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    • 1. 发明申请
    • TWO-TRANSISTOR ZERO-POWER ELECTRICALLY-ALTERABLE NON-VOLATILE LATCH
    • 双转子零电压可变电压非易失性锁存器
    • WO1996021273A2
    • 1996-07-11
    • PCT/US1996000306
    • 1996-01-04
    • ACTEL CORPORATION
    • ACTEL CORPORATIONKOWSHIK, Vikram
    • H03K03/356
    • H03K17/24H01L27/115H03K3/356008
    • A two-transistor, zero-power, electrically-alterable non-volatile latch element comprises an input node, an output node, and an erase node. A P-Channel MOS transistor has a source connected to a source of first electrical potential, a drain connected to the output node, a control gate connected to the input node, and a floating gate capacitively coupled to the control gate. An N-Channel MOS transistor has a source connected to a source of second electrical potential lower than the first electrical potential, a drain connected to the output node, a control gate connected to the input node, and a floating gate capacitively coupled to the control gate and electrically connected to the floating gate of the P-Channel MOS transistor. The floating gates of the P-Channel MOS transistor and the N-Channel MOS transistor are capacitively coupled to the erase node via a tunnel dielectric.
    • 双晶体管零功率可电可变非易失性锁存元件包括输入节点,输出节点和擦除节点。 P沟道MOS晶体管具有连接到第一电位源的源极,连接到输出节点的漏极,连接到输入节点的控制栅极和电容耦合到控制栅极的浮动栅极。 N沟道MOS晶体管具有连接到低于第一电位的第二电位源的源极,连接到输出节点的漏极,连接到输入节点的控制栅极,以及电容耦合到控制器的浮动栅极 栅极并电连接到P沟道MOS晶体管的浮置栅极。 P沟道MOS晶体管和N沟道MOS晶体管的浮置栅极经由隧道电介质电容耦合到擦除节点。