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1. 发明申请

WO2009109464A1 COATING APPARATUS WITH ROTATION MODULE 审中-公开
标题翻译：涂装装置与旋转模块
公开(公告)号：WO2009109464A1
公开(公告)日：2009-09-11
申请号：PCT/EP2009/051898
申请日：2009-02-18
申请人： APPLIED MATERIALS INC. , BANGERT, Stefan , KOENIG, Michael , SCHUESSLER, Uwe , GERTMANN, Reiner
发明人： BANGERT, Stefan , KOENIG, Michael , SCHUESSLER, Uwe , GERTMANN, Reiner
IPC分类号： C23C14/04 , C23C14/56 , C23C16/04 , C23C16/54 , H01L21/68 , H01L21/00
CPC分类号： C23C14/568 , C23C14/042 , C23C16/042 , C23C16/54 , H01L21/67173 , H01L21/682
摘要： The present invention refers to a method for coating a substrate, a coating apparatus for carrying out the method and a handling module for coating apparatuses. The handling module comprises a moveable support (13) for a substrate to be coated the support being movable between at least two positions. Further, a mask arranging device (415) for at least one of attaching and detaching a mask to the substrate, and a mask alignment device (415) for aligning the mask with respect to the substrate are provided for, wherein the mask alignment device (415) is attached to the movable support (13) so as to be movable together with the support. Alternatively, the handling module comprises a vacuum chamber, a moveable support (13) for a substrate to be coated, the support being arranged in the vacuum chamber and being rotatable between at least two positions, wherein a mask arranging device (415) for at least one of attaching and detaching a mask to the substrate is arranged within the vacuum chamber of the handling module.
摘要翻译：本发明涉及一种基材的涂布方法，实施该方法的涂布装置和涂布装置的处理模块。处理模块包括用于待涂覆的基底的可移动支撑件（13），所述支撑件可在至少两个位置之间移动。此外，提供了一种用于将掩模附着和分离至基板的掩模布置装置（415）和用于使掩模相对于基板对准的掩模对准装置（415），其中，掩模对准装置 415）附接到可动支撑件（13），以便与支撑件一起移动。替代地，处理模块包括真空室，用于待涂覆的基底的可移动支撑件（13），所述支撑件布置在真空室中并且可在至少两个位置之间旋转，其中，在处理模块的真空室内布置有至少一个将掩模附着和分离到基板上。

2. 发明申请

WO2011056403A2 SHADOW MASK ALIGNMENT AND MANAGEMENT SYSTEM 审中-公开
标题翻译： SHADOW面罩对齐与管理系统
公开(公告)号：WO2011056403A2
公开(公告)日：2011-05-12
申请号：PCT/US2010/053067
申请日：2010-10-18
申请人： APPLIED MATERIALS, INC. , KWAK, Byung-Sung, Leo , BANGERT, Stefan , HOFMANN, Ralf , KOENIG, Michael
发明人： KWAK, Byung-Sung, Leo , BANGERT, Stefan , HOFMANN, Ralf , KOENIG, Michael
IPC分类号： H01M10/04 , H01M10/0562 , H01M6/18 , H01G9/025
CPC分类号： H01M6/40 , C23C14/042 , H01M4/02 , H01M4/13 , H01M4/139 , H01M4/5825 , H01M4/621 , H01M4/623 , H01M4/663 , H01M2004/028 , Y02E60/122 , Y10T29/49002 , Y10T29/5313
摘要： A magnetic handling assembly for thin-film processing of a substrate, a system and method for assembling and disassembling a shadow mask to cover a top of a workpiece for exposure to a processing condition. The assembly may include a magnetic handling carrier and a shadow mask disposed over, and magnetically coupled to, the magnetic handling carrier to cover a top of a workpiece that is to be disposed between the shadow mask and the magnetic handling carrier when exposed to a processing condition. A system includes a first chamber with a first support to hold the shadow mask, a second support to hold a handling carrier, and an alignment system to align the shadow mask a workpiece to be disposed between the carrier and shadow mask. The first and second supports are moveable relative to each other.
摘要翻译：用于基板薄膜处理的磁性处理组件，用于组装和拆卸荫罩以覆盖工件顶部以暴露于加工状态的系统和方法。组件可以包括磁性处理载体和荫罩，其设置在磁性处理载体上并且磁耦合到磁性处理载体以覆盖待暴露于加工过程中待设置在荫罩和磁性处理载体之间的工件的顶部条件。系统包括具有用于保持荫罩的第一支撑件的第一室，用于保持处理托架的第二支撑件以及将荫罩对准待设置在承载器和荫罩之间的工件的对准系统。第一和第二支撑件可相对于彼此移动。

3. 发明申请

WO2010106410A1 EVAPORATOR, COATING INSTALLATION, AND METHOD FOR USE THEREOF 审中-公开
标题翻译：蒸发器，涂装安装及其使用方法
公开(公告)号：WO2010106410A1
公开(公告)日：2010-09-23
申请号：PCT/IB2010/000493
申请日：2010-03-10
申请人： APPLIED MATERIALS, INC. , MARTINI, Marcel , GEBELE, Thomas , HOFFMANN, Uwe , BANGERT, Stefan , KOENIG, Michael
发明人： MARTINI, Marcel , GEBELE, Thomas , HOFFMANN, Uwe , BANGERT, Stefan , KOENIG, Michael
IPC分类号： C23C14/24 , H01L21/20 , H05B33/10
CPC分类号： C23C14/243 , C23C14/12 , C23C14/246
摘要： An evaporator for applying vapor to a substrate at a coating rate, the evaporator comprising an evaporator tube (300, 310, 100) having a distribution pipe (100) with at least one nozzle outlet (110), and wherein the evaporator tube includes a pressure measurement device (10, 12), the pressure measurement device comprising an optical diaphragm gauge (10).
摘要翻译：一种用于以涂覆速率将蒸汽施加到基底的蒸发器，所述蒸发器包括具有至少一个喷嘴出口（110）的分配管（100）的蒸发器管（300,310,100），并且其中所述蒸发器管包括压力测量装置（10,12），所述压力测量装置包括光学膜片（10）。

4. 发明申请

WO2019192678A1 APPARATUS AND VACUUM SYSTEM FOR CARRIER ALIGNMENT IN A VACUUM CHAMBER, AND METHOD OF ALIGNING A CARRIER 审中-公开
公开(公告)号：WO2019192678A1
公开(公告)日：2019-10-10
申请号：PCT/EP2018/058469
申请日：2018-04-03
申请人： APPLIED MATERIALS, INC. , HEYMANNS, Matthias , VERCESI, Tommaso , BANGERT, Stefan
发明人： HEYMANNS, Matthias , VERCESI, Tommaso , BANGERT, Stefan
IPC分类号： C23C14/04 , C23C14/56 , C23C16/04 , H01L21/677 , H01L21/68 , C23C16/458 , H01L21/687
摘要： An apparatus (100) for aligning a carrier in a vacuum chamber (101) is described. The apparatus includes a first carrier transport system (120) configured to transport a first carrier (10) along a first transport path in a first direction (X), and an alignment system (130). The alignment system comprises a first mount (152) for mounting the first carrier (10) to the alignment system (130), an alignment device (151) configured to move the first mount (152) in at least one alignment direction, and a first shifting device (141) configured to move the alignment device (151) together with the first mount (152) in a second direction (Z) transverse to the first direction (X). Further, a vacuum system and a method for aligning a carrier are described.

5. 发明申请

WO2017198297A1 APPARATUS AND METHOD FOR TRANSPORTATION OF A DEPOSITION SOURCE 审中-公开
标题翻译：用于运输沉积物源的装置和方法
公开(公告)号：WO2017198297A1
公开(公告)日：2017-11-23
申请号：PCT/EP2016/061141
申请日：2016-05-18
申请人： APPLIED MATERIALS, INC. , BANGERT, Stefan , HEIMEL, Oliver , HAAS, Dieter , VERCESI, Tommaso
发明人： BANGERT, Stefan , HEIMEL, Oliver , HAAS, Dieter , VERCESI, Tommaso
IPC分类号： C23C14/12 , C23C14/24 , C23C14/56 , C23C14/34 , H01L51/00 , H01L51/56
摘要： An apparatus for contactless transportation of a deposition source is provided. The apparatus includes a deposition source assembly. The deposition source assembly includes the deposition source. The deposition source assembly includes a first active magnetic unit. The apparatus includes a guiding structure extending in a source transportation direction. The deposition source assembly is movable along the guiding structure. The first active magnetic unit and the guiding structure are configured for providing a first magnetic levitation force for levitating the deposition source assembly.
摘要翻译：提供了一种用于沉积源的非接触式运输的设备。该设备包括沉积源组件。沉积源组件包括沉积源。沉积源组件包括第一主动磁性单元。该设备包括在源运输方向上延伸的引导结构。沉积源组件可沿着引导结构移动。第一主动磁性单元和引导结构被配置为提供用于悬浮沉积源组件的第一磁悬浮力。

6. 发明申请

WO2017194098A1 METHODS OF OPERATING A DEPOSITION APPARATUS, AND DEPOSITION APPARATUS 审中-公开
标题翻译：操作沉积设备的方法和沉积设备
公开(公告)号：WO2017194098A1
公开(公告)日：2017-11-16
申请号：PCT/EP2016/060440
申请日：2016-05-10
申请人： APPLIED MATERIALS, INC. , DIEGUEZ-CAMPO, Jose Manuel , BANGERT, Stefan , LOPP, Andreas , WURSTER, Harald , HAAS, Dieter
发明人： DIEGUEZ-CAMPO, Jose Manuel , BANGERT, Stefan , LOPP, Andreas , WURSTER, Harald , HAAS, Dieter
IPC分类号： C23C14/12 , C23C14/24 , C23C14/04 , C23C16/44 , C23C16/455 , C23C14/56 , H01L51/56
摘要： A method of operating a deposition apparatus is provided. The method comprises: Deposition of an evaporated source material on a substrate (10) by guiding the evaporated source material from one or more outlets (22) of an evaporation source (20) toward the substrate (10), wherein part of the evaporated source material is blocked by and attaches to a shielding device (30) arranged between the one or more outlets (22) and the substrate (10), followed by a cleaning of the shielding device (30) by at least locally heating the shielding device (30) for releasing at least part of the attached source material from the shielding device (30). According to a further aspect, a deposition apparatus is provided that can be operated according to the described methods.
摘要翻译：提供了一种操作沉积装置的方法。该方法包括：通过将蒸发源材料从蒸发源（20）的一个或多个出口（22）引向衬底（10）而将蒸发源材料沉积在衬底（10）上，其中部分蒸发源材料被设置在一个或多个出口（22）和衬底（10）之间的防护装置（30）阻挡并附接到防护装置（30），接着通过至少局部加热防护装置（30）来清洁防护装置（30）用于从所述防护装置（30）释放至少部分所附着的源材料。根据另一方面，提供了一种可根据所述方法操作的沉积设备。

7. 发明申请

WO2017054890A1 VARIABLE SHAPER SHIELD FOR EVAPORATORS AND METHOD FOR DEPOSITING AN EVAPORATED SOURCE MATERIAL ON A SUBSTRATE 审中-公开
标题翻译：用于蒸发器的可变形状防护罩和在基底上沉积蒸发源材料的方法
公开(公告)号：WO2017054890A1
公开(公告)日：2017-04-06
申请号：PCT/EP2015/072865
申请日：2015-10-02
申请人： APPLIED MATERIALS, INC. , DIEGUEZ-CAMPO, Jose Manuel , BANGERT, Stefan , LANDGRAF, Heike , LOPP, Andreas
发明人： DIEGUEZ-CAMPO, Jose Manuel , BANGERT, Stefan , LANDGRAF, Heike , LOPP, Andreas
IPC分类号： C23C14/24 , C23C14/04 , H01L51/00
CPC分类号： C23C14/24 , C23C14/042 , C23C14/044 , H01L51/0011
摘要： A shielding device (320) for an evaporation source configured to guide evaporated source material through a plurality of outlets distributed along a length direction of the evaporation source. The shielding device including three or more spaced-apart shaper shield segments (325) configured for blocking evaporated source material (312) depending on the emission angle of the plume of evaporated source material from the plurality of outlets in a plane parallel to the length direction of the evaporation source.
摘要翻译：一种用于蒸发源的屏蔽装置（320），其构造成将蒸发的源材料引导通过沿蒸发源的长度方向分布的多个出口。所述屏蔽装置包括三个或更多个间隔开的成形器屏蔽段（325），其构造成用于根据来自多个出口的蒸发源材料的羽流在与长度方向平行的平面中的发射角来阻挡蒸发的源材料（312）的蒸发源。

8. 发明申请

WO2016202387A1 METHOD FOR MEASURING A DEPOSITION RATE AND DEPOSITION RATE CONTROL SYSTEM 审中-公开
标题翻译：测量沉积速率和沉积速率控制系统的方法
公开(公告)号：WO2016202387A1
公开(公告)日：2016-12-22
申请号：PCT/EP2015/063636
申请日：2015-06-17
申请人： APPLIED MATERIALS, INC. , DIEGUEZ-CAMPO, Jose Manuel , LANDGRAF, Heike , KOCH, Thomas , BANGERT, Stefan
发明人： DIEGUEZ-CAMPO, Jose Manuel , LANDGRAF, Heike , KOCH, Thomas , BANGERT, Stefan
IPC分类号： C23C14/24 , C23C14/54 , G05B21/02
CPC分类号： C23C14/24 , C23C14/542 , C23C14/546 , G05B21/02
摘要： A method (100) for measuring a deposition rate of evaporated material is described. The method includes measuring (110) the deposition rate with a time interval ∆T between a first measurement M1 and a second measurement M2, and adjusting (120) the time interval ∆T dependent on the measured deposition rate. Further, a deposition rate control system (200) is described. The deposition rate control system includes a deposition rate measurement assembly (210) for measuring a deposition rate of the evaporated material, and a controller (220) connected to the deposition rate measurement assembly (210) and to an evaporation source (300), wherein the controller is configured to provide a control signal to the deposition rate measurement assembly (210).
摘要翻译：描述了用于测量蒸发材料的沉积速率的方法（100）。该方法包括以第一测量M1和第二测量M2之间的时间间隔ΔT来测量（110）沉积速率，并且根据测量的沉积速率来调整（120）时间间隔ΔT。此外，描述了沉积速率控制系统（200）。沉积速率控制系统包括用于测量蒸发材料的沉积速率的沉积速率测量组件（210）和连接到沉积速率测量组件（210）和蒸发源（300）的控制器（220），其中控制器被配置为向沉积速率测量组件（210）提供控制信号。

9. 发明申请

WO2016087005A1 MATERIAL DEPOSITION SYSTEM AND METHOD FOR DEPOSITING MATERIAL IN A MATERIAL DEPOSITION SYSTEM 审中-公开
标题翻译：材料沉积系统和材料沉积材料沉积材料的方法
公开(公告)号：WO2016087005A1
公开(公告)日：2016-06-09
申请号：PCT/EP2014/076747
申请日：2014-12-05
申请人： APPLIED MATERIALS, INC. , DIEGUEZ-CAMPO, Jose Manuel , BANGERT, Stefan , HEIMEL, Oliver , HAAS, Dieter
发明人： DIEGUEZ-CAMPO, Jose Manuel , BANGERT, Stefan , HEIMEL, Oliver , HAAS, Dieter
IPC分类号： C23C14/12 , C23C14/24 , H05B33/10 , C23C14/56
CPC分类号： C23C14/24 , C23C14/12 , C23C14/568 , H01L51/001
摘要： A vacuum deposition system (300; 400; 500) for depositing material on a substrate (121) is described. The vacuum deposition system (300; 400; 500) includes a vacuum chamber (110) having a chamber volume; and a material deposition arrangement (100) for providing material to be deposited, the material deposition arrangement (100) being located within the vacuum chamber (110) during deposition. The vacuum deposition system further includes a substrate support (126; 600) for supporting a substrate (121) with a substrate size within the vacuum chamber (110). The ratio of chamber volume to substrate size is 15 m or less. Further, a method for depositing a material on a substrate (121) in a vacuum deposition system (300; 400; 500) is described.
摘要翻译：描述了用于在衬底（121）上沉积材料的真空沉积系统（300; 400; 500）。真空沉积系统（300; 400; 500）包括具有室容积的真空室（110）以及用于提供要沉积的材料的材料沉积装置（100），所述材料沉积装置（100）在沉积期间位于真空室（110）内。真空沉积系统还包括用于在真空室（110）内支撑衬底尺寸的衬底（121）的衬底支撑件（126; 600）。室容积与基板尺寸之比为15μm以下。此外，描述了在真空沉积系统（300; 400; 500）中在基板（121）上沉积材料的方法。

10. 发明申请

WO2012170363A2 METHODS OF AND HYBRID FACTORIES FOR THIN-FILM BATTERY MANUFACTURING 审中-公开
标题翻译：薄膜电池制造和混合工艺方法
公开(公告)号：WO2012170363A2
公开(公告)日：2012-12-13
申请号：PCT/US2012/040798
申请日：2012-06-04
申请人： APPLIED MATERIALS, INC. , KWAK, Byung-Sung , BANGERT, Stefan , HAAS, Dieter , NALAMASU, Omkaram
发明人： KWAK, Byung-Sung , BANGERT, Stefan , HAAS, Dieter , NALAMASU, Omkaram
CPC分类号： H01M10/0436 , H01M4/0423 , H01M4/0426 , H01M4/134 , H01M4/1395 , H01M4/382 , H01M6/188 , H01M6/40 , H01M6/50 , H01M10/0404 , H01M10/052 , Y02E60/122 , Y02P70/54
摘要： Methods of and hybrid factories for thin-film battery manufacturing are described. A method includes operations for fabricating a thin-film battery. A hybrid factory includes one or more tool sets for fabricating a thin-film battery. In an example, a hybrid factory layout for lithium-based thin-film battery manufacturing includes a process tool for depositing active layers. The process tool includes a cluster tool for deposition of an active layer. The hybrid factory layout also includes an in-line tool for deposition of an active layer and a lithium evaporation tool having one or more gloveboxes coupling the lithium evaporation tool to the cluster tool and to the in-line tool.
摘要翻译：描述了薄膜电池制造的方法和混合工厂。一种方法包括制造薄膜电池的操作。混合工厂包括一个或多个用于制造薄膜电池的工具组。在一个示例中，用于锂基薄膜电池制造的混合工厂布局包括用于沉积活性层的处理工具。该工艺工具包括用于沉积有源层的簇工具。混合工厂布局还包括用于沉积活性层的在线工具和具有将锂蒸发工具耦合到簇工具和直列工具的一个或多个手套箱的锂蒸发工具。

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