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    • 6. 发明申请
    • CHEMICAL REAGENT DELIVERY SYSTEM UTILIZING IONIC LIQUID STORAGE MEDIUM
    • 化学试剂输送系统利用离子液体储存介质
    • WO2007134183A3
    • 2008-01-17
    • PCT/US2007068693
    • 2007-05-10
    • ADVANCED TECH MATERIALSARNO JOSE IWANG LUPINGCOOPER EMANUEL I
    • ARNO JOSE IWANG LUPINGCOOPER EMANUEL I
    • B01J8/02B01J35/02
    • F17C11/00
    • A system (10) including a reagent supply container (12) in which a vessel (14) holds a composition including a chemical reagent dissolved or dispersed in a storage liquid (18) that is reversibly interactive with the chemical reagent to store the chemical reagent therein, and an ultrasonic energy source (19, 32, 34) adapted to introduce ultrasonic energy into the composition to liberate the chemical reagent therefrom for dispensing from the vessel of the reagent supply container. The ultrasonic energy source can be internally provided in the container, or may be provided as part of an external ultrasonic energy impingement unit (112), in which the stored chemical reagent, e.g., a microelectronic device manufacturing reagent, is extracted from the liquid storage medium for transport to a reagent-utilizing process or facility (38). The liquid storage medium may for example include an ionic liquid with which the chemical reagent is reversibly taken up, and subsequently released under ultrasonic energy exposure dispensing conditions.
    • 一种系统(10),包括试剂供应容器(12),其中容器(14)保持包含溶解或分散在与化学试剂可逆地相互作用的储存液体(18)中的化学试剂的组合物,以储存化学试剂 和超声能量源(19,32,34),其适于将超声能量引入所述组合物中以释放其中的化学试剂,用于从所述试剂供应容器的容器分配。 超声能量源可以内部设置在容器中,或者可以作为外部超声波能量冲击单元(112)的一部分提供,其中存储的化学试剂例如微电子器件制造试剂从液体存储器 用于运送到试剂利用过程或设施(38)的介质。 液体存储介质可以例如包括离子液体,化学试剂可以通过该离子液体被可逆地吸收,并且随后在超声能量曝光分配条件下释放。
    • 7. 发明申请
    • DELIVERY OF LOW PRESSURE DOPANT GAS TO A HIGH VOLTAGE ION SOURCE
    • 将低压多孔气体输送到高压离子源
    • WO2007027965A2
    • 2007-03-08
    • PCT/US2006034135
    • 2006-08-29
    • ADVANCED TECH MATERIALSARNO JOSE IOLANDER W KARLKAIM ROBERT
    • ARNO JOSE IOLANDER W KARLKAIM ROBERT
    • B05D3/00
    • H01J37/08H01J27/02H01J37/3172H01J2237/0203
    • A system for delivery of low-pressure dopant gas to a high-voltage ion source in the doping of semiconductor substrates, in which undesired ionization of the gas is suppressed prior to entry into the high-voltage ion source, by modulating electron energy upstream of the high-voltage ion source so that electron acceleration effects are reduced to below a level supporting an electronic ionization cascade. The gas delivery system in a specific application includes a gas flow passage, a voltage generator electrically coupled with at least a portion of the gas flow passage to impose an electric field thereon, and an obstructive structure that is deployed to modulate acceleration length of electrons of the low-pressure gas in relation to ionization potential of the gas, to suppress ionization in the gas flow passage.
    • 一种用于在半导体衬底的掺杂中向高电压离子源传送低压掺杂气体的系统,其中在进入高压离子源之前,气体的不期望的电离被抑制,通过调制 高电压离子源,使得电子加速效应降低到低于支持电子离子化级联的水平。 具体应用中的气体输送系统包括气体流动通道,与气体流动通道的至少一部分电耦合以在其上施加电场的电压发生器,以及阻塞结构,其被展开以调制电子的加速度长度 相对于气体的电离电位的低压气体,抑制气体流路中的电离。