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    • 2. 发明公开
    • Thin film magnetic disc
    • Dünnfilmmagnetplatte。
    • EP0205239A2
    • 1986-12-17
    • EP86302893.2
    • 1986-04-17
    • AKASHIC MEMORIES CORPORATION
    • Scott, John C.Li, Eric K.Washburn, Hudson A.Viswanathan, Nal T.
    • G11B5/66G11B5/716
    • G11B5/851G11B5/64
    • @ A new high quality, low cost, thin-film magnetic recording member is provided, which has a coercive field strength greater than 650 Oe, a saturation magnetization greater than 10,000 Gauss, and a squareness ratio of 0.9 or larger. The member includes a substrate on which is directly sputter deposited a chromium layer, without the use of an intervening nickel-containing layer between the substrate and the chromium. A nickel-cobalt recording layer is then sputter deposited directly onto the chromium layer. In the preferred mode, the start of that nickel-cobalt deposition begins less than 100 seconds after the chromium deposition is terminated and is followed by the sputtering of a protective layer. Before the chromium deposition, the substrate is preheated to drive off adsorbed gases, and to establish the proper conditions forthe chromium deposition. The substrate is also heated during the time between when the chromium deposition ends and the nickel-cobalt deposition begins.
    • 提供了一种新的高质量,低成本的薄膜磁记录元件,其具有大于650Oe的矫顽场强度,大于10,000高斯的饱和磁化强度和0.9或更大的矩形比。 该构件包括基底,在其上直接溅射沉积铬层,而不在基底和铬之间使用中间的含镍层。 然后将镍钴记录层直接溅射沉积到铬层上。 在优选的模式中,在铬沉积终止之后,镍钴沉积开始时间小于100秒,之后是保护层的溅射。 在铬沉积之前,将衬底预热以驱除吸附的气体,并为铬沉积建立适当的条件。 在铬沉积结束和镍 - 钴沉积开始之间的时间期间,衬底也被加热。