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1. 发明申请

WO2020030264A1 A SPUTTERING DEVICE, A DEPOSITION APPARATUS, AND A METHOD OF OPERATING A SPUTTERING DEVICE 审中-公开
公开(公告)号：WO2020030264A1
公开(公告)日：2020-02-13
申请号：PCT/EP2018/071525
申请日：2018-08-08
申请人： APPLIED MATERIALS, INC. , ZILBAUER, Thomas Werner , BERGMANN, Tobias , SCHÄFER-KOPYTTO, Daniel , SEVERIN, Daniel
发明人： ZILBAUER, Thomas Werner , BERGMANN, Tobias , SCHÄFER-KOPYTTO, Daniel , SEVERIN, Daniel
IPC分类号： H01J37/34 , C23C14/35
摘要： A sputtering device is described. The sputtering device includes a cathode arrangement being cantilevered and comprising a target tube, the cathode arrangement extending along an axial direction and having a first side being a supported side and a second side being an unsupported side; and a dark space shield provided at the second side and at least partially covering the cathode arrangement, the dark space shield providing an overlap region at which the dark space shield overlaps with the target tube along the axial direction.

2. 发明申请

WO2022002383A1 VACUUM PROCESSING APPARATUS AND METHOD OF HEATING A SUBSTRATE IN A VACUUM PROCESSING APPARATUS 审中-公开
公开(公告)号：WO2022002383A1
公开(公告)日：2022-01-06
申请号：PCT/EP2020/068498
申请日：2020-07-01
申请人： APPLIED MATERIALS, INC. , MALMS, Christopher , SCHÄFER-KOPYTTO, Daniel , BERGMANN, Tobias
发明人： MALMS, Christopher , SCHÄFER-KOPYTTO, Daniel , BERGMANN, Tobias
IPC分类号： C23C14/54 , C23C16/48 , C23C14/541 , C23C16/481 , C23C16/482 , H01L21/67115
摘要： A vacuum processing apparatus (400), comprising a vacuum chamber (410) having a chamber wall portion (202); a lamp (100), the lamp (100) comprising a lamp body (102) having a first sealed interior portion (124) disposed within the vacuum chamber (410), a seal portion (120), and a second sealed interior portion (122) between the first sealed interior portion (124) and the seal portion (120), the second sealed interior portion (122) being disposed within the vacuum chamber (410); a filament (104) provided in the first sealed interior portion (124); and a wire (106) electrically connected to the filament (104) and provided in the second sealed interior portion (122); the apparatus further comprising: a heat sink (130) coupled to the chamber wall portion (202) and the second sealed interior portion.

3. 发明申请

WO2020200442A1 SPUTTER DEPOSITION SOURCE, SPUTTER DEPOSITION APPARATUS, AND METHOD OF POWERING A SPUTTER DEPOSITION SOURCE 审中-公开
公开(公告)号：WO2020200442A1
公开(公告)日：2020-10-08
申请号：PCT/EP2019/058414
申请日：2019-04-03
申请人： APPLIED MATERIALS, INC. , SONNENSCHEIN, Joachim , SAUER, Willi , SCHÄFER-KOPYTTO, Daniel , BERGMANN, Tobias
发明人： SONNENSCHEIN, Joachim , SAUER, Willi , SCHÄFER-KOPYTTO, Daniel , BERGMANN, Tobias
IPC分类号： H01J37/32 , H01J37/34
摘要： A sputter deposition source (100) is described. The sputter deposition source includes a first sputter electrode (110) and a power supply assembly (130) for supplying the first sputter electrode with an electric current. The power supply assembly includes a cable (131) with a 5 plurality of insulated cores (132) surrounded by a common jacket (133). The cable may optionally further include a shielding arrangement (140). Further, a sputter deposition apparatus (200) is described, including two adjacent sputter electrodes that can be supplied with alternating currents via a cable including a plurality of insulated cores.

4. 发明申请

WO2022268311A1 CATHODE ASSEMBLY, DEPOSITION APPARATUS, AND METHOD FOR DEINSTALLING A CATHODE ASSEMBLY 审中-公开
公开(公告)号：WO2022268311A1
公开(公告)日：2022-12-29
申请号：PCT/EP2021/067194
申请日：2021-06-23
申请人： APPLIED MATERIALS, INC. , SCHÄFER-KOPYTTO, Daniel , BERGMANN, Tobias
发明人： SCHÄFER-KOPYTTO, Daniel , BERGMANN, Tobias
IPC分类号： H01J37/34 , H01J37/32 , H01J37/3288 , H01J37/3405 , H01J37/342 , H01J37/3435 , H01J37/3497
摘要： A cathode assembly (10) is provided. The cathode assembly includes a rotatable tube (622) having a rotational axis, a first end and a second end, the first end being opposite the second end along a direction of the rotational axis; a coolant receiving enclosure (20) in the rotatable tube (622); and a side element (624) provided at the first end of the rotatable tube (622), the side element (624) having at least one opening (625) configured to enable coolant to be drained from the coolant receiving enclosure (20) out of the rotatable tube (622).

5. 发明申请

WO2020164685A1 CATHODE DRIVE UNIT, SPUTTERING CATHODE AND METHOD FOR ASSEMBLING A CATHODE DRIVE UNIT 审中-公开
公开(公告)号：WO2020164685A1
公开(公告)日：2020-08-20
申请号：PCT/EP2019/053411
申请日：2019-02-12
申请人： APPLIED MATERIALS, INC. , SONNENSCHEIN, Joachim , SCHÄFER-KOPYTTO, Daniel , BERGMANN, Tobias
发明人： SONNENSCHEIN, Joachim , SCHÄFER-KOPYTTO, Daniel , BERGMANN, Tobias
IPC分类号： H01J37/34 , C23C14/35
摘要： A cathode drive unit (100) for a deposition source is described. The cathode drive unit includes a cathode support (102); and a belt drive for rotating the cathode support. The belt drive includes a first pulley (112) coupled to a shaft (103) driving the cathode support; a drive assembly (120) having a second pulley (114); a belt (116) engaging with the first pulley and the second pulley; a guide (130) supporting at least a portion of the drive assembly; and a tensioner (140) providing a force to at least the portion of the drive assembly for moving at least the portion of the drive assembly along the guide.

6. 发明申请

WO2020160757A1 DEPOSITION APPARATUS AND METHOD FOR MONITORING THE SAME 审中-公开
公开(公告)号：WO2020160757A1
公开(公告)日：2020-08-13
申请号：PCT/EP2019/052772
申请日：2019-02-05
申请人： APPLIED MATERIALS, INC. , SONNENSCHEIN, Joachim , SCHÄFER-KOPYTTO, Daniel , BERGMANN, Tobias
发明人： SONNENSCHEIN, Joachim , SCHÄFER-KOPYTTO, Daniel , BERGMANN, Tobias
IPC分类号： H01J37/34 , H01J37/32
摘要： A deposition apparatus (100) for depositing a material on a substrate is provided. The deposition apparatus includes a cathode assembly (10). The deposition apparatus includes a coolant receiving enclosure (20) for receiving a coolant (22) to cool the cathode assembly. The deposition apparatus includes a sensor (30) arranged outside of the coolant receiving enclosure (20) to detect a leakage of the coolant out of the coolant receiving enclosure.

7. 发明申请

WO2022002382A1 METHOD FOR OPERATING A CHAMBER, APPARATUS FOR PROCESSING A SUBSTRATE, AND SUBSTRATE PROCESSING SYSTEM 审中-公开
公开(公告)号：WO2022002382A1
公开(公告)日：2022-01-06
申请号：PCT/EP2020/068496
申请日：2020-07-01
申请人： APPLIED MATERIALS, INC. , MALMS, Christopher , BERGMANN, Tobias
发明人： MALMS, Christopher , BERGMANN, Tobias
IPC分类号： C23C16/44 , C23C16/46 , C23C16/48 , C23C14/54 , H01L21/67 , C23C14/541 , C23C16/4401 , C23C16/481 , C23C16/482 , H01L21/67115 , H01L21/67253 , H01L21/67288
摘要： A method for operating a chamber having at least one electric load having at least one voltage-carrying part exposed to varying pressure conditions in the chamber is provided. The method includes: supplying a voltage within a nominal range not exceeding a maximum voltage (U1) to the at least one electric load arranged in the chamber when the pressure in the chamber is outside of a critical pressure range (301), the critical pressure range (301) being defined as the pressure range in which arcing in the chamber occurs when the maximum voltage is supplied to the at least one electric load; and supplying a voltage not exceeding a pressure-dependent arc-free voltage (U2) to the at least one electric load arranged in the chamber when the pressure in the chamber is within the critical pressure range (301) to maintain operating the at least one electric load, the pressure-dependent arc-free voltage (U2) is lower than the maximum voltage (U1).

8. 发明申请

WO2019228610A1 HOLDER, CARRIER COMPRISING AT LEAST TWO HOLDERS, APPARATUSES AND METHODS 审中-公开
公开(公告)号：WO2019228610A1
公开(公告)日：2019-12-05
申请号：PCT/EP2018/064054
申请日：2018-05-29
申请人： APPLIED MATERIALS, INC. , LAU, Simon , BERGMANN, Tobias , HANDT, Hans Joachim , LINDENBERG, Ralph
发明人： LAU, Simon , BERGMANN, Tobias , HANDT, Hans Joachim , LINDENBERG, Ralph
IPC分类号： H01L21/677
摘要： A holder (120) configured to be attached to a carrier body (160) of a carrier for holding a substrate (101) is provided. The holder (120) includes a fixed portion (122) configured to be attached to the carrier body (160), and a floating portion (123) configured to be moveable with respect to the fixed portion (122) along a direction and including a groove (126) configured to receive at least a portion of the substrate (101).

9. 发明申请

WO2011051352A1 SUBSTRATE TRANSPORT SYSTEM AND METHOD 审中-公开
标题翻译：基板运输系统和方法
公开(公告)号：WO2011051352A1
公开(公告)日：2011-05-05
申请号：PCT/EP2010/066280
申请日：2010-10-27
申请人： APPLIED MATERIALS, INC. , SCHÄFER, Michael , BERGMANN, Tobias , HOFFMANN, Josef , SAUER, Andreas , HENRICH, Jürgen , GEISS, Andreas
发明人： SCHÄFER, Michael , BERGMANN, Tobias , HOFFMANN, Josef , SAUER, Andreas , HENRICH, Jürgen , GEISS, Andreas
IPC分类号： H01L21/67 , B65G49/00
CPC分类号： H01L21/67706 , C03B35/183 , C03B35/184 , C03B35/189
摘要： A substrate transport system adapted for transporting a substrate moving in a substrate transport direction in a processing chamber is provided. The substrate transport system includes a plurality of transport rollers each having a transport shaft and a transport wheel. The transport shaft and the transport wheel are adapted for supporting the moving substrate. A heating means is arranged between the position of the moving substrate and the transport shaft and is adapted for heating the moving substrate.
摘要翻译：提供了一种适于传送在处理室中沿基板输送方向移动的基板的基板输送系统。基板输送系统包括多个输送辊，每个输送辊具有输送轴和输送轮。传送轴和传送轮适于支撑移动的基板。在移动基板的位置和传送轴之间设置有加热装置，并适于加热移动的基板。

10. 发明申请

WO2013034409A1 VACUUM LEADTHROUGH, AND VACUUM COATING DEVICE HAVING VACUUM LEADTHROUGHS 审中-公开
标题翻译：真空真空真空真空包装真空包装
公开(公告)号：WO2013034409A1
公开(公告)日：2013-03-14
申请号：PCT/EP2012/065897
申请日：2012-08-14
申请人： SCHMID VACUUM TECHNOLOGY GMBH , GEISS, Andreas , BERGMANN, Tobias
发明人： GEISS, Andreas , BERGMANN, Tobias
IPC分类号： H01L31/18 , C23C16/458 , C23C16/54 , H01L21/687
CPC分类号： C23C16/4585 , C23C16/54 , H01L21/67126 , H01L21/68792
摘要： A vacuum leadthrough is disclosed for installation in a chamber wall (18) having a vacuum side (102) and an outer side (104), the leadthrough comprising a shaft (106) which can be driven rotationally and is arranged such that it can be displaced axially with respect to the chamber wall (18), having a first bearing bush (108) for installation in the chamber wall (18) and having at least one seal (110) for static sealing of the first bearing bush (108) with respect to the chamber wall (18), a gastight axial expansion element (112) being received with a first end on the first bearing bush (108) and being sealed with respect to the first bearing bush (108), a second end of the axial expansion element (112) being connected to a second bearing bush (120) and being sealed with respect to the latter, which second bearing bush (120) is received at least partially coaxially in the first bearing bush (108) and can be displaced axially relative to the first bearing bush (108) by means of the axial expansion element (112), the shaft (106) being mounted rotatably within the second bearing bush (120) and being sealed with respect to the latter by a shaft seal (132).
摘要翻译：公开了一种用于安装在具有真空侧（102）和外侧（104）的腔室壁（18）中的真空引线，所述引线包括轴（106），所述轴可被旋转地驱动并且布置成使得其可以具有用于安装在室壁（18）中的第一轴承衬套（108）并具有用于第一轴承衬套（108）的静态密封的至少一个密封件（110）相对于室壁（18），气密的轴向膨胀元件（112）被接纳在第一轴承衬套（108）上的第一端并且相对于第一轴承衬套（108）被密封，第二端轴向膨胀元件（112）连接到第二轴承衬套（120）并且相对于第二轴承衬套被密封，该第二轴承衬套（120）至少部分地同轴地容纳在第一轴承衬套（108）中并且可以被移位通过轴向相对于第一轴承衬套（108）轴向地轴向膨胀元件（112），所述轴（106）可旋转地安装在所述第二轴承衬套（120）内并且通过轴密封件（132）相对于所述轴密封件被密封。

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