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1. 发明申请

WO2007111067A1 METHOD FOR SMOOTHING A SURFACE OF A GLASS SUBSTRATE, AND SUBSTRATE FOR A REFLECTIVE MASK BLANK USED IN EUV LITHOGRAPHY, OBTAINABLE BY THAT METHOD 审中-公开
标题翻译：用于平滑玻璃基板的表面的方法以及用于通过该方法获得的用于在EUV平台中使用的反射掩模层的基板
公开(公告)号：WO2007111067A1
公开(公告)日：2007-10-04
申请号：PCT/JP2007/053440
申请日：2007-02-19
申请人： ASAHI GLASS COMPANY, LIMITED , UNO, Toshiyuki , IKUTA, Yoshiaki , YOKOYAMA, Mika , EBIHARA, Ken
发明人： UNO, Toshiyuki , IKUTA, Yoshiaki , YOKOYAMA, Mika , EBIHARA, Ken
IPC分类号： C03C17/02
CPC分类号： C03C17/02 , B82Y10/00 , B82Y40/00 , C03C17/002 , C03C17/36 , C03C17/3665 , G03F1/24
摘要： ABSTRACT To provide a method for smoothing a surface of a glass substrate having a concave defect, such as a pit or a scratch. A method for smoothing a surface of a glass substrate having a concave defect thereon, comprising: forming a film on the surface of the glass substrate having the concave defect by a dry deposition method, the film comprising a glass material having a fluid point Tf of 150 C or above and of not higher than a strain point Ts ( C) of the glass substrate; and heating the film of the glass material at a temperature of not lower than Tf and not higher than Ts to put the film in such state that the film of the glass material can flow so as to bury the concave defect, followed by cooling the film of the glass material, thereby to smooth the surface of the glass substrate having the concave defect.
摘要翻译：摘要提供一种用于平滑具有诸如凹坑或划痕的凹陷缺陷的玻璃基板的表面的方法。一种用于使其上具有凹陷缺陷的玻璃基板的表面平滑的方法，包括：通过干法沉积法在具有凹陷缺陷的玻璃基板的表面上形成膜，所述膜包括具有流体点Tf的玻璃材料 150℃以上且不高于玻璃基板的应变点Ts（℃）在不低于Tf且不高于Ts的温度下加热玻璃材料的膜以使膜处于玻璃材料的膜可以流动的状态，以便掩埋凹陷缺陷，随后冷却膜从而使具有凹陷缺陷的玻璃基板的表面光滑。

2. 发明申请

WO2007081059A3 REFLECTIVE-TYPE MASK BLANK FOR EUV LITHOGRAPHY 审中-公开
公开(公告)号：WO2007081059A3
公开(公告)日：2007-07-19
申请号：PCT/JP2007/050845
申请日：2007-01-12
申请人： ASAHI GLASS COMPANY, LIMITED , IKUTA, Yoshiaki , UNO, Toshiyuki , EBIHARA, Ken
发明人： IKUTA, Yoshiaki , UNO, Toshiyuki , EBIHARA, Ken
IPC分类号： G03F1/14
摘要： There are provided a substrate with a reflective layer and an EUV mask blank, which can prevent particles from adhering to a surface of the reflective layer or an absorbing layer, or into a reflective layer or an absorbing layer during formation thereof by eliminating electrical connection between a film formed on a front surface of the substrate and a film formed on a rear surface of the substrate. A substrate with a reflective layer, which is usable to fabricate a reflective mask blank for EUV lithography, comprising a chucking layer formed on a rear surface opposite a surface with the reflective layer formed thereon, the chucking layer serving to chuck and support the substrate by an electrostatic chuck, wherein the reflective layer has no electrical connection to the chucking layer.

3. 发明申请

WO2006006635A2 DEFECT REPAIR DEVICE AND DEFECT REPAIR METHOD 审中-公开
标题翻译：缺陷修复装置和缺陷修复方法
公开(公告)号：WO2006006635A2
公开(公告)日：2006-01-19
申请号：PCT/JP2005/012964
申请日：2005-07-07
申请人： ASAHI GLASS COMPANY, LIMITED , IKUTA, Yoshiaki , UNO, Toshiyuki
发明人： IKUTA, Yoshiaki , UNO, Toshiyuki
IPC分类号： H01L21/00
CPC分类号： B82Y40/00 , B82Y10/00 , G03F1/24 , G03F1/72 , G03F1/84 , G03F7/70591 , G03F7/70958 , G21K1/062 , G21K2201/067
摘要： A defect repair device includes a defect inspection unit configured to find a size of a protruding defect on a front surface of a multi-layer film having a rear surface opposite to the front surface, a calculation unit configured to calculate a repair energy so as to repair the protruding defect based on the size of the protruding defect found by the defect inspection unit, an energy supplier, and an energy controller configured to control the energy supplier to supply the repair energy calculated by the calculation unit to a portion in the multi-layer film from the rear surface of the multi-layer film so as to cause a decrease in a volume of the portion and retract the protruding defect into the multi-layer film.
摘要翻译：缺陷修复装置包括：缺陷检查单元，被配置为在具有与前表面相对的后表面的多层膜的前表面上发现突出缺陷的尺寸;计算单元，被配置为计算修复能量，以便基于由缺陷检查单元，能量供应器和能量控制器发现的突出缺陷的尺寸来修复突出缺陷，能量控制器被配置为控制能量供应商将由计算单元计算的修复能量提供给多维度的部分，从多层膜的背面形成多层膜，使得该部分的体积减小并将突出缺陷缩回到多层膜中。

4. 发明申请

WO2008029571A1 QUARTZ GLASS SUBSTRATE AND PROCESS FOR ITS PRODUCTION 审中-公开
标题翻译： QUARTZ玻璃基板及其生产工艺
公开(公告)号：WO2008029571A1
公开(公告)日：2008-03-13
申请号：PCT/JP2007/065109
申请日：2007-07-26
申请人： ASAHI GLASS COMPANY, LIMITED , IKUTA, Yoshiaki , KIKUGAWA, Shinya
发明人： IKUTA, Yoshiaki , KIKUGAWA, Shinya
IPC分类号： C03B19/14 , C03C3/06
CPC分类号： C03B19/1453 , C03B2201/03 , C03B2201/12 , C03C3/06 , C03C2201/11 , C03C2201/12 , C03C2201/23 , Y10T428/166 , Y10T428/249969 , Y10T428/252
摘要： For a substrate having fine convexoconcave patterns on its surface, the dimensions of the convexoconcave patterns in a vertical direction of a quartz glass substrate are controlled to be uniform with extreme accuracy and over the entire substrate surface. The quartz glass substrate is made to have a fictive temperature distribution of at most 4O°C and a halogen concentration of less than 400 ppm, or a fictive temperature distribution of at most 4O°C, a halogen concentration of at least 400ppm and a halogen concentration distribution of at most 400ppm and the etching rate of the surface of the quartz glass substrate is made uniform, whereby the dimensions of the convexoconcave patterns in a vertical direction of the quartz glass substrate are controlled to be uniform with good accuracy and over the entire substrate surface.
摘要翻译：对于在其表面上具有细凹凸图案的基板，石英玻璃基板的垂直方向上的凸凹图案的尺寸被控制为具有极高的精度和整个基板表面的均匀。使石英玻璃基板具有至多40℃的虚拟温度分布和小于400ppm的卤素浓度或至多40℃的假想温度分布，至少400ppm的卤素浓度和卤素浓度分布至多为400ppm，并且石英玻璃基板的表面的蚀刻速率均匀，从而将石英玻璃基板的垂直方向的凸凹图案的尺寸控制为均匀，精度高，整个基材表面。

5. 发明申请

WO2007032504A1 PHOTOMASK, PHOTOMASK MANUFACTURING METHOD, AND PHOTOMASK PROCESSING DEVICE 审中-公开
标题翻译：照相机，照相机制造方法和光电处理装置
公开(公告)号：WO2007032504A1
公开(公告)日：2007-03-22
申请号：PCT/JP2006/318440
申请日：2006-09-11
申请人： ASAHI GLASS COMPANY, LIMITED , IKUTA, Yoshiaki , KOJIMA, Hiroshi , OTSUKA, Kouji
发明人： IKUTA, Yoshiaki , KOJIMA, Hiroshi , OTSUKA, Kouji
IPC分类号： G03F1/14 , G03F7/20
CPC分类号： G03F7/707 , G03F1/60 , G03F7/703 , G03F7/70783
摘要： A photomask is manufactured by a method including providing a substrate having a surface on which a predetermined pattern is to be formed, positioning the substrate in an exposure tool so as to obtain an amount of deformation of the surface due to an external force imposed on the substrate, calculating a target profile of the surface, based on the amount of deformation and a target flatness of the surface, and processing the surface of the substrate so as to make the surface substantially flat when the substrate is positioned in the exposure tool.
摘要翻译：通过包括提供具有要在其上形成预定图案的表面的基板的方法制造光掩模，将基板定位在曝光工具中，以便获得由于施加在其上的外力而导致的表面的变形量基板，基于所述表面的变形量和目标平面度来计算所述表面的目标轮廓，以及当所述基板位于所述曝光工具中时，对所述基板的表面进行处理，以使所述表面基本上平坦。

6. 发明申请

WO2007043488A1 METHOD FOR DEPOSITING MULTILAYER FILM OF MASK BLANK FOR EUV LITHOGRAPHY AND METHOD FOR PRODUCING MASK BLANK FOR EUV LITHOGRAPHY 审中-公开
标题翻译：用于沉积掩膜的多层膜的方法用于EUV层析和用于生成用于EUV层析的掩模层的方法
公开(公告)号：WO2007043488A1
公开(公告)日：2007-04-19
申请号：PCT/JP2006/320143
申请日：2006-10-02
申请人： ASAHI GLASS COMPANY, LIMITED , IKUTA, Yoshiaki , KRICK, David , MA, Hsing, Chign
发明人： IKUTA, Yoshiaki , KRICK, David , MA, Hsing, Chign
IPC分类号： C23C14/46
CPC分类号： C23C14/225 , B82Y10/00 , B82Y40/00 , C23C14/046 , C23C14/46 , G03F1/24 , G03F1/68
摘要： A method for depositing, by ion beam sputtering, a multilayer reflective coating of a reflective mask blank for EUV lithography on a substrate (1) having a concave defect formed thereon, characterized in that the method comprises carrying out ion beam sputtering so that an absolute value of an angle α formed between a normal line (1-1) of a substrate (1) and sputtered particles (2) landing on the substrate is maintained so as to satisfy the formula of 35°≤α≤80° while rotating the substrate about a central axis (3) thereof .
摘要翻译：一种用于在其上形成有凹陷缺陷的衬底（1）上沉积用于EUV光刻的反射掩模板的多层反射涂层的方法，其特征在于，所述方法包括进行离子束溅射使得绝对保持基板（1）的法线（1-1）与着陆在基板上的溅射粒子（2）之间形成的角度α的值，以满足公式35°= a = 80°，同时旋转衬底围绕其中心轴线（3）。

7. 发明申请

WO2005059972A2 SYNTHETIC QUARTZ GLASS FOR OPTICAL MEMBER AND ITS PRODUCTION METHOD 审中-公开
标题翻译：光学会员合成石英玻璃及其制作方法
公开(公告)号：WO2005059972A2
公开(公告)日：2005-06-30
申请号：PCT/JP2004/019443
申请日：2004-12-17
申请人： ASAHI GLASS COMPANY, LIMITED , IKUTA, Yoshiaki , AGATA, Noriyuki
发明人： IKUTA, Yoshiaki , AGATA, Noriyuki
IPC分类号： H01L21/00
CPC分类号： C03C3/06 , C03B19/1453 , C03B2201/03 , C03B2201/04 , C03B2201/07 , C03B2201/075 , C03B2201/12 , C03B2201/21 , C03B2201/23 , C03B2207/36 , Y02P40/57
摘要： A synthetic quartz glass for an optical member which is free from compaction and rarefaction is obtained. A synthetic quartz glass for an optical member to be used for an optical device employing a light having a wavelength of at most 400 nm and at least 170 nm as a light source, which contains substantially no oxygen excess defects, dissolved oxygen molecules nor reduction type defects, which has a chlorine concentration of at most 50 ppm and a OH group concentration of at most 100 ppm, and which contains oxygen deficient defects within a concentration range of at most 5 ~10¿14? defects/cm¿3? and at least 1 ~10¿13? defects/cm¿3?. The fluorine concentration is preferably at most 100 ppm.
摘要翻译：得到不含压实和稀释的用于光学构件的合成石英玻璃。用于光学构件的合成石英玻璃，其用于使用波长最多为400nm且至少170nm的光作为光源的光学元件，其基本上不含氧过剩缺陷，溶解的氧分子或还原型缺陷，其氯浓度最多为50ppm，OH基浓度为至多100ppm，并且在氧浓度范围内至多为5〜10×14×缺陷/ cm 3的含氧缺陷。至少1〜10〜13？缺陷/cm¿3?. 氟浓度优选为100ppm以下。

8. 发明申请

WO2008053705A2 METHOD FOR REMOVING FOREIGN MATTERS FROM SUBSTRATE SURFACE 审中-公开
标题翻译：从基板表面移除外部事项的方法
公开(公告)号：WO2008053705A2
公开(公告)日：2008-05-08
申请号：PCT/JP2007/070214
申请日：2007-10-10
申请人： ASAHI GLASS COMPANY, LIMITED , IKUTA, Yoshiaki
发明人： IKUTA, Yoshiaki
CPC分类号： H01L21/02054 , C03C15/00 , C03C23/0005 , C03C23/0075 , G03F1/82
摘要： To provide a method for removing foreign matters, capable of easily removing inorganic foreign matters strongly attached to the surface of a substrate made of silicon or glass or the surface of an inorganic coating formed on the substrate surface while the increase of the surface roughness is suppressed, and further capable of preventing reattachment of once removed foreign matters to the substrate surface. A method for removing inorganic foreign matters from the surface of a substrate made of silicon or glass or the surface of an inorganic coating formed on the surface of the substrate, which comprises applying a light beam in a wavelength range which makes the light absorption coefficient of at least one of a material of the substrate, a material of the inorganic coating and the inorganic foreign matters be at least 0.01/cm, to the surface of the substrate or to the surface of the inorganic coating in an application amount of at least 10 J/cm 2 in an oxygen- or ozone-containing atmosphere, and exposing the surface of the substrate or the surface of the inorganic coating having a negative surface potential to an acidic solution having a pH≤6.
摘要翻译：提供一种去除异物的方法，其能够容易地除去强度附着在由硅或玻璃制成的基板的表面上的无机异物或在表面粗糙度的增加被抑制时在基板表面上形成的无机涂层的表面并且还能够防止一旦去除的异物重新附着到基板表面。一种从硅或玻璃制成的基板的表面除去无机异物的方法或在基板的表面上形成的无机涂层的表面，该方法包括：将波长范围内的光束施加到使光吸收系数为所述基材的材料，所述无机涂层的材料和所述无机异物中的至少一种与所述基材的表面或所述无机涂层的表面的比例为至少0.01 / cm，涂布量为至少10 在含氧气氛或含臭氧的气氛中的J / cm 2，将底物表面或具有负表面电位的无机涂层的表面暴露于pH = 6的酸性溶液中。

9. 发明申请

WO2005105685A1 OPTICAL MEMBER MADE OF SYNTHETIC QUARTZ GLASS, AND PROCESS FOR ITS PRODUCTION 审中-公开
标题翻译：合成石英玻璃的光学部件及其生产工艺
公开(公告)号：WO2005105685A1
公开(公告)日：2005-11-10
申请号：PCT/JP2005/007281
申请日：2005-04-08
申请人： ASAHI GLASS COMPANY, LIMITED , OGAWA, Tomonori , IKUTA, Yoshiaki , KIKUGAWA, Shinya
发明人： OGAWA, Tomonori , IKUTA, Yoshiaki , KIKUGAWA, Shinya
IPC分类号： C03C3/06
CPC分类号： C03C3/06 , C03C4/0071 , C03C4/0085 , C03C2201/23 , C03C2203/44 , C03C2203/54
摘要： To reduce the change in the refractive index of an irradiated portion of synthetic quartz glass, caused by the irradiation with a high energy light emitted from a light source such as a KrF excimer laser or an ArF excimer laser. A process for producing an optical member made of synthetic quartz glass, wherein the OH group concentration of the optical member is set depending upon the energy density of the laser beam employed, to adjust the ratio R (KJ/cm 2 .ppb) -1 of the change in the refractive index of the optical member to the cumulative irradiation energy (KJ/cm 2 ) by the laser, to be 0≤R≤0.2, thereby to control the change in the refractive index of the optical member made of synthetic quartz glass by the irradiation with a laser beam to be within a predetermined range.
摘要翻译：为了减少由诸如KrF准分子激光器或ArF准分子激光器的光源发射的高能量光的照射引起的合成石英玻璃的照射部分的折射率的变化。一种制造由合成石英玻璃制成的光学部件的方法，其中根据所使用的激光束的能量密度设置光学部件的OH基浓度，以调节比率R（KJ / cm 2）光学构件的折射率相对于激光的累积照射能量（KJ / cm 2）的变化的<-1>为0≤R≤0.2，从而控制折射率的变化通过用激光束照射由合成石英玻璃制成的光学构件的折射率在预定范围内。

10. 发明申请

WO2008047886A1 METHOD OF SMOOTHING SURFACE OF SUBSTRATE FOR EUV MASK BLANK, AND EUV MASK BLANK OBTAINED BY THE METHOD 审中-公开
标题翻译：用于EUV掩蔽层的基板的平滑表面的方法和由方法获得的EUV掩蔽层
公开(公告)号：WO2008047886A1
公开(公告)日：2008-04-24
申请号：PCT/JP2007/070391
申请日：2007-10-12
申请人： ASAHI GLASS CO., LTD. , YOKOYAMA, Mika , IKUTA, Yoshiaki , MATSUMOTO, Katsuhiro
发明人： YOKOYAMA, Mika , IKUTA, Yoshiaki , MATSUMOTO, Katsuhiro
IPC分类号： C03C17/25 , C03C17/36
CPC分类号： C03C17/36 , C03C17/25 , C03C17/3618 , C03C17/3639 , C03C17/3665 , C03C2217/213 , C03C2217/78 , C03C2218/116
摘要： The present invention is to provide a method of smoothing a surface of a substrate for an EUV mask blank, having concave defects such as pits or scratches. The present invention relates to a method of smoothing a surface of a substrate for a reflective mask blank for EUV lithography, comprising applying a solution containing a polysilazane compound to a substrate surface having concave defects, and heating and curing the applied solution to form a silica coating (a coating comprising SiO2 as a main skeleton), thereby smoothing the substrate surface having concave defects.
摘要翻译：本发明是提供一种使EUV掩模坯料的基板的表面光滑的方法，其具有诸如凹坑或划痕的凹陷缺陷。本发明涉及一种平滑用于EUV光刻的反射掩模板的基板表面的方法，包括将含有聚硅氮烷化合物的溶液涂布到具有凹陷缺陷的基板表面上，并加热并固化所施加的溶液以形成二氧化硅涂层（以SiO 2为主要骨架的涂层），从而平滑具有凹陷缺陷的基板表面。

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