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1. 发明申请

WO2018046329A1 FLUID HANDLING STRUCTURE FOR LITHOGRAPHIC APPARATUS 审中-公开
标题翻译：光刻设备的流体处理结构
公开(公告)号：WO2018046329A1
公开(公告)日：2018-03-15
申请号：PCT/EP2017/071509
申请日：2017-08-28
申请人： ASML NETHERLANDS B.V.
发明人： VAN DEN EIJNDEN, Pepijn , ROPS, Cornelius, Maria , POLET, Theodorus, Wilhelmus , KEUKENS, Floor, Lodewijk , TANASA, Gheorghe , CORTIE, Rogier, Hendrikus, Magdalena , CUYPERS, Koen , BUDDENBERG, Harold, Sebastiaan , GATTOBIGIO, Giovanni, Luca , VAN VLIET, Evert , TEN KATE, Nicolaas , FRENCKEN, Mark, Johannes, Hermanus , VAN ERVE, Jantien, Laura , TEUNISSEN, Marcel, Maria, Cornelius, Franciscus
IPC分类号： G03F7/20
摘要： A fluid handling structure (12) configured to confine immersion fluid to a region of a lithographic apparatus, the fluid handling structure comprising: an aperture (15) formed therein for the passage there through of a projection beam through the immersion fluid; a first part (100); and a second part (200); and wherein at least one of the first part and the second part define a surface (20) adapted for the extraction of the immersion fluid from the region; and wherein the fluid handling structure is adapted to provide a fluid flow into or out of the surface of the fluid handling structure and wherein movement of the first part relative to the second part is effective to change a position of the fluid flow into or out of the surface relative to the aperture, and wherein one of the first part and second part comprises at least one through-hole (51, 61) for the fluid flow there through and the other of the first part and second part comprises at least one opening (55, 65) for the fluid flow there through, the at least one through-hole and at least one opening being in fluid communication when aligned, the movement allowing alignment of the at least one opening with different ones of the at least one through-hole thereby to change the position of the fluid flow into or out of the surface relative to the aperture.
摘要翻译：一种流体处理结构（12），其被配置为将浸没流体限制到光刻设备的区域，所述流体处理结构包括：孔（15），其中形成有用于使得通过其中的投影光束通过浸液; 第一部分（100）; 和第二部分（200）; 并且其中所述第一部分和所述第二部分中的至少一个限定适于从所述区域提取所述浸没流体的表面（20）;其中，并且其中流体处理结构适于提供流体流入或流出流体处理结构的表面，并且其中第一部分相对于第二部分的移动有效地改变流体流入或流出所述表面相对于所述孔口，并且其中所述第一部分和所述第二部分中的一个包括用于流体流过的至少一个通孔（51,61），并且所述第一部分和所述第二部分中的另一个包括至少一个开口（55,65），所述至少一个通孔和至少一个开口在对齐时流体连通，所述移动允许所述至少一个开口与所述至少一个通孔中的不同通孔对准从而改变流体流入或流出表面相对于孔的位置。

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