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1. 发明申请

WO2021249768A1 SUBSTRATE HOLDER FOR USE IN A LITHOGRAPHIC APPARATUS AND A METHOD OF MANUFACTURING A SUBSTRATE HOLDER 审中-公开
公开(公告)号：WO2021249768A1
公开(公告)日：2021-12-16
申请号：PCT/EP2021/063942
申请日：2021-05-25
申请人： ASML NETHERLANDS B.V. , ASML HOLDING N.V.
发明人： DE GROOT, Antonius, Franciscus, Johannes , AKBAS, Mehmet, Ali , CIFTCI SANDIKCI, Aysegul , DENG, Jerry, Jianguo , NEKLYUDOVA, Mariya , MAYER, Ryan , GUPTA, Sonia , STENEKEN, Ryan, Charles , VAN DE WINKEL, Jimmy, Matheus, Wilhelmus , OLEXOVITCH, Christopher M. , PERRY, Michael
IPC分类号： G03F7/20 , H01L21/687 , G03F7/707 , G03F7/7095 , H01L21/6875 , H01L21/68757
摘要： Described herein is a method of producing a substrate holder for use in a lithographic apparatus, the substrate holder comprising a plurality of burls projecting from the substrate holder and each burl having a distal end surface configured to engage with a substrate. The method including applying, via a plasma enhanced chemical vapor deposition, a coating of a wear-resistant material at the distal end surface of one or more burls of the plurality of burls. The applying of the coating includes adjusting radio frequency (RF) power of RF electrodes in a range 100 to 1000 W for creating plasma; and exposing, in a chamber, the one or more plurality of burls to a precursor gas at a gas flow rate between 20 to 300 seem, the pre-cursor gas being Flexane.

2. 发明申请

WO2017182216A1 SUBSTRATE SUPPORT, LITHOGRAPHIC APPARATUS AND LOADING METHOD 审中-公开
标题翻译：基板支撑，光刻设备和加载方法
公开(公告)号：WO2017182216A1
公开(公告)日：2017-10-26
申请号：PCT/EP2017/056644
申请日：2017-03-21
申请人： ASML NETHERLANDS B.V.
发明人： ONVLEE, Johannes , DE GROOT, Antonius, Franciscus, Johannes , SYMENS, Wim , VLES, David, Ferdinand
IPC分类号： G03F7/20
CPC分类号： G03F7/70708 , G03F7/70691 , G03F7/707 , G03F7/70733
摘要： The invention relates to a substrate support (WT) for supporting a substrate (W). The substrate support comprises the main body (MB), a clamping device (VC; VSO) and a dither device (DD). The main body comprises the support surface (S) for supporting the substrate (W). The clamping device is arranged to provide the clamping force to clamp the substrate on the support surface. The dither device is configured to dither the clamping force. The dither device may be configured to dither the clamping force while the substrate W is being loaded onto the support surface.
摘要翻译：本发明涉及用于支撑衬底（W）的衬底支撑件（WT）。基板支架包括主体（MB），夹紧装置（VC; VSO）和抖动装置（DD）。主体包括用于支撑基板（W）的支撑表面（S）。夹紧装置布置成提供夹紧力以将基底夹紧在支撑表面上。抖动装置被配置为抖动夹紧力。抖动装置可以被配置为在衬底W被加载到支撑表面上时抖动夹紧力。

3. 发明申请

WO2020143993A1 ELASTIC GUIDING DEVICE, POSITIONING DEVICE, BLADE AND LITHOGRAPHIC APPARATUS 审中-公开
公开(公告)号：WO2020143993A1
公开(公告)日：2020-07-16
申请号：PCT/EP2019/084979
申请日：2019-12-12
申请人： ASML NETHERLANDS B.V.
发明人： MULDER, Erwin, Andreas, Bernardus , BUSTRAAN, Krijn, Frederik , DE GROOT, Antonius, Franciscus, Johannes , KOOLSTRA, Rinze , BROM, Paul, Peter, Anna, Antonius
IPC分类号： G03F7/20 , B23Q1/36 , F16C11/12 , F16C29/02
摘要： The invention relates to elastic guiding device to support a mass with respect to a base in a support direction, wherein the stiffness in support direction compared to stiffness in other direction, for example the stiffness in vertical direction compared to the stiffness in horizontal directions is substantially increased. The invention further relates to a positioning device comprising at least one elastic guiding device, and a lithographic apparatus comprising such positioning device.

4. 发明申请

WO2013178484A1 SUPPORT APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：支持设备，平面设备和设备制造方法
公开(公告)号：WO2013178484A1
公开(公告)日：2013-12-05
申请号：PCT/EP2013/060218
申请日：2013-05-17
申请人： ASML NETHERLANDS B.V.
发明人： DONDERS, Sjoerd, Nicolaas, Lambertus , FIEN, Menno , HOOGENDAM, Christiaan, Alexander , HOUBEN, Martijn , JACOBS, Johannes, Henricus, Wilhelmus , KOEVOETS, Adrianus, Hendrik , LAFARRE, Raymond, Wilhelmus, Louis , OVERKAMP, Jim, Vincent , TEN KATE, Nicolaas , WESTERLAKEN, Jan, Steven, Christiaan , DE GROOT, Antonius, Franciscus, Johannes , VAN BEIJNUM, Maarten , DE JONG, Rob
IPC分类号： G03F7/20
CPC分类号： G03F7/70716 , G03F7/70341 , G03F7/707 , G03F7/70733
摘要： A support apparatus (60) for a lithographic apparatus has an object holder (61) and an extraction body (65) radially outward of the object holder. The object holder is configured to support an object (W). The extraction body includes an extraction opening (66) configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection (30) configured such that it surrounds the object holder and such that, in use, a layer of liquid (32) is retained on the projection and in contact with an object supported on the object holder.
摘要翻译：用于光刻设备的支撑设备（60）具有物体保持器（61）和物体保持器径向外侧的提取体（65）。物体保持器被配置为支撑物体（W）。提取体包括提取开口（66），其构造成从支撑装置的顶表面提取流体。提取体与物体保持器间隔开，使得提取体基本上与物体保持器分离。提取体包括构造成使其围绕物体保持器并且使用中的一液体（32）保持在突起上并与被保持物体支撑的物体接触的突起（30）。

5. 发明申请

WO2013160123A1 LITHOGRAPHIC APPARATUS COMPRISING AN ACTUATOR, AND METHOD FOR PROTECTING SUCH ACTUATOR 审中-公开
标题翻译：包括执行器的平面设备和用于保护执行器的方法
公开(公告)号：WO2013160123A1
公开(公告)日：2013-10-31
申请号：PCT/EP2013/057659
申请日：2013-04-12
申请人： ASML NETHERLANDS B.V.
发明人： CADEE, Theodorus, Petrus, Maria , BROERS, Sander, Christiaan , HOL, Sven, Antoin, Johan , HUANG, Yang-Shan , DE GROOT, Antonius, Franciscus, Johannes , VAN DE VEN, Bastiaan, Lambertus, Wilhelmus, Marinus
IPC分类号： G03F7/20
CPC分类号： G03F7/70766 , G03F7/70533 , G03F7/70758 , G03F7/709
摘要： A lithographic apparatus comprises a system. The system comprises a first part (208), a second part (204) and an energy absorbing element (210). The second part is configured to move relatively to the first part. The system has a gap (216) located between the first part and the second part during an operation mode of the system. The energy absorbing element is for absorbing energy between the first part and the second part when the first part and the second part crash onto each other in a failure mode of the system. The energy absorbing element is outside the gap.
摘要翻译：光刻设备包括一个系统。该系统包括第一部分（208），第二部分（204）和能量吸收元件（210）。第二部分被配置为相对于第一部分移动。该系统在系统的操作模式期间具有位于第一部分和第二部分之间的间隙（216）。当第一部分和第二部分在系统的故障模式下彼此碰撞时，能量吸收元件用于在第一部分和第二部分之间吸收能量。能量吸收元件在间隙之外。

6. 发明申请

WO2013143777A3 SUBSTRATE TABLE SYSTEM, LITHOGRAPHIC APPARATUS AND SUBSTRATE TABLE SWAPPING METHOD 审中-公开
公开(公告)号：WO2013143777A3
公开(公告)日：2013-10-03
申请号：PCT/EP2013/053084
申请日：2013-02-15
申请人： ASML NETHERLANDS B.V.
发明人： VAN DE VEN, Bastiaan, Lambertus, Wilhelmus, Marinus , DE GROOT, Antonius, Franciscus, Johannes , HOOGENDAM, Christiaan, Alexander , LOOPSTRA, Erik, Roelof , BUTLER, Hans
IPC分类号： G03F7/20
摘要： A substrate table system includes a substrate table (WT) and a dual directional motor for moving the substrate table in a plane of movement. The plane of movement is defined by a first direction and a second direction perpendicular to the first direction. The dual directional motor includes: a first pusher structure (FPS) extending in the first direction, the substrate table being movable in respect of the first pusher structure, the first pusher structure and the substrate table being arranged to cooperate so as to form a first motor arranged to exert a force between the first pusher structure and the substrate table in the first direction; and a second pusher structure (SPS) extending in the first direction, the substrate table being movable in respect of the second pusher structure (along the first and second directions), the second pusher structure and the substrate table being arranged to cooperate so as to form a second motor arranged to exert a force between the second pusher structure and the substrate table in the second direction.

7. 发明申请

WO2013113632A3 A STAGE SYSTEM AND A LITHOGRAPHIC APPARATUS 审中-公开
公开(公告)号：WO2013113632A3
公开(公告)日：2013-08-08
申请号：PCT/EP2013/051472
申请日：2013-01-25
申请人： ASML NETHERLANDS B.V. , KONINKLIJKE PHILIPS ELECTRONICS N.V.
发明人： VAN DE VEN, Bastiaan, Lambertus, Wilhelmus , DE GROOT, Antonius, Franciscus, Johannes , VERMEULEN, Johannes, Petrus, Martinus, Bernardus , CADEE, Theodorus, Petrus, Maria , RIJS, Robertus, Mathijs, Gerardus , VAN LIESHOUT, Richard, Henricus, Adrianus
IPC分类号： G03F7/20
摘要： A movable stage system is configured to support an object subjected to a lithography process. A short stroke part (SS) is configured to support the object (W) and a long stroke part (LS) is configured to support the short stroke part. The short stroke part is movable over a relative small range of movement with respect to the long stroke part. The long stroke part is movable over a relative large range of movement with respect to a base support arranged to support the long stroke part. A shielding element (SE) is arranged between the short and long stroke parts. A position control system (PCS) maintains a substantially constant distance between the shielding element and the short stroke part.

8. 发明申请

WO2021115765A1 METHOD OF MANUFACTURING A SUBSTRATE SUPPORT FOR A ITHOGRAPHIC APPARATUS, SUBSTRATE TABLE, LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, METHOD OF USE 审中-公开
公开(公告)号：WO2021115765A1
公开(公告)日：2021-06-17
申请号：PCT/EP2020/082988
申请日：2020-11-20
申请人： ASML NETHERLANDS B.V.
发明人： STEUR, Michael, Marinus, Anna , TEN KATE, Nicolaas , TROMP, Siegfried, Alexander , WINKELS, Koen, Gerhardus , DE GROOT, Antonius, Franciscus, Johannes
IPC分类号： G03F7/20 , H01L21/683
摘要： The disclosure relates to substrate tables and methods of manufacturing substrate supports for substrate tables. In one arrangement, a plurality of holes are formed through a base member. A burl formation member is joined to the base member. A plurality of burl structures are formed in the burl formation member. Each burl structure comprises a distal surface that contacts, in use, a substrate being supported. Each burl structure comprises an opening to at least one of the holes formed through the base member.

9. 发明申请

WO2020038661A1 SUBSTRATE SUPPORT, LITHOGRAPHIC APPARATUS, SUBSTRATE INSPECTION APPARATUS, DEVICE MANUFACTURING METHOD 审中-公开
公开(公告)号：WO2020038661A1
公开(公告)日：2020-02-27
申请号：PCT/EP2019/069153
申请日：2019-07-16
申请人： ASML NETHERLANDS B.V.
发明人： VERMEULEN, Johannes, Petrus, Martinus, Bernardus , MEULENDIJKS, Luc, Leonardus, Adrianus, Martinus , DE GROOT, Antonius, Franciscus, Johannes , PIJNENBURG, Johannes, Adrianus, Cornelis, Maria
IPC分类号： G03F7/20
摘要： The invention provides a substrate support (1) for supporting a substrate (W), the support comprising a support body (WT) with a support surface (11) for supporting the substrate and a rotary dither device (50) configured to induce relative rotary dither motion between the substrate and the support surface of the support body around a rotation axis which is perpendicular to the support surface.

10. 发明申请

WO2018072975A1 MOTOR ASSEMBLY, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：电机组件，光刻设备和器件制造方法
公开(公告)号：WO2018072975A1
公开(公告)日：2018-04-26
申请号：PCT/EP2017/074449
申请日：2017-09-27
申请人： ASML NETHERLANDS B.V.
发明人： DUIJSENS, Pim, Jozef, Hendrik , DE GROOT, Antonius, Franciscus, Johannes
IPC分类号： G03F7/20 , H02K41/03 , H02K16/00
摘要： A motor assembly for driving an object in a driving direction is described, the motor assembly comprising: - a plurality of linear motors, each motor configured to generate a driving force in the driving direction, each of the linear motors comprising: - a first electromagnetic assembly and a second electromagnetic assembly, configured to co-operate with the first electromagnetic assembly, for generating the driving force; wherein the first electromagnetic assembly and the second magnetic assembly face each other and define a gap between each other in a direction perpendicular to the driving direction; - a first interface for connecting the first electromagnetic assemblies to a common member; - a second interface for connecting the second electromagnetic assemblies to the object to be driven; wherein the first electromagnetic assemblies and the second electromagnetic assemblies are stacked in the direction perpendicular to the driving direction, and wherein at least one of the first and second interfaces is configured to enable a relative displacement between the respective first electromagnetic assemblies and the second electromagnetic assemblies in the direction perpendicular to the driving direction.
摘要翻译：描述了一种用于在驱动方向上驱动物体的电机组件，该电机组件包括： - 多个线性电机，每个电机被配置为在驱动方向上产生驱动力，每个线性电机线性马达，其包括：第一电磁组件和第二电磁组件，其被配置为与所述第一电磁组件配合以产生所述驱动力; 其中所述第一电磁组件和所述第二磁组件彼此面对并且在垂直于所述驱动方向的方向上限定彼此之间的间隙; - 用于将第一电磁组件连接到公共构件的第一接口; - 用于将第二电磁组件连接到待驱动对象的第二接口; 其中所述第一电磁组件和所述第二电磁组件在垂直于所述驱动方向的方向上堆叠，并且其中所述第一和第二接口中的至少一个被配置为使得所述相应的第一电磁组件和所述第二电磁组件之间的相对位移在垂直于行驶方向的方向上。

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