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1. 发明申请

WO2005033655A2 ELECTRODE ASSEMBLY FOR ANALYSIS OF METAL ELECTROPLATING SOLUTION, COMPRISING SELF-CLEANING MECHANISM, PLATING OPTIMIZATION MECHANISM, AND/OR VOLTAGE LIMITING MECHANISM 审中-公开
标题翻译：用于金属电镀解决方案的电极组件，包括自清洁机理，镀层优化机理和/或电压限制机制
公开(公告)号：WO2005033655A2
公开(公告)日：2005-04-14
申请号：PCT/US2004/029705
申请日：2004-09-10
申请人： ADVANCED TECHNOLOGY MATERIALS, INC. , KING, Mackenzie, E. , WANG, Weihua , HAN, Jianwen , ROEDER, Jeffrey, F. , LURCOTT, Steven, M. , STAWASZ, Michele
发明人： KING, Mackenzie, E. , WANG, Weihua , HAN, Jianwen , ROEDER, Jeffrey, F. , LURCOTT, Steven, M. , STAWASZ, Michele
IPC分类号： G01N
CPC分类号： C25D21/12
摘要： The present invention relates to an electrode assembly useful for analyzing metal electroplating solutions. Such electrode assembly comprises a measuring electrode, preferably a rotating disc electrode or a microelectrode, and at least one of an in situ cleaning mechanism, a nucleation and metal growth optimization mechanism, and a voltage limiting mechanism. The present invention also relates to usage of such electrode assembly for in situ cleaning of the measuring electrode, nucleation and metal growth optimization, or voltage limitation.
摘要翻译：本发明涉及一种用于分析金属电镀溶液的电极组件。这种电极组件包括测量电极，优选旋转圆盘电极或微电极，以及原位清洁机构，成核和金属生长优化机构中的至少一个以及电压限制机构。本发明还涉及这种电极组件用于测量电极的原位清洗，成核和金属生长优化或电压限制的用途。

2. 发明申请

WO2007149813A3 ELECTROCHEMICAL SENSING AND DATA ANALYSIS SYSTEM, APPARATUS AND METHOD FOR METAL PLATING 审中-公开
公开(公告)号：WO2007149813A3
公开(公告)日：2007-12-27
申请号：PCT/US2007/071462
申请日：2007-06-18
申请人： ADVANCED TECHNOLOGY MATERIALS, INC. , HAN, Jianwen , HILGARTH, Monica, K. , KING, Mackenzie , LURCOTT, Steven, M.
发明人： HAN, Jianwen , HILGARTH, Monica, K. , KING, Mackenzie , LURCOTT, Steven, M.
IPC分类号： A01N43/22
摘要： An electrochemical sensing and data analysis system (and apparatus and methods) adapted for control of electroplating of various metal(s) on a wafer or other suitable substrate. Components of the system utilize multi-variate analysis (MVA) and galvanostatic, potentiodynamic or other electrical measurements (or combinations thereof) to predict, adjust or control plating parameters, e.g., to achieve improved yield of plated substrates with acceptable levels of defects (or lack thereof).

3. 发明申请

WO2005108649A2 ONE-POINT RECALIBRATION METHOD FOR REDUCING ERROR IN CONCENTRATION MEASUREMENTS FOR AN ELECTROLYTIC SOLUTION 审中-公开
标题翻译：用于减少电解液浓度测量误差的一点检测方法
公开(公告)号：WO2005108649A2
公开(公告)日：2005-11-17
申请号：PCT/US2005/012647
申请日：2005-04-15
申请人： ADVANCED TECHNOLOGY MATERIALS, INC. , HAN, Jianwen , KING, Mackenzie , TOM, Glenn , LURCOTT, Steven, M.
发明人： HAN, Jianwen , KING, Mackenzie , TOM, Glenn , LURCOTT, Steven, M.
IPC分类号： C25D5/00
CPC分类号： G01N27/42 , C25D21/12
摘要： The present invention relates to a method for mathematically re-calibrating and adjusting an initial concentration analysis model that suffers from electrochemical measurement errors caused by surface state changes in the working/counter/reference electrode after extended usage. Specifically, such recalibration method reimburses long-term drift in the electrochemical measurements based on a single point testing.
摘要翻译：本发明涉及一种用于数学重新校准和调整初始浓度分析模型的方法，该模型在延长使用后遭受由工作/计数/参考电极的表面状态变化引起的电化学测量误差。具体地说，这种重新校准方法基于单点测试来补偿电化学测量中的长期漂移。

4. 发明申请

WO2005111275A2 METHODS AND APPARATUSES FOR MONITORING ORGANIC ADDITIVES IN ELECTROCHEMICAL DEPOSITION SOLUTIONS 审中-公开
标题翻译：用于监测电化学沉积溶液中有机添加剂的方法和装置
公开(公告)号：WO2005111275A2
公开(公告)日：2005-11-24
申请号：PCT/US2005/013836
申请日：2005-04-21
申请人： ADVANCED TECHNOLOGY MATERIALS, INC. , HAN, Jianwen , KING, Mackenzie , WANG, Weihua , TOM, Glenn , JUNG, Jay
发明人： HAN, Jianwen , KING, Mackenzie , WANG, Weihua , TOM, Glenn , JUNG, Jay
IPC分类号： C25D5/18
CPC分类号： C25D5/18 , C25D1/00 , C25D3/38 , C25D21/12 , C25D21/14 , G01N27/42 , H05K3/188 , H05K2203/163
摘要： The present invention relates in general to real-time analysis of electrochemical deposition (ECD) metal plating solutions, for the purpose of reducing plating defects and achieving high quality metal deposition. The present invention provides various new electrochemical analytical cell designs for reducing cross-contamination and increasing analytical signal strength. The present invention also provides improved plating protocols for increasing potential signal strength and reducing the time required for each measurement cycle. Further, the present invention provides new methods and algorithms for simultaneously determining concentrations of suppressor, accelerator, and leveler in a sample ECD solution within three experimental runs. A particularly preferred embodiment of the present invention provides a method for simultaneously determining concentrations of all three organic additives within a single experimental run by using a single analytical cell, while interactions between such additives are properly accounted for.
摘要翻译：本发明一般涉及电化学沉积（ECD）金属电镀溶液的实时分析，以减少电镀缺陷并实现高质量的金属沉积。本发明提供用于减少交叉污染和增加分析信号强度的各种新的电化学分析池设计。本发明还提供改进的电镀方案，用于增加潜在的信号强度并减少每个测量周期所需的时间。此外，本发明提供了用于在三个实验运行中同时测定样品ECD溶液中的抑制剂，促进剂和矫味剂的浓度的新方法和算法。本发明的一个特别优选的实施方案提供了一种通过使用单一分析电池同时测定单个实验运行中所有三种有机添加剂的浓度的方法，同时适当地考虑了这些添加剂之间的相互作用。

5. 发明申请

WO2008157345A3 WAFER RECLAMATION COMPOSITIONS AND METHODS 审中-公开
公开(公告)号：WO2008157345A3
公开(公告)日：2008-12-24
申请号：PCT/US2008/066906
申请日：2008-06-13
申请人： ADVANCED TECHNOLOGY MATERIALS, INC. , VISINTIN, Pamela , JIANG, Ping , KORZENSKI, Michael , KING, Mackenzie , HAN, Jianwen , HILGARTH, Monica , LIU, Jun , ZHOU, Renjie , MINSEK, David
发明人： VISINTIN, Pamela , JIANG, Ping , KORZENSKI, Michael , KING, Mackenzie , HAN, Jianwen , HILGARTH, Monica , LIU, Jun , ZHOU, Renjie , MINSEK, David
IPC分类号： C11D7/08 , G03F7/42
摘要： Removal compositions and processes for removing at least one material layer from a rejected microelectronic device structure having same thereon. The removal composition preferably includes hydrofluoric acid. The composition achieves substantial removal of the material(s) to be removed while not damaging the layers to be retained, for reclaiming, reworking, recycling and/or reuse of said structure. Processes include the monitoring and modifying said compositions.

6. 发明申请

WO2005108650A1 METHODS AND APPARATUS FOR DETERMINING ORGANIC COMPONENT CONCENTRATIONS IN AN ELECTROLYTIC SOLUTION 审中-公开
标题翻译：用于确定电解液中有机组分浓度的方法和装置
公开(公告)号：WO2005108650A1
公开(公告)日：2005-11-17
申请号：PCT/US2005/013211
申请日：2005-04-20
申请人： ADVANCED TECHNOLOGY MATERIALS, INC , HAN, Jianwen , KING, Mackenzie
发明人： HAN, Jianwen , KING, Mackenzie
IPC分类号： C25D5/00
CPC分类号： C25D21/14 , C25D3/38
摘要： The present invention relates to a method and apparatus for determining organic additive concentrations in a sample electrolytic solution, preferably a copper electroplating solution, by measuring the double layer capacitance of a measuring electrode in such sample solution. Specifically, the present invention utilizes the correlation between double layer capacitance and the organic additive concentration for concentration mapping, based on the double layer capacitance measured for the sample electrolytic solution.
摘要翻译：本发明涉及通过测量这种样品溶液中的测量电极的双层电容来测定样品电解溶液（优选铜电镀溶液）中的有机添加剂浓度的方法和装置。具体地说，本发明基于对样品电解液测量的双层电容，利用双层电容与浓度映射的有机添加剂浓度之间的相关性。

7. 发明申请

WO2005108969A2 METHODS FOR ANALYZING INORGANIC COMPONENTS OF AN ELECTROLYTIC SOLUTION, AND/OR CLEANING AN ELECTROCHEMICAL ANALYTICAL CELL 审中-公开
标题翻译：用于分析电解液的无机组分和/或清洁电化学分析细胞的方法
公开(公告)号：WO2005108969A2
公开(公告)日：2005-11-17
申请号：PCT/US2005/013227
申请日：2005-04-19
申请人： ADVANCED TECHNOLOGY MATERIAL INC. , HAN, Jianwen , KING, Mackenzie , WANG, Weihua
发明人： HAN, Jianwen , KING, Mackenzie , WANG, Weihua
IPC分类号： G01N27/26
CPC分类号： G01N27/49 , G01N27/38
摘要： Cyclic electric potential is employed for measuring copper and sulfuric acid concentration in an electrochemical copper-plating solution. Such cyclic electric potential is further employed for cleaning electrode surface in an electrochemical analytical cell.
摘要翻译：循环电位用于测量电化学镀铜溶液中的铜和硫酸浓度。这种循环电位进一步用于清洁电化学分析池中的电极表面。

8. 发明申请

WO2003106990A1 METHOD FOR DETERMINING CONCENTRATIONS OF ADDITIVES IN ACID COPPER ELECTROCHEMICAL DEPOSITION BATHS 审中-公开
标题翻译：用于确定酸性电化学沉积物中添加剂浓度的方法
公开(公告)号：WO2003106990A1
公开(公告)日：2003-12-24
申请号：PCT/US2003/017568
申请日：2003-06-04
申请人： ADVANCED TECHNOLOGY MATERIALS, INC.
发明人： HAN, Jianwen , ETTERMAN, Ronni, M. , ROBERTSON, Peter, M. , BHELLA, Richard , PRICE, David
IPC分类号： G01N27/42
CPC分类号： G01N27/4161 , G01N27/42
摘要： The present invention relates to a method for determining concentration of brightener and leveler contained in an aqueous acid metal electroplating solution, which minimizes the interference between the effects of the brightener and the effects of the leveler, by firstly determining the concentration of the brightener at a first set of measurement conditions, and secondly determining the concentration of the leveler at a second set of measurement conditions, provided that the first set of measurement conditions differ from the second set of measurement conditions on either (1) the rotation speed of a rotating disc electrode used for measuring plating potential of said aqueous acid metal electroplating solution, or (2) the electroplating duration at which the plating potential of said aqueous acid metal electroplating solution is measured, such that the rotation speed of the first set of measurement conditions is lower than the rotation speed of the second set of measurement conditions, and that the electroplating duration of the first set of measurement conditions is shorter than that of the second set of measurement conditions.
摘要翻译：本发明涉及一种用于测定含水酸性金属电镀溶液中的增白剂和矫正剂浓度的方法，其通过首先确定增白剂的浓度来最小化增白剂的作用和矫味剂的影响之间的干扰第一组测量条件，其次在第二组测量条件下确定矫直机的浓度，条件是第一组测量条件与第二组测量条件不同，（1）旋转盘的旋转速度用于测量所述含水酸性金属电镀溶液的电镀电位的电极，或（2）测量所述酸性金属电镀溶液的电镀电位的电镀持续时间，使得第一组测量条件的转速较低比第二组测量条件的转速高，并且第一组测量条件的电镀持续时间比第二组测量条件的电镀持续时间短。

9. 发明公开

EP1747449A2 ONE-POINT RECALIBRATION METHOD FOR REDUCING ERROR IN CONCENTRATION MEASUREMENTS FOR AN ELECTROLYTIC SOLUTION 审中-公开
标题翻译：单点校准为降低浓度测量的过失的电解质溶液
公开(公告)号：EP1747449A2
公开(公告)日：2007-01-31
申请号：EP05735505.9
申请日：2005-04-15
申请人： ADVANCED TECHNOLOGY MATERIALS, INC.
发明人： HAN, Jianwen , KING, Mackenzie , TOM, Glenn , LURCOTT, Steven, M.
IPC分类号： G01N27/26 , G01R19/00
CPC分类号： G01N27/42 , C25D21/12
摘要： The present invention relates to a method for mathematically re-calibrating and adjusting an initial concentration analysis model that suffers from electrochemical measurement errors caused by surface state changes in the working/counter/reference electrode after extended usage. Specifically, such recalibration method reimburses long-term drift in the electrochemical measurements based on a single point testing.

10. 发明公开

EP1747305A2 METHODS AND APPARATUSES FOR MONITORING ORGANIC ADDITIVES IN ELECTROCHEMICAL DEPOSITION SOLUTIONS 审中-公开
标题翻译：方法和仪器监测有机添加剂在解电化学沉积
公开(公告)号：EP1747305A2
公开(公告)日：2007-01-31
申请号：EP05738985.0
申请日：2005-04-21
申请人： ADVANCED TECHNOLOGY MATERIALS, INC.
发明人： HAN, Jianwen , KING, Mackenzie , WANG, Weihua , TOM, Glenn , JUNG, Jay
IPC分类号： C25D5/18 , G01N27/26
CPC分类号： C25D5/18 , C25D1/00 , C25D3/38 , C25D21/12 , C25D21/14 , G01N27/42 , H05K3/188 , H05K2203/163
摘要： The present invention relates in general to real-time analysis of electrochemical deposition (ECD) metal plating solutions, for the purpose of reducing plating defects and achieving high quality metal deposition. The present invention provides various new electrochemical analytical cell designs for reducing cross-contamination and increasing analytical signal strength. The present invention also provides improved plating protocols for increasing potential signal strength and reducing the time required for each measurement cycle. Further, the present invention provides new methods and algorithms for simultaneously determining concentrations of suppressor, accelerator, and leveler in a sample ECD solution within three experimental runs. A particularly preferred embodiment of the present invention provides a method for simultaneously determining concentrations of all three organic additives within a single experimental run by using a single analytical cell, while interactions between such additives are properly accounted for.

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