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1. 发明专利

JP2010251710A Sensor system for semiconductor manufacturing apparatus 有权
标题翻译：用于半导体制造设备的传感器系统
公开(公告)号：JP2010251710A
公开(公告)日：2010-11-04
申请号：JP2010016870
申请日：2010-01-28
申请人： Applied Materials Inc , アプライドマテリアルズインコーポレイテッドApplied Materials,Incorporated
发明人： SCHAUER RONALD VERN , DASCOLI RAPHAEL , BHARGAVA SHIVAN
IPC分类号： H01L21/683 , H01L21/02
CPC分类号： H01L21/67259 , C23C14/505 , G01P3/00 , G01P13/00 , G05B19/418 , G05B2219/45031 , H01L21/67115 , H01L21/681 , H01L21/6838 , H01L21/68764 , H01L21/68792
摘要： PROBLEM TO BE SOLVED: To reduce unevenness of substrates which may cause problems as devices decrease in size. SOLUTION: A chamber monitoring system may include a parallel architecture in which a single sensor control system is coupled to a number of different processing chamber control board sensor lines. A single rotation sensor such as a tachometer may reside in a central control unit remote from the processing chambers such that rotation data may be processed by a single system and thereafter routed according to a variety of different network communication protocols to the main system controller or a factory interface, or both of them. Pull-up networks in the central control unit and the chamber control boards are matched so as to reduce electrical signal anomalies such as crowbar effects. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：为了减少当装置尺寸减小时可能引起问题的基板的不均匀性。解决方案：腔室监视系统可以包括并行架构，其中单个传感器控制系统耦合到多个不同的处理室控制板传感器线路。诸如转速计的单个旋转传感器可以驻留在远离处理室的中央控制单元中，使得旋转数据可以由单个系统处理，然后根据各种不同的网络通信协议被路由到主系统控制器或工厂界面或两者。中央控制单元和室控制板上的上拉网络匹配，以减少电信号异常，如撬棍效应。版权所有（C）2011，JPO＆INPIT

2. 发明专利

SG11201606082WA SMART CHAMBER AND SMART CHAMBER COMPONENTS 未知
公开(公告)号：SG11201606082WA
公开(公告)日：2016-09-29
申请号：SG11201606082W
申请日：2015-02-16
申请人： APPLIED MATERIALS INC
发明人： BINNS SIMON NICHOLAS , WEST BRIAN T , SCHAUER RONALD VERN , JOHNSON ROGER M , COX MICHAEL S
IPC分类号： H01L21/02 , H01L21/203
摘要： A process chamber includes a chamber body having a chamber lid assembly disposed thereon, one or more monitoring devices coupled to the chamber lid assembly, and one or more antennas disposed adjacent to the chamber lid assembly that are in communication with the one or more monitoring devices.

3. 发明专利

SG11201404726TA ENHANCED RE-HOSTING CAPABILITY FOR LEGACY HARDWARE AND SOFTWARE 未知
公开(公告)号：SG11201404726TA
公开(公告)日：2014-09-26
申请号：SG11201404726T
申请日：2013-02-20
申请人： APPLIED MATERIALS INC
发明人： SCHAUER RONALD VERN , COVINGTON MARK ROGER , KUMARASWAMI SURESH , PURI AMITABH
IPC分类号： G06F13/14 , G06F9/44

4. 发明申请

WO2010048379A3 REMOTE ACCESS GATEWAY FOR SEMICONDUCTOR PROCESSING EQUIPMENT 审中-公开
标题翻译：用于半导体加工设备的远程访问网关
公开(公告)号：WO2010048379A3
公开(公告)日：2010-07-15
申请号：PCT/US2009061630
申请日：2009-10-22
申请人： APPLIED MATERIALS INC , SCHAUER RONALD VERN
发明人： SCHAUER RONALD VERN
IPC分类号： H01L21/00 , G06F3/01 , H01L21/02
CPC分类号： G05B19/409
摘要： An apparatus for providing an interface for semiconductor processing equipment is disclosed. In some embodiments, an apparatus for providing an interface for semiconductor processing equipment having an interface card includes a display logic subsystem to provide an interface to one or more devices such as video and information displays, light pens, keyboards, computer mice, and warning light networks and alarms via a data and control bus; a bridge to provide access to the data and control bus; and a local computer subsystem coupled to the bridge and the display logic subsystem, wherein the local computer subsystem provides access to one or more remote devices.
摘要翻译：公开了一种用于提供半导体处理设备的接口的设备。在一些实施例中，用于提供具有接口卡的半导体处理设备的接口的设备包括显示逻辑子系统，以提供与一个或多个设备的接口，诸如视频和信息显示器，光笔，键盘，计算机鼠标和警告灯网络和报警通过数据和控制总线; 提供对数据和控制总线的访问的桥梁; 以及耦合到所述桥和所述显示逻辑子系统的本地计算机子系统，其中所述本地计算机子系统提供对一个或多个远程设备的访问。

5. 发明公开

EP3117449A4 SMART CHAMBER AND SMART CHAMBER COMPONENTS 有权
标题翻译： INTELLIGENTE KAMMER UND KOMPONENTEN DER INTELLIGENTEN KAMMER
公开(公告)号：EP3117449A4
公开(公告)日：2017-08-23
申请号：EP15762097
申请日：2015-02-16
申请人： APPLIED MATERIALS INC
发明人： BINNS SIMON NICHOLAS , WEST BRIAN T , SCHAUER RONALD VERN , JOHNSON ROGER M , COX MICHAEL S
IPC分类号： H01L21/02 , H01J37/32 , H01J37/34 , H01L21/203
CPC分类号： H01J37/3476 , H01J37/32935 , H01J37/3405 , H01J37/3414 , H01J37/3479
摘要： A process chamber includes a chamber body having a chamber lid assembly disposed thereon, one or more monitoring devices coupled to the chamber lid assembly, and one or more antennas disposed adjacent to the chamber lid assembly that are in communication with the one or more monitoring devices.
摘要翻译：处理腔室包括腔室主体，腔室主体具有设置在腔室盖组件上的腔室盖组件，耦合到腔室盖组件的一个或多个监测装置以及邻近腔室盖组件布置的一个或多个天线，所述天线与一个或多个监测装置。

6. 发明公开

EP2817720A4 ENHANCED RE-HOSTING CAPABILITY FOR LEGACY HARDWARE AND SOFTWARE 有权
标题翻译：改进RE托管能力为老年硬件和软件
公开(公告)号：EP2817720A4
公开(公告)日：2016-03-16
申请号：EP13751134
申请日：2013-02-20
申请人： APPLIED MATERIALS INC
发明人： SCHAUER RONALD VERN , COVINGTON MARK ROGER , KUMARASWAMI SURESH , PURI AMITABH
IPC分类号： G06F13/10 , G06F9/44 , H01L21/67
CPC分类号： G05B19/02 , G06F13/105 , H01L21/67253 , H02J4/00
摘要： Embodiments of the invention are directed toward systems and methods that execute legacy semiconductor applications using a non-legacy controller. In some embodiments a hardware abstraction layer and/or an emulator can be used to provide communication between a non-legacy operating system and legacy components including legacy applications. In some embodiments various methods and/or devices can be used to emulate and/or translate communications between legacy and non-legacy components.

7. 发明申请

WO2011100293A3 PROCESS CHAMBER GAS FLOW IMPROVEMENTS 审中-公开
标题翻译：过程气室流量改进
公开(公告)号：WO2011100293A3
公开(公告)日：2011-12-15
申请号：PCT/US2011024153
申请日：2011-02-09
申请人： APPLIED MATERIALS INC , DETMAR STANLEY , WEST BRIAN T , SCHAUER RONALD VERN
发明人： DETMAR STANLEY , WEST BRIAN T , SCHAUER RONALD VERN
IPC分类号： H01L21/3065
CPC分类号： H01J37/32449 , H01J37/321 , H01J37/3244 , H01J2237/334
摘要： Embodiments of the present invention generally provide plasma etch process chamber improvements. An improved gas injection nozzle is provided for use at a central location of the lid of the chamber. The gas injection nozzle may be used in an existing plasma etch chamber and is configured to provide a series of conic gas flows across the surface of a substrate positioned within the chamber. In one embodiment, an improved exhaust kit for use in the plasma etch chamber is provided. The exhaust kit includes apparatus that may be used in an existing plasma etch chamber and is configured to provide annular flow of exhaust gases from the processing region of the chamber.
摘要翻译：本发明的实施例通常提供等离子体蚀刻处理室的改进。提供了一种改进的气体注入喷嘴，用于在室的盖的中心位置。气体注入喷嘴可以用于现有的等离子体蚀刻室，并且被配置为提供跨过位于腔室内的衬底的表面的一系列圆锥气流。在一个实施例中，提供了一种用于等离子体蚀刻室中的改进的排气套件。排气套件包括可用于现有等离子体蚀刻室中并且被配置为提供来自腔室的处理区域的排气的环形流的装置。

8. 发明申请

WO2010042660A2 METHOD AND APPARATUS FOR DETECTING AN IDLE MODE OF PROCESSING EQUIPMENT 审中-公开
标题翻译：检测加工设备空闲模式的方法和装置
公开(公告)号：WO2010042660A2
公开(公告)日：2010-04-15
申请号：PCT/US2009059899
申请日：2009-10-07
申请人： APPLIED MATERIALS INC , SCHAUER RONALD VERN
发明人： SCHAUER RONALD VERN
IPC分类号： H01L21/66
CPC分类号： G05B19/41865 , G05B2219/31455 , G05B2219/34306 , G05B2219/45031 , Y02P70/163 , Y02P90/20
摘要： Methods and apparatus for detecting an idle mode of processing equipment are provided herein. In some embodiments, an apparatus for monitoring a processing system may include a first system adapter for monitoring a first process chamber and determining a state thereof; and a first support adapter for communicating with the first system adapter and a first support system coupled to the first process chamber, the support adapter configured to communicate a readiness to operate the first support system at a low power mode to a controller of the support system in response to the state of the first process chamber being in an idle mode.
摘要翻译：本文提供了用于检测处理设备的空闲模式的方法和装置。在一些实施例中，用于监视处理系统的装置可以包括用于监视第一处理室并确定其状态的第一系统适配器; 以及用于与所述第一系统适配器通信的第一支撑适配器和耦合到所述第一处理室的第一支撑系统，所述支撑适配器被配置为将所述第一支撑系统以低功率模式操作的准备状态传送到所述支撑系统的控制器响应于第一处理室处于空闲模式的状态。

9. 发明申请

WO03079412A9 FACILITIES CONNECTION BUCKET FOR PRE-FACILITATION OF WAFER FABRICATION EQUIPMENT 审中-公开
标题翻译：设备制造设备预先安装的设施
公开(公告)号：WO03079412A9
公开(公告)日：2004-04-01
申请号：PCT/US0304219
申请日：2003-02-12
申请人： APPLIED MATERIALS INC
发明人： SCHAUER RONALD VERN
IPC分类号： B23Q1/01 , H01L21/00
CPC分类号： H01L21/67196 , B23Q1/01 , H01L21/67017
摘要： The present invention provides a standardized facilities box having a mechanism for mounting the box to a support pedestal of a semiconductor fabrication facility (i.e., a pedestal for supporting a semiconductor processing tool, or a support a pedestal of a support grid for a raised floor useable in a semiconductor device fabrication facility). The standardized facilities box includes one or more mechanisms that allow any of a set of add on features to be selectively coupled (i.e., for attachment at predetermined locations without machining) thereto. Other aspects include a facilities box having its own support leg, having a sensor, and/or having a lift/lower mechanism for lifting the facilities box or for lifting items to/from the facilities box.
摘要翻译：本发明提供了一种标准化设备箱，其具有用于将箱体安装到半导体制造设备（即，用于支撑半导体加工工具的支架或用于支撑高架地板的支撑栅格的支架）的支撑基座的机构在半导体器件制造设备中）。标准化设施箱包括一个或多个机构，其允许一组附加特征中的任何一个选择性地联接（即，用于在预定位置处连接而不加工）。其他方面包括具有其自己的支撑腿的设施箱，具有传感器，和/或具有用于提升设施箱的升降机构，或用于将设备提升到设施箱。

10. 发明申请

WO03051581A3 METHOD AND APPARATUS FOR ALIGNMENT OF CARRIERS, CARRIER HANDLERS AND SEMICONDUCTOR HANDLING EQUIPMENT 审中-公开
标题翻译：载体，载体处理器和半导体处理装置的对准方法和装置
公开(公告)号：WO03051581A3
公开(公告)日：2003-10-16
申请号：PCT/US0239358
申请日：2002-12-10
申请人： APPLIED MATERIALS INC
发明人： LAPPEN ALAN RICK , SCHAUER RONALD VERN
IPC分类号： H01L21/68 , H01L21/00
CPC分类号： H01L21/68 , Y10T29/49895 , Y10T29/49899 , Y10T29/49902 , Y10T29/53052 , Y10T29/53978
摘要： A carrier alignment tool system in accordance with a preferred embodiment of the present invention provides a tool and method of using the tool, which emulates the door of a substrate carrier having a removable door. The tool permits the alignment between a door opener mechanism and the load-port or other handler, on which a carrier is to be supported to be tested and corrected, until proper alignment is achieved prior to beginning substrate processing.
摘要翻译：根据本发明的优选实施例的载体对准工具系统提供了使用该工具的工具和方法，其模拟具有可拆卸门的衬底载体的门。该工具允许门开启机构与负载端口或其他处理器之间的对准，在载体端口或其他处理器上载体被支撑以进行测试和校正，直到在开始基板处理之前实现适当的对准。

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