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1. 发明申请

US20080095954A1 Multilayer Coatings By Plasma Enhanced Chemical Vapor Deposition 审中-公开
标题翻译：多层涂料通过等离子体增强化学气相沉积
公开(公告)号：US20080095954A1
公开(公告)日：2008-04-24
申请号：US11661055
申请日：2005-09-02
申请人： Aaron Gabelnick , Christina Lambert
发明人： Aaron Gabelnick , Christina Lambert
IPC分类号： C23C16/513
CPC分类号： B05D1/62 , B05D7/53 , B05D2201/00 , C08J7/123 , C23C16/0272 , C23C16/401
摘要： The present invention provides a process for preparing a multiple layer coating on the surface of an organic polymeric substrate by means of atmospheric pressure plasma deposition, the steps of the process comprising depositing a layer (first layer) of a plasma polymerized, optically clear, highly adherent, organosilicon compound onto the surface of the organic polymeric substrate by atmospheric pressure plasma deposition of a gaseous mixture comprising an organosilicon reagent compound and optionally an oxidant in a first step and thereafter in a second step depositing a substantially uniform layer (second layer) of a silicon oxide compound onto the exposed surface of said first layer by atmospheric pressure plasma deposition of a gaseous mixture comprising an oxidant and an organosilicon reagent compound, wherein the molar ratio of oxidant to organosilicon reagent compound in the gaseous mixture is greater in the second step than in the first step.
摘要翻译：本发明提供了一种通过大气压等离子体沉积在有机聚合物基材的表面上制备多层涂层的方法，该方法的步骤包括沉积等离子体聚合的，光学透明的，高度的粘附的有机硅化合物通过大气压等离子体沉积包含有机硅试剂化合物和任选的氧化剂的气体混合物在第一步骤中，然后在第二步骤中沉积基本均匀的层（第二层），在有机聚合物基材的表面上沉积有机硅化合物氧化硅化合物通过大气压等离子体沉积包含氧化剂和有机硅试剂化合物的气体混合物在所述第一层的暴露表面上，其中气态混合物中氧化剂与有机硅试剂化合物的摩尔比在第二步骤中更大比第一步。

2. 发明申请

US20070264508A1 Abrasion Resistant Coatings by Plasma Enhanced Chemical Vapor Diposition 审中-公开
标题翻译：通过等离子体增强化学气相沉积的耐磨涂层
公开(公告)号：US20070264508A1
公开(公告)日：2007-11-15
申请号：US11663799
申请日：2005-10-06
申请人： Aaron Gabelnick , Christina Lambert , John Warakomski , Ludo Aerts
发明人： Aaron Gabelnick , Christina Lambert , John Warakomski , Ludo Aerts
IPC分类号： B32B9/04 , C08J7/00 , C23C16/50
CPC分类号： C23C16/0272 , B05D1/62 , B05D7/52 , B05D2201/00 , C08G77/26 , C23C16/402 , C23C16/45565 , C23C16/50 , Y10T428/31663
摘要： A process for preparing a multiple layer coating on the surface of an organic polymeric substrate by means of atmospheric pressure glow discharge deposition, the steps of the process comprising depositing a layer (first layer) of a plasma polymerized, optically clear, organosilicon compound and thereafter in a second step depositing a substantially uniform layer (second layer) of a polymeric siloxane or silicon oxide compound onto the exposed surface of said first layer, wherein the multiple layer coating has a thickness of at least 2.0 μm and an abrasion resistance demonstrating a change of 20 delta haze units or less after 500 Tabor cycles, measured according to ASTM D1044, CS10F wheels, 500 g weight.
摘要翻译：一种通过大气压辉光放电沉积在有机聚合物基材的表面上制备多层涂层的方法，该方法的步骤包括沉积等离子体聚合的，光学透明的有机硅化合物的层（第一层），此后在第二步骤中，将聚合物硅氧烷或氧化硅化合物的基本上均匀的层（第二层）沉积到所述第一层的暴露表面上，其中所述多层涂层具有至少2.0μm的厚度和显示出改变的耐磨性在500 Tabor循环后，根据ASTM D1044，CS10F轮，500g重量测量的20个三角洲雾度单位或更小。

3. 发明申请

US20060222779A1 Glow discharge-generated chemical vapor deposition 审中-公开
标题翻译：辉光放电产生的化学气相沉积
公开(公告)号：US20060222779A1
公开(公告)日：2006-10-05
申请号：US10567144
申请日：2004-09-07
申请人： Aaron Gabelnick , Christina Lambert
发明人： Aaron Gabelnick , Christina Lambert
IPC分类号： H05H1/24
CPC分类号： C23C16/505 , C23C16/401 , H05H1/2406 , H05H2001/2412 , H05H2001/4697
摘要： A process for creating plasma polymerized deposition on a substrate using a glow discharge is described. The glow discharge is created between an electrode and a counterelectrode. A mixture of a balance gas and a tetraalkylorthosilicate is flowed through the glow discharge onto a substrate to deposit a coating onto the substrate as an optically clear coating or to create surface modification. The process, which is preferably carried out at or near atmospheric pressure, can be designed to create an optically clear powder-free or virtually powder free coating.
摘要翻译：描述了使用辉光放电在基板上产生等离子体聚合沉积的方法。在电极和反电极之间产生辉光放电。将平衡气体和原硅酸四烷基酯的混合物通过辉光放电流体流到基底上，以将其作为光学透明涂层沉积到基底上，或者产生表面改性。该方法优选在大气压或接近大气压下进行，可以设计成产生光学透明的无粉末或实际上无粉末的涂层。

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