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1. 发明专利

AT509907T 未知
公开(公告)号：AT509907T
公开(公告)日：2011-06-15
申请号：AT01998181
申请日：2001-11-28
申请人： ASAHI GLASS CO LTD
发明人： ITO MASAHIRO , WATANABE KUNIO , OKAZOE TAKASHI , KANEKO ISAMU , SHIRAKAWA D
IPC分类号： C07C303/22 , C07C51/58 , C07C51/60 , C07C59/135 , C07C309/82
摘要： The present invention provides a process whereby fluorine atom-containing sulfonyl fluoride compound(s) useful as e.g. materials for ion-exchange membranes, can be produced efficiently and at low cost without structural limitations while solving the difficulties in production. Namely, the present invention provides a process which comprises reacting XSO2R -E (1) with R -E (2) to form XSO2R -E-R (3), then reacting (3) with fluorine in a liquid phase to form FSO2R -E -R (4), and further, decomposing the compound to obtain FSO2R -E (5), wherein R is a bivalent organic group, E is a monovalent reactive group, R is a monovalent organic group, E is a monovalent reactive group which is reactive with E , E is a bivalent connecting group formed by the reaction of E with E , R is a bivalent organic group formed by the fluorination of R , etc., R is the same group as R , etc., E is a bivalent connecting group formed by the fluorination of E, etc., E is a monovalent group formed by the decomposition of E , and X is a halogen atom.

2. 发明专利

DE60315085T2 未知
公开(公告)号：DE60315085T2
公开(公告)日：2008-04-10
申请号：DE60315085
申请日：2003-03-03
申请人： ASAHI GLASS CO LTD
发明人： OKADA SHINJI , KAWAGUCHI YASUHIDE , TAKEBE YOKO , KANEKO ISAMU , KODAMA SHUN-ICHI
IPC分类号： G03F7/004 , G03F7/027 , C08F220/10 , G03F7/039 , H01L21/027
摘要： A resist composition comprising the following fluoropolymer (A), an acid-generating compound (B) which generates an acid under irradiation with light and an organic solvent (C): Fluoropolymer (A): a fluoropolymer having blocked acidic groups, which is a fluoropolymer having monomeric units formed by cyclopolymerization of a fluorinated diene of the formula (1) and monomeric units formed by polymerization of an acrylic monomer of the formula (2) and which is, when a copolymer obtained by polymerizing the fluorinated diene of the formula (1) and the acrylic monomer of the formula (2), has no blocked acidic groups, obtained by forming blocked acidic groups in the copolymer: CF2=CR -Q-CR =CH2 wherein each of R and R which are independent of each other, is a hydrogen atom, a fluorine atom, a methyl group or a trifluoromethyl group, and Q is a bivalent organic group which is a blocked acidic group capable of forming an acidic group by an acid, an acidic group, or a group which can be converted to a blocked acidic group and which is other than an acidic group; CH2=CR -CO2R wherein R is a hydrogen atom, a fluorine atom, a methyl group or a trifluoromethyl group, and R is a hydrogen atom, a hydrocarbon group, an organic group having an acidic group, an organic group having a blocked acidic group capable of forming an acidic group by an acid, or an organic group having a group which can be converted to a blocked acidic group and which is other than an acidic group.

3. 发明专利

AU2003277581A1 RESIST COMPOSITION 未知
公开(公告)号：AU2003277581A1
公开(公告)日：2004-06-07
申请号：AU2003277581
申请日：2003-11-06
申请人： ASAHI GLASS CO LTD
发明人： KAWAGUCHI YASUHIDE , KANEKO ISAMU , TAKEBE YOKO , OKADA SHINJI , YOKOKOJI OSAMU
IPC分类号： C08F8/00 , C08F8/02 , C08F14/18 , C08F16/02 , C08F16/24 , C08F36/16 , G03C1/492 , G03F7/004 , G03F7/039 , H01L21/027
摘要： A resist composition which can easily form a resist pattern excellent in transparency for vacuum ultraviolet rays such as an F 2 excimer laser or the like and dry etching characteristics and further excellent in sensitivity, resolution, flatness, thermal resistance and the like, is provided. The resist composition, characterized by comprising (A) a fluorine-containing polymer having an acidic group blocked with a blocking group containing a cycloalkyl group, an organic group having one or more of cycloalkyl groups, a bicycloalkyl group or the like, (B) an acid generating compound capable of generating an acid by irradiation with a light, and (C) an organic solvent.

4. 发明专利

DE69124923T2 未知
公开(公告)号：DE69124923T2
公开(公告)日：1997-07-03
申请号：DE69124923
申请日：1991-11-08
申请人： ASAHI GLASS CO LTD
发明人： KANEKO ISAMU , KAMIYA HIROKI
IPC分类号： C08K5/54 , C08K5/544 , C08L27/16 , C08L83/08 , C08L27/12 , C08K13/02
摘要： A vulcanizable rubber composition comprising: (A) 100 parts by weight of a fluororubber polymer containing at least 10 mol% of vinylidene fluoride as constituting monomer units; (B) from 0.1 to 300 parts by weight of an organic silicon compound having an amino group; and (C) a vulcanizing agent in an amount sufficient to vulcanize Component (A). e

5. 发明专利

SU1727534A3 METHOD OF PRODUCING ALKALI METAL HYDROXIDE SOLUTION 未知
公开(公告)号：SU1727534A3
公开(公告)日：1992-04-15
申请号：SU4028662
申请日：1986-12-12
申请人： ASAHI GLASS CO LTD
发明人： MIYAKE KHARUKHISA , KANEKO ISAMU , VATAKABE ATSUSI
IPC分类号： C08J5/22 , C25B1/46 , C25B9/19 , C25B13/08
摘要： A method for producing an alkali metal hydroxide by electrolysis in an electrolytic cell comprising an anode compartment and a cathode compartment, which comprises supplying an alkali metal chloride to the anode compartment and water or a dilute alkali metal hydroxide to the cathode compartment, wherein a fluorine-containing cation exchange membrane comprising a first outer layer of a perfluorocarbon polymer having -SO₃M groups (wherein M is an alkali metal) with a thickness of at least 5 µm, and a second layer of a perfluorocarbon polymer having -CO₂M groups (wherein M is an alkali metal) and a water content of from 2 to 7% by weight in a 45 wt% NaOH aqueous solution with a thickness of at least 5 µm, the water content of the first layer being higher than that of the second layer, is disposed with the first layer facing the cathode compartment.

6. 发明专利

DE602006014165D1 EINE FLUORSULFONYLGRUPPE ENTHALTENDE VERBINDUNG, VERFAHREN ZU DEREN HERSTELLUNG UND POLYMER DAVON 未知
公开(公告)号：DE602006014165D1
公开(公告)日：2010-06-17
申请号：DE602006014165
申请日：2006-07-26
申请人： ASAHI GLASS CO LTD
发明人： KANEKO ISAMU , WATAKABE ATSUSHI , TAYANAGI JYUNICHI , SAITO SUSUMU
IPC分类号： C07C303/02 , C07C303/22 , C07C309/82 , C08F214/18

7. 发明专利

DE60223654T2 未知
公开(公告)号：DE60223654T2
公开(公告)日：2008-10-30
申请号：DE60223654
申请日：2002-01-31
申请人： ASAHI GLASS CO LTD
发明人： KANEKO ISAMU , OKADA SHINJI , KAWAGUCHI YASUHIDE , TAKEBE YOKO , KODAMA SHUN-ICHI
IPC分类号： G03F7/039 , G03F7/004 , H01L21/027
摘要： To provide a chemical amplification type resist composition which is excellent in transparency to a radiation and in dry etching properties and which gives a resist pattern excellent in sensitivity, resolution, evenness, heat resistance, etc. A resist composition comprising a fluoropolymer (A) which is a fluoropolymer having repeating units formed by cyclopolymerization of a fluorinated diene represented by the formula (1) and which has blocked acidic groups as Q, an acid-generating compound (B) which generates an acid under irradiation with light, and an organic solvent (C): CF2=CR -Q-CR =CH2 wherein each of R and R which are independent of each other, is a hydrogen atom, a fluorine atom, a methyl group or a trifluoromethyl group, and Q is a bivalent organic group having a blocked acidic group capable of forming an acidic group by an acid or a group which can be converted to such a blocked acidic group.

8. 发明专利

DE60123947D1 未知
公开(公告)号：DE60123947D1
公开(公告)日：2006-11-30
申请号：DE60123947
申请日：2001-05-30
申请人： ASAHI GLASS CO LTD
发明人： KASHIWAGI KIMIAKI , OGAWA GEN , SATO MASAKUNI , OHARU KAZUYA , KANEKO ISAMU , SUGIYAMA NORIHIDE , TATEMATSU SHIN
IPC分类号： C07C43/17 , C07C41/24 , C08F16/12 , C08F16/32 , C08G77/00 , G02B6/00 , G02B6/02
摘要： A novel polymer useful as an optical resin material excellent in heat resistance, a novel monomer for obtaining the polymer, etc., are provided. A fluorinated diene represented by CF2=CF(CF2)nC(CF3)ROCF=CF2 (wherein R is a fluorine atom or a trifluoromethyl group, and n is an integer of from 1 to 3), and a polymer thereof.

9. 发明专利

AT289082T 未知
公开(公告)号：AT289082T
公开(公告)日：2005-02-15
申请号：AT01938643
申请日：2001-06-13
申请人： ASAHI GLASS CO LTD
发明人： KANEKO ISAMU , OKADA SHINJI , KAWAGUCHI YASUHIDE , TAKEBE YOKO , KODAMA SYUN-ICHI
IPC分类号： C08L27/12 , C08L29/14 , G03F7/004 , G03F7/039 , H01L21/027
摘要： The following resist composition of chemical amplification type, which is excellent in transparency to light beams and dry etching properties and gives a resist pattern excellent in sensitivity, resolution, evenness, heat resistance, etc. A resist composition which comprises a fluoropolymer (A) comprising monomer units (a) of a fluorovinyl monomer having -CF2-OR (wherein R is a C1-10 alkyl group) and monomer units (b) of an alicyclic ethylenic monomer, an acid-generating compound (B) which generates an acid upon irradiation with light, and an organic solvent (C).

10. 发明专利

DE69124923D1 未知
公开(公告)号：DE69124923D1
公开(公告)日：1997-04-10
申请号：DE69124923
申请日：1991-11-08
申请人： ASAHI GLASS CO LTD
发明人： KANEKO ISAMU , KAMIYA HIROKI
IPC分类号： C08K5/54 , C08K5/544 , C08L27/16 , C08L83/08 , C08L27/12 , C08K13/02
摘要： A vulcanizable rubber composition comprising: (A) 100 parts by weight of a fluororubber polymer containing at least 10 mol% of vinylidene fluoride as constituting monomer units; (B) from 0.1 to 300 parts by weight of an organic silicon compound having an amino group; and (C) a vulcanizing agent in an amount sufficient to vulcanize Component (A). e

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