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    • 2. 发明授权
    • Fluorescent lamp with improved phosphor blend
    • 具有改善的荧光粉混合物的荧光灯
    • US5714836A
    • 1998-02-03
    • US937332
    • 1992-08-28
    • Roger B. HuntLawrence L. HopeWilliam J. Roche
    • Roger B. HuntLawrence L. HopeWilliam J. Roche
    • C09K11/02H01J61/44H01J61/46H01J1/62
    • H01J61/46C09K11/025H01J61/44
    • A fluorescent lamp comprises at least one layer of a quad-phosphor blend for emitting visible illumination having a white color. The quad-phosphor blend comprising a first and second green emitting phosphor component with each green emitting phosphor component having different visible emission spectrum principally in the 520 to 560 nm wavelength range. A third blue emitting phosphor component has an emission spectrum principally in the 440 to 470 nm wavelength range. A fourth red emitting phosphor component has an emission spectrum principally in the 590 to 620 nm wavelength range. The first green emitting phosphor component is a alkaline earth metal activated phosphor and the second green emitting phosphor is a rare earth activated phosphor wherein the relative proportions of the phosphor components are such that an enhanced color rendering index is produced as compared to tri-component blends formed from three of the phosphor components.
    • 荧光灯包括用于发射具有白色的可见光的至少一层四光子混合物。 四荧光体掺合物包括第一和第二绿色发光荧光体组分,其中每个绿色发光荧光粉组分主要具有520至560nm波长范围的不同的可见光发射光谱。 第三蓝色荧光体组分具有主要在440至470nm波长范围内的发射光谱。 第四个红色发光荧光体组分的发射光谱主要在590nm到620nm的波长范围内。 第一绿色荧光体组分是碱土金属活化磷光体,第二绿色荧光体是稀土活化荧光体,其中荧光体组分的相对比例使得与三组分共混物相比产生增强的显色指数 由三个荧光体组分形成。
    • 6. 发明授权
    • Edge breakdown protection in ACEL thin film display
    • ACEL薄膜显示屏边缘击穿保护
    • US4983880A
    • 1991-01-08
    • US565870
    • 1990-08-08
    • Mohamed I. AbdallaLawrence L. HopeTimothy Fohl
    • Mohamed I. AbdallaLawrence L. HopeTimothy Fohl
    • H05B33/22H05B33/28
    • H05B33/28H05B33/22
    • The present invention is directed to novel AC thin film electroluminescent display devices employing a protective dielectric stripe along the edges of the transparent electrode (or conductor). In particular, the present invention is directed to an AC thin film electroluminescent display device comprising:a multilayer stack including a first dielectric layer; a phosphor layer; and a second dielectric layer; situated on a glass substrate which includes parallel stripes of etched transparent conductors;said multilayer stack further including a protective stripe of dielectric material placed at least along the edges of the transparent conductors.The present invention is also directed to a method for protecting an AC thin film electroluminescent display device against premature breakdown at the edges of the transparent conductors. This protection is achieved by depositing a stripe of dielectric material along the edges of the transparent conductors.
    • 本发明涉及使用沿着透明电极(或导体)的边缘的保护电介质条纹的新型AC薄膜电致发光显示装置。 特别地,本发明涉及一种AC薄膜电致发光显示装置,其包括:包括第一介电层的多层堆叠; 磷光体层; 和第二电介质层; 位于包括蚀刻透明导体的平行条纹的玻璃基板上; 所述多层堆叠还包括至少沿着透明导体的边缘放置的介电材料的保护条。 本发明还涉及一种用于保护AC薄膜电致发光显示装置以防止在透明导体的边缘处过早击穿的方法。 该保护通过沿着透明导体的边缘沉积介电材料条来实现。
    • 8. 发明授权
    • Sputtering cathode apparatus
    • 溅射阴极装置
    • US4437966A
    • 1984-03-20
    • US431958
    • 1982-09-30
    • Lawrence L. HopeErnest A. Davey
    • Lawrence L. HopeErnest A. Davey
    • C23C14/36C23C14/35H01J37/34C23C15/00
    • H01J37/3408
    • A sputtering cathode apparatus for the deposition of thin films which are produced at a relatively high deposition rate. A relatively large planar magnetron sputtering system or apparatus is provided with a preferred single convoluted electron path so as to obtain high geometric efficiency. The target is larger than the substrate and the substrate motion is confined to an area within the defined target area. The cathode system requires a vacuum system of relatively small dimension due to the increase in target size in comparison with substrate size along with the provision for multiple plasma legs separated by non-emissive regions therebetween. This construction enables minimized substrate motion relative to the target.
    • 一种用于沉积薄膜的溅射阴极装置,其以相对较高的沉积速率生产。 相对较大的平面磁控溅射系统或装置设置有优选的单个卷积电子路径,以获得高的几何效率。 目标大于衬底,并且衬底运动被限制在限定的目标区域内的区域。 与基板尺寸相比,阴极系统需要具有相对较小尺寸的真空系统,同时提供了由其间的非发射区域分开的多个等离子体腿。 这种结构使得相对于目标的衬底运动最小化。