专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

WO2012025484A1 CARRIER FOR A SUBSTRATE AND A METHOD FOR ASSEMBLING THE SAME 审中-公开
标题翻译：用于衬底的载体和用于组装衬底的方法
公开(公告)号：WO2012025484A1
公开(公告)日：2012-03-01
申请号：PCT/EP2011/064371
申请日：2011-08-22
申请人： APPLIED MATERIALS, INC. , BRÜNING, Andre , HEIMEL, Oliver , HINTERSCHUSTER, Reiner , WOLF, Hans Georg
发明人： BRÜNING, Andre , HEIMEL, Oliver , HINTERSCHUSTER, Reiner , WOLF, Hans Georg
IPC分类号： C23C14/50
CPC分类号： C23C14/50 , C03C17/002 , Y10T29/49826 , Y10T29/49963
摘要： The present invention is relates to carriers for substrates and to methods for assembling the same in the field of vacuum deposition of thin films. In particular, the present invention is directed a carrier (1) for a substrate to be coated in a vacuum chamber comprising: a first frame (3) comprising two vertical sections (32) and two horizontal sections (31) being dimensioned to surround the substrate; a second frame (2) dimensioned to define an area of the substrate to be coated, and to cover at least a first part (33) of the first frame (3) to prevent the first part (33) of the first frame (3) from being coated when the second frame (2) is mounted to the first frame (3); and wherein the second frame (2) is detachably mounted to the first frame (3).
摘要翻译：本发明涉及用于衬底的载体及其在薄膜的真空沉积领域中的组装方法。特别地，本发明涉及一种用于要涂覆在真空室中的基底的载体（1），包括：包括两个垂直部分（32）和两个水平部分（31）的第一框架（3），其尺寸被设计成围绕基质; 第二框架（2）的尺寸设置成限定待涂覆的基底的区域，并且覆盖第一框架（3）的至少第一部分（33）以防止第一框架（3）的第一部分（33））在第二框架（2）安装到第一框架（3）时被涂覆; 并且其中所述第二框架（2）可拆卸地安装到所述第一框架（3）。

2. 发明申请

WO2016015745A1 APPARATUS AND METHOD FOR HOLDING A SUBSTRATE DURING LAYER DEPOSITION IN A VACUUM CHAMBER 审中-公开
标题翻译：在真空室中的层沉积期间保持基底的装置和方法
公开(公告)号：WO2016015745A1
公开(公告)日：2016-02-04
申请号：PCT/EP2014/066181
申请日：2014-07-28
申请人： APPLIED MATERIALS, INC. , HINTERSCHUSTER, Reiner , BRÜNING, Andre
发明人： HINTERSCHUSTER, Reiner , BRÜNING, Andre
IPC分类号： C23C16/458 , C23C14/50 , B65G49/06
CPC分类号： C23C16/4587 , B25B11/005 , C23C14/50
摘要： The present disclosure provides a holding arrangement (100) for holding a substrate (10) during layer deposition in a vacuum chamber. The holding arrangement (100) includes a carrier (110) having a support surface (112) configured for supporting the substrate (10); and one or more holding devices (120) provided at the carrier (110). Each each holding device (120) includes at least one rotatable device (122) configured to rotate around a rotation axis (124), wherein the rotation axis (124) is substantially perpendicular to the support surface (112), and wherein the rotatable device (122) has a contact element (126, 526) positioned at a distance from the rotation axis (124) for holding the substrate (10) after rotation.
摘要翻译：本公开提供了一种用于在层沉积期间在真空室中保持衬底（10）的保持装置（100）。保持装置（100）包括具有支撑表面（112）的载体（110），支撑表面（112）构造成支撑基底（10）; 以及设置在所述载体（110）处的一个或多个保持装置（120）。每个保持装置（120）包括构造成围绕旋转轴线（124）旋转的至少一个可旋转装置（122），其中旋转轴线（124）基本上垂直于支撑表面（112），并且其中可旋转装置（122）具有定位在离开旋转轴线（124）一定距离处的接触元件（126,526），用于在旋转之后保持基板（10）。

3. 发明申请

WO2015158390A1 CARRIER FOR SUBSTRATES 审中-公开
标题翻译：基板载体
公开(公告)号：WO2015158390A1
公开(公告)日：2015-10-22
申请号：PCT/EP2014/057919
申请日：2014-04-17
申请人： APPLIED MATERIALS, INC. , BRÜNING, Andre , HEIMEL, Oliver , HINTERSCHUSTER, Reiner
发明人： BRÜNING, Andre , HEIMEL, Oliver , HINTERSCHUSTER, Reiner
IPC分类号： H01J37/32 , H01L21/687 , C23C16/458 , C23C14/50 , G03F7/20
CPC分类号： H01J37/32715 , C23C14/50 , C23C16/4585 , C23C16/4587 , G03F7/707 , G03F7/70716 , G03F7/70783 , H01J37/32376 , H01L21/68728
摘要： A carrier (100) for supporting a substrate (101) in a substrate processing chamber (600) for vacuum processing is described. The carrier includes at least two holders (120), wherein each holder includes a fixed portion (122), which is configured to be attached to a carrier body having a fixed position with respect to the carrier body, a floating portion (123), which is movable relative to the fixed portion along at least one direction (140), and a fixing mechanism, which is provided in a fixed position relative to the floating portion and which is configured to clamp the substrate in the holder. Moreover, the floating portion is movable along the at least one direction from a first end position to a second end position, and said floating portion further comprises a force arrangement (130) configured to center or to pull the substrate in the carrier in the at least one direction.
摘要翻译：描述了用于在用于真空处理的基板处理室（600）中支撑基板（101）的载体（100）。载体包括至少两个保持器（120），其中每个保持器包括固定部分（122），其被构造成附接到相对于载体主体具有固定位置的载体主体，浮动部分（123）其可沿至少一个方向（140）相对于所述固定部分移动;以及固定机构，所述固定机构相对于所述浮动部分设置在固定位置，并且被构造成将所述基板夹持在所述保持器中。此外，浮动部分可以沿着至少一个方向从第一端部位置移动到第二端部位置，并且所述浮动部分还包括力装置（130），其配置成使载体中的基板在中心位置或在其中拉动至少一个方向。

4. 发明申请

WO2015188878A1 CLAMP ARRANGEMENT FOR A SUBSTRATE CARRIER, AND METHOD FOR OPENING AND FASTENING A CLAMP ARRANGEMENT 审中-公开
标题翻译：底板承载件的夹紧装置，以及打开和紧固夹紧装置的方法
公开(公告)号：WO2015188878A1
公开(公告)日：2015-12-17
申请号：PCT/EP2014/062420
申请日：2014-06-13
申请人： APPLIED MATERIALS, INC. , BRÜNING, Andre , HINTERSCHUSTER, Reiner
发明人： BRÜNING, Andre , HINTERSCHUSTER, Reiner
IPC分类号： H01L21/67 , H01L21/687
CPC分类号： H01L21/68707 , H01L21/67115 , H01L21/68728
摘要： A clamp device (100), a clamp tool (200), and a clamp arrangement (300) for clamping a substrate (480) to be processed in a substrate carrier (500) are described. The clamp device includes a first lever (110) and a second lever (120), wherein the first lever (110) is movably supported in a first joint (115), the second lever (120) is movably supported in a second joint (125), and wherein the first lever (110) and the second lever (120) are movably connected to each other by a first common joint (140). The second lever (120) includes a clamping portion (121) adapted for being pressed against the substrate (480; 510) to be processed. At least one of the first lever (110) and the second lever (120) comprises a contact portion (116; 126) for providing functional contact to a clamp tool (200; 610). The clamp tool is adapted for opening and fastening the clamp device.
摘要翻译：描述了夹持装置（100），夹紧工具（200）和用于夹持待处理衬底（480）在衬底载体（500）中的夹具装置（300）。夹持装置包括第一杆（110）和第二杆（120），其中第一杆（110）可移动地支撑在第一接头（115）中，第二杆（120）可移动地支撑在第二接头 125），并且其中所述第一杆（110）和所述第二杆（120）通过第一公共接头（140）可移动地彼此连接。第二杆（120）包括适于被压靠待加工的衬底（480; 510）的夹紧部分（121）。所述第一杆（110）和所述第二杆（120）中的至少一个包括用于向夹具（200; 610）提供功能接触的接触部分（116; 126）。夹具用于打开和固定夹紧装置。

5. 发明申请

WO2017050350A1 SUBSTRATE CARRIER, AND SPUTTER DEPOSITION APPARATUS AND METHOD USING THE SAME 审中-公开
标题翻译：基板载体和溅射沉积装置及其使用方法
公开(公告)号：WO2017050350A1
公开(公告)日：2017-03-30
申请号：PCT/EP2015/071609
申请日：2015-09-21
申请人： APPLIED MATERIALS, INC. , BRÜNING, Andre , KELLER, Stefan , HINTERSCHUSTER, Reiner , ZILBAUER, Thomas Werner
发明人： BRÜNING, Andre , KELLER, Stefan , HINTERSCHUSTER, Reiner , ZILBAUER, Thomas Werner
IPC分类号： C23C14/50 , H01J37/32 , H01J37/34 , H01L21/677 , H01L21/687
CPC分类号： H01J37/32715 , C23C14/34 , C23C14/50 , C23C14/562 , H01J37/32733 , H01J37/32752 , H01J37/3405 , H01L21/67706 , H01L21/67709 , H01L21/67712 , H01L21/6776 , H01L21/68757 , H01L21/68764 , H01L21/68771
摘要： A carrier (100) for supporting at least one substrate during a sputter deposition process is provided. The carrier (100) includes a non-conductive carrier body (102) having a first end (111) and an opposing second end (112); an electrically insulated first guiding device (120) provided at the first end (111) of the ceramic carrier body (102); and an electrically insulated second guiding device (130) provided at the second end (112) of the ceramic carrier body (102).
摘要翻译：提供了一种用于在溅射沉积工艺期间支撑至少一个基板的载体（100）。载体（100）包括具有第一端（111）和相对的第二端（112）的非导电载体主体（102）。设置在陶瓷载体主体（102）的第一端（111）处的电绝缘的第一引导装置（120）; 以及设置在陶瓷载体主体（102）的第二端（112）处的电绝缘的第二引导装置（130）。

6. 发明申请

WO2014114360A1 SUBSTRATE CARRIER ARRANGEMENT AND METHOD FOR HOLDING A SUBSTRATE 审中-公开
标题翻译：基板载体布置和用于保持基板的方法
公开(公告)号：WO2014114360A1
公开(公告)日：2014-07-31
申请号：PCT/EP2013/051589
申请日：2013-01-28
申请人： APPLIED MATERIALS, INC. , YANG, Chi-Chang , BRÜNING, Andre , HINTERSCHUSTER, Reiner , LIN, Shin-Hung , LIN, Chun-Hung
发明人： YANG, Chi-Chang , BRÜNING, Andre , HINTERSCHUSTER, Reiner , LIN, Shin-Hung , LIN, Chun-Hung
IPC分类号： C23C14/50 , C23C16/458
CPC分类号： C23C14/50 , C23C16/458
摘要： A substrate carrier arrangement is provided for holding a substrate having a substrate surface to be processed. The substrate carrier arrangement includes a first substrate carrier plate (201) and a second substrate carrier plate (202). The second substrate carrier plate (202) is adapted for covering an opening (203) provided in the first substrate carrier plate (201). The substrate (101) is held between the first substrate carrier plate (201) and the second substrate carrier plate (202) such that a substrate surface (102) to be processed is exposed for processing through the opening (203).
摘要翻译：提供了用于保持具有待处理衬底表面的衬底的衬底载体布置。衬底载体布置包括第一衬底承载板（201）和第二衬底承载板（202）。第二基板承载板（202）适于覆盖设置在第一基板承载板（201）中的开口（203）。基板（101）保持在第一基板载体板（201）和第二基板载体板（202）之间，使得待处理的基板表面（102）通过开口（203）露出以进行处理。

7. 发明申请

WO2015014411A1 HOLDING ARRANGEMENT FOR SUBSTRATES 审中-公开
标题翻译：基板保持布置
公开(公告)号：WO2015014411A1
公开(公告)日：2015-02-05
申请号：PCT/EP2013/066294
申请日：2013-08-02
申请人： APPLIED MATERIALS, INC. , BRÜNING, Andre , HINTERSCHUSTER, Reiner , WOLF, Hans Georg , ZILBAUER, Thomas Werner
发明人： BRÜNING, Andre , HINTERSCHUSTER, Reiner , WOLF, Hans Georg , ZILBAUER, Thomas Werner
IPC分类号： C23C14/50 , C03C17/00 , B65G49/06 , C23C16/458
CPC分类号： C23C16/4585 , C23C14/50 , C23C16/4587
摘要： A holding arrangement (10) for holding a substrate (20) during vacuum layer deposition is provided. The holding arrangement (10) includes a frame (30) having two or more frame elements (31, 32, 33, 34), the frame elements (31, 32, 33, 34) forming an aperture opening, and elastic means (40) configured to provide a clamping force acting against portions of the substrate edges for clamping the substrate (20) at said substrate edges.
摘要翻译：提供了一种用于在真空层沉积期间保持基板（20）的保持装置（10）。保持装置（10）包括具有两个或多个框架元件（31,32,33,34）的框架（30），形成开口的框架元件（31,32,33,34）和弹性装置（40 ），其被配置成提供作用于所述基板边缘的部分的夹紧力，以将所述基板（20）夹持在所述基板边缘。

8. 发明申请

WO2014139594A1 CARRIER FOR A SUBSTRATE AND METHOD FOR CARRYING A SUBSTRATE 审中-公开
标题翻译：用于基板的载体和用于承载基板的方法
公开(公告)号：WO2014139594A1
公开(公告)日：2014-09-18
申请号：PCT/EP2013/055457
申请日：2013-03-15
申请人： APPLIED MATERIALS, INC. , HINTERSCHUSTER, Reiner , BRÜNING, Andre
发明人： HINTERSCHUSTER, Reiner , BRÜNING, Andre
IPC分类号： C23C14/50 , C03C17/00
CPC分类号： C23C14/04 , C23C14/50 , C23C16/042 , C23C16/4587
摘要： A carrier (200; 300; 400) for carrying a substrate (210; 310) in a deposition chamber is described. The carrier includes a frame (240; 250; 260; 270; 340; 350; 360; 370; 440; 450; 460; 470) for vertically holding the substrate (210; 310), wherein the frame has a substantially rectangular shape with a bottom frame part (240; 340; 440); a fixing means (225; 325) for firmly fixing the substrate (210; 310) to the carrier (200; 300; 400), wherein the fixing means (225; 325) is located in a center region of the bottom frame part (240; 340; 440); and one or more support members (220; 230; 320) for supporting but not firmly fixing the substrate (210; 310). Further, a method for carrying a substrate during deposition is described.
摘要翻译：描述了用于在沉积室中承载衬底（210; 310）的载体（200; 300; 400）。载体包括用于垂直保持基底（210; 310）的框架（240; 250; 260; 270; 340; 350; 360; 370; 440; 450; 460; 470），其中框架具有基本上矩形的形状，底部框架部分（240; 340; 440）; 用于将所述基板（210; 310）牢固地固定到所述载体（200; 300; 400）上的固定装置（225; 325），其中所述固定装置（225; 325）位于所述底部框架部分 240; 340; 440）; 以及用于支撑但不牢固地固定所述基底（210; 310）的一个或多个支撑构件（220; 230; 320）。此外，描述了在沉积期间承载基底的方法。

9. 发明申请

WO2015014410A1 HOLDING ARRANGEMENT FOR SUBSTRATES 审中-公开
标题翻译：基板保持布置
公开(公告)号：WO2015014410A1
公开(公告)日：2015-02-05
申请号：PCT/EP2013/066293
申请日：2013-08-02
申请人： APPLIED MATERIALS, INC. , HEIMEL, Oliver , BRÜNING, Andre
发明人： HEIMEL, Oliver , BRÜNING, Andre
IPC分类号： C23C14/50 , C03C17/00 , B65G49/06 , C23C16/458
CPC分类号： C23C14/50 , C03C17/002 , C23C16/4585
摘要： A holding arrangement (10) for holding a substrate (20) during vacuum layer deposition is provided. The holding arrangement (10) includes a frame (30) configured to support the substrate (20), and one or more holding devices (40) attached to the frame (30) and configured to provide a holding force to the substrate (20). Each holding device (40) includes an elastic unit (41) configured to provide the holding force, and engaging means (42) configured to be engaged for providing a release force (52) opposing the holding force to release the substrate (20).
摘要翻译：提供了一种用于在真空层沉积期间保持基板（20）的保持装置（10）。保持装置（10）包括构造成支撑衬底（20）的框架（30）和附接到框架（30）并被配置为向衬底（20）提供保持力的一个或多个保持装置（40）。每个保持装置（40）包括构造成提供保持力的弹性单元（41）和构造成接合的接合装置（42），用于提供与保持力相反的释放力（52）以释放衬底（20）。

10. 发明申请

WO2018184690A1 SUPPLY LINE GUIDE FOR A VACUUM PROCESSING SYSTEM 审中-公开
公开(公告)号：WO2018184690A1
公开(公告)日：2018-10-11
申请号：PCT/EP2017/058373
申请日：2017-04-07
申请人： APPLIED MATERIALS, INC. , BRÜNING, Andre , SAUER, Andreas
发明人： BRÜNING, Andre , SAUER, Andreas
IPC分类号： B01J3/02 , C23C14/56
摘要： A supply line guide (100) for guiding a plurality of supply lines in a vacuum chamber of a processing system is described. The supply line guide includes a guiding arrangement (110) including a plurality of connected elements (115), wherein the connected elements (115) are angle-adjustable relative to each other. Further, the supply line guide includes a flexible tube (120) provided around the guiding arrangement (110).

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式