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1. 发明申请

WO2013113632A3 A STAGE SYSTEM AND A LITHOGRAPHIC APPARATUS 审中-公开
公开(公告)号：WO2013113632A3
公开(公告)日：2013-08-08
申请号：PCT/EP2013/051472
申请日：2013-01-25
申请人： ASML NETHERLANDS B.V. , KONINKLIJKE PHILIPS ELECTRONICS N.V.
发明人： VAN DE VEN, Bastiaan, Lambertus, Wilhelmus , DE GROOT, Antonius, Franciscus, Johannes , VERMEULEN, Johannes, Petrus, Martinus, Bernardus , CADEE, Theodorus, Petrus, Maria , RIJS, Robertus, Mathijs, Gerardus , VAN LIESHOUT, Richard, Henricus, Adrianus
IPC分类号： G03F7/20
摘要： A movable stage system is configured to support an object subjected to a lithography process. A short stroke part (SS) is configured to support the object (W) and a long stroke part (LS) is configured to support the short stroke part. The short stroke part is movable over a relative small range of movement with respect to the long stroke part. The long stroke part is movable over a relative large range of movement with respect to a base support arranged to support the long stroke part. A shielding element (SE) is arranged between the short and long stroke parts. A position control system (PCS) maintains a substantially constant distance between the shielding element and the short stroke part.

2. 发明申请

WO2013098053A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：WO2013098053A1
公开(公告)日：2013-07-04
申请号：PCT/EP2012/074507
申请日：2012-12-05
申请人： ASML NETHERLANDS B.V.
发明人： BUTLER, Hans , BLEEKER, Arno , HENNUS, Pieter , HOEKS, Martinus , HOL, Sven, Antoin, Johan , VAN DER SCHOOT, Harmen , SLAGHEKKE, Bernardus , TINNEMANS, Patricius , VAN DER WIJST, Marc , ZAAL, Koen , CADEE, Theodorus, Petrus, Maria , BEERENS, Ruud , FISCHER, Olof , AANGENENT, Wouter , BOSCH, Niels, Johannes, Maria
IPC分类号： G03F7/20
CPC分类号： G03F7/70258 , G03F7/70275 , G03F7/70366 , G03F7/70391 , G03F7/704 , G03F7/70558 , G03F7/70816 , G03F7/709
摘要： An exposure apparatus (1) including a projection system (12, 14) configured to project a plurality of radiation beams onto a target; a movable frame (8) that is at least rotatable around an axis (10); and an actuator system (11) configured to displace the movable frame to an axis away from an axis corresponding to the geometric center of the movable frame and to cause the frame to rotate around an axis through the center of mass of the frame.
摘要翻译：一种曝光装置（1），包括被配置为将多个辐射束投影到目标上的投影系统（12,14）至少可绕轴线（10）旋转的可移动框架（8）; 以及致动器系统（11），其构造成将可移动框架移动到远离与可移动框架的几何中心对应的轴线的轴线上，并使框架围绕通过框架的质心的轴线旋转。

3. 发明申请

WO2016102131A1 THERMAL CONDITIONIG METHOD 审中-公开
标题翻译：热调节方法
公开(公告)号：WO2016102131A1
公开(公告)日：2016-06-30
申请号：PCT/EP2015/077426
申请日：2015-11-24
申请人： ASML NETHERLANDS B.V.
发明人： CADEE, Theodorus, Petrus, Maria , DE SMET, Benjamin, Joseph , DONDERS, Sjoerd, Nicolaas, Lambertus , VERDONCK, Adrianus, Marinus
IPC分类号： G03F7/20
CPC分类号： G03F7/70875 , F25B39/02 , F25B2339/023 , G02B7/028 , G02B7/1815 , G03F7/708 , G03F7/70808 , G03F7/70858 , G03F7/70891
摘要： A method of thermally conditioning a physical object, comprises: • guiding a two phase cooling medium through a cooling duct (CDU) provided in the physical object (PHO), the cooling duct extending from a supply side (SUS of the physical object where the two phase cooling medium enters the cooling duct, to a discharging side (DIS) of the physical object where the two phase cooling medium discharges from the cooling duct, • the cooling duct comprising a pre heating duct (PDU), a phase transitioning duct (TRA) and a discharging duct (DDU), • wherein the guiding the two phase cooling medium through the cooling duct provided in the physical object comprises: • guiding the two phase cooling medium in a liquid phase via the pre heating duct from the supply side at least partly towards the discharging side of the physical object, the two phase cooling medium being pre-heated in the pre-heating duct; • guiding the two phase cooling medium from the pre heating duct to the phase transitioning duct, the phase transitioning duct extending from the supply side to the discharging side of the physical object, the two phase cooling medium at least partly transitioning from the liquid phase towards a gas phase in the phase transitioning duct; • guiding the two phase cooling medium from the phase transitioning duct to the discharging duct; and • discharging at the discharging side the two phase cooling medium from the discharging duct.
摘要翻译：一种对物理物体进行热调理的方法，包括：•通过设置在物体（PHO）中的冷却管道（CDU）引导两相冷却介质，冷却管道从供应侧（物理物体的SUS 两相冷却介质进入冷却管道，进入物理对象的排放侧（DIS），两相冷却介质从冷却管道排出;•冷却管道包括预热管道（PDU），相变管道 TRA）和排放管道（DDU），其中通过设置在物理对象中的冷却管道引导两相冷却介质包括：•通过预热管道从供应侧引导液相中的两相冷却介质至少部分地朝向物理物体的排出侧，两相冷却介质在预热管道中预热;将两相冷却介质从预热管道引导至相转移离子管，相转变管从物理物体的供给侧延伸到排出侧，两相冷却介质至少部分地从相位向相转变管中的气相转变; •将两相冷却介质从相变管道引导到排放管道; 以及•在排出侧从排放管排出两相冷却介质。

4. 发明申请

WO2013160123A1 LITHOGRAPHIC APPARATUS COMPRISING AN ACTUATOR, AND METHOD FOR PROTECTING SUCH ACTUATOR 审中-公开
标题翻译：包括执行器的平面设备和用于保护执行器的方法
公开(公告)号：WO2013160123A1
公开(公告)日：2013-10-31
申请号：PCT/EP2013/057659
申请日：2013-04-12
申请人： ASML NETHERLANDS B.V.
发明人： CADEE, Theodorus, Petrus, Maria , BROERS, Sander, Christiaan , HOL, Sven, Antoin, Johan , HUANG, Yang-Shan , DE GROOT, Antonius, Franciscus, Johannes , VAN DE VEN, Bastiaan, Lambertus, Wilhelmus, Marinus
IPC分类号： G03F7/20
CPC分类号： G03F7/70766 , G03F7/70533 , G03F7/70758 , G03F7/709
摘要： A lithographic apparatus comprises a system. The system comprises a first part (208), a second part (204) and an energy absorbing element (210). The second part is configured to move relatively to the first part. The system has a gap (216) located between the first part and the second part during an operation mode of the system. The energy absorbing element is for absorbing energy between the first part and the second part when the first part and the second part crash onto each other in a failure mode of the system. The energy absorbing element is outside the gap.
摘要翻译：光刻设备包括一个系统。该系统包括第一部分（208），第二部分（204）和能量吸收元件（210）。第二部分被配置为相对于第一部分移动。该系统在系统的操作模式期间具有位于第一部分和第二部分之间的间隙（216）。当第一部分和第二部分在系统的故障模式下彼此碰撞时，能量吸收元件用于在第一部分和第二部分之间吸收能量。能量吸收元件在间隙之外。

5. 发明申请

WO2013113633A1 LITHOGRAPHIC APPARATUS WITH A METROLOGY SYSTEM FOR MEASURING A POSITION OF A SUBSTRATE TABLE 审中-公开
标题翻译：具有用于测量基板的位置的计量系统的平面设备
公开(公告)号：WO2013113633A1
公开(公告)日：2013-08-08
申请号：PCT/EP2013/051479
申请日：2013-01-25
申请人： ASML NETHERLANDS B.V.
发明人： KOEVOETS, Adrianus, Hendrik , DONDERS, Sjoerd, Nicolaas, Lambertus , CADEE, Theodorus, Petrus, Maria
IPC分类号： G03F7/20
CPC分类号： G03F7/70775 , G03F7/70833 , G03F7/70858
摘要： A lithographic apparatus comprises a substrate table for accommodating a substrate; a projection system for imaging a pattern onto the substrate, and a metrology system for measuring a position of the substrate table with respect to the projection system. The metrology system comprises a metrology frame connected to the projection system, a grid positioned stationary with respect to the metrology frame, and an encoder connected to the substrate table and facing the grid for measuring the position of the substrate table relative to the grid. The metrology frame has a surface oriented towards the substrate table, and the surface has been configured, e.g., by writing or etching, so as to form the grid.
摘要翻译：光刻设备包括用于容纳衬底的衬底台; 用于将图案成像到基板上的投影系统，以及用于测量相对于投影系统的基板台的位置的计量系统。测量系统包括连接到投影系统的计量框架，相对于计量框架静止定位的格栅，以及连接到基板台并面向格栅的编码器，用于测量基板台相对于格栅的位置。测量框架具有朝向衬底台的表面，并且表面已经被配置为例如通过书写或蚀刻来形成网格。

6. 发明申请

WO2016071059A1 THERMAL CONDITIONING FLUID PUMP 审中-公开
标题翻译：热调节流体泵
公开(公告)号：WO2016071059A1
公开(公告)日：2016-05-12
申请号：PCT/EP2015/072940
申请日：2015-10-05
申请人： ASML NETHERLANDS B.V.
发明人： CADEE, Theodorus, Petrus, Maria
IPC分类号： G03F7/20 , F28D15/02 , G02B7/00 , H01L23/473
CPC分类号： G03F7/70891 , F28D15/02 , F28F13/16 , F28F2250/08 , G02B7/008 , G03F7/70875 , G03F7/709
摘要： A pump constructed to pump a two-phase fluid provided with magnetic field responsive particles, comprises a collecting duct constructed to guide the two-phase fluid, a collecting duct magnet system arranged along the collecting duct and configured for generating a magnetic field in at least a part of the collecting duct, a pumping duct constructed to guide the two-phase fluid, a pumping duct inlet being connected to a collecting duct outlet and a pumping duct magnet system arranged along the pumping duct and configured for generating a magnetic field in at least a part of the pumping duct. A pump driver is configured to drive the collecting duct magnet system to generate a spatial repetition of collecting duct magnetic fields moving along a length of the collecting duct, the pump driver further being configured to drive the pumping duct magnet system to generate a spatial repetition of pumping duct magnetic fields moving along a length of the pumping duct. In an embodiment, a magnetic field strength of the pumping duct magnetic field exceeds a magnetic field strength of the collecting duct magnetic fields.
摘要翻译：构造成泵送设置有磁场响应颗粒的两相流体的泵，包括构造成引导两相流体的收集管道，沿着收集管道布置的收集管道磁体系统，并且被配置为至少在至少收集管道的一部分，构造成引导两相流体的泵送管道，连接到收集管道出口的泵送管道入口和沿着泵送管道布置的泵送管道磁体系统，并且被构造成用于在泵送管道的至少一部分。泵驱动器被配置成驱动收集管道磁体系统以产生沿收集管道的长度移动的收集管道磁场的空间重复，泵驱动器还被配置为驱动泵送管道磁体系统以产生空间重复泵送管道磁场沿泵送管道的长度移动。在一个实施例中，泵送管道磁场的磁场强度超过收集管道磁场的磁场强度。

7. 发明申请

WO2016034320A1 SENSOR, OBJECT POSITIONING SYSTEM, LITHOGRAPHIC APPARATUS AND DEVICE DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：传感器，对象定位系统，平面设备和设备设备制造方法
公开(公告)号：WO2016034320A1
公开(公告)日：2016-03-10
申请号：PCT/EP2015/066519
申请日：2015-07-20
申请人： ASML NETHERLANDS B.V.
发明人： AKKERMANS, Johannes, Antonius, Gerardus , BEERENS, Ruud, Antonius, Catharina, Maria , BROERS, Sander, Christiaan , DE BEST, Jeroen Johannes Theodorus Hendrikus , HEEREN, Adrianus, Marinus, Wouter , LEENKNEGT, George, Alois, Leonie , LENSSEN, Bo , SCHELLENS, Hendrikus, Johannes , VAN DER KRIEKEN, Peter , CADEE, Theodorus, Petrus, Maria , VAN EIJK, Jan , VAN LIESHOUT, Richard, Henricus, Adrianus
IPC分类号： G03F7/20 , G01L5/16 , G01P15/09 , G01P15/18 , H01L21/68
CPC分类号： G03F7/70775 , G01L1/16 , G01P15/0915 , G01P15/18 , G03F7/70716 , G03F7/70783 , G03F7/7085
摘要： The invention relates to a sensor (SE) comprising two shear-mode piezoelectric transducers (TR1, TR2), wherein each piezoelectric transducer comprises a bottom surface (BS) and a top surface (TS), wherein the top surfaces of the piezoelectric transducers are rigidly connected to each other, and wherein the bottom surfaces are configured to be attached to an object (OB) to be measured.
摘要翻译：本发明涉及包括两个剪切模式压电换能器（TR1，TR2）的传感器（SE），其中每个压电换能器包括底表面（BS）和顶表面（TS），其中压电换能器的顶表面彼此刚性地连接，并且其中底表面被配置为附接到待测量的物体（OB）。

8. 发明申请

WO2013167463A1 LITHOGRAPHIC APPARATUS 审中-公开
标题翻译： LITHOGRAPHIC设备
公开(公告)号：WO2013167463A1
公开(公告)日：2013-11-14
申请号：PCT/EP2013/059157
申请日：2013-05-02
申请人： ASML NETHERLANDS B.V.
发明人： KOEVOETS, Adrianus, Hendrik , CADEE, Theodorus, Petrus, Maria , SINGH, Harmeet
IPC分类号： G03F7/20
CPC分类号： G03F7/70858 , G03F7/70758
摘要： A lithographic apparatus comprises a first body (B1; MO) comprising a heat source (HS; CL), a second body (B2; ME) and a heater device (HD). The second body has a facing surface (FS) facing the first body via a gap (GA) between the first and second bodies. The heat source is for providing a heat flux to the second body via the gap. The heater device is attached to the facing surface. The heater device is configured to provide a further heat flux to the second body.
摘要翻译：光刻设备包括包括热源（HS; CL），第二主体（B2; ME）和加热器装置（HD）的第一主体（B1; MO）。第二主体具有经由第一和第二主体之间的间隙（GA）面向第一主体的面对表面（FS）。热源用于经由间隙向第二体提供热通量。加热器装置连接到相对表面。加热器装置被配置为向第二主体提供另外的热通量。

9. 发明申请

WO2013117518A2 LITHOGRAPHIC APPARATUS COMPRISING A SUPPORT FOR HOLDING AN OBJECT, AND A SUPPORT FOR USE THEREIN 审中-公开
标题翻译：包含用于保存对象的支持的平面设备及其使用的支持
公开(公告)号：WO2013117518A2
公开(公告)日：2013-08-15
申请号：PCT/EP2013/052154
申请日：2013-02-04
申请人： ASML NETHERLANDS B.V.
发明人： CADEE, Theodorus, Petrus, Maria , BANINE, Vadim, Yevgenyevich , ZAAL, Koen, Jacobus, Johannes, Maria , BADIE, Ramin , SINGH, Harmeet
IPC分类号： G03F7/20
CPC分类号： G03F7/70725 , G03F7/70708 , G03F7/70733 , H01L21/6875
摘要： A lithographic apparatus has a support that is provided with burls for holding an object. The support has been fabricated with a lithographic manufacturing method, e.g., a MEMS-technology, so as to create burls whose orientations or positions are individually electrically controllable.
摘要翻译：光刻设备具有一个支撑件，该支撑件设置有用于保持物体的毛刺。已经利用诸如MEMS技术的光刻制造方法来制造支撑件，以便产生其取向或位置可单独地电可控制的孔。

10. 发明申请

WO2013113634A3 LITHOGRAPHIC APPARATUS COMPONENT AND LITHOGRAPHIC APPARATUS 审中-公开
公开(公告)号：WO2013113634A3
公开(公告)日：2013-08-08
申请号：PCT/EP2013/051480
申请日：2013-01-25
申请人： ASML NETHERLANDS B.V.
发明人： KOEVOETS, Adrianus , DONDERS, Sjoerd , VAN SCHOOT, Jan , ZAAL, Koen , CADEE, Theodorus, Petrus, Maria
IPC分类号： G03F7/20
摘要： A lithographic apparatus component, such as a metrology system or an optical element (e.g., a mirror) is provided with a temperature control system for controlling deformation of the component. The control system includes channels provided close to a surface of the component through which a two phase cooling medium is supplied. The metrology system measures a position of at least a moveable item with respect to a reference position and includes a metrology frame connected to the reference position. An encoder is connected to the moveable item and constructed and arranged to measure a relative position of the encoder with respect to a reference grid. The reference grid may be provided directly on a surface of the metrology frame. A lithographic projection apparatus may have the metrology system for measuring a position of the substrate table with respect to the projection system.

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