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    • 1. 发明授权
    • Crosslinked triacrylate polymer beads
    • 交联的三丙烯酸酯聚合物珠
    • US4414278A
    • 1983-11-08
    • US370992
    • 1982-04-22
    • Abraham B. CohenChristina N. Lazaridis
    • Abraham B. CohenChristina N. Lazaridis
    • C08F22/10B32B5/16
    • C08F22/105Y10T428/2982
    • Discrete, substantially nonswellable crosslinked polymeric beads, 0.7 to 20 .mu.m average diameter wherein at least 90% of the beads by population are below 20 .mu.m, which are nonagglomerating in any solvent or solvents including solvents for the liquid monomer or monomers used in preparation thereof. The polymeric beads are homopolymers of tri- and tetraacrylate and tri- and tetramethacrylate monomers, copolymers thereof, copolymers of one of said acrylate or methacrylate monomers with up to 50% of a monomer having a single terminal ethylenic group or with up to 75% of a monomer having two terminal ethylenic groups or three terminal ethylenic groups different from said triacrylate or trimethacrylate monomers defined above.
    • 离散的,基本不可穿透的交联聚合物珠粒,其平均直径为0.7-20μm,其中至少90%的珠子总数低于20μm,在任何溶剂或溶剂中是非团聚的,包括用于制备液体单体或单体的溶剂 其中。 聚合物珠粒是三和四丙烯酸酯和三甲基丙烯酸酯和四甲基丙烯酸酯单体的均聚物,其共聚物,所述丙烯酸酯或甲基丙烯酸酯单体之一的共聚物与高达50%的具有单末端烯属基团的单体或最多75% 具有两个末端烯基或与上述三丙烯酸酯或三甲基丙烯酸酯单体不同的三个末端烯基的单体。
    • 3. 发明授权
    • Methods of imaging photopolymerizable materials containing diester
polyether
    • 含有二聚醚的光聚合材料成像方法
    • US4308338A
    • 1981-12-29
    • US212859
    • 1980-12-04
    • William J. ChambersChristina N. Lazaridis
    • William J. ChambersChristina N. Lazaridis
    • G03F7/027G03F7/031G03C5/00
    • G03F7/027G03F7/031
    • A photopolymerizable element, preferably a lithographic plate, is provided. This element comprises a substrate bearing a photopolymerizable layer having a weight of about 1 to about 90 mg/dm.sup.2, said layer comprising:(1) at least one ethylenically unsaturated diester polyhydroxy polyether of the formula ##STR1## wherein R is H or CH.sub.3 ; R.sup.4 is H or an alkyl of 1-4 carbon atoms; n is 1-15; p is 0 or 1; and, when p is 1, R.sup.5 is H or CH.sub.3, and R.sup.6 is H, CH.sub.3 or C.sub.2 H.sub.5 ;(2) an organic, radiation-sensitive, free-radical generating system comprising 2,4,5-triarylimidazolyl dimer and p-aminophenyl ketone; and(3) a macromolecular, organic, polymeric binder.A polymeric image is formed by imagewise exposing the layer to actinic radiation and then developing the resulting image such as by removing unexposed portions of the layer with a solvent.
    • 提供可光聚合元件,优选平版印刷版。 该元件包括承载重量约1至约90mg / dm 2的可光聚合层的基底,所述层包含:(1)至少一种下式的烯属不饱和二酯多羟基聚醚,其中R 是H或CH 3; R4是H或1-4个碳原子的烷基; n为1-15; p为0或1; 当p为1时,R5为H或CH3,R6为H,CH3或C2H5; (2)包含2,4,5-三芳基咪唑基二聚体和对氨基苯基酮的有机,辐射敏感的自由基产生体系; 和(3)大分子有机聚合物粘合剂。 通过将层成像曝光于光化辐射,然后显影所得图像,例如通过用溶剂除去该层的未曝光部分而形成聚合物图像。
    • 4. 发明授权
    • Radiation sensitive element having a thin photopolymerizable layer
    • 辐射敏感元件具有薄的可光聚合层
    • US4264708A
    • 1981-04-28
    • US134229
    • 1980-03-26
    • William J. ChambersChristina N. Lazaridis
    • William J. ChambersChristina N. Lazaridis
    • G03F7/027G03F7/031G03C1/68
    • G03F7/031G03F7/027Y10S430/106Y10S430/111Y10S430/12
    • A photopolymerizable element, preferably a lithographic plate, is provided. This element comprises a substrate bearing a photopolymerizable layer having a weight of about 1 to about 90 mg/dm.sup.2, said layer comprising:(1) at least one ethylenically unsaturated diester polyhydroxy polyether of the formula ##STR1## wherein R is H or CH.sub.3 ; R.sup.4 is H or an alkyl of 1-4 carbon atoms; n is 1-15; p is 0 or 1; and, when p is 1, R.sup.5 is H or CH.sub.3, and R.sup.6 is H, CH.sub.3 or C.sub.2 H.sub.5 ;(2) an organic, radiation-sensitive, free-radical generating system comprising 2,4,5-triarylimidazolyl dimer and p-aminophenyl ketone; and(3) a macromolecular, organic, polymeric binder.A polymeric image is formed by imagewise exposing the layer to actinic radiation and then developing the resulting image such as by removing unexposed portions of the layer with a solvent.
    • 提供可光聚合元件,优选平版印刷版。 该元件包括承载重量约1至约90mg / dm 2的可光聚合层的基底,所述层包含:(1)至少一种下式的烯属不饱和二酯多羟基聚醚,其中R 是H或CH 3; R4是H或1-4个碳原子的烷基; n为1-15; p为0或1; 当p为1时,R5为H或CH3,R6为H,CH3或C2H5; (2)包含2,4,5-三芳基咪唑基二聚体和对氨基苯基酮的有机,辐射敏感的自由基产生体系; 和(3)大分子有机聚合物粘合剂。 通过将层成像曝光于光化辐射,然后显影所得图像,例如通过用溶剂除去该层的未曝光部分,形成聚合物图像。