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    • 2. 发明申请
    • NEW SUNSCREEN COMPOUNDS AND COMPOSITIONS CONTAINING SAME AND METHODS FOR USE THEREOF
    • 新SUNSCREEN化合物及其组合物及其使用方法
    • WO2005062860A3
    • 2006-05-04
    • PCT/US2004042962
    • 2004-12-20
    • AVON PROD INCGONZALEZ ANTHONY DPECHKO ANDREW HANDERSON GLEN TKALAFSKY ROBERT E
    • GONZALEZ ANTHONY DPECHKO ANDREW HANDERSON GLEN TKALAFSKY ROBERT E
    • A61K8/00A61K8/02A61K8/40A61K31/235A61Q17/00A61Q17/04A61Q19/00C07C53/00C07C53/122C07F7/00C07F7/02C07F7/04C07F7/08
    • A61K8/40A61K2800/52A61Q17/04
    • There is provided a photostable and synergistically enhanced topical sunscreen composition that provides increased substantivity, waterproofness, sweat resistance and rub off resistance. There is further provided methods of enhancing the photostability of a sunscreen active in a topical sunscreen composition, synergistically enhancing the W absorbance of a topical sunscreen composition having a sunscreen active, and enhancing the substantivity, waterproofness, sweat resistance and rub off resistance in a topical sunscreen composition. The preferred compositions and methods have a sunscreen active, a cosmetically acceptable vehicle, and novel 2­ substituted-3,3-diaryl-2-propenoic acid derivatives with [A] a C 16 to C 50 straight or branched chain, substituted or un-substituted, conjugated or non­ conjugated hydrocarbon, or [B] a siloxane, polysiloxane, organo-modified polysiloxane residue, a group represented by the formula R 10 [Si (R 10 ) 2] n- and R 11 which is a silicone residue derived from a silicone represented by the formula R 11 0H having a molecular weight up to about 30,000, wherein each R 10 is independently selected from the group consisting of alkyl, alkoxy, aryl and aryloxy and n is from (1) to about (500).
    • 提供了一种光稳定和协同增强的局部防晒组合物,其提供增强的亲和性,防水性,耐汗性和耐擦性。 进一步提供了在局部防晒组合物中增强防晒活性物质的光稳定性的方法,协同地提高了具有防晒活性的局部防晒组合物的W吸光度,并且增强了局部防晒组合物的亲和性,防水性,耐汗性和抗擦伤性 防晒组合物。 优选的组合物和方法具有防晒活性物质,美容上可接受的载体和新的2位取代-3,3-二芳基-2-丙烯酸衍生物,其具有[A] C 16至C 13 - 50个直链或支链,取代或未取代的共轭或非共轭烃,或[B]硅氧烷,聚硅氧烷,有机改性聚硅氧烷残基,由式R 10表示的基团, 作为衍生自由式R 11表示的硅氧烷的硅氧烷残基的[Si(R 10)2] n - 和R 11 > 0H,分子量高达约30,000,其中每个R 10独立地选自烷基,烷氧基,芳基和芳氧基,n为(1)至约(500)。