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1. 发明申请

WO2022128112A1 ROLLER FOR A CARRIER TRANSPORT ASSEMBLY, SUBSTRATE PROCESSING SYSTEM, METHOD OF MAINTAINING A SUBSTRATE PROCESSING SYSTEM, AND METHOD OF MANUFACTURING A DEVICE 审中-公开
公开(公告)号：WO2022128112A1
公开(公告)日：2022-06-23
申请号：PCT/EP2020/086839
申请日：2020-12-17
申请人： APPLIED MATERIALS, INC. , BRÜNING, Andre , EHMANN, Christian Wolfgang , JIANG, Kaiyun , LINDENBERG, Ralph , HEIMEL, Oliver , KURITA, Shinichi
发明人： BRÜNING, Andre , EHMANN, Christian Wolfgang , JIANG, Kaiyun , LINDENBERG, Ralph , HEIMEL, Oliver , KURITA, Shinichi
IPC分类号： H01L21/67 , H01L21/677
摘要： A roller for a carrier transport assembly is described. The roller includes a roller body being rotatable and having a substrate support surface; a roller casing surround at least a portion of the roller; and a trapping surface of the roller casing, the trapping surface having at least a first surface portion facing the roller.

2. 发明申请

WO2011090905A2 TRANSFER ROBOT WITH SUBSTRATE COOLING 审中-公开
标题翻译：转移机架与底板冷却
公开(公告)号：WO2011090905A2
公开(公告)日：2011-07-28
申请号：PCT/US2011/021286
申请日：2011-01-14
申请人： APPLIED MATERIALS, INC. , KURITA, Shinichi , INAGAWA, Makoto , MATSUMOTO, Takayuki
发明人： KURITA, Shinichi , INAGAWA, Makoto , MATSUMOTO, Takayuki
IPC分类号： H01L21/677 , B25J15/08 , B65G49/06
CPC分类号： B25J19/0054 , B65G49/061 , C03B35/20 , H01L21/67109 , H01L21/67742 , Y02P40/57
摘要： Embodiments of the present invention provide a transfer robot having a cooling plate attached thereto for cooling a substrate during transfer between a processing chamber and a load lock chamber. In one embodiment, the cooling plate is a single, large area cooling plate attached to the transfer robot beneath the substrate being transferred. In another embodiment, the cooling plate is an array of substrates attached to the transfer robot beneath the substrate being transferred. The cooling plate may include a conduit path for circulating a cooling fluid throughout the cooling plate. The cooling plate may have an upper surface with a high emissivity coating applied thereto.
摘要翻译：本发明的实施例提供一种传送机器人，其具有附接到其上的冷却板，用于在处理室和装载锁定室之间的转移期间冷却基板。在一个实施例中，冷却板是连接到传送机器人下面的单个大面积的冷却板，所述转移机器人正在被转移。在另一个实施例中，冷却板是附接到转移机器人下方的基板阵列，其被转移。冷却板可以包括用于使冷却流体循环遍及冷却板的导管路径。冷却板可以具有施加到其上的高辐射率涂层的上表面。

3. 发明申请

WO2010091205A2 GROUND RETURN FOR PLASMA PROCESSES 审中-公开
标题翻译：等离子体处理的接地返回
公开(公告)号：WO2010091205A2
公开(公告)日：2010-08-12
申请号：PCT/US2010/023236
申请日：2010-02-04
申请人： APPLIED MATERIALS, INC. , CHOI, Soo Young , TINER, Robin L. , KURITA, Shinichi , WHITE, John M. , SORENSEN, Carl A. , KHO, Jeffrey A. , ANWAR, Suhail , FURUTA, Gaku , INAGAWA, Makoto
发明人： CHOI, Soo Young , TINER, Robin L. , KURITA, Shinichi , WHITE, John M. , SORENSEN, Carl A. , KHO, Jeffrey A. , ANWAR, Suhail , FURUTA, Gaku , INAGAWA, Makoto
IPC分类号： H05H1/34 , H01L21/205
CPC分类号： C23C16/5096 , C23C16/4585 , H01J37/32091 , H01J37/32174 , H01J37/32568 , H01L21/67069
摘要： A method and apparatus for providing an electrically symmetrical ground or return path for electrical current between two electrodes is described. The apparatus includes at least on radio frequency (RF) device coupled to one of the electrodes and between a sidewall and/or a bottom of a processing chamber. The method includes moving one electrode relative to another and realizing a ground return path based on the position of the displaced electrode using one or both of a RF device coupled to a sidewall and the electrode, a RF device coupled to a bottom of the chamber and the electrode, or a combination thereof.
摘要翻译：描述了用于为两个电极之间的电流提供电对称接地或返回路径的方法和设备。该装置包括至少一个射频（RF）装置，该射频（RF）装置耦合到电极中的一个并且位于处理室的侧壁和/或底部之间。该方法包括使用一个电极相对于另一个电极移动，并且使用耦合到侧壁和电极的RF装置，耦合到腔室底部的RF装置以及耦合到侧壁和电极的RF装置中的一个或两个，基于位移电极的位置实现接地返回路径，电极或其组合。

4. 发明申请

WO2009126901A3 DYNAMIC SCRIBE ALIGNMENT FOR LASER SCRIBING, WELDING OR ANY PATTERNING SYSTEM 审中-公开
公开(公告)号：WO2009126901A3
公开(公告)日：2009-10-15
申请号：PCT/US2009/040232
申请日：2009-04-10
申请人： APPLIED MATERIALS, INC. , INAGAWA, Makoto , KURITA, Shinichi , SHAMOUN, Bassam , KRISHNASWAMI, Sriram , SHIRK, Michael D. , CUNNINGHAM, Kevin L.
发明人： INAGAWA, Makoto , KURITA, Shinichi , SHAMOUN, Bassam , KRISHNASWAMI, Sriram , SHIRK, Michael D. , CUNNINGHAM, Kevin L.
IPC分类号： H01L21/78 , H01L31/042
摘要： Methods and systems for improving the alignment between a previously formed feature and a subsequently formed feature are provided. An exemplary method can include laser scribing a workpiece (104, 550) having a previously formed first feature. The exemplary method includes imaging the workpiece (104, 550) with an imaging device (320, 420, 554, 640) so as to capture a plurality of positions of the first feature on the workpiece (104, 550) relative to the laser-scribing device (100). The exemplary method further includes using the captured positions to align output from the laser-scribing device (100) in order to form a second feature on the workpiece (104, 550) at a controlled distance from the first feature.

5. 发明申请

WO2008109311A2 CONTROL OF SLIT VALVE DOOR SEAL PRESSURE 审中-公开
标题翻译：缝隙阀门密封压力的控制
公开(公告)号：WO2008109311A2
公开(公告)日：2008-09-12
申请号：PCT/US2008/055180
申请日：2008-02-27
申请人： APPLIED MATERIALS, INC. , MATSUMOTO, Takayuki , KURITA, Shinichi
发明人： MATSUMOTO, Takayuki , KURITA, Shinichi
IPC分类号： F16K51/02
CPC分类号： F16K3/188 , F16K3/02 , F16K51/02 , Y10T137/0396
摘要： Apparatuses and methods are provided for sealing a slit valve passage between two substrate processing chambers. A body with two openings to register with openings in the walls of the process chambers, and a passageway between them, houses a sealing member configured to extend and retract to block or open the passageway. The sealing member comprises a seal on one face that covers one opening, and a moveable lateral extension on the other face that braces against the other opening. The extension is actuated to contact the wall of the body, providing a bracing or sealing force to the seal on the other face of the sealing member. The sealing force may be adjusted by varying the gas pressure to the sealing member based on pressure conditions in the process chambers.
摘要翻译：提供了用于密封两个基板处理室之间的狭缝阀通道的装置和方法。具有与处理室的壁中的开口对准的两个开口以及它们之间的通道的主体容纳密封构件，密封构件构造成伸出和缩回以阻塞或打开通道。密封构件在覆盖一个开口的一个面上具有密封件，并且在另一个面上具有可移动的横向延伸部，该另一个面支撑另一个开口。致动该延伸部以接触本体的壁，为密封构件的另一面上的密封件提供支撑或密封力。基于处理室中的压力条件，通过改变密封构件的气体压力可以调节密封力。

6. 发明申请

WO2008106634A2 FLOATING SLIT VALVE FOR TRANSFER CHAMBER INTERFACE 审中-公开
标题翻译：用于移动式机房接口的浮动式滑阀
公开(公告)号：WO2008106634A2
公开(公告)日：2008-09-04
申请号：PCT/US2008/055448
申请日：2008-02-29
申请人： APPLIED MATERIALS, INC. , WHITE, John M. , KURITA, Shinichi , MATSUMOTO, Takayuki
发明人： WHITE, John M. , KURITA, Shinichi , MATSUMOTO, Takayuki
IPC分类号： F16K51/00 , B21D51/16 , F16K25/00
CPC分类号： F16K51/02 , Y10S438/905 , Y10T29/49412
摘要： The present invention generally comprises a floating slit valve for interfacing with a chamber. A floating slit valve moves or "floats" relative to another object such as a chamber. The slit valve may be coupled between two chambers. When a chamber coupled with the slit valve is heated, the slit valve may also be heated by conduction. As the slit valve is heated, it may thermally expand. When a vacuum is drawn in a chamber, the slit valve may deform due to vacuum deflection. By disposing a low friction material spacer between the chamber and the slit valve, the slit valve may not rub against the chamber during thermal expansion/contraction and/or vacuum deflection and thus, may not generate undesirable particle contaminants. Additionally, slots drilled through the chamber for coupling the slit valve to the chamber may be sized to accommodate thermal expansion/contraction and vacuum deflection of the slit valve.
摘要翻译：本发明一般包括用于与腔室接口的浮动狭缝阀。浮动狭缝阀移动或“漂浮” 相对于另一个物体如室。狭缝阀可以连接在两个腔室之间。当与狭缝阀连接的腔室被加热时，狭缝阀也可以通过传导加热。当狭缝阀受热时，可能会发生热膨胀。当在腔室内抽真空时，狭缝阀可能由于真空偏转而变形。通过在腔室和狭缝阀之间设置低摩擦材料间隔件，狭缝阀在热膨胀/收缩和/或真空偏转期间不会与腔室摩擦，因此不会产生不希望有的颗粒污染物。另外，通过腔室钻出的用于将狭缝阀连接到腔室的狭槽的尺寸可以适应狭缝阀的热膨胀/收缩和真空偏转。

7. 发明申请

WO2012173692A1 CVD MASK ALIGNMENT FOR OLED PROCESSING 审中-公开
标题翻译：用于OLED处理的CVD掩模对准
公开(公告)号：WO2012173692A1
公开(公告)日：2012-12-20
申请号：PCT/US2012/033657
申请日：2012-04-13
申请人： APPLIED MATERIALS, INC. , MORI, Ikuo , KURITA, Shinichi , LIN, Chang-Tsung , JOHNSTON, Benjamin M. , KIM, Beom Soo
发明人： MORI, Ikuo , KURITA, Shinichi , LIN, Chang-Tsung , JOHNSTON, Benjamin M. , KIM, Beom Soo
IPC分类号： H01L51/56 , C23C16/04
CPC分类号： H01L51/56 , C23C16/042
摘要： The present invention generally relates to a CVD apparatus for OLED processing. For OLED processing, a mask is oftentimes utilized during the CVD process. Properly aligning the mask over the substrate can be accomplished by utilizing two X-Y-Z motion alignment elements together with two Z motion alignment elements and one or more alignment visualization systems. The mask is initially disposed on the alignment elements. The visualization systems confirm whether the mask is properly aligned. If realignment is necessary, then the two X-Y-Z alignment elements move the mask while the two Z alignment elements remain stationary. The visualization systems then confirm the mask is properly aligned so that the CVD process may then proceed.
摘要翻译：本发明一般涉及用于OLED处理的CVD设备。对于OLED处理，在CVD过程中通常使用掩模。可以通过利用两个X-Y-Z运动对准元件与两个Z运动对准元件和一个或多个对准可视化系统一起来将掩模适当地对准衬底上的掩模。掩模最初设置在对准元件上。可视化系统确认掩模是否正确对齐。如果需要重新对准，则两个X-Y-Z对准元件移动掩模，同时两个Z对准元件保持静止。然后，可视化系统确认掩模被正确对准，以便CVD工艺可以继续进行。

8. 发明申请

WO2011137373A2 VERTICAL INLINE CVD SYSTEM 审中-公开
标题翻译：立式CVD系统
公开(公告)号：WO2011137373A2
公开(公告)日：2011-11-03
申请号：PCT/US2011/034623
申请日：2011-04-29
申请人： APPLIED MATERIALS, INC. , KURITA, Shinichi , KUDELA, Jozef , ANWAR, Suhail , WHITE, John M. , YIM, Dong-Kil , WOLF, Hans , ZVALO, Dennis , INAGAWA, Makoto , MORI, Ikuo
发明人： KURITA, Shinichi , KUDELA, Jozef , ANWAR, Suhail , WHITE, John M. , YIM, Dong-Kil , WOLF, Hans , ZVALO, Dennis , INAGAWA, Makoto , MORI, Ikuo
IPC分类号： C23C16/50 , C23C16/44 , H01L21/205
CPC分类号： H01L21/67712 , C23C16/4587 , C23C16/46 , C23C16/463 , C23C16/511 , C23C16/54 , H01J37/32192 , H01J37/3222 , H01J37/32513 , H01J37/32522 , H01J37/32889 , H01J37/32899 , H01L21/67098 , H01L21/67126 , H01L21/67173 , H01L21/6719 , H01L21/67201
摘要： The present invention generally relates to a vertical CVD system having a processing chamber that is capable of processing multiple substrates. The multiple substrates are disposed on opposite sides of the processing source within the processing chamber, yet the processing environments are not isolated from each other. The processing source is a horizontally centered vertical plasma generator that permits multiple substrates to be processed simultaneously on either side of the plasma generator, yet independent of each other. The system is arranged as a twin system whereby two identical processing lines, each with their own processing chamber, are arranged adjacent to each other. Multiple robots are used to load and unload the substrates from the processing system. Each robot can access both processing lines within the system.
摘要翻译：本发明一般涉及具有能够处理多个基板的处理室的垂直CVD系统。多个基板设置在处理室内的处理源的相对侧上，但处理环境彼此不隔离。处理源是水平居中的垂直等离子体发生器，其允许在等离子体发生器的任一侧上同时处理多个基板，但彼此独立。该系统被布置为双系统，由此两个相同的处理线各自具有它们自己的处理室，彼此相邻布置。多个机器人用于从处理系统装载和卸载基板。每个机器人可以访问系统内的两条处理线。

9. 发明申请

WO2010025253A2 LOAD LOCK CHAMBER FOR LARGE AREA SUBSTRATE PROCESSING SYSTEM 审中-公开
标题翻译：用于大面积基板处理系统的负载锁室
公开(公告)号：WO2010025253A2
公开(公告)日：2010-03-04
申请号：PCT/US2009/055200
申请日：2009-08-27
申请人： APPLIED MATERIALS, INC. , BEHDJAT, Mehran , KURITA, Shinichi , INAGAWA, Makoto , ANWAR, Suhail
发明人： BEHDJAT, Mehran , KURITA, Shinichi , INAGAWA, Makoto , ANWAR, Suhail
IPC分类号： H01L21/00 , H01L21/02
CPC分类号： H01L21/67201 , H01L21/67236
摘要： The present invention generally includes a load lock chamber for transferring large area substrates into a vacuum processing chamber. The load lock chamber may have one or more separate, environmentally isolated environments. Each processing environment may have a plurality exhaust ports for drawing a vacuum. The exhaust ports may be located at the corners of the processing environment. When a substrate is inserted into the load lock chamber from the factory interface, the environment may need to be evacuated. Due to the exhaust ports located at the corners of the environment, any particles or contaminants that may be present may be pulled to the closest corner and out of the load lock chamber without being pulled across the substrate. Thus, substrate contamination may be reduced.
摘要翻译：本发明一般包括用于将大面积基板传送到真空处理室中的负载锁定室。负载锁定室可能有一个或多个独立的，环境隔离的环境。每个处理环境可以具有用于抽真空的多个排气口。排气口可以位于处理环境的角落处。当基板从工厂接口插入负载锁定室时，环境可能需要撤离。由于排气口位于环境的角落处，可能存在的任何微粒或污染物可能会被拉到最近的拐角并从负载锁定室流出，而不会被拉过基板。因此，基材污染可能会减少。

10. 发明申请

WO2008022029A2 LOAD LOCK CHAMBER WITH HEATER IN TUBE 审中-公开
标题翻译：带加热器的管路箱
公开(公告)号：WO2008022029A2
公开(公告)日：2008-02-21
申请号：PCT/US2007/075699
申请日：2007-08-10
申请人： APPLIED MATERIALS, INC. , ANWAR, Suhail , LEE, Jae-chull , KURITA, Shinichi
发明人： ANWAR, Suhail , LEE, Jae-chull , KURITA, Shinichi
IPC分类号： H01J1/02
CPC分类号： H01L21/67115 , C23C16/54 , H01L21/67201
摘要： Embodiments of the invention include a heated load lock chamber. In one embodiment, a heated load lock chamber includes a chamber body having a plurality of lamp assembles disposed at least partially therein. Each lamp assembly includes a transmissive tube housing a lamp. The transmissive tube extends into the chamber body and provides a pressure barrier isolating the lamp from the interior volume of the load lock chamber. In another embodiment, an open end of the transmissive tube extends through a sidewall of the chamber body. A closed end of the transmissive tube is surrounded by the interior volume of the chamber body and is supported below a top of the chamber body in a spaced apart relation. The open end of the tube is sealed to the sidewall of the chamber body such that the interior of the tube is open to atmosphere.
摘要翻译：本发明的实施例包括加热的负载锁定室。在一个实施例中，加热的负载锁定室包括具有至少部分地设置在其中的多个灯组件的室主体。每个灯组件包括容纳灯的透射管。透射管延伸到室主体中并提供将灯隔离到负载锁定室的内部空间的压力屏障。在另一个实施例中，透射管的开口端延伸穿过腔体的侧壁。透射管的封闭端被室主体的内部空间包围，并以间隔的关系支撑在腔室主体的顶部下方。管的开口端被密封到腔体的侧壁，使得管的内部对大气敞开。

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