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1. 发明申请

WO2012021215A3 APPARATUS AND METHOD FOR TEMPERATURE CONTROL DURING POLISHING 审中-公开
标题翻译：在抛光过程中用于温度控制的装置和方法
公开(公告)号：WO2012021215A3
公开(公告)日：2012-04-12
申请号：PCT/US2011040630
申请日：2011-06-16
申请人： APPLIED MATERIALS INC , CHEN HUNG CHIH , HSU SAMUEL CHU-CHIANG , DANDAVATE GAUTAM SHASHANK , KOOSAU DENIS M
发明人： CHEN HUNG CHIH , HSU SAMUEL CHU-CHIANG , DANDAVATE GAUTAM SHASHANK , KOOSAU DENIS M
IPC分类号： H01L21/304
CPC分类号： B24B37/30 , B24B37/015
摘要： Embodiments of the present invention relate to apparatus and method for improve uniformity of a polishing process. Embodiments of the present invention provide a heating mechanism configured to apply thermal energy to a perimeter of a substrate during polishing, or a cooling mechanism configured to cool a central region of the substrate during polishing, or a biased heating mechanism configured to create a temperature step differential on a given radius of a polishing pad.
摘要翻译：本发明的实施例涉及用于改善抛光工艺的均匀性的设备和方法。本发明的实施例提供了一种加热机构，该加热机构被配置为在抛光期间将热能施加到基板的周边，或者被配置为在抛光期间冷却基板的中心区域的冷却机构，或者被配置为产生温度阶跃的偏置加热机构抛光垫给定半径上的差异。

2. 发明申请

WO2012019144A3 SUBSTRATE EDGE TUNING WITH RETAINING RING 审中-公开
标题翻译：带有挡边的基板边缘调整
公开(公告)号：WO2012019144A3
公开(公告)日：2012-06-07
申请号：PCT/US2011046828
申请日：2011-08-05
申请人： APPLIED MATERIALS INC , CHEN HUNG CHIH , HSU SAMUEL CHU-CHIANG , YUAN YIN , ZHANG HUANBO , DANDAVATE GAUTAM SHASHANK , SILVETTI MARIO DAVID
发明人： CHEN HUNG CHIH , HSU SAMUEL CHU-CHIANG , YUAN YIN , ZHANG HUANBO , DANDAVATE GAUTAM SHASHANK , SILVETTI MARIO DAVID
IPC分类号： H01L21/304
CPC分类号： B24B41/06 , B24B37/32 , B24B41/067
摘要： A carrier head for a chemical mechanical polisher includes base, a substrate mounting surface, an annular inner ring, and an annular outer ring. The inner ring has an inner surface configured to circumferentially surround the edge of a substrate positioned on the substrate mounting surface, an outer surface, and a lower surface to contact a polishing pad. The inner ring is vertically movable relative to the substrate mounting surface. The outer ring has an inner surface circumferentially surrounding the inner ring, an outer surface, and a lower surface to contact the polishing pad. The outer ring is vertically movable relative to and independently of the substrate mounting surface and the inner ring. The lower surface of the inner ring has a first width, and the lower surface of the outer ring has a second width greater than the first width.
摘要翻译：用于化学机械抛光机的载具头包括基座，基板安装表面，环形内环和环形外环。内环具有构造为沿周向环绕定位在基板安装表面上的基板的边缘，外表面和接触抛光垫的下表面的内表面。内环相对于基板安装表面可垂直移动。外环具有周向围绕内环的内表面，外表面和接触抛光垫的下表面。外环相对于并独立于基板安装表面和内环可垂直移动。内圈的下表面具有第一宽度，并且外圈的下表面具有大于第一宽度的第二宽度。

3. 发明专利

SG187782A1 SUBSTRATE EDGE TUNING WITH RETAINING RING 未知
公开(公告)号：SG187782A1
公开(公告)日：2013-03-28
申请号：SG2013009766
申请日：2011-08-05
申请人： APPLIED MATERIALS INC
发明人： CHEN HUNG CHIH , HSU SAMUEL CHU-CHIANG , YUAN YIN , ZHANG HUANBO , DANDAVATE GAUTAM SHASHANK , SILVETTI MARIO DAVID
摘要： A carrier head for a chemical mechanical polisher includes base, a substrate mounting surface, an annular inner ring, and an annular outer ring. The inner ring has an inner surface configured to circumferentially surround the edge of a substrate positioned on the substrate mounting surface, an outer surface, and a lower surface to contact a polishing pad. The inner ring is vertically movable relative to the substrate mounting surface. The outer ring has an inner surface circumferentially surrounding the inner ring, an outer surface, and a lower surface to contact the polishing pad. The outer ring is vertically movable relative to and independently of the substrate mounting surface and the inner ring. The lower surface of the inner ring has a first width, and the lower surface of the outer ring has a second width greater than the first width.

4. 发明专利

SG11201608293YA RETAINING RING HAVING INNER SURFACES WITH FACETS 未知
公开(公告)号：SG11201608293YA
公开(公告)日：2016-11-29
申请号：SG11201608293Y
申请日：2015-04-15
申请人： APPLIED MATERIALS INC
发明人： OH JEONGHOON , ZUNIGA STEVEN M , NAGENGAST ANDREW J , HSU SAMUEL CHU-CHIANG , DANDAVATE GAUTAM SHASHANK
IPC分类号： H01L21/304
摘要： A retaining ring comprises a generally annular body. The body comprises a top surface, a bottom surface, an outer surface connected to the top surface at an outer top perimeter and the bottom surface at an outer bottom perimeter, and an inner surface connected to the top surface at an inner top perimeter and the bottom surface at an inner bottom perimeter. The inner surface comprises seven or more planar facets. Adjacent planar facets are connected at corners. The inner bottom perimeter comprises straight edges of the planar facets connected at the corners.

5. 发明专利

SG10201506082UA SUBSTRATE EDGE TUNING WITH RETAINING RING 未知
公开(公告)号：SG10201506082UA
公开(公告)日：2015-09-29
申请号：SG10201506082U
申请日：2011-08-05
申请人： APPLIED MATERIALS INC
发明人： CHEN HUNG CHIH , HSU SAMUEL CHU-CHIANG , YUAN YIN , ZHANG HUANBO , DANDAVATE GAUTAM SHASHANK , SILVETTI MARIO DAVID
摘要： A carrier head for a chemical mechanical polisher includes base, a substrate mounting surface, an annular inner ring, and an annular outer ring. The inner ring has an inner surface configured to circumferentially surround the edge of a substrate positioned on the substrate mounting surface, an outer surface, and a lower surface to contact a polishing pad. The inner ring is vertically movable relative to the substrate mounting surface. The outer ring has an inner surface circumferentially surrounding the inner ring, an outer surface, and a lower surface to contact the polishing pad. The outer ring is vertically movable relative to and independently of the substrate mounting surface and the inner ring. The lower surface of the inner ring has a first width, and the lower surface of the outer ring has a second width greater than the first width.

6. 发明专利

SG10202108096RA RETAINING RING HAVING INNER SURFACES WITH FEATURES 未知
公开(公告)号：SG10202108096RA
公开(公告)日：2021-08-30
申请号：SG10202108096R
申请日：2016-05-27
申请人： APPLIED MATERIALS INC
发明人： REEDY STEVEN MARK , YAVELBERG SIMON , OH JEONGHOON , ZUNIGA STEVEN M , NAGENGAST ANDREW J , HSU SAMUEL CHU-CHIANG , DANDAVATE GAUTAM SHASHANK
摘要： Some implementations of a retaining ring has an inner surface having a first portion formed of multiple planar facets and a second portion that adjoins the first portion along a boundary and includes a frustoconical surface that is sloped downwardly from outside in. Some implementations of the retaining ring have a crenellated or serpentine inner surface, and/or an inner surface with alternating region of different surface properties or different tilt angles.

7. 发明专利

SG11201708368UA RETAINING RING HAVING INNER SURFACES WITH FEATURES 未知
公开(公告)号：SG11201708368UA
公开(公告)日：2017-12-28
申请号：SG11201708368U
申请日：2016-05-27
申请人： APPLIED MATERIALS INC
发明人： REEDY STEVEN MARK , YAVELBERG SIMON , OH JEONGHOON , ZUNIGA STEVEN M , NAGENGAST ANDREW J , HSU SAMUEL CHU-CHIANG , DANDAVATE GAUTAM SHASHANK
IPC分类号： B24B37/32 , B24B41/06 , H01L21/304 , H01L21/306
摘要： Some implementations of a retaining ring has an inner surface having a first portion formed of multiple planar facets and a second portion that adjoins the first portion along a boundary and includes a frustoconical surface that is sloped downwardly from outside in. Some implementations of the retaining ring have a crenellated or serpentine inner surface, and/or an inner surface with alternating region of different surface properties or different tilt angles.

8. 发明申请

WO2014014661A1 SENSORS IN CARRIER HEAD OF A CM P SYSTEM 审中-公开
标题翻译：传感器在CM P系统的载体头
公开(公告)号：WO2014014661A1
公开(公告)日：2014-01-23
申请号：PCT/US2013049169
申请日：2013-07-02
申请人： APPLIED MATERIALS INC
发明人： CMMISF E HUNG CHIH , DANDAVATE GAUTAM SHASHANK , HSU SAMUEL CHU CHIANG , KOOSAU DENIS M
IPC分类号： H01L21/304 , H01L21/66
CPC分类号： B24B37/30 , B24B37/015
摘要： Sensors can be located in a carrier head for a chemical mechanical polishing system. In some implementations the carrier head includes a flexible membrane, and a thermocouple is positioned on the lower surface of the flexible membrane or embedded in the flexible membrane adjacent the lower surface. In some implementations, the carrier head optical sensor is secured to the head and positioned to sense a reflectivity of a spot on a back surface of a substrate held in the carrier head, and a controller is configured to receive a signal from the optical sensor and determine precession of the substrate based on the signal.
摘要翻译：传感器可以位于用于化学机械抛光系统的载体头中。在一些实施方案中，载体头包括柔性膜，并且热电偶位于柔性膜的下表面上或嵌入在柔性膜中邻近下表面。在一些实施方案中，载体头部光学传感器被固定到头部并被定位成感测保持在载体头部中的基底的背面上的斑点的反射率，并且控制器被配置为从光学传感器接收信号，基于信号确定基板的进动。

9. 发明公开

EP2601677A4 SUBSTRATE EDGE TUNING WITH RETAINING RING 有权
标题翻译：亚特兰蒂斯伯恩麻醉药EINEM HALTERING
公开(公告)号：EP2601677A4
公开(公告)日：2015-05-27
申请号：EP11815393
申请日：2011-08-05
申请人： APPLIED MATERIALS INC
发明人： CHEN HUNG CHIH , HSU SAMUEL CHU-CHIANG , YUAN YIN , ZHANG HUANBO , DANDAVATE GAUTAM SHASHANK , SILVETTI MARIO DAVID
IPC分类号： H01L21/304 , B24B37/32 , B24B41/06
CPC分类号： B24B41/06 , B24B37/32 , B24B41/067
摘要： A carrier head for a chemical mechanical polisher includes base, a substrate mounting surface, an annular inner ring, and an annular outer ring. The inner ring has an inner surface configured to circumferentially surround the edge of a substrate positioned on the substrate mounting surface, an outer surface, and a lower surface to contact a polishing pad. The inner ring is vertically movable relative to the substrate mounting surface. The outer ring has an inner surface circumferentially surrounding the inner ring, an outer surface, and a lower surface to contact the polishing pad. The outer ring is vertically movable relative to and independently of the substrate mounting surface and the inner ring. The lower surface of the inner ring has a first width, and the lower surface of the outer ring has a second width greater than the first width.
摘要翻译：用于化学机械抛光机的载体头包括基底，基底安装表面，环形内环和环形外环。所述内圈具有内表面，所述内表面被构造为围绕位于所述基板安装表面上的基板的边缘，外表面和与所述抛光垫接触的下表面。内环可相对于基板安装表面垂直移动。外环具有周向包围内环的内表面，外表面和与抛光垫接触的下表面。外环可以相对于衬底安装表面和内环独立地上下移动。内圈的下表面具有第一宽度，并且外环的下表面具有大于第一宽度的第二宽度。

10. 发明公开

EP3134915A4 RETAINING RING HAVING INNER SURFACES WITH FACETS 有权
公开(公告)号：EP3134915A4
公开(公告)日：2017-12-13
申请号：EP15783681
申请日：2015-04-15
申请人： APPLIED MATERIALS INC
发明人： OH JEONGHOON , ZUNIGA STEVEN M , NAGENGAST ANDREW J , HSU SAMUEL CHU-CHIANG , DANDAVATE GAUTAM SHASHANK
IPC分类号： B24B37/32 , B24B37/04
CPC分类号： H01L21/3212 , B24B37/04 , B24B37/32 , B24B41/06
摘要： A retaining ring comprises a generally annular body. The body comprises a top surface, a bottom surface, an outer surface connected to the top surface at an outer top perimeter and the bottom surface at an outer bottom perimeter, and an inner surface connected to the top surface at an inner top perimeter and the bottom surface at an inner bottom perimeter. The inner surface comprises seven or more planar facets. Adjacent planar facets are connected at corners. The inner bottom perimeter comprises straight edges of the planar facets connected at the corners.

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