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1. 发明申请

WO2022200014A1 DIGITAL HOLOGRAPHIC MICROSCOPE AND ASSOCIATED METROLOGY METHOD 审中-公开
公开(公告)号：WO2022200014A1
公开(公告)日：2022-09-29
申请号：PCT/EP2022/055506
申请日：2022-03-04
申请人： ASML NETHERLANDS B.V. , ASML HOLDING N.V.
发明人： COENE, Willem, Marie, Julia, Marcel , TENNER, Vasco, Tomas , CRAMER, Hugo, Augustinus, Joseph , DEN BOEF, Arie, Jeffrey , KOEK, Wouter , SOKOLOV, Sergei , VAN DE WIJDEVEN, Jeroen, Johan, Maarten , RAUB, Alexander, Kenneth
IPC分类号： G03H1/00 , G03H1/04 , G03H1/08 , G03H1/02 , G03H1/26
摘要： Disclosed is a method of correcting a holographic image, a processing device, a dark field digital holographic microscope, a metrology apparatus and an inspection apparatus. The method comprises obtaining the holographic image; determining at least one attenuation function due to motion blur from the holographic image; and correcting the holographic image or a portion thereof using the at least one attenuation function.

2. 发明申请

WO2021058338A1 METROLOGY SYSTEMS, COHERENCE SCRAMBLER ILLUMINATION SOURCES AND METHODS THEREOF 审中-公开
公开(公告)号：WO2021058338A1
公开(公告)日：2021-04-01
申请号：PCT/EP2020/075785
申请日：2020-09-15
申请人： ASML NETHERLANDS B.V. , ASML HOLDING N.V.
发明人： SETIJA, Irwan, Dani , DEN BOEF, Arie, Jeffrey , SWILLAM, Mohamed , BEUKMAN, Arjan, Johannes, Anton
IPC分类号： G02F1/295 , G02B27/48 , G03F7/20
摘要： A system includes a radiation source and a phased array. The phased array includes optical elements, waveguides and phase modulators. The phased array generates a beam of radiation. The optical elements radiate radiation waves. The waveguides guide radiation from the radiation source to the optical elements. The phase modulators adjust phases of the radiation waves such that the radiation waves accumulate to form the beam. An amount of incoherence of the beam is based on randomization of the phases.

3. 发明申请

WO2016015955A1 ALIGNMENT SENSOR AND LITHOGRAPHIC APPARATUS BACKGROUND 审中-公开
标题翻译：对准传感器和平面设备背景
公开(公告)号：WO2016015955A1
公开(公告)日：2016-02-04
申请号：PCT/EP2015/065412
申请日：2015-07-07
申请人： ASML NETHERLANDS B.V. , ASML HOLDING N.V.
发明人： MATHIJSSEN, Simon, Gijsbert, Josephus , DEN BOEF, Arie, Jeffrey , KREUZER, Justin, Lloyd , TINNEMANS, Patricius, Aloysius, Jacobus
IPC分类号： G03F9/00
CPC分类号： G03F9/7088 , G03F9/7065 , G03F9/7069
摘要： An alignment sensor for a lithographic apparatus is arranged and constructed to measure an alignment of a movable part of the lithographic apparatus in respect of a stationary part of the lithographic apparatus. The alignment sensor comprises a light source configured to generate a pulse train at a optical wavelength and a pulse repetition frequency, a non-linear optical element, arranged in an optical propagation path of the pulse train, the non-linear optical element configured to transform the pulse train at the optical wavelength into a transformed pulse train in an optical wavelength range, an optical imaging system configured to project the transformed pulse train onto an alignment mark comprising a diffraction grating; a detector to detect a diffraction pattern as diffracted by the diffraction grating, and a data processing device configured to derive alignment data from the detected diffraction pattern as detected by the detector.
摘要翻译：用于光刻设备的对准传感器被布置和构造成测量相对于光刻设备的静止部分的光刻设备的可移动部分的对准。对准传感器包括被配置为产生光波长的脉冲串和脉冲重复频率的光源，布置在脉冲串的光传播路径中的非线性光学元件，非线性光学元件被配置为转换将光波长的脉冲序列转换为光波长范围内的变换脉冲序列;配置成将经变换的脉冲串投影到包括衍射光栅的对准标记上的光学成像系统; 检测器，用于检测由衍射光栅衍射的衍射图案;以及数据处理装置，被配置为从检测器检测到的检测到的衍射图案中导出对准数据。

4. 发明申请

WO2021037509A1 ON CHIP SENSOR FOR WAFER OVERLAY MEASUREMENT 审中-公开
公开(公告)号：WO2021037509A1
公开(公告)日：2021-03-04
申请号：PCT/EP2020/072063
申请日：2020-08-05
申请人： ASML HOLDING N.V. , ASML NETHERLANDS B.V.
发明人： SWILLAM, Mohamed , ROUX, Stephen , ELAZHARY, Tamer, Mohamed, Tawfik, Ahmed, Mohamed , DEN BOEF, Arie, Jeffrey
IPC分类号： G03F7/20 , H01L31/0232 , G02B6/42
摘要： A sensor apparatus includes a sensor chip, an illumination system, a first optical system, a second optical system, and a detector system. The illumination system is coupled to the sensor chip and transmits an illumination beam along an illumination path. The first optical system is coupled to the sensor chip and includes a first integrated optic to configure and transmit the illumination beam toward a diffraction target on a substrate, disposed adjacent to the sensor chip, and generate a signal beam including diffraction order sub-beams generated from the diffraction target. The second optical system is coupled to the sensor chip and includes a second integrated optic to collect and transmit the signal beam from a first side to a second side of the sensor chip. The detector system is configured to measure a characteristic of the diffraction target based on the signal beam transmitted by the second optical system.

5. 发明申请

WO2021028292A1 PHASE MODULATORS IN ALIGNMENT TO DECREASE MARK SIZE 审中-公开
公开(公告)号：WO2021028292A1
公开(公告)日：2021-02-18
申请号：PCT/EP2020/072054
申请日：2020-08-05
申请人： ASML NETHERLANDS B.V. , ASML HOLDING N.V.
发明人： BIJNEN, Franciscus, Godefridus, Casper , ERALP, Muhsin , HUISMAN, Simon, Reinald , DEN BOEF, Arie, Jeffrey
IPC分类号： G03F9/00 , G01B9/02
摘要： An alignment apparatus includes an illumination system configured to direct one or more illumination beams towards an alignment target and receive the diffracted beams from the alignment target. The alignment apparatus also includes a self-referencing interferometer configured to generate two diffraction sub-beams, wherein the two diffraction sub-beams are orthogonally polarized, rotated 180 degrees with respect to each other around an alignment axis, and spatially overlapped. The alignment apparatus further includes a beam analyzer configured to generate interference between the overlapped components of the diffraction sub-beams and produce two orthogonally polarized optical branches, and a detection system configured to determine a position of the alignment target based on light intensity measurement of the optical branches, wherein the measured light intensity is temporally modulated by a phase modulator.

6. 发明申请

WO2015051970A1 POLARIZATION INDEPENDENT INTERFEROMETER 审中-公开
标题翻译：极化独立干扰仪
公开(公告)号：WO2015051970A1
公开(公告)日：2015-04-16
申请号：PCT/EP2014/069412
申请日：2014-09-11
申请人： ASML NETHERLANDS B.V. , ASML HOLDING N.V.
发明人： TINNEMANS, Patricius, Aloysius, Jacobus , DEN BOEF, Arie, Jeffrey , KREUZER, Justin , Loyd , MATHIJSSEN, Simon, Gijsbert, Josephus
IPC分类号： G03F9/00
CPC分类号： G03F9/7069 , G01B9/02011 , G01B9/02015 , G01B11/272 , G01B2290/70 , G03F9/7049 , G03F9/7088
摘要： Apparatus, systems, and methods are used for detecting the alignment of a feature on a substrate using a polarization independent interferometer. The apparatus, system, and methods include optical elements that receive light that has diffracted or scattered from a mark on a substrate. The optical elements may split the diffracted light into multiple subbeams of light which are detected by one or more detectors. The diffracted light may be combined optically or during processing after detection. The system may determine alignment and/or overlay based on the received diffracted light having any polarization angle or state.
摘要翻译：装置，系统和方法用于使用偏振无关干涉仪来检测基板上特征的对准。该装置，系统和方法包括从基板上的标记衍射或散射的光的光学元件。光学元件可以将衍射光分成由一个或多个检测器检测的多个子光束。衍射光可以在光学上或在检测后的处理期间组合。该系统可以基于接收到的具有任何偏振角或状态的衍射光来确定对准和/或覆盖。

7. 发明申请

WO2014056708A2 MARK POSITION MEASURING APPARATUS AND METHOD, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：标记位置测量装置和方法，光刻装置和装置制造方法
公开(公告)号：WO2014056708A2
公开(公告)日：2014-04-17
申请号：PCT/EP2013/069664
申请日：2013-09-23
申请人： ASML NETHERLANDS B.V. , ASML HOLDING N.V.
发明人： MATHIJSSEN, Simon, Gijsbert, Josephus , DEN BOEF, Arie, Jeffrey , DRAZKIEWICZ, Stanley , KREUZER, Justin , NIJMEIJER, Gerrit, Johannes
IPC分类号： G03F9/00
CPC分类号： G03F7/70141 , G01B11/14 , G03F9/7069 , G03F9/7088
摘要： An apparatus to measure the position of a mark, the apparatus including an illumination arrangement to direct radiation across a pupil of the apparatus, the illumination arrangement comprising an illumination source to provide multiple-wavelength radiation of substantially equal polarization and a wave plate to alter the polarization of the radiation in dependency of the wavelength, such that radiation of different polarization is supplied; an objective lens to direct radiation on the mark using the radiation supplied by the illumination arrangement while scanning the radiation across the mark in a scanning direction; a radiation processing element to process radiation that is diffracted by the mark and received by the objective lens; and a detection arrangement to detect variation in an intensity of radiation output by the radiation processing element during the scanning and to calculate from the detected variation a position of the mark in at least a first direction of measurement.
摘要翻译：一种用于测量标记位置的装置，该装置包括用于将辐射引导穿过该装置的光瞳的照明装置，所述照明装置包括照明源，以提供基本上相等偏振的多波长辐射和波片，以改变依赖于波长的辐射的极化，使得提供不同极化的辐射; 物镜，用于在扫描方向上扫描横过标记的辐射，使用由照明装置提供的辐射来将辐射引导到标记上; 辐射处理元件，用于处理由所述标记衍射并由所述物镜接收的辐射; 以及检测装置，用于检测在扫描期间由辐射处理元件输出的辐射强度的变化，并且根据检测到的变化来计算至少第一测量方向上的标记的位置。

8. 发明申请

WO2022063508A1 METROLOGY TOOL WITH POSITION CONTROL OF PROJECTION SYSTEM 审中-公开
公开(公告)号：WO2022063508A1
公开(公告)日：2022-03-31
申请号：PCT/EP2021/073400
申请日：2021-08-24
申请人： ASML NETHERLANDS B.V. , ASML HOLDING N.V.
发明人： BUTLER, Hans , DEN BOEF, Arie, Jeffrey , BAGGEN, Mark, Constant, Johannes , RAAYMAKERS, Jeroen, Arnoldus, Leonardus, Johannes , ZIMMERMAN, Richard, Carl
IPC分类号： G03F7/20 , G01N21/956
摘要： Described herein is a metrology tool. The metrology tool includes a substrate table (ST) to hold a substrate (S); a projection system (PS) configured to project a beam on a target portion (TP) of the substrate; an actuator (PEA) configured to adjust a position of the projection system relative to the substrate on the substrate table; a sensor configured to determine a position of the substrate table; and a one or more processors configured to: determine, based on the position of the substrate table, a position error of the substrate table with respect to a reference; and control, via the actuator, a position of the projection system to compensate for the position error of the substrate table so that the beam projects on the target portion of the substrate.

9. 发明申请

WO2022128688A1 METROLOGY METHOD FOR MEASURING AN ETCHED TRENCH AND ASSOCIATED METROLOGY APPARATUS 审中-公开
公开(公告)号：WO2022128688A1
公开(公告)日：2022-06-23
申请号：PCT/EP2021/084830
申请日：2021-12-08
申请人： ASML NETHERLANDS B.V.
发明人： MATHIJSSEN, Simon, Gijsbert, Josephus , DEN BOEF, Arie, Jeffrey
IPC分类号： G03F1/80 , G03F1/84 , G03F7/20 , H01L21/66
摘要： Disclosed is method of determining at least one homogeneity metric describing homogeneity of an etched trench on a substrate formed by a lithographic manufacturing process. The method comprises obtaining one or more images of the etched trench, wherein each of said one or more images comprises a spatial representation of one or more parameters of scattered radiation as detected by a detector or camera following scattering and/or diffraction from the etched trench; and measuring homogeneity along the length of the etched trench on said one or more images to determine said at least one homogeneity metric.

10. 发明申请

WO2020141140A1 METROLOGY METHOD 审中-公开
公开(公告)号：WO2020141140A1
公开(公告)日：2020-07-09
申请号：PCT/EP2019/087015
申请日：2019-12-24
申请人： ASML NETHERLANDS B.V.
发明人： MATHIJSSEN, Simon, Gijsbert, Josephus , NOOT, Marc, Johannes , BHATTACHARYYA, Kaustuve , DEN BOEF, Arie, Jeffrey , GRZELA, Grzegorz , DAVIS, Timothy, Dugan , ZWIER, Olger, Victor , HUIJGEN, Ralph, Timotheus , ENGBLOM, Peter, David , GEMMINK, Jan-Willem
IPC分类号： G03F7/20 , G06T5/00 , G06T5/50
摘要： A method provides the steps of receiving an image from a metrology tool, determining individual units of said image and discriminating the units which provide accurate metrology values. The images are obtained by measuring the metrology target at multiple wavelengths. The discrimination between the units, when these units are pixels in said image, is based on calculating a degree of similarity between said units.

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