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1. 发明申请

WO2008118009A1 CONTAMINATION PREVENTION SYSTEM, LITHOGRAPHIC APPARATUS, RADIATION SOURCE AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：污染防治系统，光刻设备，辐射源及器件制造方法
公开(公告)号：WO2008118009A1
公开(公告)日：2008-10-02
申请号：PCT/NL2008/050160
申请日：2008-03-20
申请人： ASML NETHERLANDS B.V. , WASSINK, Arnoud Cornelis
发明人： WASSINK, Arnoud Cornelis
IPC分类号： G03F7/20 , G21K1/00 , G21K3/00
CPC分类号： G03F7/70916 , B82Y10/00 , G03F7/70033 , G03F7/70883
摘要： The invention relates to a contamination prevention system (71) comprising a rotatable channel barrier (72), which is driven by means of a suitable bearing (73,74). The contamination prevention system (71) according to the invention is arranged with a cooling system (75) provided substantially in a vicinity of the bearing (73). The cooling system (75) may comprise conducts (75a) through which a suitable fluid coolant, notably gas, is provided. It is possible that the gas is supplied via a central channel (79a) provided in a shaft of the contamination prevention system. Additionally, a supplementary cooling system (76) may be provided arranged with suitable conducts (76a). Because this cooling system (76) is arranged on the periphery of the contamination prevention system (71), it may use water as a suitable coolant. The invention further relates to a lithographic projection apparatus, a radiation source and a method of manufacturing an integrated structure.
摘要翻译：本发明涉及一种防污染系统（71），其包括可旋转的通道屏障（72），其通过合适的轴承（73,74）驱动。根据本发明的防污染系统（71）布置有基本上设置在轴承（73）附近的冷却系统（75）。冷却系统（75）可以包括导体（75a），通过该导管（75a）提供合适的流体冷却剂，特别是气体。通过设置在防污染系统的轴中的中心通道（79a）可以供给气体。此外，可以提供布置有适当导体（76a）的辅助冷却系统（76）。由于该冷却系统（76）布置在防污染系统（71）的外围，因此可以使用水作为合适的冷却剂。本发明还涉及光刻投影装置，辐射源和制造集成结构的方法。

2. 发明申请

WO2008072959A3 RADIATION SYSTEM AND LITHOGRAPHIC APPARATUS 审中-公开
公开(公告)号：WO2008072959A3
公开(公告)日：2008-06-19
申请号：PCT/NL2007/050598
申请日：2007-11-27
申请人： ASML NETHERLANDS B.V. , WASSINK, Arnoud Cornelis , BANINE, Vadim Yevgenyevich , IVANOV, Vladimir Vitalevitch , KOSHELEV, Konstantin Nikolaevitch , CADEE, Theodorus Petrus Maria , KRIVTSUN, Vladimir Mihailovitch , KLUNDER, Derk Jan Wilfred , VAN HERPEN, Maarten Marinus Johannes Wilhelmus , BROM, Paul Peter Anna Antonius , SOER, Wouter Anthon , GLUSHKOV, Denis
发明人： WASSINK, Arnoud Cornelis , BANINE, Vadim Yevgenyevich , IVANOV, Vladimir Vitalevitch , KOSHELEV, Konstantin Nikolaevitch , CADEE, Theodorus Petrus Maria , KRIVTSUN, Vladimir Mihailovitch , KLUNDER, Derk Jan Wilfred , VAN HERPEN, Maarten Marinus Johannes Wilhelmus , BROM, Paul Peter Anna Antonius , SOER, Wouter Anthon , GLUSHKOV, Denis
IPC分类号： G03F7/20 , H05G2/00 , G21K1/00
摘要： A radiation system (1) for generating a beam of radiation (2) that defines an optical axis (3) is provided. The radiation system (1) includes a plasma produced discharge source (4) for generating EUV radiation. The discharge source (4) includes a pair of electrodes (5) constructed and arranged to be provided with a voltage difference, and a system for producing a plasma between the pair of electrodes (5) so as to provide a discharge (7) in the plasma between the electrodes (5). The radiation system (1) also includes a debris catching shield (11) for catching debris (8) from the electrodes (5). The debris catching shield (11) is constructed and arranged to shield the electrodes (5) from a line of sight provided in a predetermined spherical angle relative the optical axis (3), and to provide an aperture (12) to a central area (10) between the electrodes (5) in the line of sight.

3. 发明申请

WO2008153389A1 CONTAMINATION PREVENTION SYSTEM, LITHOGRAPHIC APPARATUS, RADIATION SOURCE, AND METHOD FOR MANUFACTURING A DEVICE 审中-公开
标题翻译：污染防治系统，光刻设备，辐射源和制造设备的方法
公开(公告)号：WO2008153389A1
公开(公告)日：2008-12-18
申请号：PCT/NL2008/050371
申请日：2008-06-12
申请人： ASML NETHERLANDS B.V. , BUIS, Edwin Johan , HOOGENDAM, Christiaan Alexander , STRUYCKEN, Alexander Matthijs , WASSINK, Arnoud Cornelis , BIJLAART, Erik Theodorus Maria , BROM, Paul Peter Anna Antonius
发明人： BUIS, Edwin Johan , HOOGENDAM, Christiaan Alexander , STRUYCKEN, Alexander Matthijs , WASSINK, Arnoud Cornelis , BIJLAART, Erik Theodorus Maria , BROM, Paul Peter Anna Antonius
IPC分类号： G03F7/20
CPC分类号： G03F7/70916 , G03F7/709
摘要： A contamination prevention system is constructed and arranged to prevent material from propagating with radiation into a lithographic apparatus. The contamination prevention system includes a rotatable carrier provided with a plurality of generally radially outwardly extending blades. The blades are constructed and arranged to absorb or deflect the material. The system also includes a stationary shaft, and a bearing constructed and arranged to rotate the rotatable carrier and the blades around the shaft. The rotatable carrier is provided with a space for at least partially receiving a portion of the shaft.
摘要翻译：防污染系统被构造和布置成防止材料通过辐射传播到光刻设备中。防污染系统包括设置有多个大致径向向外延伸的叶片的可旋转载体。叶片被构造和布置成吸收或偏转材料。该系统还包括固定轴和构造和布置成使可旋转的载体和叶片围绕轴旋转的轴承。可旋转托架设置有用于至少部分地容纳轴的一部分的空间。

4. 发明公开

EP2092394A2 RADIATION SYSTEM AND LITHOGRAPHIC APPARATUS 审中-公开
标题翻译：辐射系统和设备的光刻
公开(公告)号：EP2092394A2
公开(公告)日：2009-08-26
申请号：EP07834726.7
申请日：2007-11-27
申请人： ASML Netherlands B.V.
发明人： WASSINK, Arnoud Cornelis , BANINE, Vadim Yevgenyevich , IVANOV, Vladimir Vitalevitch , KOSHELEV, Konstantin Nikolaevitch , CADEE, Theodorus Petrus Maria , KRIVTSUN, Vladimir Mihailovitch , KLUNDER, Derk Jan Wilfred , VAN HERPEN, Maarten Marinus Johannes Wilhelmus , BROM, Paul Peter Anna Antonius , SOER, Wouter Anthon , GLUSHKOV, Denis
IPC分类号： G03F7/20 , H05G2/00 , G21K1/00
CPC分类号： G03F7/70933 , G03F7/70858 , G03F7/70883 , G03F7/70916 , G03F7/70925 , G03F7/70983 , H05G2/003 , H05G2/005
摘要： A radiation system (1) for generating a beam of radiation (2) that defines an optical axis (3) is provided. The radiation system (1) includes a plasma produced discharge source (4) for generating EUV radiation. The discharge source (4) includes a pair of electrodes (5) constructed and arranged to be provided with a voltage difference, and a system for producing a plasma between the pair of electrodes (5) so as to provide a discharge (7) in the plasma between the electrodes (5). The radiation system (1) also includes a debris catching shield (11) for catching debris (8) from the electrodes (5). The debris catching shield (11) is constructed and arranged to shield the electrodes (5) from a line of sight provided in a predetermined spherical angle relative the optical axis (3), and to provide an aperture (12) to a central area (10) between the electrodes (5) in the line of sight.

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