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    • 4. 发明申请
    • RELEASE FILM, RELEASABLE CUSHION MATERIAL AND PROCESS FOR PRODUCING PRINTED BOARD
    • 释放膜,可释放的垫片材料和生产印刷板的工艺
    • US20090042038A1
    • 2009-02-12
    • US12245139
    • 2008-10-03
    • Tamao OkuyaHiroshi ArugaMasaru Yamauchi
    • Tamao OkuyaHiroshi ArugaMasaru Yamauchi
    • B32B27/00B32B37/00
    • H05K3/281B30B15/061Y10T156/10Y10T428/265Y10T428/3154Y10T428/31663
    • To provide a release film which does not need to be changed often for hot press and is easy to be changed; a releasable cushion material which can reduce the frequency of changing a cushion material main body; and a process for producing a printed board with good productivity and low cost.A release film 10 which is to be provided on a surface of a cushion material made of silicone rubber, and which has a layer 14 containing Si on one side of a substrate 12 made of a fluororesin; a releasable cushion material wherein the release film is provided on a surface of the cushion material made of silicone rubber so that the layer containing Si is located on the cushion material side; and a process for producing a printed board wherein, when a laminate of a printed board main body and coverlay films is subjected to hot press as sandwiched between press boards, the release film is disposed on a surface of the cushion material of the coverlay film side so that the layer containing Si is located on the cushion material side.
    • 为了提供热压机不需要经常更换并易于更换的脱模膜; 可释放的缓冲材料,其可以降低改变衬垫材料主体的频率; 以及生产率高,成本低的印刷电路板的制造方法。 一种剥离膜10,其设置在由硅橡胶制成的衬垫材料的表面上,并且在由氟树脂制成的衬底12的一侧上具有含有Si的层14; 一种可释放的衬垫材料,其中所述脱模膜设置在由硅橡胶制成的衬垫材料的表面上,使得含有Si的层位于所述衬垫材料侧上; 以及印刷电路板的制造方法,其中,当将印刷电路板主体和覆盖膜的叠层体夹在压板之间进行热压时,将剥离膜设置在覆盖膜侧的缓冲材料的表面上 使得含有Si的层位于缓冲材料侧。
    • 5. 发明申请
    • FILM FOR MEMBRANE STRUCTURE
    • 薄膜结构薄膜
    • US20070243373A1
    • 2007-10-18
    • US11697864
    • 2007-04-09
    • Takuya NakaoMasaru YamauchiTutomu Fusyuku
    • Takuya NakaoMasaru YamauchiTutomu Fusyuku
    • B32B27/00B32B27/08B32B27/28
    • C08J7/045C08J5/22C08J2327/12Y10T428/269Y10T428/3154Y10T428/31544Y10T428/31663
    • A film for a membrane structure, which comprises a film substrate containing a fluororesin, a photocatalyst layer and an interlayer interposed between the film substrate and the photocatalyst layer, wherein the fluororesin is at least one member selected from the group consisting of an ethylene/tetrafluoroethylene copolymer, a tetrafluoroethylene/hexafluoropropylene copolymer, a tetrafluoroethylene/perfluoro(alkyl vinyl ether) copolymer, a polyvinyl fluoride and a polyvinylidene fluoride; the interlayer contains an organic-inorganic hybrid polymer obtained by hydrolyzing/co-condensing at least one member selected from the group consisting of an organosilane, a hydrolysate of an organosilane and a condensate of an organosilane, and a silyl group-containing organic polymer; and the mass remaining ratio of the organic-inorganic hybrid polymer is from 50 to 80% at 500° C. measured by thermogravimetric analysis.
    • 一种用于膜结构的膜,其包含含有氟树脂的薄膜基材,光催化剂层和插入在所述薄膜基材和所述光催化剂层之间的夹层,其中所述氟树脂是选自乙烯/四氟乙烯 共聚物,四氟乙烯/六氟丙烯共聚物,四氟乙烯/全氟(烷基乙烯基醚)共聚物,聚氟乙烯和聚偏二氟乙烯; 中间层包含通过水解/共缩合从有机硅烷,有机硅烷的水解产物和有机硅烷的缩合物和含甲硅烷基的有机聚合物中选择的至少一种而获得的有机 - 无机杂化聚合物; 有机无机杂化聚合物的质量剩余率在500℃下为50〜80%,通过热重分析法测定。
    • 7. 发明授权
    • Film for membrane structure
    • 膜结构膜
    • US07732045B2
    • 2010-06-08
    • US11697864
    • 2007-04-09
    • Takuya NakaoMasaru YamauchiTutomu Fusyuku
    • Takuya NakaoMasaru YamauchiTutomu Fusyuku
    • B32B27/08B32B27/16B32B27/20B32B27/26B32B27/28B32B33/00
    • C08J7/045C08J5/22C08J2327/12Y10T428/269Y10T428/3154Y10T428/31544Y10T428/31663
    • A film for a membrane structure, which comprises a film substrate containing a fluororesin, a photocatalyst layer and an interlayer interposed between the film substrate and the photocatalyst layer, wherein the fluororesin is at least one member selected from the group consisting of an ethylene/tetrafluoroethylene copolymer, a tetrafluoroethylene/hexafluoropropylene copolymer, a tetrafluoroethylene/perfluoro(alkyl vinyl ether) copolymer, a polyvinyl fluoride and a polyvinylidene fluoride; the interlayer contains an organic-inorganic hybrid polymer obtained by hydrolyzing/co-condensing at least one member selected from the group consisting of an organosilane, a hydrolysate of an organosilane and a condensate of an organosilane, and a silyl group-containing organic polymer; and the mass remaining ratio of the organic-inorganic hybrid polymer is from 50 to 80% at 500° C. measured by thermogravimetric analysis.
    • 一种用于膜结构的膜,其包含含有氟树脂的薄膜基材,光催化剂层和插入在所述薄膜基材和所述光催化剂层之间的夹层,其中所述氟树脂是选自乙烯/四氟乙烯 共聚物,四氟乙烯/六氟丙烯共聚物,四氟乙烯/全氟(烷基乙烯基醚)共聚物,聚氟乙烯和聚偏二氟乙烯; 中间层包含通过水解/共缩合从有机硅烷,有机硅烷的水解产物和有机硅烷的缩合物和含甲硅烷基的有机聚合物中选择的至少一种而获得的有机 - 无机杂化聚合物; 有机无机杂化聚合物的质量剩余率在500℃下为50〜80%,通过热重分析法测定。
    • 8. 发明授权
    • Fluorocopolymer film and its application
    • 含氟聚合物膜及其应用
    • US07361717B2
    • 2008-04-22
    • US11167304
    • 2005-06-28
    • Shigeru AidaMasaru YamauchiHiroshi Aruga
    • Shigeru AidaMasaru YamauchiHiroshi Aruga
    • C08F16/24
    • C08F214/265C08F214/26C08J5/00C08J2327/12
    • A fluorocopolymer film formed by molding at a molding temperature of at most 320° C. a fluorocopolymer comprising repeating units based on ethylene, repeating units based on tetrafluoroethylene, repeating units based on hexafluoropropylene and repeating units based on a fluoroalkyl vinyl ether represented by CF2═CFORf (wherein Rf represents a C1-10 fluoroalkyl group), having a molar ratio of the repeating units based on ethylene/the repeating units based on tetrafluoroethylene of from 10/90 to 60/40, a content of the repeating units based on hexafluoropropylene to the total repeating units of from 0.1 to 20 mol % and a content of the fluoroalkyl vinyl ether to the total repeating units of from 0.1 to 10 mol %, and having a volumetric flow rate of from 0.1 to 30 mm3/sec at 297° C.
    • 一种含氟共聚物膜,其通过在至多320℃的成型温度下模塑而成,包含基于乙烯的重复单元,基于四氟乙烯的重复单元,基于六氟丙烯的重复单元和基于CF 3表示的氟烷基乙烯基醚的重复单元的含氟共聚物, (其中R f表示C 1-10烷基),其摩尔比为 基于乙烯的重复单元/基于四氟乙烯的重复单元为10/90至60/40,基于六氟丙烯的重复单元与总重复单元的含量为0.1至20摩尔%,氟代烷基的含量 乙烯基醚至总重复单元为0.1至10摩尔%,并且在297℃下的体积流速为0.1至30毫米3 /秒。
    • 10. 发明授权
    • Release film, releasable cushion material and process for producing printed board
    • 剥离膜,可释放缓冲材料和印刷板生产工艺
    • US07754326B2
    • 2010-07-13
    • US12245139
    • 2008-10-03
    • Tamao OkuyaHiroshi ArugaMasaru Yamauchi
    • Tamao OkuyaHiroshi ArugaMasaru Yamauchi
    • B32B18/00B32B25/08B32B25/20
    • H05K3/281B30B15/061Y10T156/10Y10T428/265Y10T428/3154Y10T428/31663
    • To provide a release film which does not need to be changed often for hot press and is easy to be changed; a releasable cushion material which can reduce the frequency of changing a cushion material main body; and a process for producing a printed board with good productivity and low cost.A release film 10 which is to be provided on a surface of a cushion material made of silicone rubber, and which has a layer 14 containing Si on one side of a substrate 12 made of a fluororesin; a releasable cushion material wherein the release film is provided on a surface of the cushion material made of silicone rubber so that the layer containing Si is located on the cushion material side; and a process for producing a printed board wherein, when a laminate of a printed board main body and coverlay films is subjected to hot press as sandwiched between press boards, the release film is disposed on a surface of the cushion material of the coverlay film side so that the layer containing Si is located on the cushion material side.
    • 为了提供热压机不需要经常更换并易于更换的脱模膜; 可释放的缓冲材料,其可以降低改变衬垫材料主体的频率; 以及生产率高,成本低的印刷电路板的制造方法。 一种剥离膜10,其设置在由硅橡胶制成的衬垫材料的表面上,并且在由氟树脂制成的衬底12的一侧上具有含有Si的层14; 一种可释放的衬垫材料,其中所述脱模膜设置在由硅橡胶制成的衬垫材料的表面上,使得含有Si的层位于所述衬垫材料侧上; 以及印刷电路板的制造方法,其中,当将印刷电路板主体和覆盖膜的叠层体夹在压板之间进行热压时,将剥离膜设置在覆盖膜侧的缓冲材料的表面上 使得含有Si的层位于缓冲材料侧。