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1. 发明申请

WO2007023133A2 PHOTOPOLYMER PRINTING PLATE PRECURSOR. 审中-公开
标题翻译：光刻胶印刷机前身。
公开(公告)号：WO2007023133A2
公开(公告)日：2007-03-01
申请号：PCT/EP2006065436
申请日：2006-08-18
申请人： AGFA GEVAERT , WILLIAMSON ALEXANDER , VAN DAMME MARC , JAUNKY WOJCIECH , VAN AERT HUBERTUS
发明人： WILLIAMSON ALEXANDER , VAN DAMME MARC , JAUNKY WOJCIECH , VAN AERT HUBERTUS
CPC分类号： G03F7/033 , B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/14 , B41C2210/04 , B41C2210/06 , B41C2210/22 , B41C2210/24 , G03F7/031
摘要： A photopolymer printing plate precursor comprising a photosensitive coating on a support, wherein said photosensitive coating comprises a composition that is photopolymerizable upon absorption of light, said composition comprising at least one binder, a polymerizable compound, a sensitizer and a photoinitiator, characterized in that said binder is a copolymer that has a Tg of less than 70 °C, and wherein 1 to 50 mol-% of the monomeric units of said copolymer are substituted by at least one acidic group, has a very high sensitivity and resistence of the exposed image parts against alkaline developers, when exposed with a laser, even if no pre-heat step is performed.
摘要翻译：一种光敏聚合物印版前体，其包括在载体上的感光涂层，其中所述感光涂层包含在吸收光时可光聚合的组合物，所述组合物包含至少一种粘合剂，可聚合化合物，敏化剂和光引发剂，其特征在于所述粘合剂是Tg小于70℃的共聚物，其中1至50摩尔％的所述共聚物的单体单元被至少一个酸性基团取代，具有非常高的曝光图像的灵敏度和耐受性即使没有进行预热步骤，也可以用激光曝光。

2. 发明申请

WO2007057337A2 METHOD OF MAKING A LITHOGRAPHIC PRINTING PLATE 审中-公开
标题翻译：制作平版印刷版的方法
公开(公告)号：WO2007057337A2
公开(公告)日：2007-05-24
申请号：PCT/EP2006068264
申请日：2006-11-09
申请人： AGFA GRAPHICS NV , WILLIAMSON ALEXANDER , VAN DAMME MARC , GRIES WILLI-KURT , VAN AERT HUBERTUS
发明人： WILLIAMSON ALEXANDER , VAN DAMME MARC , GRIES WILLI-KURT , VAN AERT HUBERTUS
CPC分类号： G03F7/033 , B41C1/1008 , B41C1/1016 , B41C2201/04 , B41C2201/14 , B41C2210/04 , B41C2210/06 , B41C2210/08 , B41C2210/10 , B41C2210/20 , B41C2210/22 , B41C2210/24 , G03F7/0388 , G03F7/32
摘要： A method of making a lithographic printing plate comprising the steps of : a) providing a lithographic printing plate precursor comprising (i) a support having a hydrophilic surface or which is provided with a hydrophilic layer, (ii) a coating on said support, comprising a photopolymerizable layer, and, optionally, an intermediate layer between the photopolymerizable layer and the support, wherein said photopolymerizable layer comprises a polymerizable compound, a polymerization initiator and a reactive binder, b) image-wise exposing said coating in a plate setter, c) optionally, heating the precursor in a preheating unit, d) developing the precursor off-press in a gumming unit by treating the coating of the precursor with a gum solution, thereby removing the non-exposed areas of the photopolymerizable layer from the support , whereby said reactive binder is a polymer containing a monomeric unit which comprises a group having an ethylenically unsaturated bond.
摘要翻译：一种制备平版印刷版的方法，包括以下步骤：a）提供平版印刷版前体，其包含（i）具有亲水表面的或具有亲水层的载体，（ii）所述载体上的涂层，包括可光聚合层，以及任选地在可光聚合层和载体之间的中间层，其中所述可光聚合层包含可聚合化合物，聚合引发剂和反应性粘合剂，b）在平板印刷机中成像曝光所述涂层，c ）任选地，在预热单元中加热前体，d）通过用胶溶液处理前体的涂层来在上胶单元中显影前体脱模，从而从支持体除去未曝光的可光聚合层的区域，由此所述反应性粘合剂是含有包含具有烯属不饱和键的基团的单体单元的聚合物。

3. 发明申请

WO2004035686A2 POLYMER FOR HEAT-SENSITIVE LITHOGRAPHIC PRINTING PLATE PRECURSOR 审中-公开
标题翻译：聚合物用于热敏平版印刷板前驱体
公开(公告)号：WO2004035686A2
公开(公告)日：2004-04-29
申请号：PCT/EP0350633
申请日：2003-09-18
申请人： AGFA GEVAERT , GROENENDAAL BERT , LOCCUFIER JOHAN , VAN AERT HUUB , VAN DAMME MARC
发明人： GROENENDAAL BERT , LOCCUFIER JOHAN , VAN AERT HUUB , VAN DAMME MARC
IPC分类号： B41C1/10 , C08G8/28 , C08L61/14 , G03F7/105
CPC分类号： C08G8/28 , B41C1/1008 , B41C2210/02 , B41C2210/04 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41C2210/262 , C08L61/14
摘要： A polymer for a heat-sensitive lithographic printing plate precursor is disclosed wherein the polymer comprises a phenolic monomeric unit wherein the H atom of the hydroxy group of the phenyl group of the phenolic monomeric unit is replaced by a group comprising a N-imide group and wherein the substitution of the polymer increases the chemical resistance of the coating of the printing plate precursor.
摘要翻译：公开了一种用于热敏平版印刷版前体的聚合物，其中聚合物包含酚类单体单元，其中酚单体单元的苯基的羟基的H原子被包括N-酰亚胺基团和其中聚合物的取代增加了印版前体的涂层的耐化学性。

4. 发明申请

WO2007057442A3 METHOD OF MAKING A PHOTOPOLYMER PRINTING PLATE 审中-公开
标题翻译：制作光聚合物印刷板的方法
公开(公告)号：WO2007057442A3
公开(公告)日：2007-08-23
申请号：PCT/EP2006068619
申请日：2006-11-17
申请人： AGFA GRAPHICS NV , GRIES WILLI-KURT , VAN DAMME MARC
发明人： GRIES WILLI-KURT , VAN DAMME MARC
IPC分类号： G03F7/09 , G03F7/32
CPC分类号： G03F7/092 , B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/04 , B41C2201/14 , B41C2210/04 , B41C2210/06 , B41C2210/08 , B41C2210/10 , B41C2210/20 , B41C2210/22 , B41C2210/24 , G03F7/32
摘要： A method of making a lithographic printing plate comprising the steps of : a) providing a lithographic printing plate precursor comprising (i) a support having a hydrophilic surface or which is provided with a hydrophilic layer, (ii) a coating on said support, comprising a photopolymerizable layer, and, optionally, an intermediate layer between the photopolymerizable layer and the support, wherein said photopolymerizable layer comprises a polymerizable compound and a polymerization initiator, b) image-wise exposing said coating in a plate setter, c) optionally, heating the precursor in a preheating unit, d) developing the precursor off -press in a gumming unit by treating the coating of the precursor with a gum solution, thereby removing the non-exposed areas of the photopolymerizable layer from the support , wherein said photopolymerizable layer further comprises a polymer containing an acid group and a basic nitrogen-containing compound capable of neutralizing said acid group, or wherein said photopolymerizable layer further comprises a polymer containing an acid group which is neutralized by a basic nitrogen-containing compound.
摘要翻译：制备平版印刷版的方法包括以下步骤：a）提供平版印刷版前体，其包含（i）具有亲水性表面或具有亲水层的载体，（ii）在所述载体上的涂层，其包含可光聚合层和任选地在可光聚合层和载体之间的中间层，其中所述可光聚合层包含可聚合化合物和聚合引发剂，b）将图像曝光于涂布机中的所述涂层，c）任选加热所述前体在预热单元中，d）通过用胶溶液处理所述前体的涂层，从而在所述上胶单元中使所述前体脱离显影，由此从所述支撑体去除所述可光聚合层的未曝光区域，其中所述可光聚合层进一步包含含有酸基团和能够中和所述酸基团的碱性含氮化合物的聚合物，所述可光聚合层还包含含有被碱性含氮化合物中和的酸基的聚合物。

5. 发明申请

WO0206898A3 MATERIAL AND METHOD FOR MAKING AN ELECTROCONDUCTIVE PATTERN 审中-公开
标题翻译：制造电极图案的材料和方法
公开(公告)号：WO0206898A3
公开(公告)日：2002-05-02
申请号：PCT/EP0107083
申请日：2001-06-22
申请人： AGFA GEVAERT
发明人： LAMOTTE JOHAN , LOUWET FRANK , VAN DAMME MARC , VERMEERSCH JOAN , VAN AERT HUBERTUS , GROENENDAAL LAMBERTUS
IPC分类号： G03F7/032 , G03F7/004 , G03F7/016 , G03F7/022 , G03F7/09 , H01B1/12 , H01B13/00 , H01L21/28 , H05K3/10
CPC分类号： G03F7/0166 , G03F7/0163 , G03F7/093 , H05K3/105
摘要： A material for making an electroconductive pattern, the material comprising a support and a light-exposure differentiable element, characterized in that the light-exposure differentiable element comprises an outermost layer containing a polyanion and a polymer or copolymer of a substituted or unsubstituted thiophene, and optionally a second layer contiguous with the outermost layer; and wherein the outermost layer and/or the optional second layer contains a light-sensitive component capable upon exposure of changing the removability of the exposed parts of the outermost layer relative to the unexposed parts of the outermost layer; and a method of making an electroconductive pattern on a support using the material for making an electroconductive pattern.
摘要翻译：一种用于制造导电图案的材料，所述材料包括支撑体和曝光可微分元件，其特征在于，所述曝光可微元件包括含有聚阴离子的最外层和取代或未取代的噻吩的聚合物或共聚物，以及可选地与最外层邻接的第二层; 并且其中最外层和/或任选的第二层包含能够暴露于相对于最外层的未曝光部分改变最外层的暴露部分的可去除性的光敏部件; 以及使用制造导电图案的材料在支撑体上形成导电图案的方法。

6. 发明专利

JP2003076021A Ultraviolet-light sensitive imaging element for making lithographic printing plate 有权
标题翻译：用于制作光刻印版的超光敏感成像元件
公开(公告)号：JP2003076021A
公开(公告)日：2003-03-14
申请号：JP2002171476
申请日：2002-06-12
申请人： Agfa Gevaert Nv , アグフア−ゲヴエルト,ナームローゼ・フエンノートシヤツプ
发明人： VAN DAMME MARC , HENDRIKX PETER , VAN AERT HUUB
IPC分类号： G03F7/039 , B41C1/10 , B41N1/14 , C08F246/00 , G03F7/00 , G03F7/004 , G03F7/021 , G03F7/30
CPC分类号： G03F7/3035 , B41C1/1008 , B41C2210/04 , B41C2210/08 , B41C2210/24 , G03F7/021
摘要： PROBLEM TO BE SOLVED: To provide an imaging element for making a lithographic printing plate having improved sensitivity to UV and developable with an aqueous solution on or outside a printing machine and to provide a method for making a lithographic printing plate using the imaging element. SOLUTION: The imaging element comprises a lithographic support and an imaging layer comprising (i) a polymer having aryldiazosulfonate units and/or aryltriazenylsulfonate units and (ii) a compound capable of generating a radical and/or an acid upon exposure to UV. The imaging element can be exposed by UV light and developed by water or an aqueous solution. The exposure and/or development can be carried out on or outside a printing machine.
摘要翻译：要解决的问题：提供一种用于制造具有改善的对UV的敏感性并且可以用印刷机器上或外部的水溶液显影的平版印刷版的成像元件，并提供使用该成像元件制造平版印刷版的方法。解决方案：所述成像元件包括光刻支架和成像层，所述成像层包含（i）具有芳基重氮磺酸酯单元和/或芳基三氮烯基磺酸酯单元的聚合物和（ii）在暴露于UV时能够产生自由基和/或酸的化合物。成像元件可以通过紫外光曝光并用水或水溶液显影。曝光和/或显影可以在印刷机上或外面进行。

7. 发明专利

JP2002200854A UNTREATED LITHOGRAPHIC PRINTING PLATE 审中-公开
公开(公告)号：JP2002200854A
公开(公告)日：2002-07-16
申请号：JP2001353251
申请日：2001-11-19
申请人： AGFA GEVAERT NV
发明人： VAN DAMME MARC , SAP WIM
IPC分类号： G03F7/004 , B41C1/055 , B41C1/10 , B41N1/14 , G03F7/00 , G03F7/11
摘要： PROBLEM TO BE SOLVED: To provide an untreated material which is suitable for heat mode direct-to-plate recording and is characterized by high sensitivity and high quality of lithographic printing and achieves a high run length when it is exposed on an outer drum laser recorder and an inner drum laser recorder. SOLUTION: A negative acting heat-sensitive material for producing a lithographic printing plate by the direct-to-plate recording characterized by comprising a lithographic base with a hydrophilic surface, a lipophilic image forming layer and a crosslinked hydrophilic top layer in this indicated order and comprising at least one transition metal complex of an organic acid in the lipophilic image forming layer is disclosed. The material of the present invention is characterized by improved run length and can be used as a printing plate just after exposure.

8. 发明专利

JP2001088458A PROCESSLESS THERMAL PRINTING PLATE WITH DISTINCT NANOSTRUCTURE 失效
公开(公告)号：JP2001088458A
公开(公告)日：2001-04-03
申请号：JP2000253784
申请日：2000-08-24
申请人： AGFA GEVAERT NV
发明人： VERMEERSCH JOAN , LOUWET FRANK , SAMIJN RAFAEL , VAN DAMME MARC
IPC分类号： G03F7/004 , B41C1/055 , B41C1/10 , B41M5/36 , B41N1/14 , G03F7/00
摘要： PROBLEM TO BE SOLVED: To provide a processless thermal printing plate with a distinct nanostructure. SOLUTION: A heat-sensitive material for manufacturing a negative type (negative working) non-ablative lithographic printing plate, wherein a thermoplastic polymer bead and a compound that can convert light into heat are contained in a heat-sensitive layer supported on the surface of a hydrophilic metallic substrate and not containing a binder, is provided. The thermoplastic polymer bead has a diameter in the limits of 0.2-1.4 μm.

9. 发明专利

JP2000131831A HEAT MODE SENSITIVE IMAGE FORMING ELEMENT FOR MANUFACTURE OF POSITIVE WORKING PRINTING PLATE 失效
公开(公告)号：JP2000131831A
公开(公告)日：2000-05-12
申请号：JP10513699
申请日：1999-04-13
申请人： AGFA GEVAERT NV
发明人： VAN DAMME MARC , VERMEERSCH JOAN , HAUQUIER GUIDO , VERSCHUEREN ERIC
IPC分类号： G03F7/039 , B41C1/10 , B41M5/36 , B41N1/14 , G03F7/00
摘要： PROBLEM TO BE SOLVED: To provide a heat mode image forming element capable of giving a planographic printing plate having superior printability by an easy method, capable of development by a selective, rapid, easy and ecological method and having high infrared sensitivity and a large difference in developability between exposed and unexposed regions. SOLUTION: The heat mode image forming element for the manufacture of a planographic printing plate has a 1st layer containing a polymer soluble in an aqueous alkaline solution on a planographic printing base having a hydrophilic surface and a top layer on the 1st layer side of the base. The top layer is sensitive to IR and impermeable to an aqueous alkaline developer. At least one of the 1st layer and the top layer contains a surfactant.

10. 发明专利

JP2000066379A HEAT MODE SENSITIVE IMAGE FORMING ELEMENT FOR MANUFACTURE OF POSITIVE WORKING PRINTING PLATE 失效
公开(公告)号：JP2000066379A
公开(公告)日：2000-03-03
申请号：JP5705599
申请日：1999-03-04
申请人： AGFA GEVAERT NV
发明人： VERSCHUEREN ERIC , VAN DAMME MARC , VERMEERSCH JOAN , HAUQUIER GUIDO , JUNG JOERG DR , HABENHAUER HELMUTH
IPC分类号： G03F7/004 , B41C1/10 , B41M5/36 , G03F7/00 , G03F7/11 , G03F7/30
摘要： PROBLEM TO BE SOLVED: To obtain a heat mode sensitive image forming element for the manufacture of a planographic printing plate having a wide development latitude, high resolution and improved scratch resistance. SOLUTION: The heat mode sensitive image forming element has a 1st layer contg. a polymer soluble in an aq. alkaline soln. but insoluble in water and

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