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1. 发明授权

US07404827B2 Fabric treating agent composition 失效
标题翻译：织物处理剂组成
公开(公告)号：US07404827B2
公开(公告)日：2008-07-29
申请号：US10567327
申请日：2004-08-04
申请人： Akira Ishikawa , Masahito Chiwaki , Motoko Fujii , Akira Fujiu
发明人： Akira Ishikawa , Masahito Chiwaki , Motoko Fujii , Akira Fujiu
IPC分类号： D06M10/00
CPC分类号： C11D1/72 , C11D3/3742 , D06M13/463 , D06M15/53 , D06M15/6436 , D06M15/647
摘要： The present invention relates to a fiber product treating agent composition containing (a) a nonionic surfactant containing 1 to 3 polyoxyalkylene groups having the number-average addition mol number of the oxyalkylene group of 50 to 200 and 1 to 3 hydrocarbon groups having 14 to 32 carbon atoms and having an HLB of 16 or more and a melting point of 30 to 80° C., and (b) an amino-modified silicone compound in a mass ratio of the component (a)/the component (b) of 4/1 to 1/4.
摘要翻译：本发明涉及一种纤维制品处理剂组合物，其含有（a）含有1〜3个氧化烯基的加成摩尔数为50〜200，1〜3个碳原子数为14〜32的聚氧化烯的非离子表面活性剂碳原子，HLB为16以上，熔点为30〜80℃，（b）成分（a）/成分（b）的质量比为4的氨基改性硅氧烷化合物 / 1至1/4。

2. 发明申请

US20060277688A1 Fabric treating agent composition 失效
标题翻译：织物处理剂组成
公开(公告)号：US20060277688A1
公开(公告)日：2006-12-14
申请号：US10567327
申请日：2004-08-04
申请人： Akira Ishikawa , Masahito Chiwaki , Motoko Fujji , Akira Fujiu
发明人： Akira Ishikawa , Masahito Chiwaki , Motoko Fujji , Akira Fujiu
IPC分类号： C11D3/00
CPC分类号： C11D1/72 , C11D3/3742 , D06M13/463 , D06M15/53 , D06M15/6436 , D06M15/647
摘要： The present invention relates to a fiber product treating agent composition containing (a) a nonionic surfactant containing 1 to 3 polyoxyalkylene groups having the number-average addition mol number of the oxyalkylene group of 50 to 200 and 1 to 3 hydrocarbon groups having 14 to 32 carbon atoms and having an HLB of 16 or more and a melting point of 30 to 80° C., and (b) an amino-modified silicone compound in a mass ratio of the component (a)/the component (b) of 4/1 to 1/4.
摘要翻译：本发明涉及一种纤维制品处理剂组合物，其含有（a）含有1〜3个氧化烯基的加成摩尔数为50〜200，1〜3个碳原子数为14〜32的聚氧化烯的非离子表面活性剂碳原子，HLB为16以上，熔点为30〜80℃，（b）成分（a）/成分（b）的质量比为4的氨基改性硅氧烷化合物 / 1至1/4。

3. 发明授权

US08007545B2 Deodorant compositions 有权
标题翻译：除臭剂组合物
公开(公告)号：US08007545B2
公开(公告)日：2011-08-30
申请号：US11543162
申请日：2006-10-05
申请人： Motoko Fujii , Akira Ishikawa
发明人： Motoko Fujii , Akira Ishikawa
IPC分类号： C11D3/00 , C11D3/37
CPC分类号： A61Q15/00 , A61K8/41 , A61K8/44 , A61K8/60 , A61K8/86 , A61Q13/00
摘要： The present invention relates to a deodorant composition including (a) a polyhydroxyamine compound having a specific structure and/or a salt thereof, and (b) a penetrant including at least one substance selected from the group consisting of (b1) a nonionic surfactant having a specific structure, (b2) a surfactant having a residue of a monosaccharide, etc., (b3) a nonionic organic solvent having a log P value of from 0 to 4; and (b4) an amine oxide type or carbobetaine type amphoteric surfactant; as well as a deodorizing method using the deodorant composition. The deodorant composition of the present invention is capable of reducing or eliminating a composite odor derived from sweat smell and aldehydes, readily producing a water-based deodorant, and is safe even upon contacting with a human body.
摘要翻译：本发明涉及一种除臭剂组合物，其包含（a）具有特定结构的多羟基胺化合物和/或其盐，和（b）包含至少一种选自（b1）非离子表面活性剂的渗透剂，具体结构，（b2）具有单糖残基的表面活性剂等，（b3）logP值为0〜4的非离子性有机溶剂; 和（b4）氧化胺型或碳甜菜碱型两性表面活性剂; 以及使用除臭剂组合物的除臭方法。本发明的除臭剂组合物能够减少或消除由汗液和醛衍生的复合气味，容易产生水性除臭剂，即使与人体接触也是安全的。

4. 发明申请

US20090221467A1 Wrinkle-Removing Composition 有权
标题翻译：防皱组合物
公开(公告)号：US20090221467A1
公开(公告)日：2009-09-03
申请号：US12087165
申请日：2007-03-06
申请人： Motoko Fujii , Akira Ishikawa
发明人： Motoko Fujii , Akira Ishikawa
IPC分类号： C11D3/20
CPC分类号： D06M13/148 , D06M13/17 , D06M15/53 , D06M2200/20
摘要： The present invention relates to a wrinkle-removing composition containing a specific PO/EO-added compound represented by formula (1) and (b) a specific compound represented by formula (2): R1—Y—[(PO)m/(EO)n]—H (1) wherein R1is a hydrocarbon group having 10 to 22 carbon atoms, PO represents C3H6O, EO represents C2H4O, m and n each represent the added mole number on the average, m is a number of 3 to 100, n is a number of 1 to 10, (PO) and (EO) may be added in a random or block form, and the order in which (PO) and (EO) are added is not limited; and Y is —O—, —COO—, —CONH— or —NHCO—, R2—Z—CH2CH(OH)CH2OH (2) wherein R2represents a hydrocarbon group having 5 to 20 carbon atoms, and Z is —O— or —COO—.
摘要翻译：本发明涉及一种除皱组合物，其含有由式（1）和（b）表示的特定的PO / EO加成的化合物，由式（2）表示的具体化合物：<？in-line-formula description =“In 线型公式“end =”lead“？> R1-Y - [（PO）m /（EO）n] -H（1）<？in-line-formula description =”In-line Formulas“end =”tail 其中R 1是具有10-22个碳原子的烃基，PO代表C 3 H 6 O，EO代表C 2 H 4 O，m和n各自表示平均加入的摩尔数，m是3到100的数，n是在图1〜10中，（PO）和（EO）可以以无规或嵌段形式加入，并且添加（PO）和（EO）的顺序不受限制; 并且Y是-O - ， - COO - ， - CONH-或-NHCO-，<β在线公式描述=“在线公式”end =“lead”→> R2-Z-CH2CH（OH）CH2OH （2）<？in-line-formula description =“In-line formula”end =“tail”？>其中R2表示碳原子数为5〜20的烃基，Z为-O-或-COO-。

5. 发明授权

US07981854B2 Wrinkle-removing composition comprising a propoxylated/ethoxylated alkyl surfactant 有权
标题翻译：包含丙氧基化/乙氧基化烷基表面活性剂的去皱组合物
公开(公告)号：US07981854B2
公开(公告)日：2011-07-19
申请号：US12087165
申请日：2007-03-06
申请人： Motoko Fujii , Akira Ishikawa
发明人： Motoko Fujii , Akira Ishikawa
IPC分类号： C11D1/722 , C11D1/825
CPC分类号： D06M13/148 , D06M13/17 , D06M15/53 , D06M2200/20
摘要： The present invention relates to a wrinkle-removing composition containing a specific PO/EO-added compound represented by formula (1) and (b) a specific compound represented by formula (2): R1—Y—[(PO)m/(EO)n]—H (1) wherein R1is a hydrocarbon group having 10 to 22 carbon atoms, PO represents C3H6O, EO represents C2H4O, m and n each represent the added mole number on the average, m is a number of 3 to 100, n is a number of 1 to 10, (PO) and (EO) may be added in a random or block form, and the order in which (PO) and (EO) are added is not limited; and Y is —O—, —COO—, —CONH— or —NHCO—, R2—Z—CH2CH(OH)CH2OH (2) wherein R2represents a hydrocarbon group having 5 to 20 carbon atoms, and Z is —O— or —COO—.
摘要翻译：本发明涉及一种除皱组合物，其含有式（1）和（b）表示的特定PO / EO加成化合物，式（2）表示的特定化合物：R1-Y- [（PO）m /（ EO）n] -H（1）其中R1是具有10-22个碳原子的烃基，PO表示C3H6O，EO表示C2H4O，m和n各自表示平均加入的摩尔数，m为3至100的数，n为1〜10的数，（PO）和（EO）可以以无规或嵌段形式加入，并且添加（PO）和（EO）的顺序不受限制; 并且Y是-O - ， - COO - ， - CONH-或-NHCO-，R2-Z-CH2CH（OH）CH2OH（2）其中R2表示碳原子数为5〜20的烃基，Z为-O- -COO-。

6. 发明申请

US20070117739A1 Deodorant compositions 有权
标题翻译：除臭剂组合物
公开(公告)号：US20070117739A1
公开(公告)日：2007-05-24
申请号：US11543162
申请日：2006-10-05
申请人： Motoko Fujii , Akira Ishikawa
发明人： Motoko Fujii , Akira Ishikawa
IPC分类号： C11D3/37
CPC分类号： A61Q15/00 , A61K8/41 , A61K8/44 , A61K8/60 , A61K8/86 , A61Q13/00
摘要： The present invention relates to a deodorant composition including (a) a polyhydroxyamine compound having a specific structure and/or a salt thereof, and (b) a penetrant including at least one substance selected from the group consisting of (b1) a nonionic surfactant having a specific structure, (b2) a surfactant having a residue of a monosaccharide, etc., (b3) a nonionic organic solvent having a log P value of from 0 to 4; and (b4) an amine oxide type or carbobetaine type amphoteric surfactant; as well as a deodorizing method using the deodorant composition. The deodorant composition of the present invention is capable of reducing or eliminating a composite odor derived from sweat smell and aldehydes, readily producing a water-based deodorant, and is safe even upon contacting with a human body.
摘要翻译：本发明涉及一种除臭剂组合物，其包含（a）具有特定结构的多羟基胺化合物和/或其盐，和（b）包含至少一种选自（b1）非离子表面活性剂的渗透剂，具体结构，（b2）具有单糖残基的表面活性剂等，（b3）logP值为0〜4的非离子性有机溶剂; 和（b4）氧化胺型或碳甜菜碱型两性表面活性剂; 以及使用除臭剂组合物的除臭方法。本发明的除臭剂组合物能够减少或消除由汗液和醛衍生的复合气味，容易产生水性除臭剂，即使与人体接触也是安全的。

7. 发明授权

US08398193B2 Inkjet recording apparatus 有权
标题翻译：喷墨记录装置
公开(公告)号：US08398193B2
公开(公告)日：2013-03-19
申请号：US13135750
申请日：2011-07-14
申请人： Hideo Izawa , Akira Ishikawa , Kouichi Ooyama
发明人： Hideo Izawa , Akira Ishikawa , Kouichi Ooyama
IPC分类号： B41J25/308
CPC分类号： B41J25/3088 , B41J25/308
摘要： [Problem to be Solved] To provide an inkjet recording apparatus capable of adjusting a gap with high accuracy and easily.[Solution] The present invention provides an inkjet recording apparatus 100 including line heads 20 to 23 capable of recording on a recording medium 1, a head box 11 that houses the line heads 20 to 23, and gap adjustment cams 30 to 32 that abut on a lower surface of a bottom 11b in the head box 11, in which the head box 11 is slightly movable in an up-and-down direction by rotating the gap adjustment cams 30 to 32.
摘要翻译： [待解决的问题]提供能够高精度且容易地调整间隙的喷墨记录装置。 [解决方案]本发明提供一种喷墨记录装置100，其包括能够在记录介质1上记录的行头20至23，容纳行头20至23的头盒11和邻接的行间距调节凸轮30至32 头箱11中的底部11b的下表面，其中通过旋转间隙调节凸轮30至32，头箱11可在上下方向上稍微移动。

8. 发明授权

US08371689B2 Ink-jet recording apparatus 有权
标题翻译：喷墨记录装置
公开(公告)号：US08371689B2
公开(公告)日：2013-02-12
申请号：US12927485
申请日：2010-11-16
申请人： Hideo Izawa , Akira Ishikawa
发明人： Hideo Izawa , Akira Ishikawa
IPC分类号： B41J2/01
CPC分类号： B41J3/60 , B41J11/002 , B41J15/04 , B41J29/13
摘要： The present invention is an ink-jet recording apparatus 100 capable of carrying out printing continuously onto both surfaces of a recording medium 1, the ink-jet recording apparatus 100 having: a first unit 10a having a first ink-jet recording head 2a for carrying out printing onto a first surface la of the recording medium 1 and having a first drying drum 3apositioned below the first ink-jet recording head 2a and heating and drying the recording medium 1 after the printing; and a second unit 10b having a second ink-jet recording head 2b for carrying out printing onto a second surface 1b of the recording medium 1 and having a second drying drum 3b positioned below the second ink-jet recording head 2b and heating and drying the recording medium 1 after the printing.
摘要翻译：本发明是一种喷墨记录装置100，其能够连续地在记录介质1的两个表面上进行打印，喷墨记录装置100具有：第一单元10a，具有用于承载的第一喷墨记录头2a 将其印刷到记录介质1的第一表面1a上，并具有位于第一喷墨记录头2a下方的第一干燥鼓3，并在印刷之后加热和干燥记录介质1; 以及具有第二喷墨记录头2b的第二单元10b，用于在记录介质1的第二表面1b上进行印刷，并具有位于第二喷墨记录头2b下方的第二干燥鼓3b，并加热并干燥记录介质1。

9. 发明授权

US08368071B2 Semiconductor device including a thin film transistor and capacitor 有权
标题翻译：半导体器件包括薄膜晶体管和电容器
公开(公告)号：US08368071B2
公开(公告)日：2013-02-05
申请号：US11716068
申请日：2007-03-09
申请人： Akira Ishikawa
发明人： Akira Ishikawa
IPC分类号： H01L29/04
CPC分类号： H01L29/786 , G02F1/136213 , H01L27/124 , H01L27/1248 , H01L27/1255 , H01L29/4908 , H01L29/78648 , Y10S257/903 , Y10S257/906 , Y10S257/908 , Y10S257/924
摘要： A semiconductor device and a method for preparing the same that can solve crack of a semiconductor film, capacitance electrodes and the like due to stress when forming a source electrode and a drain electrode in a semiconductor device having a thin film transistor and a holding capacitance with three or more capacitance electrodes is provided. Before forming the source electrode and the drain electrode, a crystalline silicon film for relaxing the stress is formed, then a contact hole connecting to the semiconductor film of the thin film transistor is opened, and a metal film to be the source electrode and the drain electrode is formed.
摘要翻译：在具有薄膜晶体管和保持电容的半导体器件中形成源电极和漏电极时由于应力引起的半导体膜，电容电极等的裂纹的半导体器件及其制造方法提供三个或更多个电容电极。在形成源电极和漏电极之前，形成用于缓和应力的晶体硅膜，然后打开与薄膜晶体管的半导体膜连接的接触孔，并将作为源电极和漏极的金属膜形成电极。

10. 发明授权

US08198680B2 Semiconductor element, semiconductor device and methods for manufacturing thereof 有权
标题翻译：半导体元件，半导体器件及其制造方法
公开(公告)号：US08198680B2
公开(公告)日：2012-06-12
申请号：US11822775
申请日：2007-07-10
申请人： Akira Ishikawa
发明人： Akira Ishikawa
IPC分类号： H01L27/12
CPC分类号： H01L29/41733 , H01L21/84 , H01L27/1203 , H01L29/66757 , H01L29/78621 , H01L29/78675
摘要： The present invention provides a method of manufacturing a semiconductor element having a miniaturized structure and a semiconductor device in which the semiconductor element having a miniaturized structure is integrated highly, by overcoming reduction of the yield caused by alignment accuracy, accuracy of a processing technique by reduced projection exposure, a finished dimension of a resist mask, an etching technique and the like. An insulating film covering a gate electrode is formed, and a source region and a drain region are exposed, a conductive film is formed thereover, a resist having a different film thickness is formed by applying the resist over the conductive film, the entire surface of the resist is exposed to light and developed, or the entire surface of the resist is etched to form a resist mask, and the conductive film is etched by using the resist mask to form a source and drain electrode.
摘要翻译：本发明提供一种制造具有小型结构的半导体元件和半导体器件的方法，其中具有小型结构的半导体元件被高度集成，通过克服由对准精度引起的成品率的降低，加工技术的精度降低投影曝光，抗蚀剂掩模的成品尺寸，蚀刻技术等。形成覆盖栅电极的绝缘膜，并且源极区域和漏极区域露出，在其上形成导电膜，通过在导电膜上涂覆抗蚀剂，形成具有不同膜厚度的抗蚀剂，整个表面将抗蚀剂曝光并显影，或者蚀刻抗蚀剂的整个表面以形成抗蚀剂掩模，并且通过使用抗蚀剂掩模来蚀刻导电膜以形成源极和漏极。

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