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    • 3. 发明专利
    • Liquid chromatography system
    • HK1066863A1
    • 2005-04-01
    • HK04109844
    • 2004-12-13
    • ADVION BIOSCIENCES INCKIONIX INC
    • MOON JAMES ESCHULTZ GARY ACORSO THOMAS NDAVIS TIMOTHY JGALVIN GREGORY JLOWES STEPHEN
    • G01N20060101B01D20060101G01N27/62B01D15/08G01N30/60G01N30/72G01N37/00H01J20060101H01J49/04
    • An electrospray device, a liquid chromatography device and an electrospray-liquid chromatography system are disclosed. The electrospray device comprises a substrate defining a channel between an entrance orifice on an injection surface and an exit orifice on an ejection surface, a nozzle defined by a portion recessed from the ejection surface surrounding the exit orifice, and an electrode for application of an electric potential to the substrate to optimize and generate an electrospray; and, optionally, additional electrode(s) to further modify the electrospray. The liquid chromatography device comprises a separation substrate defining an introduction channel between an entrance orifice and a reservoir and a separation channel between the reservoir and an exit orifice, the separation channel being populated with separation posts perpendicular to the fluid flow; a cover substrate bonded to the separation substrate to enclose the reservoir and the separation channel adjacent the cover substrate; and, optionally, electrode(s) for application of a electric potential to the fluid. The exit orifice of the liquid chromatography device may be homogeneously interfaced with the entrance orifice of the electrospray device to form an integrated single system. An array of multiple systems may be fabricated in a single monolithic chip for rapid sequential fluid processing and generation of electrospray for subsequent analysis, such as by positioning the exit orifices of the electrospray devices near the sampling orifice of a mass spectrometer.
    • 8. 发明专利
    • IMPROVED METHODS OF FABRICATING MICROELECTROMECHANICAL AND MICROFLUIDIC DEVICES
    • CA2374666A1
    • 2000-12-21
    • CA2374666
    • 2000-06-14
    • KIONIX INC
    • MOON JAMES EDAVIS TIMOTHY JSHAW KEVIN AGALVIN GREGORY JWILSON SHARLENE AWALDROP PAUL C
    • G01N37/00B01D15/08B05B5/00B81B1/00B81C1/00H01L21/302H01L21/3065
    • Three fundamental and three derived aspects of the present invention are disclosed. The three fundamental aspects each disclose a process sequence th at may be integrated in a full process. The first aspect, designated as "latent masking", defines a mask in a persistent material like silicon oxide that is held abeyant after definition while intervening processing operations are performed. The laten oxide pattern is then used to mask an etch. The second aspect, designated as "simultaneous multi-level etching (SMILE)", provides a process sequence wherein a first pattern may be given an advanced start relative to a second pattern in etching into an underlying material, such that the first pattern may be etched deeper, shallower, or to the same depth as the second pattern. The third aspect, designated as "delayed LOCOS", provides a means of defining a contact hole pattern at one stage of a process, then using the defined pattern at a later stage to open the contact holes. The fourth aspect provides a process sequen ce that incorporates all three fundamental aspects to fabricate an integrated liquid chromatography (LC)/electrospray ionization (ESI) device. The fifth aspect provides a process sequence that incorporates two of the fundamental aspects to fabricatean ESI device. The sixth aspect provides a process sequence that incorporates two of the fundamental aspects to fabricate an LC device. The process improvements described provide increased manufacturing yield and design latitude in comparison to previously disclosed methods of fabrication.