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    • 1. 发明授权
    • Image pickup apparatus and image pickup system
    • 摄像设备和摄像系统
    • US08134190B2
    • 2012-03-13
    • US12390836
    • 2009-02-23
    • Akira OkitaMasanori OguraSeiichiro SakaiTakanori Watanabe
    • Akira OkitaMasanori OguraSeiichiro SakaiTakanori Watanabe
    • H01L27/146
    • H01L27/14603H01L27/1463H01L27/14641
    • To provide a solid-state image pickup apparatus with little or no difference in the dark currents between adjacent photoelectric conversion elements and providing a high sensitivity and a low dark current even in a high-speed readout operation.A well 302 is formed on a wafer 301, and semiconductor layers 101a, 101b are formed in the well to constitute photodiodes. A well contact 306 is formed between the semiconductor layers 101a, 101b. Element isolation regions 303b, 303a are provided between the well contact and the semiconductor layers, and channel stop layers 307b, 307a are provided under the element isolation regions 303b, 303a. A conductive layer 304 is provided on the element isolation region 303b, and a side wall 308 is provided on a side face of the conductive layer 304. A distance a between an end of the element isolation region 303b and the conductive layer 304, a width b of the side wall 308 and a device isolation width c satisfy a relation c>a≧b.
    • 为了提供即使在高速读出操作中,相邻的光电转换元件之间的暗电流几乎或没有差异,并且提供高灵敏度和低暗电流的固态图像拾取装置。 阱302形成在晶片301上,半导体层101a,101b形成在阱中以构成光电二极管。 在半导体层101a,101b之间形成阱接触306。 元件隔离区域303b,303a设置在阱接触件和半导体层之间,并且通道阻挡层307b,307a设置在元件隔离区域303b,303a的下方。 导电层304设置在元件隔离区域303b上,侧壁308设置在导电层304的侧面上。元件隔离区域303b的一端与导电层304之间的距离a,宽度 侧壁308的b和装置隔离宽度c满足关系c>a≥b。
    • 3. 发明申请
    • Image pickup apparatus and image pickup system
    • 摄像设备和摄像系统
    • US20060043393A1
    • 2006-03-02
    • US11212630
    • 2005-08-29
    • Akira OkitaMasanori OguraSeiichiro SakaiTakanori Watanabe
    • Akira OkitaMasanori OguraSeiichiro SakaiTakanori Watanabe
    • H01L33/00
    • H01L27/14603H01L27/1463H01L27/14641
    • To provide a solid-state image pickup apparatus with little or no difference in the dark currents between adjacent photoelectric conversion elements and providing a high sensitivity and a low dark current even in a high-speed readout operation. A well 302 is formed on a wafer 301, and semiconductor layers 101a, 101b are formed in the well to constitute photodiodes. A well contact 306 is formed between the semiconductor layers 101a, 101b. Element isolation regions 303b, 303a are provided between the well contact and the semiconductor layers, and channel stop layers 307b, 307a are provided under the element isolation regions 303b, 303a. A conductive layer 304 is provided on the element isolation region 303b, and a side wall 308 is provided on a side face of the conductive layer 304. A distance a between an end of the element isolation region 303b and the conductive layer 304, a width b of the side wall 308 and a device isolation width c satisfy a relation c>a≧b.
    • 为了提供即使在高速读出操作中,相邻的光电转换元件之间的暗电流几乎或没有差异,并且提供高灵敏度和低暗电流的固态图像拾取装置。 阱302形成在晶片301上,半导体层101a,101b形成在阱中以构成光电二极管。 在半导体层101a,101b之间形成阱触点306。 元件隔离区域303b,303a设置在阱接触件和半导体层之间,并且沟道阻挡层307b,307a设置在元件隔离区域303b,303a的下方。 导电层304设置在元件隔离区域303b上,侧壁308设置在导电层304的侧面上。元件隔离区域303b的端部与导电层304之间的距离a, 侧壁308的宽度b和装置隔离宽度c满足关系c> a> = b。
    • 4. 发明申请
    • IMAGE PICKUP APPARATUS AND IMAGE PICKUP SYSTEM
    • 图像拾取装置和图像拾取系统
    • US20090159945A1
    • 2009-06-25
    • US12390836
    • 2009-02-23
    • Akira OkitaMasanori OguraSeiichiro SakaiTakanori Watanabe
    • Akira OkitaMasanori OguraSeiichiro SakaiTakanori Watanabe
    • H01L27/146
    • H01L27/14603H01L27/1463H01L27/14641
    • To provide a solid-state image pickup apparatus with little or no difference in the dark currents between adjacent photoelectric conversion elements and providing a high sensitivity and a low dark current even in a high-speed readout operation.A well 302 is formed on a wafer 301, and semiconductor layers 101a, 101b are formed in the well to constitute photodiodes. A well contact 306 is formed between the semiconductor layers 101a, 101b. Element isolation regions 303b, 303a are provided between the well contact and the semiconductor layers, and channel stop layers 307b, 307a are provided under the element isolation regions 303b, 303a. A conductive layer 304 is provided on the element isolation region 303b, and a side wall 308 is provided on a side face of the conductive layer 304. A distance a between an end of the element isolation region 303b and the conductive layer 304, a width b of the side wall 308 and a device isolation width c satisfy a relation c>a≧b.
    • 为了提供即使在高速读出操作中,相邻的光电转换元件之间的暗电流几乎或没有差异,并且提供高灵敏度和低暗电流的固态图像拾取装置。 阱302形成在晶片301上,半导体层101a,101b形成在阱中以构成光电二极管。 在半导体层101a,101b之间形成阱接触306。 元件隔离区域303b,303a设置在阱接触件和半导体层之间,并且通道阻挡层307b,307a设置在元件隔离区域303b,303a的下方。 导电层304设置在元件隔离区域303b上,侧壁308设置在导电层304的侧面上。元件隔离区域303b的一端与导电层304之间的距离a,宽度 侧壁308的b和设备隔离宽度c满足关系c> a> = b。
    • 6. 发明申请
    • IMAGE PICKUP APPARATUS AND IMAGE PICKUP SYSTEM
    • 图像拾取装置和图像拾取系统
    • US20120181590A1
    • 2012-07-19
    • US13371738
    • 2012-02-13
    • Akira OkitaMasanori OguraSeiichiro SakaiTakanori Watanabe
    • Akira OkitaMasanori OguraSeiichiro SakaiTakanori Watanabe
    • H01L31/0224
    • H01L27/14603H01L27/1463H01L27/14641
    • A solid-state image pickup apparatus with little or no difference in the dark currents between adjacent photoelectric conversion elements, and that provides a high sensitivity and a low dark current even in a high-speed readout operation, includes a well formed on a wafer, and semiconductor layers formed in the well to constitute photodiodes. A well contact is formed between the semiconductor layers. Element isolation regions are provided between the well contact and the semiconductor layers, and channel stop layers are provided under the element isolation regions. A conductive layer is provided on the element isolation region, and a side wall is provided on a side face of the conductive layer. A distance a between an end of the element isolation region and the conductive layer, a width b of the side wall and a device isolation width c satisfy a relation c>a≧b.
    • 即使在高速读出操作中,相邻的光电转换元件之间的暗电流几乎或没有差异的固态图像拾取装置也提供了高灵敏度和低暗电流,包括在晶片上形成的阱, 以及在阱中形成的构成光电二极管的半导体层。 在半导体层之间形成阱接触。 在阱接触和半导体层之间提供元件隔离区,并且在元件隔离区之下提供通道阻挡层。 导电层设置在元件隔离区上,侧壁设置在导电层的侧面上。 元件隔离区域的端部与导电层之间的距离a,侧壁的宽度b和器件隔离宽度c满足关系c>a≥b。
    • 7. 发明授权
    • Image pickup device
    • 图像拾取装置
    • US07943975B2
    • 2011-05-17
    • US12555854
    • 2009-09-09
    • Toru KoizumiSeiichiro SakaiMasanori Ogura
    • Toru KoizumiSeiichiro SakaiMasanori Ogura
    • H01L31/062
    • H01L27/14609H01L27/14603H01L27/14641H01L31/035281H01L31/03529
    • A solid-state imaging device includes a plurality of pixels, each pixel including a photoelectric conversion unit, an amplifying transistor, and a reset transistor. The photoelectric conversion unit is arranged in a well of a first conductivity type on a semiconductor substrate. A source or drain region of the amplifying transistor or the reset transistor is arranged between the photoelectric conversion unit of a first pixel and the photoelectric conversion unit of a second pixel adjacent to the first pixel. In the first pixel, a first semiconductor region of an impurity concentration higher than that of the well of the first conductivity type is arranged between the source or drain region and the photoelectric conversion unit, and a second semiconductor region of the first conductivity type is arranged under the first semiconductor region.
    • 固态成像装置包括多个像素,每个像素包括光电转换单元,放大晶体管和复位晶体管。 光电转换单元布置在半导体衬底上的第一导电类型的阱中。 放大晶体管或复位晶体管的源极或漏极区域布置在第一像素的光电转换单元和与第一像素相邻的第二像素的光电转换单元之间。 在第一像素中,在源极或漏极区域与光电转换单元之间布置有比第一导电类型的阱高的杂质浓度的第一半导体区域,并且布置第一导电类型的第二半导体区域 在第一个半导体区域。
    • 8. 发明申请
    • IMAGE PICKUP DEVICE
    • 图像拾取器件
    • US20100020212A1
    • 2010-01-28
    • US12555854
    • 2009-09-09
    • Toru KoizumiSeiichiro SakaiMasanori Ogura
    • Toru KoizumiSeiichiro SakaiMasanori Ogura
    • H04N5/335
    • H01L27/14609H01L27/14603H01L27/14641H01L31/035281H01L31/03529
    • A solid-state imaging device includes a plurality of pixels, each pixel including a photoelectric conversion unit, an amplifying transistor, and a reset transistor. The photoelectric conversion unit is arranged in a well of a first conductivity type on a semiconductor substrate. A source or drain region of the amplifying transistor or the reset transistor is arranged between the photoelectric conversion unit of a first pixel and the photoelectric conversion unit of a second pixel adjacent to the first pixel. In the first pixel, a first semiconductor region of an impurity concentration higher than that of the well of the first conductivity type is arranged between the source or drain region and the photoelectric conversion unit, and a second semiconductor region of the first conductivity type is arranged under the first semiconductor region.
    • 固态成像装置包括多个像素,每个像素包括光电转换单元,放大晶体管和复位晶体管。 光电转换单元布置在半导体衬底上的第一导电类型的阱中。 放大晶体管或复位晶体管的源极或漏极区域布置在第一像素的光电转换单元和与第一像素相邻的第二像素的光电转换单元之间。 在第一像素中,在源极或漏极区域与光电转换单元之间布置有比第一导电类型的阱高的杂质浓度的第一半导体区域,并且布置第一导电类型的第二半导体区域 在第一个半导体区域。
    • 10. 发明申请
    • Image pickup device
    • 图像拾取装置
    • US20050269604A1
    • 2005-12-08
    • US11146131
    • 2005-06-07
    • Toru KoizumiSeiichiro SakaiMasanori Ogura
    • Toru KoizumiSeiichiro SakaiMasanori Ogura
    • H01L27/146H01L31/0352H01L31/062
    • H01L27/14609H01L27/14603H01L27/14641H01L31/035281H01L31/03529
    • The present invention uses an image pickup device comprising a plurality of pixels respectively including a photoelectric conversion unit for converting incoming light into a signal charge, an amplifying unit for amplifying the signal charge generated by the photoelectric conversion unit and a transfer unit for transferring the signal charge from the photoelectric conversion unit to the amplifying unit, in which the photoelectric conversion unit is formed of a first-conductivity-type first semiconductor region and a second-conductivity-type second semiconductor region and a second-conductivity-type third semiconductor region is formed on at least a part of the gap between a photoelectric conversion unit of a first pixel and a photoelectric conversion unit of a second pixel adjacent to the first pixel, a first-conductivity-type fourth semiconductor region having an impurity concentration higher than that of the first semiconductor region is formed between the photoelectric conversion unit and the third semiconductor region and a first-conductivity-type fifth semiconductor region formed at a position deeper than the fourth semiconductor region and having an impurity concentration higher than that of the first semiconductor region is included between the photoelectric conversion unit and the third semiconductor region.
    • 本发明使用包括多个像素的图像拾取装置,所述多个像素分别包括用于将入射光转换成信号电荷的光电转换单元,用于放大由光电转换单元产生的信号电荷的放大单元和用于传送信号的转移单元 由光电转换单元向放大单元充电,其中光电转换单元由第一导电型第一半导体区和第二导电型第二半导体区和第二导电型第三半导体区形成 形成在第一像素的光电转换单元和与第一像素相邻的第二像素的光电转换单元之间的间隙的至少一部分上,第一导电型第四半导体区域的杂质浓度高于 第一半导体区域形成在光电转换单元之间 光电转换单元和第三半导体层之间包括第三半导体区域和形成在比第四半导体区域更深的位置并且具有高于第一半导体区域的杂质浓度的第一导电型第五半导体区域 地区。