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1. 发明申请

WO2020025101A1 APPARATUS WITH MOVABLE SHIELD CARRIER 审中-公开
公开(公告)号：WO2020025101A1
公开(公告)日：2020-02-06
申请号：PCT/EP2018/070601
申请日：2018-07-30
申请人： APPLIED MATERIALS, INC. , ZANG, Sebastian Gunther , SAUER, Andreas , KREBS, Matthias , HOFMANN, Annabelle , SIGMUND, Jerry
发明人： ZANG, Sebastian Gunther , SAUER, Andreas , KREBS, Matthias , HOFMANN, Annabelle , SIGMUND, Jerry
IPC分类号： C23C14/12 , C23C14/04 , C23C14/50 , C23C14/56 , H01L51/00 , H01L21/677
摘要： A vacuum processing apparatus for processing a substrate is described. The processing apparatus system includes a vacuum chamber and a deposition source provided in the vacuum chamber. The apparatus further comprises a first track arrangement with a first transportation track adapted to transport a substrate and a second transportation track, adapted to transport a mask. Furthermore, the apparatus comprises a third transportation track, adapted to transport a mask shield between the deposition source and the mask to avoid contamination of the mask. The third transportation track is adapted to transport the mask shield outside the vacuum chamber so it is possible to disassemble and clean a mask shield, contaminated with material from the deposition source.

2. 发明申请

WO2021052592A1 METHOD OF OPERATING AN EVAPORATION SOURCE, EVAPORATION SYSTEM, AND SHIELD HANDLING APPARATUS 审中-公开
公开(公告)号：WO2021052592A1
公开(公告)日：2021-03-25
申请号：PCT/EP2019/075245
申请日：2019-09-19
申请人： APPLIED MATERIALS, INC. , HOFMANN, Annabelle , KREBS, Matthias , KHAMEHGIR, Pejman , SCHEER, Evelyn
发明人： HOFMANN, Annabelle , KREBS, Matthias , KHAMEHGIR, Pejman , SCHEER, Evelyn
IPC分类号： C23C14/24 , C23C14/12 , C23C14/56 , H01L51/00
摘要： A method of operating an evaporation source (100) in a vacuum chamber (11) is provided. The evaporation source comprises a vapor distribution assembly (130) with one or more vapor outlets (131) and a first shielding device (120) provided at the vapor distribution assembly (130). The method comprises (i) emitting evaporated source material (15) from the one or more vapor outlets, wherein at least a part of the evaporated source material emitted from the one or more vapor outlets is blocked by the first shielding device, (ii) detaching the first shielding device (120) from the vapor distribution assembly (130) in the vacuum chamber, and (iii) attaching a second shielding device (121) to the vapor distribution assembly (130) in the vacuum chamber. Further, a shield handling apparatus (180) for exchanging shielding devices of an evaporation source in a vacuum chamber is provided, as well as an evaporation system (200) comprising a shield handling apparatus (180).

3. 发明申请

WO2021013327A1 EVAPORATION SOURCE, DEPOSITION SYSTEM, AND EVAPORATION METHOD 审中-公开
公开(公告)号：WO2021013327A1
公开(公告)日：2021-01-28
申请号：PCT/EP2019/069590
申请日：2019-07-19
申请人： APPLIED MATERIALS, INC. , HOFMANN, Annabelle , KREBS, Matthias
发明人： HOFMANN, Annabelle , KREBS, Matthias
IPC分类号： C23C14/24
摘要： Embodiments described herein relate to an evaporation source (100) including a crucible (120) for evaporating a source material, a material reservoir (110) arranged at least partially higher than the crucible (120) for storing the source material, and a material feeding passage (115) extending in a downward direction from the material reservoir (110) to the crucible for gravitationally feeding the source material into the crucible.

4. 发明申请

WO2021052595A1 METHOD OF OPERATING AN EVAPORATION SOURCE, EVAPORATION SYSTEM, AND SHIELD HANDLING APPARATUS 审中-公开
公开(公告)号：WO2021052595A1
公开(公告)日：2021-03-25
申请号：PCT/EP2019/075250
申请日：2019-09-19
申请人： APPLIED MATERIALS, INC. , KHAMEHGIR, Pejman , HOFMANN, Annabelle , SCHEER, Evelyn , BUSCHBECK, Wolfgang , KREBS, Matthias
发明人： KHAMEHGIR, Pejman , HOFMANN, Annabelle , SCHEER, Evelyn , BUSCHBECK, Wolfgang , KREBS, Matthias
IPC分类号： H01L51/00 , C23C14/12 , C23C14/24 , C23C14/56 , C23C14/04
摘要： A method of operating an evaporation source (100) in a vacuum chamber (11) is provided. The evaporation source comprises a vapor distribution assembly (130) with one or more vapor outlets (131) and a shielding device (120) attached to the vapor distribution assembly (130). The method comprises (i) emitting evaporated source material (15) from the one or more vapor outlets, wherein at least a part of the evaporated source material is blocked by the shielding device, (ii) detaching the shielding device (120) from the vapor distribution assembly (130) in the vacuum chamber, and (iii) cleaning the shielding device (120). Further, a shield handling apparatus (180) for cleaning a shielding device of an evaporation source in a vacuum chamber is provided, as well as an evaporation system (200) comprising a shield handling apparatus (180).

5. 发明申请

WO2016107637A1 MASKING ARRANGEMENT FOR MASKING A SUBSTRATE DURING A DEPOSITION PROCESS, DEPOSITION APPARATUS FOR LAYER DEPOSITION ON A SUBSTRATE, AND METHOD FOR CLEANING A MASKING ARRANGEMENT 审中-公开
标题翻译：用于在沉积过程中掩蔽基底的掩蔽装置，用于在基底上沉积的沉积装置和用于清洁掩蔽装置的方法
公开(公告)号：WO2016107637A1
公开(公告)日：2016-07-07
申请号：PCT/EP2014/079387
申请日：2014-12-29
申请人： APPLIED MATERIALS, INC. , SAUER, Andreas , HOFMANN, Annabelle
发明人： SAUER, Andreas , HOFMANN, Annabelle
IPC分类号： C23C14/04 , C23C16/04
CPC分类号： C23C14/042 , C23C16/042
摘要： A masking arrangement (100) for masking a substrate (10) during a deposition process is provided. The masking arrangement (100) includes one or more surface areas (130) configured for exposure to a material deposition source during the deposition process, wherein the one or more surface areas (130) are at least partially coated with a solder (140).
摘要翻译：提供了一种用于在沉积过程中掩蔽衬底（10）的掩模布置（100）。掩模装置（100）包括被配置用于在沉积过程期间暴露于材料沉积源的一个或多个表面区域（130），其中所述一个或多个表面区域（130）至少部分地涂覆有焊料（140）。

6. 发明申请

WO2017108081A1 FILM FORMING APPARATUS 审中-公开
标题翻译：成膜装置
公开(公告)号：WO2017108081A1
公开(公告)日：2017-06-29
申请号：PCT/EP2015/080841
申请日：2015-12-21
申请人： APPLIED MATERIALS, INC. , SAUER, Andreas , HOFMANN, Annabelle
发明人： SAUER, Andreas , HOFMANN, Annabelle
IPC分类号： C23C14/56 , C23C16/54
CPC分类号： C23C14/562 , C23C16/545
摘要： An apparatus for processing a thin film on a substrate is described. The apparatus includes a vacuum chamber comprising a housing, a rear wall and a removable closing plate; a processing drum being arranged between the rear wall and the removable closing plate inside the vacuum chamber, the processing drum being at least partially surrounded by a processing region; a first process separating wall portion attached to the removable closing plate; a second process separating wall portion attached to the housing or the rear wall; wherein in a closed position of the removable closing plate, the first process separating wall portion and the second process separating wall portion jointly provide a process separating wall dividing the processing region into adjacent processing sections.
摘要翻译：描述了用于处理衬底上的薄膜的设备。该设备包括真空室，该真空室包括壳体，后壁和可移除的封闭板; 在所述真空室内部的所述后壁和所述可移除封闭板之间布置处理鼓，所述处理鼓至少部分地被处理区域围绕; 第一过程分离壁部分，该壁部分连接到可移除封闭板; 第二过程分离壁部分连接到壳体或后壁; 其中在所述可移除封闭板的关闭位置中，所述第一工艺分离壁部分和所述第二工艺分离壁部分共同提供将所述处理区域分成相邻处理部分的工艺分离壁。

7. 发明申请

WO2019020167A1 APPARATUS AND SYSTEM FOR PROCESSING A SUBSTRATE IN A VACUUM CHAMBER, AND METHOD OF TRANSPORTING A CARRIER IN A VACUUM CHAMBER 审中-公开
公开(公告)号：WO2019020167A1
公开(公告)日：2019-01-31
申请号：PCT/EP2017/068660
申请日：2017-07-24
申请人： APPLIED MATERIALS, INC. , HEYMANNS, Matthias , HOFMANN, Annabelle
发明人： HEYMANNS, Matthias , HOFMANN, Annabelle
IPC分类号： C23C14/04 , C23C14/50 , C23C16/04 , C23C16/458 , H01L21/68 , H01L51/00
摘要： An apparatus (100) for processing a substrate (10) in a vacuum chamber (101) is described. The apparatus includes a first carrier transport system configured to transport a first carrier (11) along a first transport path in a first direction (X), an alignment system (20, 120) comprising a first mount (21, 121) for mounting the first carrier (11) to the alignment system, a first shifting device (41, 141) configured to move the first carrier from the first transport path to the first mount in a second direction (Z) transverse to the first direction (X), and a common support structure (50, 150) which supports or holds at least a part of the alignment system (20, 120) and at least a part of the first shifting device (41, 141). Further, a system for processing a substrate and a method of transporting a carrier in a vacuum chamber are described.

8. 发明申请

WO2021197621A1 MATERIAL DEPOSITION APPARATUS, VACUUM DEPOSITION SYSTEM AND METHOD OF PROCESSING A LARGE AREA SUBSTRATE 审中-公开
公开(公告)号：WO2021197621A1
公开(公告)日：2021-10-07
申请号：PCT/EP2020/059616
申请日：2020-04-03
申请人： APPLIED MATERIALS, INC. , HOFMANN, Annabelle , HEYMANNS, Matthias
发明人： HOFMANN, Annabelle , HEYMANNS, Matthias
IPC分类号： C23C14/04 , C23C14/24 , C23C14/50 , H01L51/50 , C23C14/042 , H01L51/0011
摘要： A material deposition apparatus (100, 200) for depositing material on a substrate (130) in a vacuum chamber (102) is described. The material deposition apparatus (100, 200) includes a deposition arrangement (120), a mask transportation track (242) for transporting a mask carrier (240) configured for supporting a mask assembly (140) having a mask frame (142) and a mask (144), a mask stage (150) mounted to the vacuum chamber (102), the mask stage (150) being configured to accept the mask assembly (140), a substrate aligner (134) mounted to the vacuum chamber (102), the substrate aligner (134) being configured to align the substrate (130) to the mask (144), and a mask manipulation assembly (250) having two or more mask manipulators, the mask manipulation assembly (250) being mounted to the mask stage (150) and being configured to couple to the mask frame (142) and to correct a distortion of the mask (144). Further aspects of the present disclosure include a vacuum processing system and a method for processing a vertically oriented large area substrate in a vacuum chamber.

9. 发明申请

WO2018192668A1 MATERIAL DEPOSITION ARRANGEMENT, A METHOD FOR DEPOSITING MATERIAL AND A MATERIAL DEPOSITION CHAMBER 审中-公开
公开(公告)号：WO2018192668A1
公开(公告)日：2018-10-25
申请号：PCT/EP2017/059505
申请日：2017-04-21
申请人： APPLIED MATERIALS, INC. , SCHNAPPENBERGER, Frank , DEPPISCH, Thomas , HEIN, Stefan , HOFMANN, Annabelle
发明人： SCHNAPPENBERGER, Frank , DEPPISCH, Thomas , HEIN, Stefan , HOFMANN, Annabelle
IPC分类号： C23C14/24 , C23C14/54 , C23C16/455 , F16K49/00 , C23C16/52
摘要： A material deposition arrangement chamber (1000) for depositing a material on a substrate is described. The material deposition arrangement chamber comprises a vacuum generation device (1060) and a material deposition arrangement (100) having a valve element (200), configured to regulate the material flow-through of the material to be deposited.

10. 发明申请

WO2022026061A1 EVAPORATION SOURCE, VAPOR DEPOSITION APPARATUS, AND METHOD FOR COATING A SUBSTRATE IN A VACUUM CHAMBER 审中-公开
公开(公告)号：WO2022026061A1
公开(公告)日：2022-02-03
申请号：PCT/US2021/036464
申请日：2021-06-08
申请人： APPLIED MATERIALS, INC.
发明人： DEPPISCH, Thomas , BANGERT, Stefan , HOFMANN, Annabelle , LOPP, Andreas , GOIHL, Thomas
IPC分类号： C23C14/24 , C23C14/56 , C23C14/04 , C23C14/50 , H01M4/04
摘要： An evaporation source (100) for depositing an evaporated material on a substrate (10) is described. The evaporation source (100) includes an evaporation crucible (30) for evaporating a material; a vapor distributor (20) with a plurality of nozzles (21) for directing the evaporated material toward the substrate; a vapor conduit (40) extending in a conduit length direction (A) from the evaporation crucible to the vapor distributor and providing a fluid connection between the evaporation crucible and the vapor distributor, wherein at least one nozzle of the plurality of nozzles has a nozzle axis extending in, or essentially parallel to, the conduit length direction (A); and a baffle arrangement (50) in the vapor conduit. Further described are a vapor deposition apparatus (200) including such an evaporation source (100) and methods of coating a substrate in a vacuum chamber.

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