专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

WO2013106082A2 MASK-LESS FABRICATION OF THIN FILM BATTERIES 审中-公开
标题翻译：薄膜电池的无掩模制造
公开(公告)号：WO2013106082A2
公开(公告)日：2013-07-18
申请号：PCT/US2012/042523
申请日：2012-06-14
申请人： APPLIED MATERIALS, INC. , SONG, Daoying , JIANG, Chong , KWAK, Byung Sung, Leo
发明人： SONG, Daoying , JIANG, Chong , KWAK, Byung Sung, Leo
IPC分类号： H01M2/10 , H01M10/36
CPC分类号： H01M6/40 , B01J19/121 , B01J2219/0879 , B01J2219/12 , C01B21/097 , C01G51/42 , C01P2006/40 , H01M2/026 , H01M2/0277 , H01M2/26 , H01M4/04 , H01M4/0426 , H01M4/139 , H01M4/1395 , H01M4/382 , H01M4/525 , H01M6/005 , H01M6/185 , H01M6/186 , H01M10/0404 , H01M10/0436 , H01M10/052 , H01M10/0562 , H01M10/0585 , H01M2220/30 , H01M2300/0068 , Y10T29/49108
摘要： Thin film batteries (TFB) are fabricated by a process which eliminates and/or minimizes the use of shadow masks. A selective laser ablation process, where the laser patterning process removes a layer or stack of layers while leaving layer(s) below intact, is used to meet certain or all of the patterning requirements. For die patterning from the substrate side, where the laser beam passes through the substrate before reaching the deposited layers, a die patterning assistance layer, such as an amorphous silicon layer or a microcrystalline silicon layer, may be used to achieve thermal stress mismatch induced laser ablation, which greatly reduces the laser energy required to remove material.
摘要翻译：薄膜电池（TFB）通过消除和/或最小化使用荫罩的方法来制造。选择性激光烧蚀工艺用于满足某些或全部图案化要求，其中激光图案化工艺去除一层或多层的层而使层保持完好。对于激光束在到达沉积层之前穿过衬底的衬底侧的图案化，可以使用诸如非晶硅层或微晶硅层的管芯图案辅助层来实现热应力失配引起的激光器消融，这大大降低了去除材料所需的激光能量。

2. 发明申请

WO2012173874A3 THIN FILM BATTERY FABRICATION WITH MASK-LESS ELECTROLYTE DEPOSITION 审中-公开
公开(公告)号：WO2012173874A3
公开(公告)日：2012-12-20
申请号：PCT/US2012/041410
申请日：2012-06-07
申请人： APPLIED MATERIALS, INC. , SONG, Daoying , JIANG, Chong , KWAK, Byung Sung, Leo
发明人： SONG, Daoying , JIANG, Chong , KWAK, Byung Sung, Leo
IPC分类号： H01M14/00
摘要： A method of fabricating a thin film battery may include a blanket deposition of an electrolyte layer followed by selective laser patterning of the electrolyte layer. Some or all the other device layers may be in situ patterned layers - formed using shadow masks.

3. 发明申请

WO2012174260A2 PINHOLE-FREE DIELECTRIC THIN FILM FABRICATION 审中-公开
标题翻译：无孔电介质薄膜制造
公开(公告)号：WO2012174260A2
公开(公告)日：2012-12-20
申请号：PCT/US2012/042487
申请日：2012-06-14
申请人： APPLIED MATERIALS, INC. , JIANG, Chong , KWAK, Byung Sung, Leo
发明人： JIANG, Chong , KWAK, Byung Sung, Leo
IPC分类号： H01M14/00
CPC分类号： C23C14/0676 , C23C14/08 , C23C14/5826 , C23C14/586
摘要： A method of depositing a dielectric thin film may include: depositing a thin layer of dielectric; stopping deposition of the dielectric layer, and modifying the gas in the chamber if desired; inducing and maintaining a plasma in the vicinity of the substrate to provide ion bombardment of the deposited layer of dielectric; and repeating the depositing, stopping and inducing and maintaining steps until a desired thickness of dielectric is deposited. A variation on this method may include, in place of the repeating step: depositing a thick layer of lower quality dielectric; depositing a thin layer of high quality dielectric; stopping deposition of the dielectric layer, and modifying the gas in the chamber if desired; and inducing and maintaining a plasma in the vicinity of the substrate to provide ion bombardment of the deposited layer of dielectric. The thick layer of dielectric may be deposited more rapidly than the thin layers.
摘要翻译：沉积电介质薄膜的方法可以包括：沉积介电薄层; 阻止介电层的沉积，如果需要则改变腔中的气体; 在衬底附近诱导和维持等离子体，以提供沉积的电介质层的离子轰击; 并重复沉积，停止和引导和维持步骤，直到沉积所需的电介质厚度。该方法的变型可以包括：代替重复步骤：沉积较厚质量的电介质层; 沉积一层高质量的电介质; 阻止介电层的沉积，如果需要则改变腔中的气体; 以及在衬底附近诱导和维持等离子体，以提供沉积的电介质层的离子轰击。电介质的厚层可以比薄层更快地沉积。

4. 发明申请

WO2011050291A2 MATERIALS AND DEVICE STACK FOR MARKET VIABLE ELECTROCHROMIC DEVICES 审中-公开
标题翻译：市场上可见的电致发光器件的材料和器件堆叠
公开(公告)号：WO2011050291A2
公开(公告)日：2011-04-28
申请号：PCT/US2010/053802
申请日：2010-10-22
申请人： APPLIED MATERIALS, INC. , KWAK, Byung Sung, Leo , SINGH, Kaushal, K. , GORDON, Joseph, G., II , NALAMASU, Omkaram
发明人： KWAK, Byung Sung, Leo , SINGH, Kaushal, K. , GORDON, Joseph, G., II , NALAMASU, Omkaram
IPC分类号： C23C14/34 , C23C14/50 , C23C14/08 , C23C14/56
CPC分类号： G02F1/1523 , C23C14/08 , C23C14/34 , G02F1/1525 , G02F2202/06 , Y10S359/90
摘要： The present invention generally relates to electrochromic (EC) devices, such as used in electrochromic windows (ECWs), and their manufacture. The EC devices may comprise a transparent substrate; a first transparent conductive layer; a doped coloration layer, wherein the coloration layer dopants provide structural stability to the arrangement of atoms in the coloration layer; an electrolyte layer; a doped anode layer over said electrolyte layer, wherein the anode layer dopant provides increased electrically conductivity in the doped anode layer; and a second transparent conductive layer. A method of fabricating an electrochromic device may comprise depositing on a substrate, in sequence, a first transparent conductive layer, a doped coloration layer, an electrolyte layer, a doped anode layer, and a second transparent conductive layer, wherein at least one of the doped coloration layer, the electrolyte layer and the doped anode layer is sputter deposited using a combinatorial plasma deposition process.
摘要翻译：本发明一般涉及电致变色（EC）装置，例如用于电致变色窗（ECW））及其制造。 EC装置可以包括透明基板; 第一透明导电层; 掺杂着色层，其中着色层掺杂剂为着色层中的原子排列提供结构稳定性; 电解质层; 在所述电解质层上的掺杂阳极层，其中所述阳极层掺杂剂在所述掺杂阳极层中提供增加的导电性; 和第二透明导电层。制造电致变色器件的方法可以包括依次沉积在第一透明导电层，掺杂着色层，电解质层，掺杂阳极层和第二透明导电层的衬底上，其中至少一个掺杂着色层，电解质层和掺杂阳极层使用组合等离子体沉积工艺溅射沉积。

5. 发明申请

WO2015102836A1 SOLID STATE ELECTROLYTE AND BARRIER ON LITHIUM METAL AND ITS METHODS 审中-公开
标题翻译：固体电解质和阻燃剂在锂金属及其方法上的应用
公开(公告)号：WO2015102836A1
公开(公告)日：2015-07-09
申请号：PCT/US2014/069566
申请日：2014-12-10
申请人： APPLIED MATERIALS, INC.
发明人： SUN, Lizhong , JIANG, Chong , KWAK, Byung Sung, Leo , GORDON II, Joseph, G.
IPC分类号： H01M10/0562 , H01M10/052 , H01M10/058 , H01M4/139 , H01M4/38 , H01M4/62 , H01M4/58
CPC分类号： H01M4/1397 , H01M4/0426 , H01M4/5825 , H01M4/62 , H01M10/052 , H01M10/0562 , H01M10/058
摘要： A method of fabricating an electrochemical device comprising a lithium metal electrode, may comprise: providing a substrate with a lithium metal electrode on the surface thereof; depositing a first layer of dielectric material on the lithium metal electrode, the depositing the first layer being sputtering L13PO4 in an argon ambient; after the depositing the first layer, inducing and maintaining a nitrogen plasma over the first layer of dielectric material to provide ion bombardment of the first layer for incorporation of nitrogen therein; and after the depositing, the inducing and the maintaining, depositing a second layer of dielectric material on the ion bombarded first layer of dielectric material, the depositing the second layer being sputtering L13PO4 in a nitrogen-containing ambient. Electrochemical devices may comprise a barrier layer between the lithium metal electrode and the LiPON electrolyte. Tools configured for fabricating the electrochemical devices comprising lithium metal electrodes are also described.
摘要翻译：制造包含锂金属电极的电化学装置的方法可以包括：在其表面上提供具有锂金属电极的基板; 在锂金属电极上沉积介电材料的第一层，沉积第一层是在氩气环境中溅射L13PO4; 在沉积第一层之后，在第一层电介质材料上诱导和维持氮等离子体以提供用于在其中引入氮的第一层的离子轰击; 并且在淀积，诱导和维持之后，在离子轰击的第一介电材料层上沉积第二层电介质材料，沉积第二层是在含氮环境中溅射L13PO4。电化学装置可以包括在锂金属电极和LiPON电解质之间的阻挡层。还描述了构造用于制造包括锂金属电极的电化学装置的工具。

6. 发明公开

EP2721663A2 MASK-LESS FABRICATION OF THIN FILM BATTERIES 有权
标题翻译：薄膜电池面具LOSE生产
公开(公告)号：EP2721663A2
公开(公告)日：2014-04-23
申请号：EP12864769.0
申请日：2012-06-14
申请人： Applied Materials, Inc.
发明人： SONG, Daoying , JIANG, Chong , KWAK, Byung Sung, Leo
IPC分类号： H01M2/10 , H01M10/36
CPC分类号： H01M6/40 , B01J19/121 , B01J2219/0879 , B01J2219/12 , C01B21/097 , C01G51/42 , C01P2006/40 , H01M2/026 , H01M2/0277 , H01M2/26 , H01M4/04 , H01M4/0426 , H01M4/139 , H01M4/1395 , H01M4/382 , H01M4/525 , H01M6/005 , H01M6/185 , H01M6/186 , H01M10/0404 , H01M10/0436 , H01M10/052 , H01M10/0562 , H01M10/0585 , H01M2220/30 , H01M2300/0068 , Y10T29/49108
摘要： Thin film batteries (TFB) are fabricated by a process which eliminates and/or minimizes the use of shadow masks. A selective laser ablation process, where the laser patterning process removes a layer or stack of layers while leaving layer(s) below intact, is used to meet certain or all of the patterning requirements. For die patterning from the substrate side, where the laser beam passes through the substrate before reaching the deposited layers, a die patterning assistance layer, such as an amorphous silicon layer or a microcrystalline silicon layer, may be used to achieve thermal stress mismatch induced laser ablation, which greatly reduces the laser energy required to remove material.

7. 发明申请

WO2016033442A1 EXFOLIATION PROCESS FOR REMOVAL OF DEPOSITED MATERIALS FROM MASKS CARRIERS, AND DEPOSITION TOOL COMPONENTS 审中-公开
标题翻译：从掩蔽载体和沉积工具组件中去除沉积材料的浮选过程
公开(公告)号：WO2016033442A1
公开(公告)日：2016-03-03
申请号：PCT/US2015/047403
申请日：2015-08-28
申请人： APPLIED MATERIALS, INC.
发明人： SONG, Daoying , KWAK, Byung Sung, Leo
IPC分类号： H01L21/301 , H01L21/78
CPC分类号： C23C16/4407 , B08B3/12 , C23C14/564
摘要： A method for exfoliation of deposited material off a work piece may comprise: immersing the work piece in an ultrasonic bath and applying ultrasonic energy, wherein the ultrasonic bath contains a fluid either held at a constant temperature within the range from greater than room temperature to less than the fluid boiling point, or the fluid is cycled over a ΔΤ chosen within the range between room temperature and less than the fluid boiling point, wherein the temperature is chosen to provide a significant CTE mismatch between the layer and the work piece in order to promote exfoliation of the layer off the work piece, and wherein process time in the ultrasonic bath is within a range from several seconds up to 120 minutes for loosening the layer; cleaning the work piece by rinsing with liquids; and drying the work piece. A system is described for running the exfoliation process.
摘要翻译：从工件剥离沉积材料的方法可以包括：将工件浸入超声波浴中并施加超声能量，其中超声波浴含有保持在大于室温至较低的范围内的恒定温度的流体或者液体在室温和小于流体沸点之间的范围内循环选择，其中选择温度以在层和工件之间提供显着的CTE不匹配，以便促进层离开工件的剥离，并且其中在超声波浴中的处理时间在几秒至120分钟的范围内以松开该层; 用液体清洗工件; 并干燥工件。描述了运行剥离过程的系统。

8. 发明公开

EP3186823A1 EXFOLIATION PROCESS FOR REMOVAL OF DEPOSITED MATERIALS FROM MASKS CARRIERS, AND DEPOSITION TOOL COMPONENTS 审中-公开
标题翻译：去除掩模载体中沉积材料的剥离过程以及沉积工具组件
公开(公告)号：EP3186823A1
公开(公告)日：2017-07-05
申请号：EP15835701.2
申请日：2015-08-28
申请人： Applied Materials, Inc.
发明人： SONG, Daoying , KWAK, Byung Sung, Leo
IPC分类号： H01L21/301 , H01L21/78
CPC分类号： C23C16/4407 , B08B3/12 , C23C14/564
摘要： A method for exfoliation of deposited material off a work piece may comprise: immersing the work piece in an ultrasonic bath and applying ultrasonic energy, wherein the ultrasonic bath contains a fluid either held at a constant temperature within the range from greater than room temperature to less than the fluid boiling point, or the fluid is cycled over a ΔΤ chosen within the range between room temperature and less than the fluid boiling point, wherein the temperature is chosen to provide a significant CTE mismatch between the layer and the work piece in order to promote exfoliation of the layer off the work piece, and wherein process time in the ultrasonic bath is within a range from several seconds up to 120 minutes for loosening the layer; cleaning the work piece by rinsing with liquids; and drying the work piece. A system is described for running the exfoliation process.
摘要翻译：用于从工件上剥离沉积材料的方法可包括：将工件浸入超声波浴中并施加超声波能量，其中超声波浴包含保持在大于室温至小于室温的恒定温度的流体比流体沸点高，或者流体在选定在室温和低于流体沸点的范围内的ΔT上循环，其中选择温度以在层和工件之间提供显着的CTE失配，以便促进该层从工件上的剥离，并且其中超声波浴中的处理时间在几秒至120分钟的范围内以松开该层; 用液体清洗工件; 并干燥工件。描述了用于运行剥离过程的系统。

9. 发明授权

EP2721663B1 MASK-LESS FABRICATION OF THIN FILM BATTERIES 有权
标题翻译：薄膜电池面具LOSE生产
公开(公告)号：EP2721663B1
公开(公告)日：2016-10-05
申请号：EP12864769.0
申请日：2012-06-14
申请人： Applied Materials, Inc.
发明人： SONG, Daoying , JIANG, Chong , KWAK, Byung Sung, Leo
IPC分类号： H01M2/10 , H01M10/36 , H01M4/04 , H01M10/04 , H01M4/1395 , H01M4/38 , H01M6/00 , H01M6/40 , H01M4/139 , H01M10/052 , H01M10/0585
CPC分类号： H01M6/40 , B01J19/121 , B01J2219/0879 , B01J2219/12 , C01B21/097 , C01G51/42 , C01P2006/40 , H01M2/026 , H01M2/0277 , H01M2/26 , H01M4/04 , H01M4/0426 , H01M4/139 , H01M4/1395 , H01M4/382 , H01M4/525 , H01M6/005 , H01M6/185 , H01M6/186 , H01M10/0404 , H01M10/0436 , H01M10/052 , H01M10/0562 , H01M10/0585 , H01M2220/30 , H01M2300/0068 , Y10T29/49108
摘要： Thin film batteries (TFB) are fabricated by a process which eliminates and/or minimizes the use of shadow masks. A selective laser ablation process, where the laser patterning process removes a layer or stack of layers while leaving layer(s) below intact, is used to meet certain or all of the patterning requirements. For die patterning from the substrate side, where the laser beam passes through the substrate before reaching the deposited layers, a die patterning assistance layer, such as an amorphous silicon layer or a microcrystalline silicon layer, may be used to achieve thermal stress mismatch induced laser ablation, which greatly reduces the laser energy required to remove material.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式