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1. 发明申请

WO2015080572A1 REACTOR SYSTEM FOR HIGH THROUGHPUT APPLICATIONS 审中-公开
标题翻译：用于高通量应用的反应器系统
公开(公告)号：WO2015080572A1
公开(公告)日：2015-06-04
申请号：PCT/NL2014/050793
申请日：2014-11-20
申请人： AVANTIUM TECHNOLOGIES B.V.
发明人： MOONEN, Roelandus Hendrikus Wilhelmus , HARTOG, Benno
IPC分类号： B01J19/00
CPC分类号： B01J19/0093 , B01J19/0046 , B01J2219/00286 , B01J2219/00418 , B01J2219/00808 , B01J2219/00813 , B01J2219/00817 , B01J2219/0086 , B01J2219/00869 , B01J2219/00896 , B01J2219/00898 , B01J2219/00959 , B01J2219/00963 , B01J2219/00984
摘要： The invention pertains to a reactor system for high throughput applications, which reactor system comprises: -a plurality of reactor assemblies, each reactor assembly comprising: -a fluid source, which fluid source is adapted to provide a pressurized fluid to the flow- through reactors, -a flow splitter which flow splitter comprises a planar microfluidic chip, which microfluidic chip has a chip inlet channel and a plurality of chip outlet channels,which microfluidic chip further comprises a plurality of flow restrictor channels, wherein each flow restrictor channel extends from said chip inlet channel to an associated chip outlet channel, wherein the chip inlet channel and the chip outlet channels each have a diameter, wherein the diameter of the chip inlet channel is the same or less than the length of said chip inlet channel and wherein the diameter of each chip outlet channel is the same or less than the length of said chip outlet channel.
摘要翻译：本发明涉及用于高通量应用的反应器系统，该反应器系统包括： - 多个反应器组件，每个反应器组件包括： - 流体源，该流体源适于向加压流体提供加压流体一种分流器，其分流器包括平面微流体芯片，该微流体芯片具有芯片入口通道和多个芯片出口通道，该微流体芯片还包括多个限流器通道，其中每个限流器通道从所述芯片入口通道连接到相关的芯片出口通道，其中芯片入口通道和芯片出口通道各自具有直径，其中芯片入口通道的直径等于或小于所述芯片入口通道的长度，并且其中直径每个芯片出口通道的长度等于或小于所述芯片出口通道的长度。

2. 发明申请

WO2014062056A1 PRESSURE CONTROLLER 审中-公开
标题翻译：压力控制器
公开(公告)号：WO2014062056A1
公开(公告)日：2014-04-24
申请号：PCT/NL2013/050724
申请日：2013-10-11
申请人： AVANTIUM TECHNOLOGIES B.V.
发明人： MOONEN, Roelandus Hendrikus Wilhelmus , BODENSTAFF, Emilio René , HARTOG, Benno
IPC分类号： B01J19/00 , B01L3/00 , G05D16/18 , F16K99/00
CPC分类号： B01J19/0006 , B01J19/0013 , B01J19/0046 , B01J2219/00065 , B01J2219/00162 , B01J2219/00477 , B01J2219/00495 , B01L3/502746 , B01L2300/14 , B01L2400/0481 , B01L2400/0655 , F16K99/0011 , F16K99/0015 , F16K99/0026 , F16K99/0044 , F16K99/0061 , G05D16/185 , G05D16/2026 , G05D16/2093 , Y10T137/6416 , Y10T436/12
摘要： The invention pertains to a pressure controller for use in operating parallel reactors. The pressure controller comprises a reference pressure controller, that is adapted to control a reference pressure in a control chamber. The reference pressure controller comprises: a first restrictor channel, a second restrictor channel, a fluid passage, which fluid passage extends between the outlet of the first restrictor channel and the inlet of the second restrictor channel, a pressure control fluid source being adapted to provide a flow of pressure control fluid, having an entrance pressure at the inlet of the first restrictor channel and an exit pressure at the outlet of the second restrictor channel, said flow of pressure control fluid experiencing a first pressure drop Δρ1 over the first restrictor channel and a second pressure drop Δρ2 over the second restrictor channel, a connector connecting the fluid passage to the control chamber, the pressure control fluid at the connector having an intermediate pressure, said intermediate pressure being determined by the ratio between the first pressure drop Δρ1 and the second pressure drop Δ⩽ρ2, - a controllable thermal device, adapted to heat and/or cool the first restrictor channel and/or the second restrictor channel, therewith influencing the ratio between the first pressure drop Δρ1 and the second pressure drop Δρ2.
摘要翻译：本发明涉及用于操作并联反应器的压力控制器。压力控制器包括参考压力控制器，其适于控制控制室中的参考压力。参考压力控制器包括：第一限流器通道，第二限流器通道，流体通道，该流体通道在第一限流器通道的出口和第二限流器通道的入口之间延伸，压力控制流体源适于提供压力控制流体的流动，其具有在第一限流器通道的入口处的入口压力和在第二限流器通道的出口处的出口压力，所述压力控制流体流经历第一压力下降＆amp; 第一限流器通道和第二限压器通道上的第二压降和第二压降;连接器，其将流体通道连接到控制室，连接器处的压力控制流体具有中间压力，所述中间压力由比例在第一压降与Dgr＆amp; 1和第二压降“Dgr”之间; 2， - 可控热装置，适应以加热和/或冷却第一限流器通道和/或第二限流器通道，从而影响第一压降＆Dgr; 1和第二压降“Dgr”之间的比值。

3. 发明申请

WO2023072894A1 PROCESS AND EQUIPMENT FOR CONDUCTING RESEARCH ON ADSORPTION OF COMPOUNDS TO SOLIDS 审中-公开
公开(公告)号：WO2023072894A1
公开(公告)日：2023-05-04
申请号：PCT/EP2022/079699
申请日：2022-10-25
申请人： AVANTIUM TECHNOLOGIES B.V
发明人： JASTRZEBSKI, Robin , MOONEN, Roelandus Hendrikus Wilhelmus , RAS, Erik-Jan
IPC分类号： G01N30/00 , B01D53/04
摘要： Apparatus for conducting research on adsorption properties of particulate solid adsorption materials for an adsorbate in at least two parallel adsorption beds, and method of using such. The apparatus contains multiple parallel beds of adsorbent, of a comparatively small volume between 0.1 to 10 ml, which are connected to two feeds via a splitter for each feed and capillaries downstream of the splitter and upstream of the adsorption bed. The invention further relates to a method using such apparatus.

4. 发明申请

WO2014062055A1 SYSTEM AND METHOD FOR OPERATING PARALLEL REACTORS 审中-公开
标题翻译：用于操作并联反应器的系统和方法
公开(公告)号：WO2014062055A1
公开(公告)日：2014-04-24
申请号：PCT/NL2013/050723
申请日：2013-10-11
申请人： AVANTIUM TECHNOLOGIES B.V.
发明人： MOONEN, Roelandus Hendrikus Wilhelmus
IPC分类号： B01J19/00
CPC分类号： B01J19/0006 , B01J19/0046 , B01J19/0093 , B01J2219/00286 , B01J2219/00585 , B01J2219/00689 , B01J2219/00698 , B01J2219/00747 , B01J2219/00869 , B01J2219/00891 , B01J2219/00963
摘要： The invention pertains to a system for operating parallel reactors, which comprises: -a plurality of reactor assemblies, each reactor assembly comprising: -a flow-through reactor -a reactor feed line, -a reactor effluent line, -a primary fluid source, -a flow splitter which is arranged downstream of the primary fluid source and upstream of the reactor assemblies, and wherein all passive flow restrictors have an substantially equal resistance to fluid flow wherein the system further comprises a feed line pressure measurement device, wherein in each effluent line an individually controllable backpressure regulator is provided, and wherein further a pressure control arrangement is provided, said pressure control arrangement being linked to said feed line pressure measurement device and said backpressure regulators, said pressure control arrangement comprising an input device allowing to input a feed line pressure setpoint, said desired feed line pressure being the same for all reactor assemblies, wherein said pressure control arrangement is adapted to individually control the backpressure regulators such that the measured feed line pressure becomes substantially the same as the feed line pressure setpoint, and therewith substantially the same as the feed line pressures in the other reactor assemblies.
摘要翻译：本发明涉及用于操作并联反应器的系统，其包括： - 多个反应器组件，每个反应器组件包括： - 流通反应器 - 反应器进料管线， - 反应器流出物管线， - 主要流体源， - 分流器，其布置在主流体源的下游和反应器组件的上游，并且其中所有被动流量限制器具有与流体流动基本上相等的阻力，其中系统还包括进料管线压力测量装置，其中在每个流出物提供单独可控的背压调节器，并且其中还提供压力控制装置，所述压力控制装置连接到所述进料管线压力测量装置和所述背压调节器，所述压力控制装置包括允许输入进料的输入装置管道压力设定点，所有反应堆屁股的所需进料管路压力相同其中所述压力控制装置适于独立地控制背压调节器，使得所测量的进料管线压力变得基本上与进料管线压力设定点相同，并且因此基本上与其它反应器组件中的进料管线压力相同。

5. 发明授权

EP2908939B1 PRESSURE CONTROLLER 有权
标题翻译：压力控制器
公开(公告)号：EP2908939B1
公开(公告)日：2016-06-29
申请号：EP13784008.8
申请日：2013-10-11
申请人： Avantium Technologies B.V.
发明人： MOONEN, Roelandus Hendrikus Wilhelmus , BODENSTAFF, Emilio René , HARTOG, Benno
IPC分类号： B01J19/00 , B01L3/00 , G05D16/18 , F16K99/00 , G05D16/20
CPC分类号： B01J19/0006 , B01J19/0013 , B01J19/0046 , B01J2219/00065 , B01J2219/00162 , B01J2219/00477 , B01J2219/00495 , B01L3/502746 , B01L2300/14 , B01L2400/0481 , B01L2400/0655 , F16K99/0011 , F16K99/0015 , F16K99/0026 , F16K99/0044 , F16K99/0061 , G05D16/185 , G05D16/2026 , G05D16/2093 , Y10T137/6416 , Y10T436/12
摘要： A pressure controller for use in operating parallel reactors, the pressure controller including a reference pressure controller, the reference pressure controller including: a first restrictor channel, a second restrictor channel, a fluid passage, which fluid passage extends between the outlet of the first restrictor channel and the inlet of the second restrictor channel, a pressure control fluid source being adapted to provide a flow of pressure control fluid, having an entrance pressure at the inlet of the first restrictor channel and an exit pressure at the outlet of the second restrictor channel, the flow of pressure control fluid experiencing a first pressure drop Δρ1 over the first restrictor channel and a second pressure drop Δρ2 over the second restrictor channel, a connector connecting the fluid passage to the control chamber, the pressure control fluid at the connector having an intermediate pressure, the intermediate pressure being determined by the ratio between the first pressure drop Δρ1 and the second pressure drop Δρ2, a controllable thermal device, the thermal device being adapted to heat and/or cool the first restrictor channel and/or the second restrictor channel, therewith influencing the ratio between the first pressure drop Δρ1 and the second pressure drop Δρ2.

6. 发明公开

EP2908938A1 SYSTEM AND METHOD FOR OPERATING PARALLEL REACTORS 有权
标题翻译：系统及其操作方法并联电抗器
公开(公告)号：EP2908938A1
公开(公告)日：2015-08-26
申请号：EP13784007.0
申请日：2013-10-11
申请人： Avantium Technologies B.V.
发明人： MOONEN, Roelandus Hendrikus Wilhelmus
IPC分类号： B01J19/00
CPC分类号： B01J19/0006 , B01J19/0046 , B01J19/0093 , B01J2219/00286 , B01J2219/00585 , B01J2219/00689 , B01J2219/00698 , B01J2219/00747 , B01J2219/00869 , B01J2219/00891 , B01J2219/00963
摘要： A system for operating parallel reactors includes a plurality of reactor assemblies, each reactor assembly including: a flow-through reactor, a reactor feed line, a reactor effluent line, a primary fluid source, and a flow splitter which is arranged downstream of the primary fluid source and upstream of the reactor assemblies. All passive flow restrictors have an substantially equal resistance to fluid flow. A feed line pressure measurement device and a pressure control arrangement controls backpressure regulators such that the measured feed line pressure becomes substantially the same as a feed line pressure setpoint in the reactor assemblies.

7. 发明授权

EP3345676B1 REACTOR SYSTEM FOR HIGH THROUGHPUT APPLICATIONS 有权
公开(公告)号：EP3345676B1
公开(公告)日：2019-07-31
申请号：EP18159143.9
申请日：2014-11-20
申请人： Avantium Technologies B.V.
发明人： MOONEN, Roelandus Hendrikus Wilhelmus , HARTOG, Benno
IPC分类号： B01J19/00

8. 发明授权

EP3074121B1 REACTOR SYSTEM FOR HIGH THROUGHPUT APPLICATIONS 有权
标题翻译：高吞吐量应用的反应堆系统
公开(公告)号：EP3074121B1
公开(公告)日：2018-04-11
申请号：EP14809538.3
申请日：2014-11-20
申请人： Avantium Technologies B.V.
发明人： MOONEN, Roelandus Hendrikus Wilhelmus , HARTOG, Benno
IPC分类号： B01J19/00
CPC分类号： B01J19/0093 , B01J19/0046 , B01J2219/00286 , B01J2219/00418 , B01J2219/00808 , B01J2219/00813 , B01J2219/00817 , B01J2219/0086 , B01J2219/00869 , B01J2219/00896 , B01J2219/00898 , B01J2219/00959 , B01J2219/00963 , B01J2219/00984
摘要： The invention pertains to a reactor system for high throughput applications, which reactor system comprises: - a plurality of reactor assemblies, each reactor assembly comprising: - a fluid source, which fluid source is adapted to provide a pressurized fluid to the flow-through reactors, wherein in a reactor feed line and/or reactor effluent line of at least one reactor assembly a flow restrictor channel is present, which flow restrictor channel is arranged in a planar microfluidic chip, which microfluidic chip further comprises a chip inlet channel and a chip outlet channel that are in fluid communication with the flow restrictor channel, both said chip inlet channel and said chip outlet channel having a length and a diameter, wherein the diameter of the chip inlet channel is the same or less than the length of said chip inlet channel and wherein the diameter of the chip outlet channel is the same or less than the length of said chip outlet channel.

9. 发明授权

EP2908938B1 SYSTEM AND METHOD FOR OPERATING PARALLEL REACTORS 有权
标题翻译：系统及其操作方法并联电抗器
公开(公告)号：EP2908938B1
公开(公告)日：2016-12-07
申请号：EP13784007.0
申请日：2013-10-11
申请人： Avantium Technologies B.V.
发明人： MOONEN, Roelandus Hendrikus Wilhelmus
IPC分类号： B01J19/00
CPC分类号： B01J19/0006 , B01J19/0046 , B01J19/0093 , B01J2219/00286 , B01J2219/00585 , B01J2219/00689 , B01J2219/00698 , B01J2219/00747 , B01J2219/00869 , B01J2219/00891 , B01J2219/00963
摘要： A system for operating parallel reactors includes a plurality of reactor assemblies, each reactor assembly including: a flow-through reactor, a reactor feed line, a reactor effluent line, a primary fluid source, and a flow splitter which is arranged downstream of the primary fluid source and upstream of the reactor assemblies. All passive flow restrictors have an substantially equal resistance to fluid flow. A feed line pressure measurement device and a pressure control arrangement controls backpressure regulators such that the measured feed line pressure becomes substantially the same as a feed line pressure setpoint in the reactor assemblies.

10. 发明公开

EP3074121A1 REACTOR SYSTEM FOR HIGH THROUGHPUT APPLICATIONS 有权
标题翻译： REAKTORSYSTEMFÜRANWENDUNGEN MIT HOHEM DURCHSATZ
公开(公告)号：EP3074121A1
公开(公告)日：2016-10-05
申请号：EP14809538.3
申请日：2014-11-20
申请人： Avantium Technologies B.V.
发明人： MOONEN, Roelandus Hendrikus Wilhelmus , HARTOG, Benno
IPC分类号： B01J19/00
CPC分类号： B01J19/0093 , B01J19/0046 , B01J2219/00286 , B01J2219/00418 , B01J2219/00808 , B01J2219/00813 , B01J2219/00817 , B01J2219/0086 , B01J2219/00869 , B01J2219/00896 , B01J2219/00898 , B01J2219/00959 , B01J2219/00963 , B01J2219/00984
摘要： A reactor system for high throughput applications includes a plurality of reactor assemblies, each reactor assembly including: a fluid source, which fluid source is adapted to provide a pressurized fluid to the flow-through reactors, a flow splitter which flow splitter includes a planar microfluidic chip, which microfluidic chip has a chip inlet channel and a plurality of chip outlet channels, which microfluidic chip further includes a plurality of flow restrictor channels, where each flow restrictor channel extends from said chip inlet channel to an associated chip outlet channel, where the chip inlet channel and the chip outlet channels each have a diameter, where the diameter of the chip inlet channel is the same or less than the length of said chip inlet channel and where the diameter of each chip outlet channel is the same or less than the length of said chip outlet channel.
摘要翻译：用于高通量应用的反应器系统包括多个反应器组件，每个反应器组件包括：流体源，该流体源适于向流通反应器提供加压流体;分流器，其分流器包括平面微流体该微流体芯片具有芯片入口通道和多个芯片出口通道，该微流体芯片还包括多个限流器通道，其中每个限流器通道从所述芯片入口通道延伸到相关的芯片出口通道，其中芯片入口通道和芯片出口通道各自具有直径，其中芯片入口通道的直径相同或小于所述芯片入口通道的长度，并且其中每个芯片出口通道的直径相同或小于所述芯片出口通道的长度。

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