材料（127）所选择的能量以从阳极板（100）去除污染层（123,117）的能量; 使得洗涤钝化材料（127）被污染层（123,117）接收，从而去除污染层（123,117）; 以及将至少一部分擦洗钝化材料（127）沉积在阳极板（100）上，由此形成钝化层（129）。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式