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    • 5. 发明专利
    • Polishing method, fabricating method, and polishing device for glass substrate
    • 玻璃基板的抛光方法,制作方法和抛光装置
    • JP2014138973A
    • 2014-07-31
    • JP2013008782
    • 2013-01-21
    • Asahi Glass Co Ltd旭硝子株式会社
    • KIMURA HIROSHIITO MASABUMIYAMAGUCHI RYUTAKANO SHIGEKIEMO HIROYUKI
    • B24B37/34B24B37/015C03C19/00G11B5/84
    • PROBLEM TO BE SOLVED: To provide a glass substrate polishing method and polishing device capable of providing a glass substrate that is excellent in parallelism.SOLUTION: A glass substrate polishing method is characterized in that based on a detection value of a power or current of a motor, which shifts the positions of plural glass substrates abutting against a polishing surface of a surface plate of a polishing device, a polishing condition for the glass substrates is controlled in order to diminish a polishing speed difference on the polishing surface. The polishing device includes the surface plate having the polishing surface, a carrier capable of retaining the plural glass substrates to be polished with the polishing surface, the motor that shifts the relative positions of the polishing surface and the carrier, and a control unit that controls the polishing condition for the glass substrates so as to diminish the polishing speed difference on the polishing surface on the basis of the detection value of the power or current of the motor.
    • 要解决的问题:提供一种能够提供平行度优异的玻璃基板的玻璃基板研磨方法和研磨装置。解决方案:玻璃基板研磨方法的特征在于,基于一个或多个 马达,其移动与抛光装置的表面板的抛光表面抵接的多个玻璃基板的位置,控制玻璃基板的抛光条件,以减少抛光表面上的抛光速度差异。 抛光装置包括具有抛光表面的表面板,能够用抛光表面保持待抛光的多个玻璃基板的载体,移动抛光表面和载体的相对位置的电机以及控制单元 基于电动机的功率或电流的检测值,对玻璃基板的研磨条件进行研磨,以减少研磨面上的研磨速度差。